From koseki at stanford.edu  Tue Apr  8 12:47:06 2008
From: koseki at stanford.edu (Shinichi Koseki)
Date: Tue, 08 Apr 2008 12:47:06 -0700
Subject: [PQuest] low DC voltage
Message-ID: <20080408124706.qhetmazeowckscss@webmail.stanford.edu>

Dear PQuest community,

The DC voltage is low today, and the plasma is dark.
Also, the chamber pressure is way too high, as well as
it is difficult to obtain the impedance matching.

Previous user (mitsuru1) also told me that he got the
dark plasma.

Would you, anyone who knows the machine well, please
improve the situation ? Thank you...

With my Ar/Cl2 recipe (koseki.rcp, initially copied from davegaas.rcp)

Yesterday (operated normally)
RF: set 200/ forward 202.9/ reflected 0.4
microwave: set 40/ forward 45/ reflected 1
DC bias: -59.6
pressure: 3.8mtorr
stub: 975/900/50

Today (operating strangely)
RF: set 200/ forward 202.9/ reflected 9.9
microwave: set 40/ forward 46/ reflected 2
DC bias: -27.8
pressure: 94.2mtorr
stub: 1385/1330/1440

Shinichi


From jimkruger at yahoo.com  Fri Apr 18 12:41:00 2008
From: jimkruger at yahoo.com (jim kruger)
Date: Fri, 18 Apr 2008 12:41:00 -0700 (PDT)
Subject: PQ after clean 5-18-08
Message-ID: <599426.64826.qm@web38906.mail.mud.yahoo.com>

PQuest check  4-18-08

After the  chamber clean and Turbo pump scare, I
checked the Leak-up rate and the  He  blow-by on
PQuest.

The leak-up rate was   2.2 mTorr/minute, but this was
after a GaAs recipe chamber conditioning and only one
day after the Wet Clean.  The ?Best Ever? leak-up
rate,  expected after ~ days since wet lcean and after
an O2 chamber clean is about 1.0 mTorr / min.  I judge
~2 to be OK, 5 or 10 is a problem.

The back-side wafer He blow-by is very good right now.
 The issue is that the there is a high flow impedance
between the pressure monitor and the chuck so the
pressure behind the wafer is lower for high blow-by
flows and thermal impedance is raised.

For Chuck Temperature = 11 C  (chiller at 0, set point
= 13 C), the ?no wafer  ? flow was 11.1 sccm .  With a
 new carrier wafer in place  it was 5.5 sccm.  This
gives a delta of 5.6 sccm, very good.

I judge a He blow-by delta of 3 or 4 to be good, 2
marginal, 1 or less poor.  

The flows are all temperature dependent  (lower for
higher Chuck temperature) so you need to characterize
your recipe.

jim



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From jimkruger at yahoo.com  Fri Apr 18 14:19:47 2008
From: jimkruger at yahoo.com (jim kruger)
Date: Fri, 18 Apr 2008 14:19:47 -0700 (PDT)
Subject: PQuest after clean,  4-18-08--corrected date
Message-ID: <869769.66857.qm@web38908.mail.mud.yahoo.com>

Sorry, I mis-typed the date.

jim
--- jim kruger <jimkruger at yahoo.com> wrote:

> Date: Fri, 18 Apr 2008 12:41:00 -0700 (PDT)
> From: jim kruger <jimkruger at yahoo.com>
> Subject: PQ after clean 5-18-08
> To: pquest <pquest at snf.stanford.edu>
> 
> PQuest check  4-18-08
> 
> After the  chamber clean and Turbo pump scare, I
> checked the Leak-up rate and the  He  blow-by on
> PQuest.
> 
> The leak-up rate was   2.2 mTorr/minute, but this
> was
> after a GaAs recipe chamber conditioning and only
> one
> day after the Wet Clean.  The ?Best Ever? leak-up
> rate,  expected after ~ days since wet lcean and
> after
> an O2 chamber clean is about 1.0 mTorr / min.  I
> judge
> ~2 to be OK, 5 or 10 is a problem.
> 
> The back-side wafer He blow-by is very good right
> now.
>  The issue is that the there is a high flow
> impedance
> between the pressure monitor and the chuck so the
> pressure behind the wafer is lower for high blow-by
> flows and thermal impedance is raised.
> 
> For Chuck Temperature = 11 C  (chiller at 0, set
> point
> = 13 C), the ?no wafer  ? flow was 11.1 sccm .  With
> a
>  new carrier wafer in place  it was 5.5 sccm.  This
> gives a delta of 5.6 sccm, very good.
> 
> I judge a He blow-by delta of 3 or 4 to be good, 2
> marginal, 1 or less poor.  
> 
> The flows are all temperature dependent  (lower for
> higher Chuck temperature) so you need to
> characterize
> your recipe.
> 
> jim
> 
> 
> 
>      
>
____________________________________________________________________________________
> Be a better friend, newshound, and 
> know-it-all with Yahoo! Mobile.  Try it now. 
>
http://mobile.yahoo.com/;_ylt=Ahu06i62sR8HDtDypao8Wcj9tAcJ
> 



      ____________________________________________________________________________________
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From lwchang at stanford.edu  Fri Apr 18 16:39:42 2008
From: lwchang at stanford.edu (Li-Wen Chang)
Date: Fri, 18 Apr 2008 16:39:42 -0700
Subject: Fwd: pquest ECR error
In-Reply-To: <8ab79e460804181618w34662505gd95f96341edd4efd@mail.gmail.com>
References: <8ab79e460804181618w34662505gd95f96341edd4efd@mail.gmail.com>
Message-ID: <8ab79e460804181639k88d1e08nb64a8ea294c9f958@mail.gmail.com>

Hi PQuest users,
 An ECR error window popped out when I tried to use OXYGEN3.
 I've closed the error window but it looks like the program aborts itself.
Since there are several "ECR system software" under PQuest program I'm
not sure which to execute...
Does anyone know how to restart the program?

 Thank you very much
 Li-Wen


From tdo at stanford.edu  Mon Apr 28 15:29:46 2008
From: tdo at stanford.edu (Thomas O'Sullivan)
Date: Mon, 28 Apr 2008 15:29:46 -0700
Subject: Tuesday morning slot released 9am-noon
Message-ID: <48164FDA.5080903@stanford.edu>