From mihuhou at stanford.edu  Mon Jun  1 22:55:43 2009
From: mihuhou at stanford.edu (Ying Chen)
Date: Mon, 1 Jun 2009 22:55:43 -0700 (PDT)
Subject: pquest released 6/2, 9:00am-12:00pm and more
In-Reply-To: <4d36fb940904300837i7d69e3f0t435051fe7d01a922@mail.gmail.com>
Message-ID: <1593653135.1560871243922143918.JavaMail.root@zm06.stanford.edu>

Hi, Pquest users,

I found the DC reading of pquest is 50~60% higher than previous when exactly the same recipe was used. Old Oxygen3.RCP has DC voltage of 170V, so I changed the RF to 50W (from 100W) to lower the DC reading to 113V.

Ying


From mihuhou at stanford.edu  Thu Jun  4 18:53:36 2009
From: mihuhou at stanford.edu (Ying Chen)
Date: Thu, 4 Jun 2009 18:53:36 -0700 (PDT)
Subject: pquest problem report/pump might have been turned off.
In-Reply-To: <4d36fb940904300837i7d69e3f0t435051fe7d01a922@mail.gmail.com>
Message-ID: <1669806522.2278161244166816193.JavaMail.root@zm06.stanford.edu>

Hi, pquest users,

There was an application error when I was starting a recipe. After I clear the error by terminating the application and rerunning it, the pressure became abnormal. The pressure couldn't be regulated to the setpoint but became higher and higher over time.

I met this same problem ago and Jim Kruger suggested it might have been a pump being turned off when I terminated the application. I didn't know how to restart the pump so had to quit my run.

Does anyone know how to make the system return to normal? I have reservation tomorrow morning and really hope somebody can fix the system by that time.

Thanks!
Ying


From jimkruger at yahoo.com  Fri Jun  5 19:22:15 2009
From: jimkruger at yahoo.com (jim kruger)
Date: Fri, 5 Jun 2009 19:22:15 -0700 (PDT)
Subject: Pquest
Message-ID: <453018.62695.qm@web38901.mail.mud.yahoo.com>


PQuest seems to be working OK except:

still no chuck heaters but cooling flow seems better, i.e "plasma heating" seems less than before.

RF power must be divided by about a factor of 2 again to get the same bias voltage as earlier this year,  and what seems to be the same etch selectivity.
 This is a second factor of 2:  a recipe that used 40 watts RF last year required only 20 watts after the Holiday shutdown modifications.  After the latest repairs now the required RF is now 9 watts.

He blow-by is bad on standard wafers (6 or 7, with 8 = max.).  I found today that thick (850um), double polished wafers give a perfect seal.
  The He offsets have been zeroed.  Perfect seal used to show 3 sccm He (so 11 sccm flow with no wafer).  Now perfect is 0 sccm He and "no wafer" = 8.

jim

--- On Fri, 6/5/09, Andrei Faraon <faraon at stanford.edu> wrote:

> From: Andrei Faraon <faraon at stanford.edu>
> Subject: Pquest
> To: jimkruger at yahoo.com
> Date: Friday, June 5, 2009, 11:09 AM
> Hi Jim,
> 
> I just wanted to ask you about the current status for
> pquest. Is it
> operating OK? Any advice on the etching parameters?
> 
> -- 
> Andrei Faraon
> 
> Stanford University, Applied Physics
> 316 Via Pueblo Mall
> Stanford, CA, 94305
> Mobile: 650 714 7881
> Office: 650 723 2279
> www.stanford.edu/~faraon
> 


      


From dlee76 at stanford.edu  Tue Jun  9 13:59:38 2009
From: dlee76 at stanford.edu (Donkoun Lee)
Date: Tue, 09 Jun 2009 13:59:38 -0700
Subject: Etching condition for Cr and SiO2
Message-ID: <C6541B4A.20E0%dlee76@stanford.edu>

Hi all:

I plan to seperately etch 100 nm-thick SiO2 and ~50 nm thick Cr layers.

Does anyone have some experiences of the etching process for Cr and SiO2
layer? If you know, can I share your experience, such as ECR power, RF
power, gas, flow rate, working pressure, and etching rate of each material?

I really appreciate for your time and kind consideration, in advance.
Kind Regards,
Donkoun Lee

-- 
Donkoun Lee
 
Ph.D Candidate
Prof. Shan X. Wang's Group
Dept. of Materials Science & Engineering, Stanford University
McCullough Building, Rm 208, 476 Lomita Mall, Stanford, CA, 94305-4045

Office: (650)-723-2939
Fax: (650)-736-1984




From shott at stanford.edu  Fri Jun 12 17:34:02 2009
From: shott at stanford.edu (John Shott)
Date: Fri, 12 Jun 2009 17:34:02 -0700
Subject: Weekend Update!!!
Message-ID: <4A32F3FA.7080503@stanford.edu>

Pquest Community:

I believe that we have good news to report:  as of 5:20 pm Friday 
evening, the pquest is under vacuum and we believe that we have 
addressed 3 significant issues:

1. We have replaced the ferrofluidic feedthrough that Jim Kruger 
reported to be leaking earlier this week.  Fortunately, we had one of 
the spare, chemical-resistant ones on hand.

2. Elmer and Jim Haydon determined that the old belt driven assembly 
that drives the wafer clamp up and down was likely placing lateral 
torque on the ferrofluidic feedthrough .... resulting in shorter than 
expected life.  They have done a nice (and quick) job of converting it 
to an on-axis direct drive system.  Note: for those of you used to the 
sound of the "whine" as the clamp mechanism drives up and down, be 
forewarned: it's pretty silent now so you won't get the same audible cues.

3. In the process of addressing these issues during final testing, we 
experienced problems with the drive mechanism that moves the wafer arm 
to/from the load lock onto the chuck.  We have disassembled and repaired 
the drive mechanism.   Note: for those of you used to the sound of the 
"click, click, click" as the wafer arm pulls out of the etch chamber, it 
is now also pretty silent.  No more audible cues there either.

Cesar is monitoring the vacuum system now and will make a final check of 
wafer load/unload and wafer clamp operations and will also likely run an 
oxygen plasma as well.

Barring any surprises, I fully expect that Cesar will release the tool 
for use by about 7 p.m. this evening.

We are hopeful that this will allow some of you to get some useful 
etching done over the weekend.  At this point, I believe that the only 
thing yet to be resolved is the delivery and installation of the chuck 
heaters .... so we do not yet have the electrically heated chuck.  Other 
than that, however, I believe that the system to be fully functional.

Good luck and happy processing,

John



From mihuhou at stanford.edu  Sat Jun 13 11:09:40 2009
From: mihuhou at stanford.edu (Ying Chen)
Date: Sat, 13 Jun 2009 11:09:40 -0700 (PDT)
Subject: Pquest RFOUT
In-Reply-To: <4A32F3FA.7080503@stanford.edu>
Message-ID: <490628602.3791161244916580823.JavaMail.root@zm06.stanford.edu>

Hi, PQ users,

I was trying to use OXYGEN3.RCP to clean the chamber. But the RF was showing "RFOUT" with RF power reading <5 and the matching system always went out of limit.

Does anyone know how to solve this?

Thanks!
Ying


From mihuhou at stanford.edu  Wed Jun 17 20:00:20 2009
From: mihuhou at stanford.edu (Ying Chen)
Date: Wed, 17 Jun 2009 20:00:20 -0700 (PDT)
Subject: Again. Re: Pquest RFOUT
In-Reply-To: <490628602.3791161244916580823.JavaMail.root@zm06.stanford.edu>
Message-ID: <738726643.4343791245294020228.JavaMail.root@zm06.stanford.edu>

RFOUT again! 

Users before me,
Was RF ok when you were using the pquest today?

Thanks!
Ying

----- Original Message -----
From: Ying Chen <mihuhou at stanford.edu>
To: pquest at snf.stanford.edu
Sent: Sat, 13 Jun 2009 11:09:40 -0700 (PDT)
Subject: Pquest RFOUT

Hi, PQ users,

I was trying to use OXYGEN3.RCP to clean the chamber. But the RF was showing "RFOUT" with RF power reading <5 and the matching system always went out of limit.

Does anyone know how to solve this?

Thanks!
Ying



From senyod at yahoo.com  Thu Jun 18 05:54:05 2009
From: senyod at yahoo.com (Senyo Dogbe)
Date: Thu, 18 Jun 2009 05:54:05 -0700 (PDT)
Subject: Again. Re: Pquest RFOUT
Message-ID: <530639.99614.qm@web36106.mail.mud.yahoo.com>


Ying,
I used it to etch 3 wafers successfully. There was no RFOUT problem. Jim Krugger also did not have this problem.
Senyo

--- On Wed, 6/17/09, Ying Chen <mihuhou at stanford.edu> wrote:

> From: Ying Chen <mihuhou at stanford.edu>
> Subject: Again. Re: Pquest RFOUT
> To: "Ying Chen" <mihuhou at stanford.edu>
> Cc: pquest at snf.stanford.edu
> Date: Wednesday, June 17, 2009, 8:00 PM
> RFOUT again! 
> 
> Users before me,
> Was RF ok when you were using the pquest today?
> 
> Thanks!
> Ying
> 
> ----- Original Message -----
> From: Ying Chen <mihuhou at stanford.edu>
> To: pquest at snf.stanford.edu
> Sent: Sat, 13 Jun 2009 11:09:40 -0700 (PDT)
> Subject: Pquest RFOUT
> 
> Hi, PQ users,
> 
> I was trying to use OXYGEN3.RCP to clean the chamber. But
> the RF was showing "RFOUT" with RF power reading <5 and
> the matching system always went out of limit.
> 
> Does anyone know how to solve this?
> 
> Thanks!
> Ying
> 
>