From janp at stanford.edu  Thu Jul 12 16:09:20 2012
From: janp at stanford.edu (Jan Petykiewicz)
Date: Thu, 12 Jul 2012 16:09:20 -0700
Subject: PQuest free NOW until 6pm
Message-ID: <CAEOdNiELVLbuJvPXUEypDCxv9JLq1MaoiAuz7cMhymyos9YD=Q@mail.gmail.com>

Need heater for process.
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From kys86 at stanford.edu  Thu Jul 12 19:10:24 2012
From: kys86 at stanford.edu (Yangsen Kang)
Date: Thu, 12 Jul 2012 19:10:24 -0700
Subject: PQuest release now until 8pm
Message-ID: <CABy0QrJA7qiP_2G4EHBKXzym6MaWC9mqR6E-BC0ZOA8vCsOt7w@mail.gmail.com>

finish early

Best wishes,

Yangsen Kang


From popomoo at stanford.edu  Mon Jul 16 14:20:32 2012
From: popomoo at stanford.edu (Sangmoo Jeong)
Date: Mon, 16 Jul 2012 14:20:32 -0700 (PDT)
Subject: Sn as an etching mask?
In-Reply-To: <1626083086.29802457.1342473315885.JavaMail.root@zm02.stanford.edu>
Message-ID: <1062548015.29853319.1342473632407.JavaMail.root@zm02.stanford.edu>

Dear pquest users

I'd like to use the pquest machine with a thin-film of Sn.
The thickness of Sn would be 30~60 nm and I plan to use it as an etching mask for Si.
And, the gas etchant would be Cl2, but I have no idea about by-products after etching.

Mary was concerned about the doping effect to III-V materials by Sn.
If I can use Sn on this machine, I will plan to use it about once a week for less than 30 min.

I will definitely request SpecMat about the feasibility check of Sn for pquest,
but I want to check first whether any pquest users have problems with Sn.
Please let me know if you have opinions or concerns.

Thanks.


Best
Sangmoo


From jimkruger at yahoo.com  Mon Jul 16 15:41:54 2012
From: jimkruger at yahoo.com (jim kruger)
Date: Mon, 16 Jul 2012 15:41:54 -0700 (PDT)
Subject: Sn as an etching mask?
In-Reply-To: <1062548015.29853319.1342473632407.JavaMail.root@zm02.stanford.edu>
References: <1626083086.29802457.1342473315885.JavaMail.root@zm02.stanford.edu> <1062548015.29853319.1342473632407.JavaMail.root@zm02.stanford.edu>
Message-ID: <1342478514.48882.YahooMailNeo@web163105.mail.bf1.yahoo.com>

Thanks for asking first.? 


Sn is allowed, but it will not serve as a mask for CL2 etch.? Sn is rapidly etched in Cl2.
It is also very soft and sputters rapidly.

It is not likely to cause III-V issues since SnCl4 is volatile and will be pumped away (BP = 114C).
For even more caution, try to use it in Fluorine week, just before the wet clean.? 

I think you will need a different mask material anyway.


Why Sn?

SiO2 or Cr would make good masks for Cl2.
What exactly is your requirement?

jim



________________________________
 From: Sangmoo Jeong <popomoo at stanford.edu>
To: pquest at snf.stanford.edu 
Sent: Monday, July 16, 2012 2:20 PM
Subject: Sn as an etching mask?
 
Dear pquest users

I'd like to use the pquest machine with a thin-film of Sn.
The thickness of Sn would be 30~60 nm and I plan to use it as an etching mask for Si.
And, the gas etchant would be Cl2, but I have no idea about by-products after etching.

Mary was concerned about the doping effect to III-V materials by Sn.
If I can use Sn on this machine, I will plan to use it about once a week for less than 30 min.

I will definitely request SpecMat about the feasibility check of Sn for pquest,
but I want to check first whether any pquest users have problems with Sn.
Please let me know if you have opinions or concerns.

Thanks.


Best
Sangmoo
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From kys86 at stanford.edu  Thu Jul 19 15:26:22 2012
From: kys86 at stanford.edu (Yangsen Kang)
Date: Thu, 19 Jul 2012 15:26:22 -0700
Subject: PQuest release until 6pm
Message-ID: <CABy0QrJ8njp9_seVBW1BtsjM1QhkKaNc0zLv_TJttHEeGfz3wQ@mail.gmail.com>

Sorry for the late notice. Sample is not ready.


Best wishes,

Yangsen Kang


From bucklesm at stanford.edu  Thu Jul 19 15:29:39 2012
From: bucklesm at stanford.edu (Sonia Mary Buckley)
Date: Thu, 19 Jul 2012 15:29:39 -0700 (PDT)
Subject: PQuest release until 6pm
In-Reply-To: <CABy0QrJ8njp9_seVBW1BtsjM1QhkKaNc0zLv_TJttHEeGfz3wQ@mail.gmail.com>
Message-ID: <780902835.25090695.1342736979088.JavaMail.root@zm09.stanford.edu>

taken, thanks

----- Original Message -----
From: "Yangsen Kang" <kys86 at stanford.edu>
To: pquest at snf.stanford.edu
Sent: Thursday, July 19, 2012 3:26:22 PM
Subject: PQuest release until 6pm

Sorry for the late notice. Sample is not ready.


Best wishes,

Yangsen Kang


From mtang at stanford.edu  Wed Jul 25 13:57:33 2012
From: mtang at stanford.edu (Mary Tang)
Date: Wed, 25 Jul 2012 13:57:33 -0700
Subject: Request to extend Fluorine week until Monday?
Message-ID: <50105DBD.7020807@stanford.edu>

Dear Pquest users --

We have a special request from a user to extend fluorine week to Monday 
morning, July 30.  Does this pose a problem for anyone? (Especially any 
of you already scheduled for Friday afternoon through Monday.)  If so, 
please let us know by tomorrow (Thursday) at 5 pm, so everyone can plan 
accordingly.

Thanks --

Team Etch

-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
Paul G. Allen Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu



From mtang at stanford.edu  Thu Jul 26 15:58:45 2012
From: mtang at stanford.edu (Mary Tang)
Date: Thu, 26 Jul 2012 15:58:45 -0700
Subject: Fluorine time extended to Monday
Message-ID: <5011CBA5.7050803@stanford.edu>

Hello pquest users --

No one has voiced any objection to extending the fluorine time to Monday 
morning, so it's now official -- the chamber clean will be on Monday 
morning.  Jim Kruger has generously volunteered to run a test before and 
after the clean to get some data on the tool baseline, so I'll leave the 
reservation for Friday morning.

Thanks all!

Mary

-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
Paul G. Allen Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu



From vijayn at stanford.edu  Sat Jul 28 07:38:56 2012
From: vijayn at stanford.edu (Vijay Kris Narasimhan)
Date: Sat, 28 Jul 2012 07:38:56 -0700 (PDT)
Subject: Time released this AM
Message-ID: <431005992.52396546.1343486336703.JavaMail.root@zm02.stanford.edu>


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From wshuang at stanford.edu  Tue Jul 31 14:20:55 2012
From: wshuang at stanford.edu (Shuang Wang)
Date: Tue, 31 Jul 2012 14:20:55 -0700
Subject: Request to start Pquest Fluorine time early
Message-ID: <CAMQRg42MFMjG1crx8qeJRiVXTQR4gEjfLsT8it6BQ5FhcCaNTg@mail.gmail.com>

Hi Labmembers,

I'm wondering if it is OK to start Pquest Fluorine time earlier. The
scheduled time is next Monday 08/06. I'm wondering if I could start using
Fluorine gas this Friday night? If you have experiment schedule that can't
have Fluorine in the chamber during weekend, could you please send me an
email at wshuang at stanford.edu? Thanks a lot!


Yours,
Shuang

-- 
Shuang Wang,
Department of Electrical Engineering,
Stanford University, CA, 94305
Tel: 650-862-6603
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From jimkruger at yahoo.com  Tue Jul 31 18:48:49 2012
From: jimkruger at yahoo.com (jim kruger)
Date: Tue, 31 Jul 2012 18:48:49 -0700 (PDT)
Subject: Request to start Pquest Fluorine time early
In-Reply-To: <CAMQRg42MFMjG1crx8qeJRiVXTQR4gEjfLsT8it6BQ5FhcCaNTg@mail.gmail.com>
References: <CAMQRg42MFMjG1crx8qeJRiVXTQR4gEjfLsT8it6BQ5FhcCaNTg@mail.gmail.com>
Message-ID: <1343785729.97000.YahooMailNeo@web161001.mail.bf1.yahoo.com>

I would like to start with Fluorine Friday at 2 pm, if that can be agreed upon.

jimkruger



________________________________
 From: Shuang Wang <wshuang at stanford.edu>
To: pquest at snf.stanford.edu 
Sent: Tuesday, July 31, 2012 2:20 PM
Subject: Request to start Pquest Fluorine time early
 

Hi Labmembers,

I'm wondering if it is OK to start Pquest Fluorine time earlier. The scheduled time is next Monday 08/06. I'm wondering if I could start using Fluorine gas this Friday night? If you have experiment schedule that can't have Fluorine in the chamber during weekend, could you please send me an email at wshuang at stanford.edu? Thanks a lot!


Yours,
Shuang

-- 
Shuang Wang,
Department of Electrical Engineering,
Stanford University, CA, 94305
Tel: 650-862-6603
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