Fwd: Metal and Dielectric Etch Discussion

Scott Lee wslee at stanford.edu
Mon Nov 26 12:50:48 PST 2012


See message from Ed about metal and dielectric etch meeting. I am
forwarding this to the pquest list since many people use pquest as a
Au-contaminated etcher for metals. The meeting is not about the new III-V
etcher.

Scott

---------- Forwarded message ----------
From: Ed Myers <edmyers at stanford.edu>
Date: Mon, Nov 26, 2012 at 9:48 AM
Subject: Metal and Dielectric Etch Discussion
To: p5000etch at snf.stanford.edu, amtetcher at snf.stanford.edu
Cc: "Roger T. Howe" <rthowe at stanford.edu>, John Bumgarner <
jwb2005 at stanford.edu>, mary tang <mtang at stanford.edu>, Nancy Latta <
nlatta at stanford.edu>


All,

I would like to meet at 10am on Monday, Dec. 3rd in 101 Allen to discuss
the PlasmaTherm metal and dielectric etch systems.  As many of you know the
PlasmaTherm DRIE system has completed it's acceptance.  This means, it is
now available for process characterization.  I would like to meet with the
etch community to discuss the process needs for the PlasmaTherm systems.

Please come to discuss your process needs and what needs to happen on the
PlasmaTherm systems.  If you know anyone who needs etches that have not
been supported in the past, please make sure they are invited.

Regards,
Ed
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