From jwc at snf.stanford.edu  Thu Jul  1 19:30:36 2004
From: jwc at snf.stanford.edu (James Conway)
Date: Thu, 01 Jul 2004 19:30:36 -0700
Subject: Please remove excess materials from the Ebeam lab passthru.
Message-ID: <40E4C8CC.5090201@snf.stanford.edu>

Greetings:

Users are directed to please remove excess materials from the Ebeam lab 
pass through.
This is for in-process work only within the Ebeam lab and NOT to be used 
for storage of engineering materials.

Sniff ... What's that smell?!!   ;-)

Thank you for your support!

James Conway
Ebeam Technology Group

PS If you have GaAs, GaAlAs, GaN substrates you wish to donate to my 
work this would be of use to me for work in August.
jwc



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From jwc at snf.stanford.edu  Fri Jul  2 19:53:26 2004
From: jwc at snf.stanford.edu (James Conway)
Date: Fri, 02 Jul 2004 19:53:26 -0700
Subject: James will be away through July 19, 2004  RAITH Champions are in
 charge...
Message-ID: <40E61FA6.3080104@snf.stanford.edu>

Greetings:

I will be away on business through July 19, 2004. 
Raith Champions are in Charge of the system.  See the Who are you going 
to call sheet I have placed on the system or refer to archives. Gigi and 
Arvind are primaries in charge.  I can be reached by cell phone at 
415-412-4825 for emergencies and desperate plights of terror if you 
encounter them.

Please make every effort to cooperate and maximize throughput on the system.
Do please keep up the logbook entries up, and be sure to fill out both 
pages of the log book including:
- recording the APerture and the Beam Current
- record of results and errors you are having on the system in the 
notebook II
- record  exact working Distances used and
             - if or if not you are using focus correction and it or if 
not you observed stitching errors of any magnitude.

I am seeing a firm dependence of focus corrections across small chips 
and stitching breaks in Y on the order of 80 - 120 nm.
I need your data to help work this out upon my return.  76 eyes are 
better than one!

Many nice patterns were written on the RAITH 150 this last two weeks.  
My UVN-30 writes for JPL came out very nice once I got the parameters 
down.  LGX and DWSHIN have this process well optimized...  Smallest dot 
in June 10 nm! Smallest Line from my test 17 nm. 

Please play nicely together, its is supposed to be fun right?!


James Conway
in New York State

offline till 7-19-04

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From jwc at snf.stanford.edu  Fri Jul  2 19:54:08 2004
From: jwc at snf.stanford.edu (James Conway)
Date: Fri, 02 Jul 2004 19:54:08 -0700
Subject: [Fwd: RE: MEMS and other semiconductor courses during SEMICON WEST
 2004]
Message-ID: <40E61FD0.5050600@snf.stanford.edu>

here you go

happy fourth

JWC


-------- Original Message --------
Subject: 	RE: MEMS and other semiconductor courses during SEMICON WEST 2004
Date: 	Fri, 2 Jul 2004 11:29:09 -0500
From: 	Jill Prantera <jill at pti-inc.com>
To: 	<jwc at snf.stanford.edu>



Hi James,

 

Thank you for offering to post this information.  I have attached the 
schedule of courses we are offering with SEMI during the show and I also 
sent a one page summary of the MEMS class you took.  It has a bio of DR. 
Bruno Frazier who is now teaching for us.

 

Have a great holiday!

 

Jill Prantera

Engineering Account Manager

636-343-1333 office

636-343-8642 fax

jill at pti-inc.com <mailto:jill at pti-inc.com>

*please visit www.pti-inc.com <http://www.pti-inc.com> for all of our 
products and services

 

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From jwc at snf.stanford.edu  Tue Jul 20 16:56:50 2004
From: jwc at snf.stanford.edu (James Conway)
Date: Tue, 20 Jul 2004 16:56:50 -0700
Subject: Your comments please! Thread: Ebeam Lab conversion back to class
 100 cleanroom 
Message-ID: <40FDB142.6020706@snf.stanford.edu>

Greetings:

This is to inform you of a management directed plan to return the Ebeam 
Lab back to Full class 100 cleanroom protocols in the coming month.

Initially we would like to return to class 1000 level protocols starting 
August 1, 2004.
Smocks, bouffant, and shoe covers. Gloves with all equipment other than 
keyboards.

Starting Monday August 19, 2004 we wish to merge with the Cleanroom main 
FAB area and initiate full class 100 level protocols. Full cleanroom 
gowning protocol and gloves everywhere and at all times...

I realize that there has been much discussion and decided disagreement 
with this amongst users in the Ebeam Lab and during the Ebeam Town 
Meetings. This is your only opportunity to make your views and opinions 
known to the community and to SNF management.  I seek your consensus and 
support -- or not -- for this policy change. 

Please post your reply to beamtools at snf.stanford.edu so we can carry 
this thread on that specific mail list.

Cleaning Up the Ebeam Lab:

We also wish for your participation in helping us get the E-beam lab 
into a cleaner state and you can help us:

    * Clean up after yourself when working in the Lab.  [Your mother
      doesn't work here!]
    * No pencils or particulate generating devices such as newsprint,
      photocopies, and non-lint free paper in the lab.
    * As you wait for systems to pump down or complete a task -- please
      take a moment and use a wiper and IPA to wipe down surfaces around
      the area you are working in.
    * Pick up trash and material you can see on the floors and around
      the equipment.
    * Remove your engineering materials from this lab area and place in
      your storage boxes.

The favor of your comments, opinions and a reply is requested ASAP.  We 
seek you inputs.  Users doing critical clean level processes using the 
SEM4160 are particularly encouraged to comment, as this change is 
largely in response to concerns when using this tool.

Thank you for your support!

James Conway | Paul Jerabek | Charley Williams III
Ebeam Technology Group
Stanford Nanofabrication Facility
650-725-7075
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