From jwc at snf.stanford.edu Tue Jan 11 11:20:12 2005 From: jwc at snf.stanford.edu (James Conway) Date: Tue, 11 Jan 2005 11:20:12 -0800 Subject: Annoucement: PMMA Materials: NO MORE CHLOROBENZENE IN THE LAB AFTER FEB 1, 2005. Message-ID: <41E426EC.9080608@snf.stanford.edu> Announcement: PMMA Materials: NO MORE CHLOROBENZENE IN THE LAB AFTER FEB. 1, 2005. Greetings Lab Members: We are in the process of eliminating all Chlorobenzene based Resist systems and rolling over for lab member use to only Anisole based Resist systems used for Electron Beam Lithography in the SNF cleanroom. We hope to complete this roll over by February 1, 2005 and will remove all Chlorobenzene resist systems from the SNF cleanroom at that time. This change will affect all users working with the following PMMA materials: 2% 950K MW Poly-Methy-Methacrylate (PMMA) 5% 495K MW Poly-Methy-Methacrylate (PMMA) 9% 950K MW Poly-Methy-Methacrylate (PMMA) -- NOTE: This material is no longer stocked at SNF. ZEP-520-12 PMMA by Zeon Corp. We currently have small volumes of these materials in-house and will be making these materials available to lab members. Note that these new materials are plainly labeled with additional colored stickers and will be labeled with a 'A' in their chemical label to aid in their identification. SNF staff will be performing preliminary characterization of these materials; but it is up to the individual lab members to monitor and adjust their processes using these new materials as appropriate. This change is being made to enhance your individual safety and reduce everyone's exposure to toxic and potentially carcinogenic materials used in the SNF cleanroom. Please post your replies to beamtools at snf.stanford.edu with SUBJECT: ANISOLE RESIST Thank you for your support! James Conway Stanford Nanofabrication Facility -------------- next part -------------- An HTML attachment was scrubbed... URL: