From jwc at snf.stanford.edu Tue Jun 6 18:26:35 2006 From: jwc at snf.stanford.edu (James Conway) Date: Tue, 06 Jun 2006 18:26:35 -0700 Subject: First Announcement: Ebeam Town Hall Meeting for Wednesday June 14, 2006 from 3 - 4:30 PM Message-ID: <44862B4B.3020401@snf.stanford.edu> Greetings Ebeam and Raith Communities: The next Ebeam Town Hall Meeting will be held Wednesday June 14, 2006 from 3 - 4:30 PM in CIS 201. We hope to have a good turnout for this meeting as we sincerely desire your input and feedback on how to manage our Ebeam Lithography systems with so many Lab Members working on these systems. The agenda and items for discussion are currently open for your input and any request. Ebeam Town Hall Meeting Agenda: 1. Welcome and Introduction by James Conway ( 5 minutes) 2. Today's Feature Presentation: ( 40 minutes + 10 for Q&A) Leo P. Schuler MacDiarmid Institute for Advanced Materials & Nanotechnology Department of Electrical and Computer Engineering University of Canterbury, Christchurch, New Zealand Fabrication of functional ZnO coatings and optimizations for improved piezoelectric properties and photoluminescence Abstract: Zinc Oxide (ZnO) is a versatile material which has attractive dielectric, piezoelectric, semiconducting, acousto-optic, nonlinear optical, and electrical properties. ZnO nanomaterials are promising candidates for nanoelectronics and photonics. Compared with other semiconductor materials, ZnO has a high exciton binding energy of 60 meV, which gives it a high potential for room temperature light emission, it is more resistant to radiation, and is multifunctional as it has piezoelectric, ferroelectric, and ferromagnetic properties. ZnO can be deposited in a multitude of ways. In our department, we have been focusing in sputtering deposition. I have been concentrating on fabricating highly piezoelectric films with good photoluminescence properties. However, these two properties are somewhat contradictory. The choice of base substrate, sputtering parameters, and post deposition treatment (annealing and dry Etching) leads to modification of the crystal structure and the surface properties, which in turn leads to more intense photoluminescence (PL) response. The converse piezoelectric effect on sputtered ZnO was analyzed using interferometric methods and for the first time, using piezoelectric force microscopy (PFM). PFM is a variation of atomic force microscopy that can be applied to investigate piezoelectric thin films at the nanometer scale. Surface acoustic wave devices (SAW) were fabricated on various ZnO films and used to detect changes in UV light intensities. Finally I will give a short overview about the range of activities in the area of ZnO "Down Under". 3. Raith Reservation and Scheduling Issues: (15 minutes ) Managing the Raith 150 system with a large number of users of various experience levels: - Proposed Changes or Modification to the currently existing policies in place? - Cancellation Policy -- 24 hour notice? - Should we penalize users whom cancel, or repeatedly not show up for their reservations? - Should we implement a Raith System Standby Users listing? - 'Share the Ride' incentive for users working with small chips. 4. Additional Items to be determined... The Agenda remains open and waiting for your input! -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Mon Jun 12 10:20:36 2006 From: jwc at snf.stanford.edu (James Conway) Date: Mon, 12 Jun 2006 10:20:36 -0700 Subject: 2nd Announcement: Ebeam Town Hall Meeting: Wednesday June 14, 2006 from 3 - 4:30 PM Message-ID: <448DA264.2070102@snf.stanford.edu> Greetings Ebeam and Raith Communities: The next Ebeam Town Hall Meeting will be held this Wednesday June 14, 2006 from 3 - 4:30 PM in CIS 201. We hope to have a good turnout for this meeting as we sincerely desire your input and feedback on how to manage our Ebeam Lithography systems with so many Lab Members working on these systems. The agenda and items for discussion are currently open for your input and any request. Ebeam Town Hall Meeting Agenda: 1. Welcome and Introduction by James Conway ( 5 minutes) 2. Today's Feature Presentation: ( 40 minutes + 10 for Q&A) Leo P. Schuler MacDiarmid Institute for Advanced Materials & Nanotechnology Department of Electrical and Computer Engineering University of Canterbury, Christchurch, New Zealand Fabrication of functional ZnO coatings and optimizations for improved piezoelectric properties and photoluminescence Abstract: Zinc Oxide (ZnO) is a versatile material which has attractive dielectric, piezoelectric, semiconducting, acousto-optic, nonlinear optical, and electrical properties. ZnO nanomaterials are promising candidates for nanoelectronics and photonics. Compared with other semiconductor materials, ZnO has a high exciton binding energy of 60 meV, which gives it a high potential for room temperature light emission, it is more resistant to radiation, and is multifunctional as it has piezoelectric, ferroelectric, and ferromagnetic properties. ZnO can be deposited in a multitude of ways. In our department, we have been focusing in sputtering deposition. I have been concentrating on fabricating highly piezoelectric films with good photoluminescence properties. However, these two properties are somewhat contradictory. The choice of base substrate, sputtering parameters, and post deposition treatment (annealing and dry Etching) leads to modification of the crystal structure and the surface properties, which in turn leads to more intense photoluminescence (PL) response. The converse piezoelectric effect on sputtered ZnO was analyzed using interferometric methods and for the first time, using piezoelectric force microscopy (PFM). PFM is a variation of atomic force microscopy that can be applied to investigate piezoelectric thin films at the nanometer scale. Surface acoustic wave devices (SAW) were fabricated on various ZnO films and used to detect changes in UV light intensities. Finally I will give a short overview about the range of activities in the area of ZnO "Down Under". 3. Additional Items to be determined... The Agenda remains open and waiting for your input! -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Wed Jun 14 18:07:46 2006 From: jwc at snf.stanford.edu (James Conway) Date: Wed, 14 Jun 2006 18:07:46 -0700 Subject: Oil films or silicon oil type material on the VINOX microscope. Message-ID: <4490B2E2.5000000@snf.stanford.edu> Greetings to the Ebeam Community, All Users working in the Ebeam Lab are henceforth to be qualified and will need to review microscope operations procedures to utilize the Olympus Vinox Microscope in the Ebeam Lab. Why: For the last three months occasionally, more recently over the last three weekends, and repeatedly over several evenings this week -- I have come into the lab in the morning to discover that the Vinox microscope stage, edges of the stage, the X-Y and Focus controls are contaminated with a thin oily film that is difficult to remove. There have also been a number of times when the microscope set up has been changed in attempts to utilize the tool making it obvious that a person is using the tool but has no skill in microscopy. The end result is that the XY motion control and the Z mechanical stage rack have been damaged and most surfaces on this tool are contaminated. There have also been three recent incidents of person(s) unknown using the microscope after aqueous development (TMAH and water) from wet bench miscres. the developer solution has roughened the surface of the stage and sample holders. My concern is that if any of this unknown oily material makes it way into the SEM columns or the EBL systems it will very quickly migrate throughout the column and contaminate the LIS Stage, laser mirrors, and SEM column of these systems. This will rapidly and severely degrade the performance and utility of all of our Beam Tools. In essence it could take us down hard in just a drop of this material gets into an Ebeam system. Why would anyone let this happen?!! What I need from you: I must request that all users working in the Ebeam Lab see me and get checked out on this microscope before they use the tool again. No exceptions. I need all users to be especially careful to change their gloves before using the microscope each and every time they use it. I need all users to be especially vigilant in looking for users working outside this lab in the main cleanroom that may be entering the Ebeam Lab after hours, especially over the weekends. We need to identify the User(s) whom are working with oily stuff in the lab or inadvertently carrying these contaminants over to the Microscope from another Lab before it gets into our Ebeam systems. I cannot believe that anyone would be so careless that they could not notice this happening. The oily material is being left all over the microscope and the table surface. It is obvious from the prints on the stage that they are forcing the stage back and forth and not using the X-Y stage movement controls properly. From the hand prints on the table it is obvious their gloves and their wafer box are covered in this material. All Users are again reminded that the Ebeam Lab is a restricted area in the Cleanroom, and only persons qualified on the Ebeam tools are to be coming into this area. Only Users working in the Ebeam Tools are to be using this microscope and only on samples that are clean and free of residues. READ: ALL users doing aqueous development or other processes should be using the microscopes in the Cleanroom. Finally All Ebeam users may confront and obtain the name and coral login of anyone coming into the Ebeam Lab unescorted. Please forward this information to me and I will take it up from there. Thank you for your support! James Conway 650-725-7075 -------------- next part -------------- An HTML attachment was scrubbed... URL: