From jwc at snf.stanford.edu Mon Mar 27 12:13:47 2006 From: jwc at snf.stanford.edu (James Conway) Date: Mon, 27 Mar 2006 12:13:47 -0800 Subject: ANNOUNCEMENT: Dr. Freimut Reuther, micro resist technology, presentation on NIL and EBL resist materials THURSDAY 3-30-06 CIS 201 10 - 11 AM. Message-ID: <4428477B.1050801@snf.stanford.edu> Greetings Raith and Ebeam Communities: I was able to arrange to have Dr. Freimut Reuther, Technical Director for micro resist technology GmbH. Berlin, Germany to come to Stanford during his visit to the USA. His visit will be Thursday March 30, 2006 from 10 AM - 12 Noon with a presentation and discussions to be held in CIS 201. Starting at 10 AM there will be a 40 minute presentation followed by discussions regarding products in development at micro resist technology GmbH. Focus of the presentation will be Ormocers and Polymers that can be used for thermal nanoimprint lithography and negative tone resists for e-beam / deep UV. All interested parties within the Stanford Community are welcome to attend this meeting. The conference room has been reserved through Noon for those wishing to continue technical discussions after his presentation remarks. Thank you for your interest in Ebeam Technologies here at Stanford Nanofabrication Facility. James Conway SNF 650-725-7075 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: blutextb.gif Type: image/gif Size: 569 bytes Desc: not available URL: From jwc at snf.stanford.edu Wed Mar 29 14:28:27 2006 From: jwc at snf.stanford.edu (James Conway) Date: Wed, 29 Mar 2006 14:28:27 -0800 Subject: ANNOUNCEMENT2: Dr. Freimut Reuther, micro resist technology, presentation on NIL and EBL resist materials TOMOOROW: THURSDAY 3-30-06 CIS 201 10 - 11 AM. Message-ID: <442B0A0B.4020305@snf.stanford.edu> Greetings Raith and Ebeam Communities: I was able to arrange to have Dr. Freimut Reuther, Technical Director for micro resist technology GmbH. Berlin, Germany to come to Stanford during his visit to the USA. His visit will be tomorrow, Thursday March 30, 2006 from 10 AM - 12 Noon in CIS 201. There will be a 40 minute presentation followed by discussions regarding products in development at micro resist technology GmbH. Focus of the presentation will be Ormocers and Polymers that can be used for thermal nanoimprint lithography and negative tone resists for e-beam / deep UV. All interested parties within the Stanford Community are welcome to attend this meeting. The conference room has been reserved through Noon for those wishing to continue technical discussions after his presentations. Thank you for your interest in Ebeam Technologies here at Stanford Nanofabrication Facility. James Conway SNF 650-725-7075 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: not available Type: image/gif Size: 569 bytes Desc: not available URL: From jwc at snf.stanford.edu Thu Mar 30 09:30:34 2006 From: jwc at snf.stanford.edu (James Conway) Date: Thu, 30 Mar 2006 09:30:34 -0800 Subject: Reminder: TODAY Dr. Freimut Reuther, micro resist technology, presentation on NIL and EBL resist materials THURSDAY 3-30-06 CIS 201 10 - 11 AM. Message-ID: <442C15BA.50301@snf.stanford.edu> Please come and join us for a great presentation: Greetings Raith and Ebeam Communities: I was able to arrange to have Dr. Freimut Reuther, Technical Director for micro resist technology GmbH. Berlin, Germany to come to Stanford during his visit to the USA. His visit will be today, Thursday March 30, 2006 from 10 AM - 12 Noon in CIS 201. There will be a 40 minute presentation followed by discussions regarding products in development at micro resist technology GmbH. Focus of the presentation will be Ormocers and Polymers that can be used for thermal nanoimprint lithography and negative tone resists for e-beam / deep UV. All interested parties within the Stanford Community are welcome to attend this meeting. The conference room has been reserved through Noon for those wishing to continue technical discussions after his presentations. Thank you for your interest in Ebeam Technologies here at Stanford Nanofabrication Facility. James Conway SNF 650-725-7075 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: not available Type: image/gif Size: 569 bytes Desc: not available URL: