From jwc at snf.stanford.edu Tue Nov 7 09:31:10 2006 From: jwc at snf.stanford.edu (James Conway) Date: Tue, 07 Nov 2006 09:31:10 -0800 Subject: SPECIAL EBEAM LAB EVENT:"'3D EBL applications for UV Nano Imprint Lithography" Guido Piaszenski, Raith GmbH, Dortmund, DE. MONDAY NOV. 13 from 2 - 3 PM in CIS 101 Message-ID: <4550C2DE.7050608@snf.stanford.edu> *ANNOUNCEMENT OF A SPECIAL EBEAM LAB EVENT* *Monday November 13, 2006 2 - 3 PM CIS 101:* *"3D EBL Applications for UV Nano Imprint Lithography." * Guido Piaszenski from Raith GmbH in Dortmund, Germany has graciously offered to visit the Stanford Nanofabrication Facility and present his group's work which he will also be presenting at the NNT2006 conference in San Francisco later that week. He received his PhD in 2002 at the Ruhr-University of Bochum, Germany working with Professor U.K. K?hler. In 2003 he started working in the application department at Raith GmbH in Dortmund Germany developing, testing, and supporting Users working on the Raith Electron Beam Lithography Software applications. This meeting is open to Everyone whom wishes to attend: 2 - 3 PM CIS 101: Presentation followed by Q&A from attendees. 3 - 4:30 PM CIS 201: Technical Discussion on NIL and Ebeam Lithography topics. Abstract: Please feel free to forward this email to people of interest within the Stanford Community. -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: not available Type: image/jpeg Size: 104832 bytes Desc: not available URL: From jwc at snf.stanford.edu Fri Nov 10 08:32:44 2006 From: jwc at snf.stanford.edu (James Conway) Date: Fri, 10 Nov 2006 08:32:44 -0800 Subject: REMINDER MONDAY NOV. 13 from 2 - 3 PM in CIS 101: EBEAM LAB EVENT:"'3D EBL applications for UV Nano Imprint Lithography" Guido Piaszenski, Raith GmbH, Dortmund, DE. Message-ID: <4554A9AC.4090308@snf.stanford.edu> *ANNOUNCEMENT OF A SPECIAL EBEAM LAB EVENT* *Monday November 13, 2006 2 - 3 PM CIS 101:* *"3D EBL Applications for UV Nano Imprint Lithography." * Guido Piaszenski from Raith GmbH in Dortmund, Germany has graciously offered to visit the Stanford Nanofabrication Facility and present his group's work which he will also be presenting at the NNT2006 conference in San Francisco later that week. He received his PhD in 2002 at the Ruhr-University of Bochum, Germany working with Professor U.K. K?hler. In 2003 he started working in the application department at Raith GmbH in Dortmund Germany developing, testing, and supporting Users working on the Raith Electron Beam Lithography Software applications. This meeting is open to Everyone whom wishes to attend: 2 - 3 PM CIS 101: Presentation followed by Q&A from attendees. 3 - 4:30 PM CIS 201: Technical Discussion on NIL and Ebeam Lithography topics. Abstract: Please feel free to forward this email to people of interest within the Stanford Community. -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: not available Type: image/jpeg Size: 104832 bytes Desc: not available URL: From jwc at snf.stanford.edu Fri Nov 10 08:59:34 2006 From: jwc at snf.stanford.edu (James Conway) Date: Fri, 10 Nov 2006 08:59:34 -0800 Subject: Announcement: Friemut Reuther from micro resist will be visiting Tuesday 11-14-06 Message-ID: <4554AFF6.2010203@snf.stanford.edu> Greetings NIL Team, Friemut Reuther will be making a brief follow up visit to SNF Tuesday 11-14-06. We will be meeting at 1:00 for a quick lunch and then return to SNF in CIS 101 from about 1:30 - 2:30 to 3:00 PM. This continues discussions we started on their last visit to SNF. All interested SNF parties are welcome and I hope that all SNF NIL team members can join me for an hour or so to join in our discussions. Have a nice weekend, James Conway -------- Original Message -------- Subject: Re: micro resist Visit on 14 November? Date: Fri, 10 Nov 2006 08:48:36 -0800 From: James Conway Organization: Stanford Nanofabrication Facility - Stanford University To: Freimut Reuther CC: James Conway References: <000701c70357$b41f3290$2901000a at mrt.local> <455369DC.6090507 at snf.stanford.edu> <001701c704d6$8f556800$2901000a at mrt.local> Hello Friemut Reuther, It would be great to have you come and meet with the NIL team here at SNF next week. We have been a bit slow /'getting out of the starting gates'/ in our SNF NIL efforts, but as the end of the year approaches I am getting our molds in Quartz fabricated and we will be ready to start using our NIL system to imprint test structures and some simple devices. In specific I would like to discuss with you further details of the low molecular weight PMMA's that Microchem offers, and to assist us with selecting the most appropriate material for our initial trials. There is also great interest in learning more about mold release layers and various surface treatments for our NIL stamp masters. Looking forward to meeting with you next Tuesday afternoon. If it is possible I would desire to begin with a quick lunch at 1 PM as I am teaching a class in the SNF Cleanroom from 10 AM - 1 PM. I will likely finish with these students between 12:30 and 12:45 PM. We then can start discussions with all interested SNF and Stanford parties at ~ 1:30 PM. I have a room reserved from 1:30 - 3:00 PM. (CIS 101) Please call me on my cell phone at 001-415-412-4825 upon your arrival, and/or page me out of the SNF Cleanroom on the RED Phones at the lab entryway. Safe travels this weekend on your flight to America. Thank you, James Conway Freimut Reuther wrote: > > Hello James, > > > > Thank you for the kind response. I have considered about one hour > talks and discussions about polymers and/ or resists, which are or can > be interesting for you. I have not polanned to give a presentation. > That would be much of repetition of things we already presented. May > be we can plan such a meeting in February 2007 before the SPIE > conference, if you think it would make sense. Thank you for reserving > a conference room, but I think this is not required. I wonder whether > you have specific requests. We will visit another group in Silicon > Valley on Wednesday 15 November. So if possible I would come to you at > 11:30. Please let me know. > > > Best wishes > Freimut > > ----------------------------------------------------------------------- > Dr. Freimut Reuther > Technical Director/ Technischer Leiter > > micro resist technology GmbH > Koepenicker Str. 325 > 12555 Berlin > GERMANY > > phone: +49 30 6576 2192 > fax: +49 30 6576 2193 > email: f.reuther at microresist.de > internet: www.microresist.de > > > > ----- Original Message ----- > *From:* James Conway > *To:* Freimut Reuther > *Cc:* Piaszenski, Guido ; Mahnaz > Mansourpour > *Sent:* Thursday, November 09, 2006 6:48 PM > *Subject:* Re: Microchem Visit on 14 November? > > Greetings Freimut, > > I would be happy to host you here at SNF. This is a busy week for > everyone and we will have a few visitors. I will also have Guido > Piaszenski from RAITH GmbH in Dortmund here at that time. Please > come and join us for lunch starting at your choice of either 11:30 > or Noon and following that I have reserved a conference room for > 13:30 - 15:00 hours for your presentation if you desire to give an > update and top facilitate further discussions on EBL and NIL > resist systems. > > Please reply to me ASAP confirm and I will send out an meeting > announcement. Look forward to meeting with you again. > > All the Best, > > James Conway > > > Freimut Reuther wrote: >> Hello James, >> >> >> >> How are you? >> >> We very recently decided that I attend the NNT in San Francisco >> next week. I would like to take the opportunity to visit you and >> give you an update of our developments and of course learn from >> you, whether there is some further interest in our resists and >> polymers. We sent you some samples for testing. I would be happy >> about your feedback. As far as I can see now I could come on >> Tuesday 14 November between about noon and 3 p.m. Please let me >> know if you are interested in the talks. >> >> >> Best wishes >> Freimut >> >> ----------------------------------------------------------------------- >> >> Dr. Freimut Reuther >> Technical Director/ Technischer Leiter >> >> micro resist technology GmbH >> Koepenicker Str. 325 >> 12555 Berlin >> GERMANY >> >> phone: +49 30 6576 2192 >> fax: +49 30 6576 2193 >> email: f.reuther at microresist.de >> internet: www.microresist.de >> >> >> -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Mon Nov 13 11:21:30 2006 From: jwc at snf.stanford.edu (James Conway) Date: Mon, 13 Nov 2006 11:21:30 -0800 Subject: SPECIAL EVENT TODAY:"'3D EBL applications for UV Nano Imprint Lithography" Guido Piaszenski, Raith GmbH, Dortmund, DE. MONDAY NOV. 13 from 2 - 3 PM in CIS 101 Message-ID: <4558C5BA.6020407@snf.stanford.edu> *ANNOUNCEMENT OF A SPECIAL EBEAM LAB EVENT* *Monday November 13, 2006 2 - 3 PM CIS 101:* *"3D EBL Applications for UV Nano Imprint Lithography." * Guido Piaszenski from Raith GmbH in Dortmund, Germany has graciously offered to visit the Stanford Nanofabrication Facility and present his group's work which he will also be presenting at the NNT2006 conference in San Francisco later that week. He received his PhD in 2002 at the Ruhr-University of Bochum, Germany working with Professor U.K. K?hler. In 2003 he started working in the application department at Raith GmbH in Dortmund Germany developing, testing, and supporting Users working on the Raith Electron Beam Lithography Software applications. This meeting is open to Everyone whom wishes to attend: 2 - 3 PM CIS 101: Presentation followed by Q&A from attendees. 3 - 4:30 PM CIS 201: Technical Discussion on NIL and Ebeam Lithography topics. Abstract: Please feel free to forward this email to people of interest within the Stanford Community. -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: not available Type: image/jpeg Size: 104832 bytes Desc: not available URL: From jwc at snf.stanford.edu Tue Nov 14 09:11:12 2006 From: jwc at snf.stanford.edu (James Conway) Date: Tue, 14 Nov 2006 09:11:12 -0800 Subject: Reminder to the SNF NIL team: Friemut Reuther from micro resist will be visiting Tuesday 11-14-06 Message-ID: <4559F8B0.3010804@snf.stanford.edu> Greetings NIL Team and Raith Users interested in NIL, Friemut Reuther from Microresist.de in Berlin, Germany will be making a brief visit to SNF Today ( Tuesday 11-14-06.) We will be meeting at 1:00 for a quick lunch and then return to SNF in CIS 101 from about 1:30 - 2:30 to 3:00 PM. This continues discussions we started on their last visit to SNF. All interested SNF parties are welcome and I hope that all SNF NIL team members can join me for an hour or so to join in our discussions. I am most interested in learning more about the low molecular weight PMMA's and mold release materials that Microresist offers to employ in our NIL efforts. Please join us at 1:30 in CIS 101, James Conway -------- Original Message -------- Subject: Re: micro resist Visit on 14 November? Date: Fri, 10 Nov 2006 08:48:36 -0800 From: James Conway Organization: Stanford Nanofabrication Facility - Stanford University To: Freimut Reuther CC: James Conway References: <000701c70357$b41f3290$2901000a at mrt.local> <455369DC.6090507 at snf.stanford.edu> <001701c704d6$8f556800$2901000a at mrt.local> Hello Friemut Reuther, It would be great to have you come and meet with the NIL team here at SNF next week. We have been a bit slow /'getting out of the starting gates'/ in our SNF NIL efforts, but as the end of the year approaches I am getting our molds in Quartz fabricated and we will be ready to start using our NIL system to imprint test structures and some simple devices. In specific I would like to discuss with you further details of the low molecular weight PMMA's that Microchem offers, and to assist us with selecting the most appropriate material for our initial trials. There is also great interest in learning more about mold release layers and various surface treatments for our NIL stamp masters. Looking forward to meeting with you next Tuesday afternoon. If it is possible I would desire to begin with a quick lunch at 1 PM as I am teaching a class in the SNF Cleanroom from 10 AM - 1 PM. I will likely finish with these students between 12:30 and 12:45 PM. We then can start discussions with all interested SNF and Stanford parties at ~ 1:30 PM. I have a room reserved from 1:30 - 3:00 PM. (CIS 101) Please call me on my cell phone at 001-415-412-4825 upon your arrival, and/or page me out of the SNF Cleanroom on the RED Phones at the lab entryway. Safe travels this weekend on your flight to America. Thank you, James Conway Freimut Reuther wrote: > > Hello James, > > > > Thank you for the kind response. I have considered about one hour > talks and discussions about polymers and/ or resists, which are or can > be interesting for you. I have not polanned to give a presentation. > That would be much of repetition of things we already presented. May > be we can plan such a meeting in February 2007 before the SPIE > conference, if you think it would make sense. Thank you for reserving > a conference room, but I think this is not required. I wonder whether > you have specific requests. We will visit another group in Silicon > Valley on Wednesday 15 November. So if possible I would come to you at > 11:30. Please let me know. > > > Best wishes > Freimut > > ----------------------------------------------------------------------- > Dr. Freimut Reuther > Technical Director/ Technischer Leiter > > micro resist technology GmbH > Koepenicker Str. 325 > 12555 Berlin > GERMANY > > phone: +49 30 6576 2192 > fax: +49 30 6576 2193 > email: f.reuther at microresist.de > internet: www.microresist.de > > > > ----- Original Message ----- > *From:* James Conway > *To:* Freimut Reuther > *Cc:* Piaszenski, Guido ; Mahnaz > Mansourpour > *Sent:* Thursday, November 09, 2006 6:48 PM > *Subject:* Re: Microchem Visit on 14 November? > > Greetings Freimut, > > I would be happy to host you here at SNF. This is a busy week for > everyone and we will have a few visitors. I will also have Guido > Piaszenski from RAITH GmbH in Dortmund here at that time. Please > come and join us for lunch starting at your choice of either 11:30 > or Noon and following that I have reserved a conference room for > 13:30 - 15:00 hours for your presentation if you desire to give an > update and top facilitate further discussions on EBL and NIL > resist systems. > > Please reply to me ASAP confirm and I will send out an meeting > announcement. Look forward to meeting with you again. > > All the Best, > > James Conway > > > Freimut Reuther wrote: >> Hello James, >> >> >> >> How are you? >> >> We very recently decided that I attend the NNT in San Francisco >> next week. I would like to take the opportunity to visit you and >> give you an update of our developments and of course learn from >> you, whether there is some further interest in our resists and >> polymers. We sent you some samples for testing. I would be happy >> about your feedback. As far as I can see now I could come on >> Tuesday 14 November between about noon and 3 p.m. Please let me >> know if you are interested in the talks. >> >> >> Best wishes >> Freimut >> >> ----------------------------------------------------------------------- >> >> Dr. Freimut Reuther >> Technical Director/ Technischer Leiter >> >> micro resist technology GmbH >> Koepenicker Str. 325 >> 12555 Berlin >> GERMANY >> >> phone: +49 30 6576 2192 >> fax: +49 30 6576 2193 >> email: f.reuther at microresist.de >> internet: www.microresist.de >> >> >> -------------- next part -------------- An HTML attachment was scrubbed... URL: