From jwc at snf.stanford.edu Thu Jul 16 10:09:52 2009
From: jwc at snf.stanford.edu (James Conway)
Date: Thu, 16 Jul 2009 10:09:52 -0700
Subject: ANNOUNCEMENT: POZZETTA PRODUCTS PRESENTATION -- FRIDAY JULY 17,
2009 from 10 -11 AM in ALLEN 101 (formerly CIS 101)
Message-ID: <4A5F5EE0.1080104@snf.stanford.edu>
Good Morning Lab Members:
I have invited Artemis Vasiliades to visit Stanford tomorrow for an
exchange of information regarding process and storage cassettes as we
seek solutions to handle and process our smaller and more fragile GaAs
and thinned Fused Silica (Quartz) substrates often used in the Ebeam Lab.
I know that many of you are processing by hand what we could possibly be
batch processing in cassettes for a cleaner and higher quality
processing result. Users with odd shaped and sized substrates are
especially encouraged to bring drawings or actual samples of their
substrates to this meeting. Ms. Vasiliades will also bring several
product samples that may be useful for your work here at SNF.
All interested parties are welcome to attend!
Thank you for attending this session,
James Conway
Stanford Nanofabrication Facility
*Artemis Vasiliades*
Account Executive
Pozzetta Products, Inc
Direct: 303-783-7926
artemis at pozzetta.com
For product updates and news follow Pozzetta on Twitter
http://twitter.com/photomask
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From jwc at snf.stanford.edu Thu Jul 23 13:54:50 2009
From: jwc at snf.stanford.edu (James Conway)
Date: Thu, 23 Jul 2009 13:54:50 -0700
Subject: REMINDER EBEAM LAB TOWN HALL MEETING -- THURSDAY JULY 23, 2009
3:00 - 4:30 pm CIS 201
Message-ID: <4A68CE1A.9020307@snf.stanford.edu>
Nano-bowtie written using FIB on a RAITH IonLINE by Anika Kinkhabwala
Ebeam Town Hall Meeting Announcement:
TODAY Thursday July 23, 2009 from 3:00 to 4:30 PM we will be holding an
Ebeam Town Hall Meeting for all interested SNF Ebeam Labs Users in CIS 201
1. Discussion on Ebeam Lab Policies in place with proposed changes,
additions, or deletions to our lab policies... 10 minutes
-fast review of the reservation and equipment usage policies for the
Ebeam tools.
2. SPECIAL SPEAKER: PAUL RISSMAN --- 45 + 15 minutes for Q&A.
Paul Rissman will give a presentation on details of Electron Beam
Exposure Proximity Correction methodologies.
Paul has a wealth of experience in this area having modeled and
developed methods for EPC since 1979.
He will show examples of several modeling and EPC design tools results.
It is hoped that all Ebeam Lab members will be able to attend and add to
these discussions!
Thank you for your support!
James Conway
Stanford Nanofabrication Facility
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