From jwc at snf.stanford.edu Wed Jan 7 13:58:08 2009 From: jwc at snf.stanford.edu (jwc at snf.stanford.edu) Date: Wed, 7 Jan 2009 13:58:08 -0800 Subject: Shutdown raith SNF 2008-12-17 09:56:08: Holiday Shut shut down Message-ID: From jwc at snf.stanford.edu Wed Jan 7 13:59:41 2009 From: jwc at snf.stanford.edu (jwc at snf.stanford.edu) Date: Wed, 7 Jan 2009 13:59:41 -0800 Subject: Problem raith SNF 2009-01-07 13:59:40: SYSTEM IN QUALIFICATION Message-ID: SO FAR SO GOOD -- HAND OFF TO RAITH CHAMPIONS THIS EVENING BEAM CURRENT STABILITY MEASUREMENT OUT OF SPEC. WILL EVALUATE AND MEASUREMENTS AFTER THE EXPOSURE IS COMPLETED. JWC From jwc at snf.stanford.edu Wed Jan 7 16:55:00 2009 From: jwc at snf.stanford.edu (jwc at snf.stanford.edu) Date: Wed, 7 Jan 2009 16:55:00 -0800 Subject: Problem raith SNF 2009-01-07 16:55:00: system qualification FAILED == poor write field to write field stitching Message-ID: Good Afternoon: RAITH system qualification FAILED == poor write field to write field stitching results in numerous patterns written. While stage flatness and imaging resolution was excellent and very high resolution features were obtained; the write field to write field stitching results were far out of specification. I will repeat the System qualification in my session tomorrow. James Conway From jwc at snf.stanford.edu Thu Jan 8 17:29:50 2009 From: jwc at snf.stanford.edu (jwc at snf.stanford.edu) Date: Thu, 8 Jan 2009 17:29:50 -0800 Subject: Problem raith SNF 2009-01-07 13:59:40: SYSTEM IN QUALIFICATION Message-ID: From jwc at snf.stanford.edu Thu Jan 8 17:31:24 2009 From: jwc at snf.stanford.edu (jwc at snf.stanford.edu) Date: Thu, 8 Jan 2009 17:31:24 -0800 Subject: Problem raith SNF 2009-01-07 16:55:00: system qualification FAILED == poor write field to write field stitching Message-ID: Adjusted the power suopply voltage to the rate servo card and checked there voltages to specification on the X motor controller == excellent stitching was obtainedon the second exposures. Overlay testing tomorrow in preparation for pattern transfer jwc From jwc at snf.stanford.edu Fri Jan 9 14:07:37 2009 From: jwc at snf.stanford.edu (jwc at snf.stanford.edu) Date: Fri, 9 Jan 2009 14:07:37 -0800 Subject: Comment raith SNF 2009-01-09 14:07:36: qualification completed Message-ID: I completed the system qualification this afternoon. Outstanding Ebeam resolution was achieved. < 0.8 nm at 15 kV -- 1 - 1.2 nm at 10 kV. 5 mm WD Stitching was less than 15 nm mean + 3 sigma. Overlay registration was also supurb and remains to be measured using Ebeam scans. Additional test patterns were written this afternoon which will be RIE etched and then measured by SEM and AFM next week. System has been handed off to Users in an optimal state and I am very pleased with the Column PM routine result. Lev Markov with RAITH FS did an excellent job adjusting the Electron optical card amplifiers. Tested system at 10 and 15 kV acceleration voltage and will test at higher voltages next week as system access allows. All Users are requested to bake out their samples before loadinng. 2 minutes at 90 degrees C. All Users are requested to not exceed 21 kV acceleration voltage until after I test it next week to allow gun vacuum to reach mid to low E -010 Torr levels and for FE-GUN emission to reach optimal values. James Conway