Problem raith SNF 2010-03-02 01:56:05: alignment issue

James W. Conway jwc at snf.stanford.edu
Wed Mar 3 10:51:44 PST 2010


No problems were discovered during a detailed test of the LIStage and 
the UVW coordinates before and after adjustments.

Likely Users optical lithography layer experienced some run out or skew 
distortion in the mask fabrication.  Will be performing a session 
tomorrow and this afternoon with Soogine to determine if it was 
procedural issue or sources from the optical mask layer chip positions.

JWC


jwc at snf.stanford.edu wrote:
> This is weird likely student user issue...
> will look into it today
>
>   



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