Problem raith SNF 2010-03-02 01:56:05: alignment issue
James W. Conway
jwc at snf.stanford.edu
Wed Mar 3 10:51:44 PST 2010
No problems were discovered during a detailed test of the LIStage and
the UVW coordinates before and after adjustments.
Likely Users optical lithography layer experienced some run out or skew
distortion in the mask fabrication. Will be performing a session
tomorrow and this afternoon with Soogine to determine if it was
procedural issue or sources from the optical mask layer chip positions.
jwc at snf.stanford.edu wrote:
> This is weird likely student user issue...
> will look into it today
More information about the raith-pcs