Comment raith SNF 2011-01-05 17:56:20: system is in qualification

jwc at snf.stanford.edu jwc at snf.stanford.edu
Wed Jan 5 17:56:20 PST 2011


Initial EBl results show excellent resolution and acceptable stitching between write fields.  We ran out of time today after encountering problems performing the metrology of the Stitching Overlay test pattern.
quick inspections by SEM yielded dot features down to 8.5 nm and SPLines in the 10 to 20 nm linewidth range.
More test and measurements in the queue.
JWC




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