Problem raith SNF 2012-02-10 15:02:33: SYSTEM IS IN QUALIICATION TESTING

jwc at snf.stanford.edu jwc at snf.stanford.edu
Fri Feb 10 17:33:04 PST 2012


Systems meets acceptance criteria for resolution, vibration, and write field to write field stitching.  FBMS functionality passed initial inspection.
more imaging and measurements pending 
I am writing a 20 hr write to repeat all structures written with optimized parameters for this thin film (100 nm 2% 950K PMMA - A)
Hundred of addition patterns to write on this job both in normal stitched and FBMS mode
short dwell time contamination dot measures 13 nm 
Image ripple from vibration, acoustic noise and RF summed is 50 % less than before the shutdown!
 Imgripple measures 3.28 nm  normal before it was 5.3 to 7 nm.
i am happy with the PM.
RAITH FS comes in Monday and Tuesday for final test before workshop
If the Lab reopens for Users Tuesday User access commenses at 3 PM for this tool.
JWC




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