UPDATE: RAITH Group II A TRAINING DATE change announcement

James Conway jwc at snf.stanford.edu
Fri Apr 18 11:11:16 PDT 2003

I have changed the date of the June Class to June 17 - 20, 2003 to
better meet scheduling needs.  There will also be several training
opportunities over the summer.

> The next RAITH GROUP II  will begin training over a number of sessions
> broken into three groups:
> Advanced Hitachi Users, Intensive Short Course, the week of April 28,
> 2003.
> The next main Group II Users beginning the week of May 11, 2003
> The second Group II A Users beginning the week of June 17, 2003.
> These classes will involve a day of lecture and demo and three days of
> hands-on training. This will be followed by sessions of smaller
> breakout groups based on your application in the week to follow.
> The goal is to get all qualified advanced Hitachi Ebeam users whom
> desire access to the RAITH trained and on the system over the summer
> until we reach capacity on this system.
> Please see James Conway during my office hour for more information or
> to sign up for training.
> Thank you for your interest in E-beam Lithography and SEM at SNF!

James Conway

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