From jwc at snf.stanford.edu Thu Jan 9 13:23:57 2003 From: jwc at snf.stanford.edu (James Conway) Date: Thu, 09 Jan 2003 13:23:57 -0800 Subject: RAITH is down through next week. Message-ID: <3E1DE86D.71EDBFD@snf.stanford.edu> Greetings, During the start up of the Raith system after the Holiday break we experienced a number problems likely due to a FE Gun arcing event. (Possible EHT trip...) We are also aggressively addressing several issues that surfaced during the final weeks of last year related to write field stitching errors. The FE-tip on the LEO has exceeded its useful life and emission performance was falling. I have been trying to get LEO to address this issue since before December 2, 2002 with very little response from LEO Western Region Field Service. During startup this last Tuesday after a short interval of run up the gun most likely arced and shut itself down. This resulted in damage to the RAITH image acquisition board and also dropped the IEE-488 bus controlling and communicating with sub-systems on the Raith. Raith response to this problem has been excellent and we are to receive parts tomorrow. (Friday 1-10-03) LEO has been less forthcoming and we are experiencing a delay in bringing the system back up due to them. I have upgraded the request for service through Oberkocken, DE. the LEO headquarters and in the USA in Thornwood, N.Y. Rest assured that we are working hard to correct these problems to get back up and running, qualify the system performance, and to get Users back on the system as soon as is humanly possible. We expect to be up sometime early next week for testing. Thank you for your support! James Conway E-beam Technology Group 650-725-7075 From jwc at snf.stanford.edu Fri Jan 10 11:33:29 2003 From: jwc at snf.stanford.edu (James Conway) Date: Fri, 10 Jan 2003 11:33:29 -0800 Subject: Process Control Monitors on Beamer... Message-ID: <3E1F2009.5399D634@snf.stanford.edu> Greetings Ebeam Users: RE: Process Control Monitor I have placed a number of Hitachi and SNF Process Control Monitor (PCM) Patterns on the Hitachi H-700 (Ebeam) for your use and evaluation. The PCM files are attached for your comments and review. The PCM files are also in place on the RAITH 150 writer in the jwc/GDSII/patterns_to_test directory. These patterns are also on TIP, the CAD room PC on the far right side in directory: D:/all_users and D:/James and Henry/ *.TDB The patterns are called PCMn_L1_R1.EBMT , and the command and janet files are in the format JWCPCMn.jtx on Beamer. ...where n is numbers 0, 1, 2, 3 for increasing complexity of patterns. Please feel free to add these patterns to your runs and wafer exposures to aid you in evaluating your process development results. Shortly these patterns will be available on the SNF ebeam web site, and can be also be obtained from me on request. Just visit me during my office hour 8:30 - 9:30 AM daily, CIS 31. RE: WEDGE Patterns: The exposure and development determination patterns know as WEDGE, as described in the H-700 manual written by Mark McCord have also been regenerated and tested. WEDGE _L1_R1.EBMT with various dose array command janet files. Please employ caution in the janet files to ensure the correct dose specifications. These are currently being updated and tested again.. wedge200.jtx wedge400.jtx wedge800.jtx have finished testing and are here fore released for all users. For your convenience using jwcwedge.cmd will expose wedge400.jtx wedge800.jtx. Please copy and do not overwrite my command and janet files. You also have my permission to utilize any of my command (jwc*.cmd) or janet files (jwc*.jtx) on beamer for your process development needs. Thank you for your interest in Ebeam Technologies here at SNF, James Conway E-beam Technology Group Stanford Nanofabrication Facility -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: PCM3.gds Type: application/octet-stream Size: 30720 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: LINES&SPACES.gds Type: application/octet-stream Size: 36864 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: PCM1.gds Type: application/octet-stream Size: 28672 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: PCM2.gds Type: application/octet-stream Size: 30720 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: BOWTIE.gds Type: application/octet-stream Size: 2048 bytes Desc: not available URL: From jwc at snf.stanford.edu Fri Jan 17 09:21:35 2003 From: jwc at snf.stanford.edu (James Conway) Date: Fri, 17 Jan 2003 09:21:35 -0800 Subject: RAITH UPDATE Friday Jan. 17, 2003 Message-ID: <3E283B9F.CE12DC7@snf.stanford.edu> Greetings from the E-beam Technology Group: RAITH remains in yellow light mode for the coming week. Your results may vary... LEO SEM PACKAGE on the RAITH 150: The LEO SEM package is now working optimally after running in the new FE-Gun. We are now back to where we should be for beam brightness and emission level. Gun Vacuum has also been excellent, after bake out of the column gun section last weekend. (8.0 E -10 Torr with EHT off, 1.2 E -9 with EHT on) Beam spot sizes as small as 15 nm have been measured. Typical noise levels as imaged by examining the FWHM image ripple on a latex sphere at high magnification is on the order of 5 - 7 nm for a total beam spot size during a write of ~ 20 - 22 nm. This is a optimal set up for EBL on this system. RAITH 150 Write Field to Write Field Stitching Issues: We are continuing to evaluate and seeking a means to correct the Write Field to Write Field Stitching offset errors that we have been experiencing since early December. A number of users have encountered the problem but have been slow to report it. This problem seems to be intermittent, and we are performing a number of EBL test to determine if it is caused by a problem with the ELPHY Plus pattern generator, or within the laser interferometry stage control package. All RAITH users are request to make extra careful inspections of all patterns they have written since December 1, 2002 using SEM, and to immediate report the results of these inspections to me. Particularly useful would be measurements in X-Y (U,V) of the offset error magnitude, and supporting images you can collect during your inspections. Raith GmbH, RAITH USA and I are working diligently to quickly determine the cause and correct this situation before any more engineering materials or time are wasted due to this problem. Your comments invited. Thank you for your support! James Conway E-beam Technology Group Stanford Nanofabrication Facility 650-725-7075 -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Mon Jan 27 11:40:45 2003 From: jwc at snf.stanford.edu (James Conway) Date: Mon, 27 Jan 2003 11:40:45 -0800 Subject: RAITH UPDATE Jan. 27, 2003 11:31 AM Message-ID: <3E358B3D.66612D7B@snf.stanford.edu> Greetings and Good Morning, This last Friday afternoon it looked hopeful that we would be resolving the Write Field to adjacent Write field stitching error we had been experiencing recently on the RAITH 150. Inspections of patterns written overnight Thursday to Friday passed all inspection criteria for lateral U and V dimension offsets. E-beam Lithography write tests performed over the weekend to repeat this result on a larger number of patterns and chip writes resulted in no acceptable stitching alignment between write fields at any write, and pattern placement globally was in error on one 2 X 5 array as well. (Overlapped pattern placement) The system will continue to be down for troubleshooting and repair through this week. We will report to these list when the system comes back up for use. Raith USA personnel from Islip, N.Y. and RAITH GmbH specialist from Dortmund, Germany will arrive this afternoon to continue troubleshooting and repairs to this system. Thank you for your patience and support during this period. James Conway 650-725-7075 From jwc at snf.stanford.edu Fri Jan 31 14:06:59 2003 From: jwc at snf.stanford.edu (James Conway) Date: Fri, 31 Jan 2003 14:06:59 -0800 Subject: Need testers for a workaround method on RAITH Message-ID: <3E3AF383.83AB2FA6@snf.stanford.edu> Fu-Min and friends: I need a volunteer(s) to work with RAITH Product Manager Andreas Rampe this Sunday afternoon and possibly on Monday afternoon. You will be able to run your patterns within some constraints. We are testing the workaround method today and overnight. Please see me ASAP or call me on the cell phone after 6 PM. 415-412-4825 RSVP, James Conway 650-725-7075 From jwc at snf.stanford.edu Fri Jan 31 17:30:16 2003 From: jwc at snf.stanford.edu (James Conway) Date: Fri, 31 Jan 2003 17:30:16 -0800 Subject: Beamtools Update Friday Jan 31, 2003 Message-ID: <3E3B2328.1D324EDC@snf.stanford.edu> An HTML attachment was scrubbed... URL: