From ajavey at stanford.edu Wed Oct 1 03:49:55 2003 From: ajavey at stanford.edu (Ali Javey) Date: Wed, 1 Oct 2003 03:49:55 -0700 Subject: Raith Free 4 am - 10 am Message-ID: <1065005395.3f7ab1530f9db@webmail.stanford.edu> Finished way too early. Had a fabrication problem... Ali From jwc at snf.stanford.edu Wed Oct 1 18:16:29 2003 From: jwc at snf.stanford.edu (James Conway) Date: Wed, 01 Oct 2003 18:16:29 -0700 Subject: Reminder2: RAITH Ebeam Lithography Workshop 10 - 5 daily WED/THURS/FRI. Message-ID: <3F7B7C6D.64746AC7@snf.stanford.edu> Greetings: Just a reminder for the RAITH Ebeam Lithography Workshop we are holding this week. This is your chance to meet and work with the application specialist whom are visiting Stanford this week. It is a great chance to get all your questions answered, and bring to RAITH's and my own attention specific areas of your technical interest in Ebeam Technologies and where you may need more technical support and further training. PLEASE DON'T LET THIS GREAT OPPORTUNITY SLIP BY TO MEET AND LEARN FROM THE RAITH EXPERTS! THURSDAY WE WILL BE DISCUSSING METROLOGY AND EXPOSURE TOPICS RELATED TO SINGLE PIXEL LINES AND PERIODIC STRUCTURES SUCH AS GRATING AND PHOTONIC CRYSTAL PATTERNS. WE WILL CONVENE IN CIS 201 AT 10:00 AM AND AFTER LUNCH IN THE EBEAM LAB AT 1:15. PLEASE BRING IMAGES AND PATTERNS YOU WOULD LIKE HELP WITH. We will be holding this meeting from 10 - 5 PM daily starting out in CIS 201 (10 - 12) and 1 - 5 PM working in the Ebeam lab. Thank you for your interest in Ebeam Technologies here at SNF. James Conway Previous announcement attached. Dated August 21, 2003 and several other announcements since then. A LITHOGRAPHY WORKSHOP is scheduled for Wednesday through Friday, October 1-3. This is for current qualified users of the Stanford RAITH system only. * The topic for each day and the format will be flexible, but a general plan to follow would be to begin each day with a ~ 2 hour lecture/discussion session. ALL Raith Users are encouraged to attend the lecture/discussion sessions. Following the classroom session will be a 'practical' or hands-on session using the R150 tool. Due to limited space in the cleanroom, people must SIGN-UP for the practical session in advance. This will be on a first-come-first-serve basis. Schedule: WEDNESDAY, October 1 ==================== Question/answer of exposure problems; tips and tricks. After 2 days of presentations, and past knowledge of some difficulties experienced at SU, we can make general comments and suggestions for improving exposure results. You should come with questions. To really benefit from this, users should come PREPARED in advance with images and files that we can load on a laptop and projector and look at the questions or problems you are experiencing and talk through the process as though it is a 'case study'. THURSDAY, October 2 =================== Metrology with the R150. As a basis for this topic we can look at the stitching and overlay test pattern. In addition to learning more about stitching and overlay, you can learn about setting up measurements and doing statistical analysis on your exposure results. FRIDAY, October 3 ================= More discussion on proximity effects and circle arrays? Discussions will focus on Photonic crystal devices, but maybe there are other areas of interest which users may wish to discuss as well? - Discussions of any other remaining questions from the week. * Please Note: If you are in training on the RAITH with me, and not yet a qualified user, you are also cordially invited to attend these sessions to get a head start on the system. JWC From jwc at snf.stanford.edu Thu Oct 2 15:32:53 2003 From: jwc at snf.stanford.edu (James Conway) Date: Thu, 02 Oct 2003 15:32:53 -0700 Subject: STITCHING AND OVERLAY DEMONSTRATION AND HOW TO USE THE METROLOGY PKG. ON RAITH STARTING IN 10 MINUTES. Message-ID: <3F7CA795.7720A549@snf.stanford.edu> An HTML attachment was scrubbed... URL: From mtopinka at stanford.edu Thu Oct 2 16:33:14 2003 From: mtopinka at stanford.edu (Mark Topinka) Date: Thu, 02 Oct 2003 16:33:14 -0700 Subject: STITCHING AND OVERLAY DEMONSTRATION AND HOW TO USE THE METROLOGY PKG. ON RAITH STARTING IN 10 MINUTES. In-Reply-To: <3F7CA795.7720A549@snf.stanford.edu> Message-ID: <5.2.0.9.0.20031002163247.03c40d58@mtopinka.pobox.stanford.edu> Hi James- I'm sorry about today, something urgent came up. I will plan on being there for most of tomorrow afternoon. -Mark At 03:32 PM 10/2/2003 -0700, James Conway wrote: > >OCTOBER 2, 2003: 1530 HOURS. >HELLO: > > >USERS INTERESTED IN LEARNING MORE ABOUT STITCHING AND OVERLAY METROLOGY >USING THE RAITH 150 METROLOGY PACKAGE SHOULD COME DOWN TO THE EBEAM LAB. > >WE WILL BE STARTING ONCE WE GET A NEW SAMPLE INSIDE. > >THIS IS A FANTASTIC OPPORTUNITY TO TRAIN WITH THE EXPERTS WITH RAITH. >YOU CAN COME WITH OTHER EXPOSURE AND EBL QUESTIONS FOR DISCUSSIONS WHILE >WE ARE WRITING OUR STITCH AND OVERLAY PATTERNS. >DON'T PASS IT UP! > >THANK YOU, > >JAMES CONWAY > > From jwc at snf.stanford.edu Thu Oct 2 17:01:29 2003 From: jwc at snf.stanford.edu (James Conway) Date: Thu, 02 Oct 2003 17:01:29 -0700 Subject: Reminder3: RAITH Ebeam Lithography Workshop 10 - 5 FRI. Message-ID: <3F7CBC59.860E00AD@snf.stanford.edu> Greetings: Reminder for the RAITH Ebeam Lithography Workshop This is your last chance to join the experts from RAITH to get all your questions answered: Friday's topics will include Photonics Crystals Gratings and all your pressing questions... Please bring examples of problems and successes you have encountered in your work on the RAITH EBL system. Please come and join us.... Thank you for your attendance in this last session. James Conway FRIDAY, October 3 ================= -More discussion on proximity effects and circle arrays? -Discussions will focus on Photonic crystal devices, but maybe there are other areas of interest which users may wish to discuss as well? - Discussions of any other remaining questions from the week. =========================================================================================================== This is your chance to meet and work with the application specialist whom are visiting Stanford this week. It is a great chance to get all your questions answered, and bring to RAITH's and my own attention specific areas of your technical interest in Ebeam Technologies and where you may need more technical support and further training. PLEASE DON'T LET THIS GREAT OPPORTUNITY SLIP BY TO MEET AND LEARN FROM THE RAITH EXPERTS! PLEASE BRING IMAGES AND PATTERNS YOU WOULD LIKE HELP WITH. We will be holding this meeting from 10 - 5 PM daily starting out in CIS 201 (10 - 12) and 1 - 5 PM working in the Ebeam lab. Thank you for your interest in Ebeam Technologies here at SNF. James Conway Previous announcement attached. Dated August 21, 2003 and many other announcements since then. A LITHOGRAPHY WORKSHOP is scheduled for Wednesday through Friday, October 1-3. This is for current qualified users of the Stanford RAITH system only. * The topic for each day and the format will be flexible, but a general plan to follow would be to begin each day with a ~ 2 hour lecture/discussion session. ALL Raith Users are encouraged to attend the lecture/discussion sessions. Following the classroom session will be a 'practical' or hands-on session using the R150 tool. Due to limited space in the cleanroom, people must SIGN-UP for the practical session in advance. This will be on a first-come-first-serve basis. Schedule: WEDNESDAY, October 1 ==================== Question/answer of exposure problems; tips and tricks. After 2 days of presentations, and past knowledge of some difficulties experienced at SU, we can make general comments and suggestions for improving exposure results. You should come with questions. To really benefit from this, users should come PREPARED in advance with images and files that we can load on a laptop and projector and look at the questions or problems you are experiencing and talk through the process as though it is a 'case study'. THURSDAY, October 2 =================== Metrology with the R150. As a basis for this topic we can look at the stitching and overlay test pattern. In addition to learning more about stitching and overlay, you can learn about setting up measurements and doing statistical analysis on your exposure results. FRIDAY, October 3 ================= More discussion on proximity effects and circle arrays? Discussions will focus on Photonic crystal devices, but maybe there are other areas of interest which users may wish to discuss as well? - Discussions of any other remaining questions from the week. * Please Note: If you are in training on the RAITH with me, and not yet a qualified user, you are also cordially invited to attend these sessions to get a head start on the system. JWC From mtopinka at stanford.edu Fri Oct 3 02:39:18 2003 From: mtopinka at stanford.edu (Mark Allen Topinka) Date: Fri, 3 Oct 2003 02:39:18 -0700 Subject: raith open 7-11 Friday Message-ID: <1065173958.3f7d43c6e38fa@webmail.stanford.edu> I moved my slot to later in the weekend. -Mark From jwc at snf.stanford.edu Fri Oct 3 18:17:11 2003 From: jwc at snf.stanford.edu (James Conway) Date: Fri, 03 Oct 2003 18:17:11 -0700 Subject: Problems with PMMA as a mask -- Try this! References: Message-ID: <3F7E1F97.8957E711@snf.stanford.edu> Hello: Two things that will help you: 1- NO Oxygen during the etch process, and be sure to pump the system to base pressure before back filling and flowing your process gases for several minutes. PMMA and most of the ebeam resist materials (ZEP-520 for example) will quickly be removed with even the slightest trace of Oxygen in the process gases. My old descum process was 15 W 30 sec. 0.200 mT O2 in a March Mini-80 RIE system. This will rapidly decompose the ZEP-520 material. 2. Post develop bake on hot plate or preferably in N2 oven for 10 - 30 minutes. I recommend 90 - 110 degrees C. This will assist cure and cross linking of the resist material making it more resistant to the RIE process. Please reply with your notes and results when you have tried this to add to our knowledge base. Thanks, James Conway "Scott D. Andrews" wrote: > Has anyone tried using PMMA as a mask when etching SiO2? I need to etch > 10 nm of SiO2 with 100 nm of PMMA as the mask layer. However, when I use > the mrc with O2 and freon 23, the PMMA does not survive. Ideally, I would > like an anisotropic etch, but if necessary, I would accept a wet process > that undercuts slightly. > > Thanks, > Scott Andrews From scaccag at stanford.edu Mon Oct 6 10:38:43 2003 From: scaccag at stanford.edu (Luigi Scaccabarozzi) Date: Mon, 6 Oct 2003 10:38:43 -0700 (PDT) Subject: raith reservation NOW Message-ID: HI, I'm very sorry, I thought I reserved for this afternoon but I just realized that the reservation is for this morning. I need at least another 1-1.5hr to prepare my sample so if someone wants to get on the machine for something quick is welcome. Or if hungtao want to use it now I can switch reservation with him. sorry again for late notice. Gigi From jwc at snf.stanford.edu Mon Oct 6 10:53:54 2003 From: jwc at snf.stanford.edu (James Conway) Date: Mon, 06 Oct 2003 10:53:54 -0700 Subject: raith reservation NOW References: Message-ID: <3F81AC32.7E3EF52F@snf.stanford.edu> I have the system for computer testing... JWC Luigi Scaccabarozzi wrote: > HI, > I'm very sorry, I thought I reserved for this afternoon but I just > realized that the reservation is for this morning. > I need at least another 1-1.5hr to prepare my sample so if someone wants > to get on the machine for something quick is welcome. Or if hungtao > want to use it now I can switch reservation with him. > sorry again for late notice. > Gigi From jwc at snf.stanford.edu Mon Oct 6 16:59:28 2003 From: jwc at snf.stanford.edu (James Conway) Date: Mon, 06 Oct 2003 16:59:28 -0700 Subject: LEO PC IS UP with New Windows NT 2000 OS. Message-ID: <3F8201E0.860C5AFD@snf.stanford.edu> Mark and Hung Tao and RAITH USERS: Mark and Hung Tao: The system is available for your to continue your EBL session. Today: We have installed a brand new PC and Windows NT 2000 OS to the LEO PC. Much more memory and gobs of storage. Networked with the RAITH computer as before... UPgraded the LEO column and server software to version 4.00.03 We copied over some of the old configurations so it will appear similar to before. I will be updating the RAITH Macros in the morning... Please let me know if anyone encounters problems. 415-412-4825 All the best, James Conway Users receiving this message that are no longer using the RAITH are requested to reply to this email, and assist us in removing old log-ons on the system to clean up our working space. Thank you. JWC -------------- next part -------------- An HTML attachment was scrubbed... URL: From ajavey at stanford.edu Tue Oct 7 01:40:22 2003 From: ajavey at stanford.edu (Ali Javey) Date: Tue, 7 Oct 2003 01:40:22 -0700 Subject: Raith free for rest of the night... Message-ID: <1065516022.3f827bf612b8e@webmail.stanford.edu> Sorry for the late note. Ali From jwc at snf.stanford.edu Wed Oct 8 09:45:48 2003 From: jwc at snf.stanford.edu (James Conway) Date: Wed, 08 Oct 2003 09:45:48 -0700 Subject: Semhitachi dropped samples and minor problems and issues use the CORAL {Make Comments} utility. Message-ID: <3F843F3C.F2829F8E@snf.stanford.edu> Ebeam Lab Users on SEMHITACHI -- S4160 -- EBEAM -- RAITH: This is a good example of when to use the [make comment] utility within CORAL so users are aware of the dropped sample. Remember sometimes a dropped sample can fall into the Y goniometer sliders blocking simple translation to the exchange position. On EBEAM a dropped sample, particularly into the main chamber is much more of a problem -- please report immediately! Thank you for your support! James Conway >> A dropped specimen is NO reason to shutdown the SEM! Not even to 'Condition Yellow". >>This needlessly makes our 'uptime' specs look bad, it keeps users from running the machine when it's perfectly capable of running. Just a note to me will suffice! From jwc at snf.stanford.edu Thu Oct 9 09:23:47 2003 From: jwc at snf.stanford.edu (James Conway) Date: Thu, 09 Oct 2003 09:23:47 -0700 Subject: Significant changes to LEO configurations were made in the upgrade all users see JWC... Message-ID: <3F858B93.E73093BF@snf.stanford.edu> Greetings RAITH Users: We now have a brand new and somewhat better LEO PC running WIN NT 2000 Professional. This hardware has full USB capability and we also have installed a CD-RW on this computer. Please DO NOT load any software on this system with out approval -- the LEO system is somewhat sensitive to this as we have experienced in the past. We have upgraded the LEO column software to the new version 4.000.03. Significant changes to LEO configurations were made in the upgrade by LEO which will hose your old configurations. Changes made to the old directory structure were not acceptable to the new software so I must manually change these back to the new defaults in order to maintain your logins. Some of these changes are made at the administrator level and others need to be done with in the users preferences area of your login. Also the primary configurations for the SEM settings were returned to LEO defaults and not to the RAITH settings you must have for the system to work properly. Finally after all these changes we must merge the standard macro libraries to your users files, again in a specific sequence for it to work properly. It took me much of the day yesterday to identify and test a method to get all this to work within the macro libraries. I have done the admin. level changes for users with login names starting with letters A - H as of last night 9 PM, and will continue with these through the week. (56 users!) Please see me before your next session so we can make the changes within your login shells and test these items together. [..preferably when I am working on the systems and not writing of course...] I will post the user preferences defaults on the system and in the FAQ book as they get finalized. If you run into problems call me at 415-412-4825 I have established several test and temporary logins which can get you through this until I can fix your login should you not get to me before your session. Thank you for your support! James Conway -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Thu Oct 9 09:27:04 2003 From: jwc at snf.stanford.edu (James Conway) Date: Thu, 09 Oct 2003 09:27:04 -0700 Subject: Please help me remove old and unused logins on the RAITH system. Message-ID: <3F858C58.DA99BE0F@snf.stanford.edu> Greetings: If you have not been on the LEO and RAITH systems since your training and you have not accessed the system over the last six months you will loose your RAITH and LEO login status as we migrate onto a new OS on the LEO PC. Please see me during my office hour to establish your accounts again. Thank you, James Conway From kaimeifu at stanford.edu Thu Oct 9 19:02:26 2003 From: kaimeifu at stanford.edu (Kai-Mei Fu) Date: Thu, 09 Oct 2003 19:02:26 -0700 Subject: reservation canceled 9:30-12:00 tonight (thursday) Message-ID: <5.2.0.9.2.20031009190158.00ba8338@localhost> Cannot make reservation. Sorry for the late notice. From mtopinka at stanford.edu Fri Oct 10 02:15:11 2003 From: mtopinka at stanford.edu (Mark Topinka) Date: Fri, 10 Oct 2003 02:15:11 -0700 Subject: Raith free 1pm-6pm Friday Message-ID: <5.2.0.9.0.20031010021403.01d81888@mtopinka.pobox.stanford.edu> Sorry for the late notice folks- unexpected paper deadline that I have to deal with. From jwc at snf.stanford.edu Fri Oct 10 17:34:26 2003 From: jwc at snf.stanford.edu (James Conway) Date: Fri, 10 Oct 2003 17:34:26 -0700 Subject: Raith Blanking concerns were not observed on test today. Message-ID: <3F875012.2B7B8D0A@snf.stanford.edu> Greetings: Today I spent significant time troubleshooting two reports of blanking problems with the RAITH 150 System. My test: On bare un-patterned 100 nm PMMA I exposed areas at 0.500 um pitches blanking between moves as follows: Test were conducted in column (V) from 1, 1 to 9, 1 U:V. Test One: I examined the picoammeter with signals blanked and unblanked and did not see Beam Current above the meter noise when blanked. I performed this on charging and metal surfaces with no difference. Beam I 10 keV 30 um aperture: Beam ON 0.128 nA. Beam Off 0.000 - 0.006 nA. NO PROBLEM Test Two: 2.1: 1, 1 to 1, 9 U:V Expose a field of view at 600X for ~10 seconds, Blank, Move stage V 0.5 mm and unblank, expose again. Repeat 20 times moving in a column in V direction across chip. NO PROBLEM 2.2: 2,9 - 2,1 U:V Exposed a field of view at 600X for ~10 seconds. without blanking Move stage V 0.5 mm increments. NO PROBLEM I see scan artifacts at the ends of the column but along the path. 2.3: 3, 1 to 3, 9 U:V Scanned again another V column every 0.5 mm staying blanked the entire time No features unexpected. NO PROBLEM No artifacts. 2.4: 5, 9 to 5, 1 U:V With the LEO PC in TV mode repeated test 2.2 NO PROBLEM NO artifacts. 2.5 7, 1 to 7, 9 U:V Back to SEM mode Expose a field of view at 600X for ~10 seconds, Blank, Change mag to 300X, unblank and expose for ~20 seconds. Print a short contamination dot. No Problem, features as expected where expected. I did find one small spot shot at the end of the first raster line. Conclusions: We should all continue to carefully inspect our patterns to continue this evaluation but I conclude that the report by kaimei fu may have been a result of scanning across her sample while the system was scanning in either scan rate 1 or 2 while the stage was moving. This may have been inadvertent move by other users across her sample or by her. Other EBL writes I did this afternoon will show this problem if there is a problem. We will inspect those patterns Monday evening. Thank you for your support! James Conway -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: beamblank2.JPG Type: image/jpeg Size: 160846 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: beamblank1.JPG Type: image/jpeg Size: 126151 bytes Desc: not available URL: From jwc at snf.stanford.edu Fri Oct 10 17:36:44 2003 From: jwc at snf.stanford.edu (James Conway) Date: Fri, 10 Oct 2003 17:36:44 -0700 Subject: I am done -- next user come on down... Message-ID: <3F87509C.859CF893@snf.stanford.edu> I am nearly finished with the system and ready to hand off. Users whom have not seen me to update their configuration settings better come down NOW or see me Monday Morning. I am on the system till 6 PM today. JWC From ajavey at stanford.edu Fri Oct 10 17:58:08 2003 From: ajavey at stanford.edu (Ali Javey) Date: Fri, 10 Oct 2003 17:58:08 -0700 (PDT) Subject: reservation removed Saturday morning Message-ID: From mtopinka at stanford.edu Sun Oct 12 12:26:55 2003 From: mtopinka at stanford.edu (Mark Topinka) Date: Sun, 12 Oct 2003 12:26:55 -0700 Subject: Raith free 7-11 Message-ID: <5.2.0.9.0.20031012122630.0225cfd0@mtopinka.pobox.stanford.edu> From kaimeifu at stanford.edu Mon Oct 13 12:01:31 2003 From: kaimeifu at stanford.edu (Kai-Mei Camilla Fu) Date: Mon, 13 Oct 2003 12:01:31 -0700 (PDT) Subject: ebeam free tuesday morning 8-1 Message-ID: Sorry for late notice but no longer need reservation From jwc at snf.stanford.edu Wed Oct 15 12:26:28 2003 From: jwc at snf.stanford.edu (James Conway) Date: Wed, 15 Oct 2003 12:26:28 -0700 Subject: discontinue 950K References: <3F8D9930.F3721971@snf.stanford.edu> Message-ID: <3F8D9F64.89451267@snf.stanford.edu> Hi everyone: Just to clarify Mahnaz's last email... - Microchem Corp. materials are more consistent lot to lot :: batch to batch. In the future we will only order PMMA from Microchem and NOT Arche or Gallade Chemical. - This work refers to the 2% 950,000 Molecular Weight PMMA material only and has no reference to the STD. 5% 495,000 Molecular weight PMMA. The 2% 950K MW PMMA is our high resolution Ebeam resist used in single and bi-layer processing in our lab here. The 5% 495,000 Molecular weight PMMA is our Standard PMMA material system to result in slightly thicker films to ~300 - 250 nm thickness and it is the workhorse Ebeam resist we use here at SNF. While the 9% 950,000 MW PMMA is inventoried here and is currently 'in the house'. I see little to no apparent need for us to stock it, as that most users of this material are using it for planarization and surface protective films, and we have no process defined to work with it. We should carefully review the need to determine if we wish to stock, provide process support, and track results of this material with users. I occasionally see users confused with the various viscousities and molecular weights of these materials resulting in application of the material types in error leading to various process results. THANK YOU, James Conway Mahnaz Mansourpour wrote: > Hello all, > > It has been decided to discontinue the order of OCG PMMA 950k 2%. > Apparently the batch to batch does not produce the same result and James > gets better result from Pmma 495K mw 2%. > We still have 3 small bottles of these materials and one whole big > bottle in the box that Dave will try to see if we can send it back ( if > not we will use it up, but please no more ordering of these from Gallade > Chemical Inc.). > Please any problem or issue with this let James or me know. > Apparently that goes for pmma 9% as well, do we need it? the usage is > very low? > > mahnaz -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Wed Oct 15 12:32:06 2003 From: jwc at snf.stanford.edu (James Conway) Date: Wed, 15 Oct 2003 12:32:06 -0700 Subject: System is available for next user: grupp Message-ID: <3F8DA0B5.2D8F6FA0@snf.stanford.edu> Users: The system has been idle since about 10 AM. I am surprised that no one accessed the system! Dan you are up if you wish to start early you are up! Thank you, JWC From hungtao at stanford.edu Wed Oct 15 19:25:01 2003 From: hungtao at stanford.edu (Hung-Tao Chou) Date: Wed, 15 Oct 2003 19:25:01 -0700 Subject: raith time open from 2pm-6pm tomorrow Thursday Message-ID: <1066271101.3f8e017d18d8c@webmail.stanford.edu> My sample is not ready. -Hungtao From mtopinka at stanford.edu Wed Oct 15 22:48:09 2003 From: mtopinka at stanford.edu (Mark Topinka) Date: Wed, 15 Oct 2003 22:48:09 -0700 Subject: Raith is free for the rest of the evening / early morning Message-ID: <5.2.0.9.0.20031015224707.022adbb8@mtopinka.pobox.stanford.edu> From dfattal at stanford.edu Thu Oct 16 16:58:11 2003 From: dfattal at stanford.edu (David Fattal) Date: Thu, 16 Oct 2003 16:58:11 -0700 Subject: cancelled reservation 9:00 pm - 1:00 am tonight ... In-Reply-To: <3F87509C.859CF893@snf.stanford.edu> Message-ID: won't have time to prepare my samples... From mtopinka at stanford.edu Thu Oct 16 17:10:21 2003 From: mtopinka at stanford.edu (Mark Topinka) Date: Thu, 16 Oct 2003 17:10:21 -0700 Subject: Raith 6-9 slot open Message-ID: <5.2.0.9.0.20031016171004.0228a370@mtopinka.pobox.stanford.edu> From kaimeifu at stanford.edu Thu Oct 16 23:22:12 2003 From: kaimeifu at stanford.edu (Kai-Mei Camilla Fu) Date: Thu, 16 Oct 2003 23:22:12 -0700 (PDT) Subject: free from 9:00-1:30 tomorrow morning Message-ID: Very sorry for the late notice. Cannot get samples ready. From jwc at snf.stanford.edu Fri Oct 17 09:22:22 2003 From: jwc at snf.stanford.edu (James Conway) Date: Fri, 17 Oct 2003 09:22:22 -0700 Subject: Re3: Where did all the ZEP-520 disappear too? Did we just use it all up? The whole thread inlined. References: <000001c39414$1e729b70$f76340ab@SAMEER> <3F8EE929.A04D27F7@snf.stanford.edu> <3F8EECCE.7020808@stanford.edu> Message-ID: <3F90173E.B36B012E@snf.stanford.edu> Hi Rohit: While this is a good idea; I think it may fail in implementation. The problems seems to be one or two users whom are not following resist handling guidelines and/or are securing their own supply for themselves from our source bottles. >From the reports I have had come back to me on my email earlier in the week I can account for only about half the 100 ml bottle that we went through in less than a month. Reports seem to indicate that some 25 - 50 ml suddenly disappeared September 26 - October 6th. IN my humble opinion: We need to keep immediate control over the ZEP-520 and some of the other more expensive resist materials by keeping them locked up. Sad but true... Thank you, we will keep your idea under discussion with SNF staff. Yours, JWC "Rohit S. Shenoy" wrote: > James: > > Why don't we institute a logbook where all ebeam resist usage is > monitored? It need not be elaborate. Just one line per user showing > date, resist name, approx piece size, approx volume used. I agree > that there is no way to enforce compliance. There one will have to > rely, as in the case for a lot of other equipment use being logged, > simply on good faith. > > thanks, > -- > Rohit > > James Conway wrote: > > Sameer: > > > > Be advised it is not my intention to discontinue this material!! I > > think ZEP is great stuff! > > > > On the other hand UVN-30 is a killer for some and the MaN-2403 may be a > > likely replacement. > > Both have their utilities and benefits in the lab. > > > > My want is to closely monitor the use of all our expensive resist > > (read: all ebeam resist) and identify where and whom may be wasting > > these materials and/or handling it improperly at our facility. A lot of > > waste could be reduced if people simply get together and 'Take a Spin > together!" > > > > Yours, > > > > JWC > > > > > >> sameer jain wrote: > >> > >> > Hi James, > >> > I do not remember exactly the last time I used ZEP 520 as it is > >> > probably over a month since I did so (it should be easy to traced that > >> > down though -- from my ebeam usage logs). > >> > > >> > From what I remember, I coated 3-4 wafers during that period each > >> time > >> > using (I would guess) 2-3 ml of ZEP (Mahnaz has seen me dispense the > >> > resist). i.e. I used ~10ml of the ZEP. The bottle at that time was > >> > pretty close to being full. > >> > > >> > > >> > Hope the resist usage from all the users tally up. > >> > > >> > ciao > >> > Sameer > >> > > >> > -----Original Message----- > >> > From: James Conway [mailto:jwc at snf.stanford.edu] > >> > Sent: Wednesday, October 15, 2003 6:51 PM > >> > To: chongfei shen; fumin at snf.stanford.edu > >> > Cc: Kai-Mei Fu; Sameer Hemchand Jain; Ali Javey; Rohit S. Shenoy; > >> > Xiaolei --- REIGH Liu; Mary Tang; Paul Jerabek > >> > Subject: Where did all the ZEP-520 disappear too? Did we just use it > >> all > >> > up? > >> > > >> > Greetings: > >> > > >> > We need your help to help us track our usage of ZEP-520 last month. > >> > The last bottle was brought out in mid - September and should have > >> > lasted > >> > more than a month. > >> > Could it be that the last bottle has been looted/stolen and/or taken > >> out > >> > of > >> > the Lab. > >> > > >> > Can you please tell us: > >> > Your last use of this material? When was that? > >> > How much remained on the last time you needed it. > >> > How much you normally use for a run of X (how many) wafers? > >> > > >> > We are trying to track it down and ID whom may be using and/or wasting > >> > this > >> > expensive material! > >> > > >> > Thank you for your help, > >> > > >> > JWC > >> > > >> > Fu-Min Wang wrote: > >> > > >> > > I have no idea about where it went. I found one empty bottle and one > >> > with > >> > > about 10ml of ZEP in the refrigerator on Monday. > >> > > > >> > > Fumin > >> > > ----- Original Message ----- > >> > > From: "James Conway" > >> > > To: "Fu-Min Wang" > >> > > Cc: "chongfei shen" ; "Mahnaz Mansourpour" > >> > > > >> > > Sent: Wednesday, October 15, 2003 1:42 PM > >> > > Subject: Re: ZEP 520 > >> > > > >> > > > Where did it go? We had a full bottle in the refrigerator in the > >> > > cleanroom!!! > >> > > > > >> > > > Please check and come see me! > >> > > > > >> > > > JWC > >> > > > > >> > > > > >> > > > Fu-Min Wang wrote: > >> > > > > >> > > > > James, > >> > > > > > >> > > > > It seemed that ZEP 520 is out of stock. Do you have something on > >> > > reserve? > >> > > > > > >> > > > > Fumin > >> > > > > >> From lgx at stanford.edu Fri Oct 17 13:40:25 2003 From: lgx at stanford.edu (Guanxiong Li) Date: Fri, 17 Oct 2003 13:40:25 -0700 Subject: Reservation 3-5pm removed today Message-ID: <000801c394ee$e4e66ea0$0c9f0c80@stanford.edu> Sample not ready. Sorry for late notice. -------------- next part -------------- An HTML attachment was scrubbed... URL: From grupp at snowmass.Stanford.EDU Fri Oct 17 18:42:09 2003 From: grupp at snowmass.Stanford.EDU (Dan Grupp) Date: Fri, 17 Oct 2003 18:42:09 -0700 (PDT) Subject: Raith res removed mon 11-3; wed 8-1 Message-ID: --------------------------------------------------------------------------- Dr. Daniel Grupp, Visiting Scholar Center for Integrated Systems Stanford University Stanford, CA 94305 (650) 724-6911 FAX: 723-4659 --------------------------------------------------------------------------- From lgx at stanford.edu Sat Oct 18 10:10:06 2003 From: lgx at stanford.edu (Guanxiong Li) Date: Sat, 18 Oct 2003 10:10:06 -0700 Subject: Reservation 10am-12pm removed today Message-ID: <001801c3959a$adbb6eb0$966a40ab@stanford.edu> Sorry for the last minute notice. Something else comes up to my attention. -lgx _________________________________ -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Mon Oct 20 10:21:18 2003 From: jwc at snf.stanford.edu (James Conway) Date: Mon, 20 Oct 2003 10:21:18 -0700 Subject: [FAQ] Metal Liftoff from EBL pattern Question || EBL on Charging Substrates. References: <001d01c3969b$53b3dea0$cff9180a@hppav> Message-ID: <3F94198E.9EF4C87B@snf.stanford.edu> An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: C:\DOCUME~1\jwc\LOCALS~1\Temp\nsmailCU.gif Type: image/gif Size: 236 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: C:\DOCUME~1\jwc\LOCALS~1\Temp\nsmailF6.gif Type: image/gif Size: 10212 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: hm_spotlight2.gif Type: image/gif Size: 10212 bytes Desc: not available URL: From hungtao at stanford.edu Mon Oct 20 13:04:48 2003 From: hungtao at stanford.edu (Hung-Tao Chou) Date: Mon, 20 Oct 2003 13:04:48 -0700 Subject: time open from 3-7pm today Message-ID: <1066680288.3f943fe0374b9@webmail.stanford.edu> Sorry for the late notice, my sample is not ready. From jwc at snf.stanford.edu Mon Oct 20 15:10:32 2003 From: jwc at snf.stanford.edu (James Conway) Date: Mon, 20 Oct 2003 15:10:32 -0700 Subject: FAQ: Updating your LEO PC Macro Libraries and preference settings. Message-ID: <3F945D58.5ADCB43C@snf.stanford.edu> [Image] Greetings RAITH Users: IMPORTANT: If you are amongst the minority that still need to change settings on your LEO PC logins to be current with the changes made to the LEO PC hardware a week ago, follow the directions listed below as a FAQ. Otherwise See James Conway at your next login session for help. If you need assistance after hours, you can always call me on my cell phone at 415-412-4825. I have finished all administrator level changes and need to ensure the changes are made properly within your login for the system to work correctly for you on your next usage. Thank you for your support! James Conway ------------------------------------------------------------------------------------------------------------------ RAITH FAQ: October 20, 2003 A. Procedure to update User Preferences and then merge your LEO Column Macro Libraries with your own within your login on the LEO PC. B. Procedure to change from LEO defaults to RAITH LEO PC User settings on the LEO Electron Microscope attached to the RAITH 150. 1. Launch LEO Column Application on the LEO PC COMPUTER: [YES] to the first dialog box that pops up: ' Do you wish to merge your standard library macros.' [YES] to the second pop up box. Confirming Macro Libraries were merged. Leo column application launches and you see the default screen with CCD camera view of inside chamber. 2. Close and exit REMCON -- if it launches. 3. SEM SETTINGS FOR THE RAITH INTERFACE: Pull down from top menu bar --> [Tools] [User Preferences] TAB --> Users Directory Setup: Verify it reads C:\Program Files\LEO ELECTRON MICROSCOPE LTD\LEO-32\user\your_user_name TAB Users IMAGE Directory Setup: Verify it reads C:\Programs\LEO ELECTRON MICROSCOPE LTD\LEO-32\images\user\your_user_name\ Users Preferences pops up: Select TAB --> [SEM Conditions] * Select [Aperture Align] 'ON' This will save configuration and gun aperture and stigmation settings to your state file. * Select [Beam Blanking] 'ON' This will automatically blank when all image zones are 'frozen'. * Select [Beam Shift Magnification] to 'OFF'. * Select [Magnification Display ] setting radio button to 'Polaroid 545' selecting the correct magnification table. DO NOT SET TO CURRENT OUTPUT DEVICE. * Select [Focus Wobble] and select reduced raster 'ON' * Select [Scan Rate] setting to 2, or to whatever you prefer as a default scan rate. * Select [Emission Mode] to auto signal to 'OFF' * Select [Cross Hairs] to 'OFF' * Select [APPLY] and then [OK] to save these as your new preferences settings. 4. To merge the users Macro Libraries with the Standard System Macro Libraries: * Pull down from top menu bar --> [Tools] [Macro Editor] Macro Editor will launch and open, select from top menu bar [Library] then drop down to [Merge Standard Libraries] * Select [OK] at WARNING Pop-up box, "Your current Libraries will be merged with the Standard Library..." * Exit macro editor. 5. Saving your changes to your preferences and user login defaults: * Select [File] and [Exit] to exit LEO Column PC. * [SAVE] Changes to Configurations, etc... * [Save] SEM Conditions to save all changes made. 6. Restart LEO COLUMN PC Software. verify REMCON is started and it should automatically start and channel should be 'OPEN'. Quick icon buttons on icon toolbar should also all work. Please see James conway if you have any questions or encounter any problems. JWC 10-20-2003 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: C:\DOCUME~1\jwc\LOCALS~1\Temp\nsmailV5.gif Type: image/gif Size: 15731 bytes Desc: not available URL: From scaccag at stanford.edu Tue Oct 21 22:53:39 2003 From: scaccag at stanford.edu (Luigi Scaccabarozzi) Date: Tue, 21 Oct 2003 22:53:39 -0700 (PDT) Subject: raith free tomorrow morning (wed) Message-ID: From jwc at snf.stanford.edu Wed Oct 22 08:33:17 2003 From: jwc at snf.stanford.edu (James Conway) Date: Wed, 22 Oct 2003 08:33:17 -0700 Subject: Raith is free -- it is unloading now. Message-ID: <3F96A33D.111C3151@snf.stanford.edu> From jwc at snf.stanford.edu Wed Oct 22 08:38:41 2003 From: jwc at snf.stanford.edu (James Conway) Date: Wed, 22 Oct 2003 08:38:41 -0700 Subject: Users must always log your runs on the RAITH 150 system. Message-ID: <3F96A481.6151BFE0@snf.stanford.edu> An HTML attachment was scrubbed... URL: From lsmoore at stanford.edu Wed Oct 22 22:06:29 2003 From: lsmoore at stanford.edu (LINDSAY) Date: Wed, 22 Oct 2003 22:06:29 -0700 (PDT) Subject: 2-7 Friday free Message-ID: Hi all, I think that my reservation tomorrow is 2-7pm, but you can check on Coral. I will let you know again when I have deleted it so that you can reserve that time. sorry for the short notice. I am home sick. Lindsay From lsmoore at stanford.edu Wed Oct 22 22:25:57 2003 From: lsmoore at stanford.edu (LINDSAY) Date: Wed, 22 Oct 2003 22:25:57 -0700 (PDT) Subject: oops! 2-7 THURSDAY free In-Reply-To: Message-ID: oh jeez. sorry for the piles of email, but i MEANT thursday. NOT friday. sorry sorry sorry. On Wed, 22 Oct 2003, LINDSAY wrote: : : Hi all, : I think that my reservation tomorrow is 2-7pm, but you can check on Coral. : I will let you know again when I have deleted it so that you can reserve : that time. sorry for the short notice. I am home sick. : : Lindsay : From scaccag at stanford.edu Thu Oct 23 08:51:48 2003 From: scaccag at stanford.edu (Luigi Scaccabarozzi) Date: Thu, 23 Oct 2003 08:51:48 -0700 (PDT) Subject: raith free THIS morning 9.30-1.30 Message-ID: Very sorry I meant to cancel yesterday, as my sample is not ready... From mtopinka at stanford.edu Thu Oct 23 10:22:40 2003 From: mtopinka at stanford.edu (Mark Topinka) Date: Thu, 23 Oct 2003 10:22:40 -0700 Subject: Moved my Raith res from 7-10pm tonight to NOW Message-ID: <5.2.0.9.0.20031023102134.022a4f78@mtopinka.pobox.stanford.edu> Since nobody is using the Raith right now, I have moved my reservation from the 7-10 slot to right now. That frees up 7-10 for anybody who wants it. -Mark From jwc at snf.stanford.edu Thu Oct 23 10:40:00 2003 From: jwc at snf.stanford.edu (James Conway) Date: Thu, 23 Oct 2003 10:40:00 -0700 Subject: deleted reservation? RAITH schedule is open today from 1400 - 2200 hours( 2 - 10 PM) References: Message-ID: <3F981270.C5FC7B72@snf.stanford.edu> Done... I cc'd the raith mailing list and arvind whom is after you. Thanks, JWC LINDSAY wrote: > > Can you do me a huge favor and delete my reservation on the Raith that is > tomorrow 2-7? If you let me know when you have done this I can email > everyone and let them know it is free at that time. thanks! > Lindsay From jwc at snf.stanford.edu Thu Oct 23 18:45:32 2003 From: jwc at snf.stanford.edu (James Conway) Date: Thu, 23 Oct 2003 18:45:32 -0700 Subject: README! Policy Change now in effect! Message-ID: <3F98843C.2425461A@snf.stanford.edu> All Ebeam Tools Users: There have been more than a large number of cancellations on the ebeam systems this week. This behavior is preventing both SNF staff and new users and students waiting for system access to get their work done. Users are requested to only reserve the time they will actually need the system. If you will not be using your reservation you should remove your reservation as soon as you realize you will not be using the system. I would normally expect this to occur by the morning of the reservation, and not at the time of the reservation. If you are finished early -- great! Post immediately to the list and let others know you are finished early. Please also cc the next user in line on Coral. EBEAM: Users are not to reserve time on the systems until their patterns are on the system, tested, and they have wafers prepared and ready to write. HENCEFORTH the excuse "My wafers are not ready..." will not be acceptable . You must provide a reason for the cancellation. I expect that you will provide a reason for your cancellations, particularly if this is due to a dependence in the lab such as a system you needed before EBL was not available. This will aid us in identifying what bottlenecks at SNF that need to be addressed. This will also allow us to continue to service more users and increase throughput on the system. Your cooperation is requested to improve the current situation. Thank you, James Conway -------------- next part -------------- An HTML attachment was scrubbed... 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Name: C:\DOCUME~1\jwc\LOCALS~1\Temp\nsmailJI.gif Type: image/gif Size: 43 bytes Desc: not available URL: From hungtao at stanford.edu Fri Oct 24 17:08:17 2003 From: hungtao at stanford.edu (Hung-Tao Chou) Date: Fri, 24 Oct 2003 17:08:17 -0700 Subject: time slot open 4-8pm next Monday Message-ID: <1067040497.3f99bef12a647@webmail.stanford.edu> Need to work on another experiment next Monday. -Hungtao From kaimeifu at stanford.edu Fri Oct 24 17:34:19 2003 From: kaimeifu at stanford.edu (Kai-Mei Camilla Fu) Date: Fri, 24 Oct 2003 17:34:19 -0700 (PDT) Subject: saturday 10 am to 2:30 free Message-ID: I no longer need this reservation. Sorry for the late notice. Kai-Mei From jwson at stanford.edu Sun Oct 26 18:58:47 2003 From: jwson at stanford.edu (Ji-Won Son) Date: Sun, 26 Oct 2003 18:58:47 -0800 Subject: RAITH Free from 8pm to 12 am today (10/26/03) In-Reply-To: <3F96A481.6151BFE0@snf.stanford.edu> Message-ID: <000001c39c36$3e626a30$416140ab@stanford.edu> My write is done early, and RAITH will be free from 8pm today. Thanks. Ji-Won -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Mon Oct 27 09:14:00 2003 From: jwc at snf.stanford.edu (James Conway) Date: Mon, 27 Oct 2003 09:14:00 -0800 Subject: time slot open 4-8pm next Monday References: <1067040497.3f99bef12a647@webmail.stanford.edu> Message-ID: <3F9D5258.B250C783@snf.stanford.edu> An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Mon Oct 27 11:58:14 2003 From: jwc at snf.stanford.edu (James Conway) Date: Mon, 27 Oct 2003 11:58:14 -0800 Subject: Raith is up and ready for use. Message-ID: <3F9D78D6.FDB99093@snf.stanford.edu> Greetings: The Raith system is back up and available for the next user. All is Good! Kai Mei Fu has indicated she will not be using her Raith session today that ends at 13:30 hours today. Next... James Conway From mtopinka at stanford.edu Mon Oct 27 16:11:47 2003 From: mtopinka at stanford.edu (Mark Allen Topinka) Date: Mon, 27 Oct 2003 16:11:47 -0800 Subject: Raith done early Message-ID: <1067299907.3f9db4433b8b0@webmail.stanford.edu> hi everyone- I'm going to be finishing up early- the machine should be free starting at about 4:30. -Mark From scaccag at stanford.edu Mon Oct 27 16:15:21 2003 From: scaccag at stanford.edu (Luigi Scaccabarozzi) Date: Mon, 27 Oct 2003 16:15:21 -0800 (PST) Subject: raith free tomorrow night (tue) Message-ID: From jwc at snf.stanford.edu Wed Oct 29 15:40:23 2003 From: jwc at snf.stanford.edu (James Conway) Date: Wed, 29 Oct 2003 15:40:23 -0800 Subject: PROXIMITY CORRECTION Paper for user review... Message-ID: <3FA04FE7.93371A8C@snf.stanford.edu> Greetings, Came across a rather interesting paper on a method for proximity correction for EBL patterning of Photonic Crystal Devices. Care to review and make comments? You can pick up a copy on my desk. Left hand side in yellow manila binder. Yours, James Conway From hungtao at stanford.edu Thu Oct 30 11:12:11 2003 From: hungtao at stanford.edu (Hung-Tao Chou) Date: Thu, 30 Oct 2003 11:12:11 -0800 Subject: raith time open tomorrow (Friday) from 1-5 pm Message-ID: <1067541131.3fa1628b3f0c8@webmail.stanford.edu> Sorry, trapped by another experiment. -Hungtao From mtopinka at stanford.edu Thu Oct 30 23:16:43 2003 From: mtopinka at stanford.edu (Mark Topinka) Date: Thu, 30 Oct 2003 23:16:43 -0800 Subject: Raith 12am-3am open 10/31 (now) Message-ID: <5.2.0.9.0.20031030231536.01e652e8@mtopinka.pobox.stanford.edu> not feeling well, sorry for late notice. From scaccag at stanford.edu Fri Oct 31 19:40:03 2003 From: scaccag at stanford.edu (Luigi Scaccabarozzi) Date: Fri, 31 Oct 2003 19:40:03 -0800 (PST) Subject: raith free overnight Message-ID: sample not ready