Seminar: Resists for nanoimprint lithography and SU-8 by Microresist Technology GmbH.
jwc at snf.stanford.edu
Tue Feb 24 09:43:21 PST 2004
Thought you all might be interested in this presentation.
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Subject: Seminar: Resists for nanoimprint lithography and SU-8
Date: Mon, 23 Feb 2004 23:47:47 -0800
From: Beth Pruitt <pruitt at stanford.edu>
To: labmembers at snf.stanford.edu,kennygroup at micromachine.stanford.edu,
pruittlab at lists.stanford.edu,santiagogroup at microfluidics.stanford.edu,
microheat at lists.Stanford.EDU,Olav Solgaard <solgaard at stanford.edu>,
Mahnaz Mansourpour <mahnaz at snf.stanford.edu>, Nick Melosh
<nmelosh at stanford.edu>,Curt Frank <curt.frank at stanford.edu>, Stacey Bent
<sbent at stanford.edu>
SPECIAL SEMINAR on Ultrathick and Ultrathin resists
TUESDAY Feb 24
4pm in CISX Auditorium
Photoresists for nanoimprint lithography and Processing of thick SU-8
visitor Dr. Freimut Reuther of micro resist technology (mrt) GmbH will
discuss the following:
Overview on polymers for nanoimprint lithography (NIL) of
(characteristics, behaviour, basic processing considerations)
Overview on high thickness positive tone photoresists
Purpose and benefits of IR baking of high thickness photoresists and
baking examples including positive photoresists and SU-8
SNF recently obtained EV nanimprint lithography equipment and several
labmembers have been using SU-8 for mixed applications with varying
results. If you have questions or are thinking of using these materials,
please attend this seminar and discuss with our visitor from mrt in Berlin.
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