REMINDER: EIPBN 2004 FINAL CALL FOR PAPERS -- Deadline Jan. 7, 2003.

James Conway jwc at
Tue Jan 6 18:11:21 PST 2004

  Greetings SNF Ebeam Tool Users:


'Three Beams' as it is informally called is one of the premier 
conferences in the United States for Electron, Ion, and Photon Beam and 
Nanofabrication Technologies.  More recently it has also show marked 
increase in reports on Nano-imprint Lithography and other novel 
fabrication methods that soon may become critical enabling technologies 
in the future.
It is widely attended by industrial and academic researchers and 
students in the USA, and also well attended by members from Europe and 
Asia. I have found this not only greatly stimulating in the quality and 
breath of the topics presented -- but also most effective in networking 
with people working in this technical arena. 

You are encouraged to get you act together and submit and abstract and 
or poster for EIPBN 2004.
In the last year we have achieved some wonderful results on the two EBL 
systems we have here at SNF, most of this work has been of great quality 
but thus far largely unreported .
Nothing would me feel better than to see students I have worked with 
here at SNF presenting their results at Three Beams.

So get on it! Send in your abstract or poster submission today.
(They are also pretty easy about accepting late submissions... ;-)

Welcome back to SU and have a Happy New Year!

James Conway
Ebeam Technology Group



This is the Final Call for Papers for the 48th International Conference 
on Electron, Ion, Photon Beam Technology and Nanofabrication.

Please see the attached brochure or our web site ( 
<>) for complete information on abstract submission.

Abstract Submission Deadline is January 7, 2004

The EIPBN Conference will be held at the Marriott Hotel & Marina in San 
Diego, CA from June 1 - 4, 2004. The conference brings together 
engineers and scientists from industry, universities, and government 
from all over the world to discuss recent progress and future trends of 
lithography. We have already enlisted several invited and plenary 
speakers for this meeting, covering lithographic science and process 
technology and its application to micro and nanofabrication techniques. 
For example, the Plenary Session is featuring the following speakers and 


        M. Rothschild (MIT Lincoln Laboratory)
        Optical Immersion Lithography

        K. Cummings (ASML)
        Optical Maskless Lithography

        E.L. Hu (CNSI, UC-Santa Barbara)
        The 'New Nanotechnology': New Approaches and Critical Challenges

        A. Belcher (MIT)
        Using Nature Tools to Grow Nanostructural Materials

        H. Smith & R.F.W. Pease (MIT & Stanford)
        EIPBN 48 Years On and Still Beaming


Please see the web site or the attached announcement for further 
information on the technical program, conference committees, meeting 
registration, and accommodations.

We look forward to seeing you in San Diego!


W. Dan Meisburger, Conference Chair 2004

    WD Meisburger Consulting
    1507 Montalban Drive
    San Jose, CA 95120 USA
    Phone: 408-396-3862
    Fax: 408-997-1366
    E-mail: d.meisburger at


Roxann L. Engelstad, Program Chair 2004

    University of Wisconsin
    1513 University Ave.
    Madison, WI 53706 USA
    Phone: 608-262-5745
    Fax: 608-265-0781
    E-mail: engelsta at




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