Final Reminder: Ebeam Town Hall Meeting --- TODAY December 2, 2005. 2 - 4 PM CISX 338 All are invited to attend.
James Conway
jwc at snf.stanford.edu
Fri Dec 2 16:08:40 PST 2005
Hemanth,
Thank you for your attendance and the great feedback. I have already
asked Bryan Tracy to submit a portion of his presentation to us for
review by the users that may have missed his presentation. Hopefully I
will receive that content next week.
Thank you for your support!
James Conway
Hemanth Jagannathan wrote:
> HI James,
>
> Thanks for arranging the presentation. It was fantastic in its
> content, SEM images and tips to get better SEM images. Will it be
> possible to get a copy of Bryan's presentation? I had to run out for
> another meeting and would like to go over the presentation again.
>
> Thanks,
>
> Best-
>
> Hemanth Jagannathan
> PhD Candidate
> Department of Electrical Engineering
> Stanford University, CA
> Phone :(O)(650)-725-0417; (C) (650)-380-2105
> e-mail: jhemanth at stanford.edu <blocked::mailto:jhemanth at stanford.edu>
>
>
>
> -----Original Message-----
> From: James Conway [mailto:jwc at snf.stanford.edu]
> Sent: Friday, December 02, 2005 9:16 AM
> To: ebeam at snf.stanford.edu; Raith SNF Mailing list;
> beamtools at snf.stanford.edu; semhitachi at snf.stanford.edu;
> sem4160 at snf.stanford.edu
> Cc: weekly report; pease at jumpjibe.stanford.edu
> Subject: Final Reminder: Ebeam Town Hall Meeting --- TODAY
> December 2, 2005. 2 - 4 PM CISX 338 All are invited to attend.
>
>
> Greetings to the Ebeam and Raith User Communities:
>
> The Ebeam Lab Town Hall Meeting will be held this afternoon
> Friday December 2, 2005 at 2 - 4 PM in CIS-X 338. All interested
> parties are invited to attend this event which is always open to
> everyone.
>
>
> For your enjoyment we will have a presentation "Scanning Electron
> Microscopy in the IC Industry" by Bryan Tracy, Ph.D.. Bryan is
> the Manager for the Materials Characterization Lab at Spansion in
> Sunnyvale, CA. He presented a very interesting presentation at
> the Hitachi Nanotechnology Seminar and I invited him here to SNF
> to give his presentation here.
>
> This is a great opportunity to review some really fine Scanning
> Electron Microscopy work from an industrial perspective, while
> obtaining tips and tricks towards improving the quality of your
> SEM Imaging.
>
> Light Refreshments will be served.
>
> Thank you for your participation!
>
> Yours,
>
> James Conway
>
>
> Agenda for December's Ebeam Town Hall Meeting
>
> Friday December 2, 2005 from 2 - 4 PM in CISX 338
>
> <!--[if !supportEmptyParas]--> <!--[endif]-->
>
> This forum is intended to allow lab members using the RAITH 150
> and Hitachi HL-700 Ebeam exposure systems to provide feedback and
> inputs towards creating a supportive community of users working
> together to establish best practices and methods pushing the
> limits of Ebeam Lithography.
> This is also an opportunity to report your EBL results, problems,
> and concerns and obtain feedback from the community-at-large.
>
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>
> Last year this forum successfully developed new reservation and
> system usage guidelines that improved system access and
> utilization for a large user base. This effort was successful and
> guided similar equipment policies on other SNF tools.
>
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>
> 1. Welcome and Introduction - James W. Conway (5 min.)
>
> <!--[if !supportEmptyParas]--> <!--[endif]-->
>
> 2. Feature Presentation:
> "Scanning Electron Microscopy in the IC Industry" by Bryan Tracy,
> Ph.D..
> Member of the Technical Staff, Spansion, Sunnyvale, CA. (40
> minutes + Q&A)
>
> <!--[if !supportEmptyParas]--> <!--[endif]-->
>
> 3. Raith System Resolution and performance status report (5 - 10
> minutes)
> - Current Performance issues and results.
> - Holiday shut down plan.
>
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>
> 4. Raith Reservation and Scheduling Issues:
> (<20 minutes)
>
> - Changes or Modification to the current reservation
> policies in place?
>
> - Cancellation Policy - 24 hour notice?
> - Should we have penalty or charge for cancellations?
>
> - Should we implement a Raith Users System Standby list?
>
> <!--[if !supportEmptyParas]--> <!--[endif]-->
>
> 5. Query of User needs for Negative Tone Ebeam resist for R&D in
> 2006: (<20 min.)
>
> - Microchem MaN-2403 negative tone resist review.
>
> - User interest in HSQ and Calixarenes for High
> Resolution Negative Tone resist?
>
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>
>
>
> <!--[endif]-->
>
> Your inputs are invited.
>
> <!--[if !supportEmptyParas]--> <!--[endif]-->
>
> James W. Conway
>
> Stanford Nanofabrication Facility
>
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>
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>
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>
>
>
>
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