Statis: RAITH did not pass qualification. System remains in Yellow until fault is determined...
jwc at snf.stanford.edu
Mon Jan 10 12:01:09 PST 2005
My Raith ebeam qualification run did not pass performance criteria and
we are not returning the system to users access today. I will leave the
system in yellow light mode but may upgrade to red light shutdown status
if my run this afternoon continues to show the poor EBL results.
The delivered area dose seems to be much higher than we specified. All
single shot dots and single pixel lines (SPL's) were written were much
larger i.e., wider than ever acquired in the past. Features are too
large and gross to evaluate stitching.
The PCM qualification run is a series of patterns:
* 10 X 10 X 1000 um array of origin_targets which contain both
single shot dots and various raith circles from 25, 50, and 100 nm
widths overlaid over a normal XY target. Result: All the ring are
enormous on the order of 1 - 5 um in width.
* Several demo.csf patterns which give us much information on area,
line, and dot doses, high resolution SPL's, deflection test, and
write field to write field stitching and proximity. Results: All
features written much larger than specified. Doses appear really
large by a factor of two!
* Stitching SOS.csf: stitching pattern gives us write field to write
field stitching patterns that we can measure automatically.
Results: Features too large to evaluate stitching with.
* SPL10X10.csf pattern is our new main Process Control Monitoring
pattern. This pattern gives us a minimum SPL we can
resolved and dot shot diameters placed across 2X2 100 um
stitching fields. Results: The dose factor one lines were nearly
5 um wide. all dot shot areas fully developed out. higher dosed
single pixel lines fully developed out.
* Line and Space pattern blocks. This pattern renders minimum
features we can resolve as area line patterns with increasing
pitch. No line features were resolved and all pattern blocks fully
cleared and developed out.
* Flower pattern: Deflection and single pixel line test. Results:
Only the lowest dose single pixel lines at dose factor 0.5
resolved and were microns in size.
During this qualification run the exposure doses delivered were twice to
three times that measured on the picoammeter during the set up for this
run. The large micron scale features seen during contamination dot shot
attempts during Fridays session may have been due to either a problem
with the E/O card or with the spot functions as if we lost focus during
the shot delivery event. More test will conducted this afternoon and
tomorrow afternoon to troubleshoot the cause of this problem. We are
currently down on the system in yellow light mode until further notice.
01102005: 1200 noon
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