From jwc at snf.stanford.edu Thu Feb 2 12:08:34 2006 From: jwc at snf.stanford.edu (James Conway) Date: Thu, 02 Feb 2006 12:08:34 -0800 Subject: Found small GaAs sample on Ebeam Lab microscope Message-ID: <43E266C2.5010704@snf.stanford.edu> Dear Users: Yesterday afternoon I found a very small ~1 X 3 mm square sample presumably GaAs on the edge of the Ebeam Lab microscope stage. Perhaps you have left this sample on the stage after taking a quick peek at it.... I have placed his sample into a small sample box and it is on top of the microscope. Thank you, JWC From jwc at snf.stanford.edu Thu Feb 2 12:21:08 2006 From: jwc at snf.stanford.edu (James Conway) Date: Thu, 02 Feb 2006 12:21:08 -0800 Subject: Please report problems to the CORAL reporting system. Image acquisition was lost on RAITH last night... but never reported Message-ID: <43E269B4.2090504@snf.stanford.edu> Greetings: Late this morning, a User working on the RAITH reported to me that there was a problem on the image acquisition from the LEO to the RAITH during align write field operations. As it turns out the previous user had this problem but did not report it to the CORAL: report problem; so it never registered to my awareness until the next User came into the lab this morning. Had it been reported to CORAL I would have been automatically informed with an email from the raith-pcs at snf.stanford.edu email list. Note that it is not a problem until it is reported onto the CORAL system... (The user did make a notation in the Raith operations logbook...) FAQ XXX TBD: Cannot obtain an SEM Image in the Write Field Alignment routine on the Raith computer... If you run into problems obtaining images across the communications between the RAITH 150 package and the RAITH SEM (formerly informally called LEO SEM) it is most likely due to a problems in the communications between the computers, or a loss of a module in the SW applications running on the RAITH SEM. To correct this problem, [save] your position list and project files on the RAITH, gracefully exit and shut down either the RAITH SEM computer, or both computers, to restore the system to its default settings and to perform a re-read all the RAITH SEM software modules into the LEO Server window. The Image acquisition and all normal functionality should now be restored. If not place the system into yellow mode by reporting the problem on the raith-pcs at snf.stanford.edu . Thank you for your support! James Conway -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Fri Feb 3 10:24:32 2006 From: jwc at snf.stanford.edu (James Conway) Date: Fri, 03 Feb 2006 10:24:32 -0800 Subject: JWC is out FRI. afternoon & MONDAY all day -- FAQ: HOW to get help on the RAITH System during your session -- "Who are your gonna call" Message-ID: <43E39FE0.8070102@snf.stanford.edu> Greetings Raith Community: I will be away from the office from 1 PM this afternoon through 10 AM Tuesday morning. If you run into problems on the system attempt to call me or any Raith Champion. Please refrain from placing the system into shutdown mode (red light) while I am away from the Lab. Thank you for your support! James Conway ----------------------------------------------------------------------------------------------------------------------------------- FAQ : SYSTEM PROBLEMS: "WHO ARE YOU GOING TO CALL" Greetings Raith Users: I wish to remind everyone that we have set into place a hierarchical structure on what to do and whom to call if you encounter problems on the RAITH 150 system during my absence, or for those times I am not be available by cell phone. I may not be available by phone during this period at 415-412-4825 because at times I will be 'off-the-grid'. Please leave a voice mail and I will respond as soon as I am able to. For Example: * You encounter a LOAD LOCK Error 5 on the system and cannot complete the Load/ Unload cycle without an administrator login. * The pumps or system hardware are not working normally and the logic may have become reversed. * Beam Blanking Logic is reversed due to an RAITH150.exe application crash when the beam was unblanked... 1. If I am available, try to call me on my cell and I will walk you through the Recovery procedures. 001-415-412-4825 NOTE: I live on the fringe of cell service when at home and sometimes cannot be reached. Sometimes I can still receive a SMS text messages. I promise to respond if I am able to ASAP. 2. Try to contact a RAITH Champion: Luigi Scaccabarozzi gigi at snf.stanford.edu at 1-650-725-6970 GIGI will be away this weekend too! Arvind Sundaramurthy arvisun at stanford.edu 1-650- 450-0475 Ryan Tu ryantu at stanford.edu 1-650-799-6492 Mark Topinka mtopinka at stanford.edu 1-650-387-6049 3. Contact a RAITH USA Application Support Specialist: Dr. Joseph Klingfus, Applications Scientist jk at raithusa.com 218-483-1267 4. For Major Hardware issues and all emergencies with the LEO or RAITH Hardware: Contact the RAITH USA Field Service Manager, Cole Loomis cl at raithusa.com (631) 738-9500 or Kevin Burcham kb at raithusa.com also at the Main Raith USA line (631) 738-9500 Finally unless it is a catastrophic failure and the system becomes unsafe or in the least terrifying to operate -- please avoid placing the system into RED LIGHT Mode when I am away. ALWAYS report all errors and comments to to the CORAL 'Make Comments' or 'Report Problem' section so it gets logged into our tracking system. To quote John Shott, "Its not a problem until it is reported to CORAL." Many thanks to the many Raith Champions whom have come forward and offered to cover for me during my absence! Thank you all for your support! James Conway Ebeam Technology Group Stanford Nanofabrication Facility. office 650-725-7075 cell 415-412-4825 jwc at snf.stanford.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Fri Feb 3 11:19:02 2006 From: jwc at snf.stanford.edu (James Conway) Date: Fri, 03 Feb 2006 11:19:02 -0800 Subject: ANNOUNCEMENT: RAITH Group XIX -- Intensive 4 day short course. March 7 - 10 TUESDAY - FRIDAY 10 AM - 6 PM Message-ID: <43E3ACA6.1090305@snf.stanford.edu> Greetings RAITH Group XIX: If you are listed in the To: section of this email you are confirmed to be in RAITH Group XIX. We also wish to invite all interested parties to the Tuesday morning lecture session and demo layer one training following at 2 PM - 6 PM in the afternoon. All are also welcome to attend as an observer the 'hands-on' sessions through the week. All are also encouraged to join any Raith Champion when they are on the system to gain further exposure to the system. This is your first announcement and confirmation of your commitment for attending the RAITH Group XIX Training course to be held in March. The schedule follows along with a listing of Participants whom you will be working with as a Team. This will be an intensive four day workshop. You are expected to attend all sessions in order to gain the experience and skills you will need to qualify on the RAITH 150 system. Please note that there are specific prerequisites for this class and you must have recent relevant SEM and LITHO experience before your can sit for this class. Please see me directly should you have any questions. Thank you for your interest in Electron Beam Technologies at the Stanford Nanofabrication Facility, James Conway Ebeam Technology Group 650-725-7075 --------------------------------- RAITH Group XIX Schedule: Raith 150 Basic Users Training - Intensive 4 Day Short Course March 7 - 10, 2006 from 10 - 6 PM Tuesday through Friday. The Plan of Action: We will start out with a half day of lecture in the morning Tuesday; quickly moving into entirely 'hands on' operations training through the remainder of the week. We will break for lunch at various times, while the system is writing, so plan to be flexible with your other outside commitments. You should have started working on your GDS II patterns and preparing PMMA on your substrates if you wish to write on your material. Please bring your patterns and materials to the 'Hands-On' sessions. Some afternoons we may also be able to finish earlier, letting the system write on its own to the end of our reservations on the system. Schedule: Tuesday March 7, 2006: 10:00 - 12:30 Session 1: Basic Users Course Lecture -- CIS 115 [Please note the room change from previous classes!] 14:00 - 17:00 Session 2: RAITH System Demonstration - Layer One -- EBEAM LAB CIS L104 Wednesday March 8, 2006: 10:00 - 12:30 Session 3: RAITH System Demonstration - Layer Two: OVERLAY -- EBEAM LAB CIS L104 14:00 - 18:00 Session 4: Hands On training session One -- EBEAM LAB CIS L104 Thursday March 9, 2006: 10:00 - 12:30 Session 5: Hands On training session Two -- EBEAM LAB CIS L104 14:00 - 18:00 Session 6: Hands On training session Three -- EBEAM LAB CIS L104 Friday March 10, 2006: 10:00 - 12:30 Session 7: Hands On training session Four -- EBEAM LAB CIS L104 14:00 - 18:00 Session 8: Hands On training session Five -- EBEAM LAB CIS L104 Individual Qualification Sessions will be held after this class so you can demonstrate your skill on the system to me and gain your login to the system. I WILL PROVIDE A CD AND PRINTED MATERIALS AT THE FIRST MEETING, IF YOU HAVE NOT ALREADY RECEIVED ONE YET. ------------------------------------------------------------------------------------------------------------------------------------------- PARTICIPANTS IN RAITH GROUP XIX: <>1. Young Chul Jun mailto: ycjun at stanford.edu Coral: ycjun Phone: 650-714-3585 cell Yamamoto Group Project: Quantum Dot Cavity QED (Quantum Electron Dynamics) <> 2. Frank Jaeckel fjaeckel at stanford.edu Coral: fjaeckel Phone: 650-724-4052 office cell: 650-862-6864 W. E. Moerner Project: Electrode patterns for control... High resolution Opt. Antenna ? <>3. Randy Stoltenberg randalls at stanford.edu Coral: randalls Phone: 650-796-4527 Zhenan Bao Project: Electrode patterns for control... ? <>4. Alan Chin achin at mail.arc.nasa.gov Coral: chinah Phone: 408-887-2287 cell NASA Ames - Nanowires for Lasers and Photonics. ? <>5. Xiaowei Yu xwyu at stanford.edu Coral: xiaowei Phone: 1-650-862-3098 Stohr Group, Project: Spin Doctors, GMR device for Spintronics. -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Fri Feb 3 11:31:07 2006 From: jwc at snf.stanford.edu (James Conway) Date: Fri, 03 Feb 2006 11:31:07 -0800 Subject: First Announcement: Ebeam Town Hall Meeting for February 28, 2006 from 2:30 - 4:30 in CIS 101 Message-ID: <43E3AF7B.9080103@snf.stanford.edu> Greetings Ebeam and Raith Communities: The next Ebeam Town Hall Meeting will be held Tuesday February 28, 2006 from 2:30 - 4:30 PM at CIS 101. We hope to have a good turnout for this meeting as we will cover a number of topics under informal discussion within the Ebeam Lab. We also sincerely desire your input and feedback. The agenda and items for discussion are currently open for your input and any request. Ebeam Town Hall Meeting Agenda: 1. Welcome and Introduction by James Conway ( 5 minutes) 2. Feature Presentation: ( 30 minutes + 10 for Q&A) Yves Acremann, Stohr Group will be presenting an update from his group who are using the RAITH 150. Title: Magneto-dynamics: from field pulses to spin injection Abstract: Magnetic nanostructures still show complex switching behaviors which are important for applications. Magnetic switching by a field is envisioned to be replaced by injection of a spin polarized current into the magnet. This has been demonstrated by transport experiments. Time resolved x-ray microscopy allows for the first time to image the magnetization switching process in a spin transfer structure revealing the limitations of the macrospin model. Instead of the coherent magnetization reversal, we observe switching by lateral motion of a magnetic vortex across a nanoscale element. Our measurements reveal the fundamental roles played independently by the torques due to charge and spin currents in breaking the magnetic symmetry on picosecond time scales. 3. Microchem MaN-2403 Negative EBL Resist Technical Review: (30 minutes + ) For more than a year now we have been exploring the process parameter space working with MicroChem MaN-2403 Negative Ebeam Resist. A number of users have had a chance to test and evaluate this high quality resist material for their research here at Stanford. Several users have reported excellent EBL results using this resist. MicroChem MaN-2403 Negative Ebeam Resist offers a alternative to working with our UVN-30 amplified EBL resist. Specifically it has a wider process latitude for exposure and does not require the critical post exposure bake step. It is a Novalak based resist system and offers similar etching characteristics to other Optical Photoresist used at SNF. Users whom have tested this material are encouraged to present data and images of their EBL results working with this material. Users wishing to test and evaluate this material in February are requested to see me directly to obtain access to this material. Based on your feedback we will hope to gain consensus and together make a decision to make this material a standard stocked resist material here at SNF. 4. Raith Reservation and Scheduling Issues: (<20 minutes ) Managing the Raith 150 system with a large number of users of various experience levels. - Changes or Modification to the currently existing policies in place? - Cancellation Policy -- 24 hour notice requested? - Should we penalize users whom cancel, or repeatedly not show up for their reservations? - Should we implement a Raith System Standby Users listing? - 'Share the Ride' incentive for users working with small chips. 5. Ebeam Conference SWAG raffle: (10 minutes ) For years I have attended Three Beams, the Electron Ion Photon Beam Research Network Meeting (EIPBN) and other topical conferences. In this time I have collected a number of interesting items that I have no use for whatsoever. So to lighten up this meeting all participants may enter into a raffle to share some of this cool stuff! If you have similar items you have no use for, from comical prizes or awards to spare T-shirts and such, fell free to donate them to the Lab and we will distribute to the users in the Lab. Let have some fun with this idea at this meeting. 6. Additional Items to be determined... The Agenda remains open awaiting your input! -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Fri Feb 3 11:34:01 2006 From: jwc at snf.stanford.edu (James Conway) Date: Fri, 03 Feb 2006 11:34:01 -0800 Subject: 2nd ANNOUNCEMENT: MaN-2403 NEGATIVE EBEAM RESIST TECHNICAL REVIEW IN FEB. 28, 2006 2:30 - 4:30 PM CIS 101 Message-ID: <43E3B029.8060808@snf.stanford.edu> Greetings: For more than a year now we have been exploring the process parameter space working with MicroChem MaN-2403 Negative Ebeam Resist. A number of users have had a chance to test and evaluate this high quality resist material for their research here at Stanford. Several users have reported excellent EBL results WORKING with this resist. MicroChem MaN-2403 Negative Ebeam Resist offers a alternative to working with our UVN-30 amplified resist. Specifically it has a wider process latitude for exposure and does not require the critical post exposure bake step. It is a Novalak based resist system and offers similar etching characteristics to other Optical Photoresist used in our facility. A Baseline MaN-2403 process has been established working with several users here at SNF, at it is attached for your review. A Thickness (f) Spin Speed curve are also attached. Later this month concurrent with the next Ebeam Town Hall Meeting on February 28, 2006 from 2:30 - 4:30 PM in CIS 101; I wish to include in this meeting a technical review of this material with all labmembers using of this material. Based on your feedback and results obtained we will then gain consensus and together make a decision to make this material a standard stocked resist material here at SNF. Users wishing to test and evaluate this material in February are requested to see me directly to obtain access to this material. Thank you for your support! James Conway -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Ma-N 2403 Process.doc Type: application/msword Size: 20992 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Ma-N 2403 Negative Process.xls Type: application/vnd.ms-excel Size: 23552 bytes Desc: not available URL: From xinranw at gmail.com Sun Feb 5 21:16:06 2006 From: xinranw at gmail.com (Xinran Wang) Date: Sun, 5 Feb 2006 21:16:06 -0800 Subject: raith free tomorrow 16:00-19:00 Message-ID: <22ffcd060602052116p6fe0b94ey132647d9aaeabc06@mail.gmail.com> My sample was broken so cannot use that time. Sorry for late notice. -------------- next part -------------- An HTML attachment was scrubbed... URL: From hungtao at stanford.edu Mon Feb 6 13:46:28 2006 From: hungtao at stanford.edu (Hung-Tao Chou) Date: Mon, 6 Feb 2006 13:46:28 -0800 Subject: Raith free tomorrow 9am-1pm Message-ID: <1139262388.43e7c3b4705ac@webmail.stanford.edu> Sample is not ready. -Hungtao From jwc at snf.stanford.edu Tue Feb 7 12:24:15 2006 From: jwc at snf.stanford.edu (James Conway) Date: Tue, 07 Feb 2006 12:24:15 -0800 Subject: Load Lock errors -- please be careful with Message-ID: <43E901EF.5030103@snf.stanford.edu> An HTML attachment was scrubbed... URL: From ryantu at stanford.edu Sun Feb 12 11:13:54 2006 From: ryantu at stanford.edu (Ryan Tu) Date: Sun, 12 Feb 2006 11:13:54 -0800 Subject: Raith free today 1-5pm Message-ID: From okilic at stanford.edu Mon Feb 13 00:07:15 2006 From: okilic at stanford.edu (Onur Kilic) Date: Mon, 13 Feb 2006 00:07:15 -0800 Subject: Raith free 8am Tuesday Message-ID: <1139818035.43f03e3335dd4@webmail.stanford.edu> Raith free 8am Tuesday. Samples won't be ready. -- Onur Kilic PhD Candidate Applied Physics Stanford University http://onurkilic.com From jwc at snf.stanford.edu Mon Feb 13 09:59:05 2006 From: jwc at snf.stanford.edu (James Conway) Date: Mon, 13 Feb 2006 09:59:05 -0800 Subject: Please return the Raith off line SW keys.... Message-ID: <43F0C8E9.3080401@snf.stanford.edu> Greetings: If you have the raith off line SW keys please reply so I can confirm who has possession currently. Thank you, JWC From jwc at snf.stanford.edu Mon Feb 13 10:02:58 2006 From: jwc at snf.stanford.edu (James Conway) Date: Mon, 13 Feb 2006 10:02:58 -0800 Subject: Reports of problems using layer 61 automated write field alignment. Message-ID: <43F0C9D2.7060902@snf.stanford.edu> Greetings: Over the weekend I had report of users on log in other than my own, whom had begun seeing problems getting automated write field alignment to complete during their run. During the align.PLS scans the line scan was completed but the system does not measure the line scan or allow WF aignment to complete. You will see red lights next to the ID number on the PLS. ALL users are asked to promptly report if they run into this problem. Thank you JWC From jwc at snf.stanford.edu Tue Feb 14 10:02:21 2006 From: jwc at snf.stanford.edu (James Conway) Date: Tue, 14 Feb 2006 10:02:21 -0800 Subject: workaround and solutions for users having problems using layer 61 automated write field alignment. In-Reply-To: <43F0C9D2.7060902@snf.stanford.edu> References: <43F0C9D2.7060902@snf.stanford.edu> Message-ID: <43F21B2D.7010608@snf.stanford.edu> Greetings: Yesterday I looked at the problem the User had encountered overnight Saturday last weekend in more detail and found a that change in the Threshold parameter settings for the align write field process called in the ALIGN.PLS position list. When a user scanned his position list for layer 61 the system opens up ALIGN.PLS and performs the automated scans. The line scans completes and there is a wave form in the Line scan dialog box but the thresholds displays the WIDTH and NOT the POSITION that the system desires to measure. The data then does not get placed into the proper POS 1 POS 2 and POS 3 columns of the ALIGN.PLS so the system do receive the data as to where the targets are in order to adjust the ALIGN Write field. In the end you get a red light in the PLS. I believe I have resolved this problem by copying ALIGN.PLS from the system folder and over writing the ALIGN.PLS is users directories: training, stohr. If you are working in overlay using layer 61 and encounter this problem you can also do this simple procedure to correct this problem: 1. Scan layer 61 in your position list item. Let the system perform the line scans and you will either get green or red dots next to the ID number. 2. If necessary open ALIGN.PLS ensuring you are opening from YOUR user/data/ directory. You will see the line scan files in the listing on the right of the U, V positions and patterns names. 3. Double click on the item line in the position list. You will obtain the new dialog box containing the line scan image file which is a SEM wave form. 4. Press the apply button on the dialog box and that will pop up the Threshold algorithm - ALIGN WRITE Field dialog box. If it is another thresholding file, use the pull down menu to select ALIGN WRITE FIELD. 5. Finally on the bottom of this dialog box is a DISPLAY section and click off the POSITION button and not the WIDTH button and then press [OK]. 6. Close the align.pls list and save your changes on the pop up request. 7. Go and rescan you pattern layer 61 and all other layers exposed in overlay and you should be just fine. Users still having problems with this please seem me immediately, or call my cell. Thank you for your support! James Conway James Conway wrote: > > Greetings: > > Over the weekend I had report of users on log in other than my own, > whom had begun seeing problems getting automated write field alignment > to complete during their run. > > During the align.PLS scans the line scan was completed but the system > does not measure the line scan or allow WF aignment to complete. You > will see red lights next to the ID number on the PLS. > > ALL users are asked to promptly report if they run into this problem. > > Thank you > > JWC > > > -------------- next part -------------- An HTML attachment was scrubbed... URL: From jk at raithusa.com Tue Feb 14 19:42:39 2006 From: jk at raithusa.com (Joe Klingfus) Date: Tue, 14 Feb 2006 21:42:39 -0600 Subject: workaround and solutions for users having problems using layer 61 automated write field alignment. In-Reply-To: <43F21B2D.7010608@snf.stanford.edu> Message-ID: <001f01c631e1$dfd727a0$6900a8c0@planck> A few comments to add that I hope can help those who may have problems doing automatic alignment.... When doing overlay and mark detection it is always recommended to have at least 1 mark (not in a critical part of your pattern) in order to "practice" or "train" the system. You cannot have any success if there are marks somewhere in the middle of your design and you don't first scan any of the marks to make sure the threshold settings are OK. The Raith Demo pattern shows an example of a single field containing marks, within a special writefield called "writefield calibration". You may not have the luxury of having a special alignment field within your own design, but at least you need to drive to the location of a mark and see if the mark threshold settings are working or not. At this location you can create a special working area so that you can scan the mark a few time to adjust the threshold settings. Anyone who is doing automatic alignment should understand what I'm saying, if not, practice with the Demo pattern. When exposing only layer 61 of the Demo pattern, and using just the Working Area "writefield calibration" the system will scan only the alignment marks. This allows the user to open the Align.PLS, look at the results, and adjust the threshold settings until the marks are correctly recognized. After all settings are OK you can select other layers/working areas to expose. If any of the IDs in the Align.PLS are red, nothing will work. Even if they are all green, you still need to double-click a few of the linescans to see if the threshold settings are appropriate or else at the edge of failing. As James indicated, when adjusting the threshold settings the Parameter set displayed should say "Align write field". (This is the default. You should also see the setting "stay;set=Align write field" under Module status >> Writefield Alignment >> Autoscan options.) Is there something funny going on, and the alignment corrections are not being taken into account?? This is easy enough to determine. Have the Align Writefield window in a visible place on the desktop when you scan layer 61. The zoom, shift, and rotation numbers should change after a set of marks have been scanned. You can also check the protocol file to see if there were any changes to the align write field values. The Align.PLS is over-written each time a set of marks have been scanned. You can always look at the most recent set of scans to see the result. Joe. -----Original Message----- From: James Conway [mailto:jwc at snf.stanford.edu] Sent: Tuesday, February 14, 2006 12:02 PM To: James Conway Cc: Raith SNF Mailing list; Cole Loomis -- RAITH USA.; Joseph Klingfus Subject: Re: workaround and solutions for users having problems using layer 61 automated write field alignment. Greetings: Yesterday I looked at the problem the User had encountered overnight Saturday last weekend in more detail and found a that change in the Threshold parameter settings for the align write field process called in the ALIGN.PLS position list. When a user scanned his position list for layer 61 the system opens up ALIGN.PLS and performs the automated scans. The line scans completes and there is a wave form in the Line scan dialog box but the thresholds displays the WIDTH and NOT the POSITION that the system desires to measure. The data then does not get placed into the proper POS 1 POS 2 and POS 3 columns of the ALIGN.PLS so the system do receive the data as to where the targets are in order to adjust the ALIGN Write field. In the end you get a red light in the PLS. I believe I have resolved this problem by copying ALIGN.PLS from the system folder and over writing the ALIGN.PLS is users directories: training, stohr. If you are working in overlay using layer 61 and encounter this problem you can also do this simple procedure to correct this problem: 1. Scan layer 61 in your position list item. Let the system perform the line scans and you will either get green or red dots next to the ID number. 2. If necessary open ALIGN.PLS ensuring you are opening from YOUR user/data/ directory. You will see the line scan files in the listing on the right of the U, V positions and patterns names. 3. Double click on the item line in the position list. You will obtain the new dialog box containing the line scan image file which is a SEM wave form. 4. Press the apply button on the dialog box and that will pop up the Threshold algorithm - ALIGN WRITE Field dialog box. If it is another thresholding file, use the pull down menu to select ALIGN WRITE FIELD. 5. Finally on the bottom of this dialog box is a DISPLAY section and click off the POSITION button and not the WIDTH button and then press [OK]. 6. Close the align.pls list and save your changes on the pop up request. 7. Go and rescan you pattern layer 61 and all other layers exposed in overlay and you should be just fine. Users still having problems with this please seem me immediately, or call my cell. Thank you for your support! James Conway James Conway wrote: Greetings: Over the weekend I had report of users on log in other than my own, whom had begun seeing problems getting automated write field alignment to complete during their run. During the align.PLS scans the line scan was completed but the system does not measure the line scan or allow WF aignment to complete. You will see red lights next to the ID number on the PLS. ALL users are asked to promptly report if they run into this problem. Thank you JWC -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Wed Feb 15 11:48:07 2006 From: jwc at snf.stanford.edu (James Conway) Date: Wed, 15 Feb 2006 11:48:07 -0800 Subject: 2nd Announcement: Ebeam Town Hall Meeting for February 28, 2006 from 2:30 - 4:30 in CIS 101 Message-ID: <43F38577.7020101@snf.stanford.edu> Greetings Ebeam and Raith Communities: The next Ebeam Town Hall Meeting will be held Tuesday February 28, 2006 from 2:30 - 4:30 PM at CIS 101. We hope to have a good turnout for this meeting as we will cover a number of topics under informal discussion within the Ebeam Lab. We also sincerely desire your input and feedback. The agenda and items for discussion are currently open for your input and any request. Thank you for your interest in Ebeam Technologies at the Stanford Nanofabrication Facility, James Conway Ebeam Town Hall Meeting Agenda: 1. Welcome and Introduction by James Conway ( 5 minutes) 2. Feature Presentation: ( 30 minutes + 10 for Q&A) Yves Acremann, Stohr Group will be presenting an update from his group who are using the RAITH 150. Title: Magneto-dynamics: from field pulses to spin injection Abstract: Magnetic nanostructures still show complex switching behaviors which are important for applications. Magnetic switching by a field is envisioned to be replaced by injection of a spin polarized current into the magnet. This has been demonstrated by transport experiments. Time resolved x-ray microscopy allows for the first time to image the magnetization switching process in a spin transfer structure revealing the limitations of the macro spin model. Instead of the coherent magnetization reversal, we observe switching by lateral motion of a magnetic vortex across a nanoscale element. Our measurements reveal the fundamental roles played independently by the torques due to charge and spin currents in breaking the magnetic symmetry on picosecond time scales. 3. Microchem MaN-2403 Negative EBL Resist Technical Review: (30 minutes + ) For more than a year now we have been exploring the process parameter space working with MicroChem MaN-2403 Negative Ebeam Resist. A number of users have had a chance to test and evaluate this high quality resist material for their research here at Stanford. Several users have reported excellent EBL results using this resist. MicroChem MaN-2403 Negative Ebeam Resist offers a alternative to working with our UVN-30 amplified EBL resist. Specifically it has a wider process latitude for exposure and does not require the critical post exposure bake step. It is a Novalak based resist system and offers similar etching characteristics to other Optical Photoresist used at SNF. Users whom have tested this material are encouraged to present data and images of their EBL results working with this material. Users wishing to test and evaluate this material in February are requested to see me directly to obtain access to this material. Based on your feedback we will hope to gain consensus and together make a decision to make this material a standard stocked resist material here at SNF. 4. Raith Reservation and Scheduling Issues: (<20 minutes ) Managing the Raith 150 system with a large number of users of various experience levels. - Changes or Modification to the currently existing policies in place? - Cancellation Policy -- 24 hour notice requested? - Should we penalize users whom cancel, or repeatedly not show up for their reservations? - Should we implement a Raith System Standby Users listing? - 'Share the Ride' incentive for users working with small chips. 5. Ebeam Conference SWAG raffle: (10 minutes ) For years I have attended Three Beams, the Electron Ion Photon Beam Research Network Meeting (EIPBN) and other topical conferences. In this time I have collected a number of interesting items that I have no use for whatsoever. So to lighten up this meeting all participants may enter into a raffle to share some of this cool stuff! If you have similar items you have no use for, from comical prizes or awards to spare T-shirts and such, fell free to donate them to the Lab and we will distribute to the users in the Lab. Let have some fun with this idea at this meeting. 6. Additional Items to be determined... The Agenda remains open awaiting your input! -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Wed Feb 15 11:54:10 2006 From: jwc at snf.stanford.edu (James Conway) Date: Wed, 15 Feb 2006 11:54:10 -0800 Subject: 3rd ANNOUNCEMENT: MaN-2403 NEGATIVE EBEAM RESIST TECHNICAL REVIEW IN FEB. 28, 2006 2:30 - 4:30 PM CIS 101 Message-ID: <43F386E2.2050705@snf.stanford.edu> Greetings: For more than a year now we have been exploring the process parameter space working with MicroChem MaN-2403 Negative Ebeam Resist. A number of users have had a chance to test and evaluate this high quality resist material for their research here at Stanford. Several users have reported excellent EBL results WORKING with this resist. MicroChem MaN-2403 Negative Ebeam Resist offers a alternative to working with our UVN-30 amplified resist. Specifically it has a wider process latitude for exposure and does not require the critical post exposure bake step. It is a Novalak based resist system and offers similar etching characteristics to other Optical Photoresist used in our facility. A Baseline MaN-2403 process has been established working with several users here at SNF, at it is attached for your review. A Thickness (f) Spin Speed curve are also attached. Later this month concurrent with the next Ebeam Town Hall Meeting on February 28, 2006 from 2:30 - 4:30 PM in CIS 101; I wish to include in this meeting a technical review of this material with all labmembers using of this material. Based on your feedback and results obtained we will then gain consensus and together make a decision to make this material a standard stocked resist material here at SNF. Users wishing to test and evaluate this material in February are requested to see me directly to obtain access to this material. Thank you for your support! James Conway -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Ma-N 2403 Process.doc Type: application/msword Size: 20992 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Ma-N 2403 Negative Process.xls Type: application/vnd.ms-excel Size: 23552 bytes Desc: not available URL: From jwc at snf.stanford.edu Wed Feb 15 12:07:46 2006 From: jwc at snf.stanford.edu (James Conway) Date: Wed, 15 Feb 2006 12:07:46 -0800 Subject: Zeiss SMT Field service will be in this afternoon... expect a shift in CORAL schedule back two to three hours... Message-ID: <43F38A12.4040304@snf.stanford.edu> Greetings: After many delays Zeiss SMT Field service will be in early this afternoon to perform some adjustments to the SEM section on the system. This will hopefully eliminate the shifts between the three Magnification Ranges on the SEM, particularly the large offset between MAg range 2 and 3 that are affecting some user's results as of recent. All the centering functions will also be checked adjusted and rechecked. Please expect a shift in CORAL schedule back two to three hours as we complete pending writes on the system to test after the adjustments. Thank you for your support! James Conway From jwc at snf.stanford.edu Wed Feb 15 18:33:25 2006 From: jwc at snf.stanford.edu (James Conway) Date: Wed, 15 Feb 2006 18:33:25 -0800 Subject: Zeiss Field Service performed adjustments on the RAITH SEM today and CORAL SCHEDULE as shifted 2 + hours. Message-ID: <43F3E475.90605@snf.stanford.edu> Greetings Raith Users: 1. This afternoon, after many delays, working with Zeiss SMT field service we finished up the E/O card calibrations and users will no longer experience the large image shifts when working between the three various Magnification Amplifier ranges; when selecting different scan speeds, and when performing stigmation at high magnifications. 2. We now resume the CORAL schedule shifting your sessions back about 2 + hours from your scheduled time. Current Users on the system expect to finish about 7 PM. Ebeam lab phone is 650-725-3673 3. Current Restrictions on Operations: Users may operate the system to as high as 25 kV with no other restrictions. Gun vacuum is in the mid E -010 mBar scale. (6.2 E -010 mbar today) Please ensure that the system reached base pressure before bringing up the gun to above 20 kV. (Typical base for the system is 1.6 to 1.9 E -006 Torr.) 4. All Users are cautioned to continue to ALWAYS change their gloves as they open the LOAD LOCK chamber and to make all efforts to not contaminate the system with non-standard materials, greases, silica gels, and un-cured resist structures. Users are also encouraged to pre-bake all samples going into the system on a hot plate just before loading. I recommend 105 degrees C for 2 minutes on the hot plate. Thank you for your support! James Conway -------------- next part -------------- An HTML attachment was scrubbed... URL: From cvenky at stanford.edu Wed Feb 15 19:08:16 2006 From: cvenky at stanford.edu (Venkatesh Chembrolu) Date: Wed, 15 Feb 2006 19:08:16 -0800 Subject: Raith free tomorrow 7am-1pm Message-ID: <1140059296.43f3eca0ae532@webmail.stanford.edu> Done today. Thanks to James! Venkatesh From lxuwind at stanford.edu Wed Feb 15 20:31:02 2006 From: lxuwind at stanford.edu (Liang Xu) Date: Wed, 15 Feb 2006 20:31:02 -0800 Subject: Raith free tomorrow 7am-1pm In-Reply-To: <1140059296.43f3eca0ae532@webmail.stanford.edu> References: <1140059296.43f3eca0ae532@webmail.stanford.edu> Message-ID: <1140064262.43f400068f5b1@webmail.stanford.edu> I'll take 9am-1pm. Thanks. Quoting Venkatesh Chembrolu : > Done today. Thanks to James! > > Venkatesh > -- Liang Xu Address: 59, Dudley Lane, Escondido Village, Apt B, Stanford, CA 94305 Tel: 650-497-1934 From lxuwind at stanford.edu Thu Feb 16 11:45:00 2006 From: lxuwind at stanford.edu (Liang Xu) Date: Thu, 16 Feb 2006 11:45:00 -0800 Subject: raith free now to 1pm Message-ID: <1140119100.43f4d63c7b03a@webmail.stanford.edu> finished early. Thanks -- Liang Xu Address: 59, Dudley Lane, Escondido Village, Apt B, Stanford, CA 94305 Tel: 650-497-1934 From jwc at snf.stanford.edu Thu Feb 16 18:35:57 2006 From: jwc at snf.stanford.edu (James Conway) Date: Thu, 16 Feb 2006 18:35:57 -0800 Subject: FAQ: HOW to get help on the RAITH System during your session -- "Who are your gonna call" Message-ID: <43F5368D.4040906@snf.stanford.edu> FAQ: HOW to get help on the RAITH System during your session -- "Who are your gonna call" FAQ ##: SYSTEM PROBLEMS: "WHO ARE YOU GOING TO CALL" Greetings: I will be away tomorrow , Friday and Monday's Holiday and I wish to remind everyone that we have set into place a hierarchical structure on what to do and whom to call if you encounter problems on the RAITH 150 system during my absence' or for those times I am not be available by cell phone. I will be available by phone at 415-412-4825 and also by voice mail and SMS text messaging. I will respond at my earliest opportunity. I normally will call the Ebeam Lab several times daily. For Example: * You encounter a LOAD LOCK Error 4 on the system and cannot complete the Load/ Unload cycle without an administrator login. * The pumps or system hardware are not working normally and the logic may have become reversed. * Beam Blanking Logic is reversed due to an RAITH150.exe application crash when the beam was unblanked... 1. If I am available, try to call me on my cell and I will walk you through the Recovery procedures. 001-415-412-4825 2. Try to contact a RAITH Champion: Luigi Scaccabarozzi gigi at snf.stanford.edu at 1-650-725-6970 Arvind Sundaramurthy arvisun at stanford.edu 1-650- 450-0475 Ryan Tu ryantu at stanford.edu 1-650-799-6492 Mark Topinka mtopinka at stanford.edu 1-650-387-6049 3. Contact a RAITH USA Application Support Specialist: Dr. Joseph Klingfus, Applications Scientist jk at raithusa.com 218-483-1267 4. For Major Hardware issues and all emergencies with the LEO or RAITH Hardware: Contact the RAITH USA Field Service Manager, Cole Loomis cl at raithusa.com (631) 738-9500 or Kevin Burcham also at the Main Raith USA line (631) 738-9500 Finally unless it is a catastrophic failure and the system becomes unsafe or in the least terrifying to operate -- please avoid placing the system into 'RED LIGHT' Mode when I am away. ALWAYS report all errors and comments to to the CORAL 'Make Comments' or 'Report Problem' section so it gets logged into our tracking system. To quote John Shott, "Its not a problem until it is reported to CORAL." Many thanks to the many Raith Champions whom have come forward and offered to cover for me during my absence! Thank you all for your support! James Conway Ebeam Technology Group Stanford Nanofabrication Facility. 650-725-7075 cell 415-412-4825 jwc at snf.stanford.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Thu Feb 16 18:57:14 2006 From: jwc at snf.stanford.edu (James Conway) Date: Thu, 16 Feb 2006 18:57:14 -0800 Subject: Please be careful in your utilization of the expensive PMMA materials. Message-ID: <43F53B8A.6080706@snf.stanford.edu> Greetings Ebeam and Raith Users Groups: To ensure a supply of the normal blends of PMMA in the cleanroom over the holiday weekend I have placed a new bottle of both 9% 950K PMMA - A and 2% 950K PMMA -A into the yellow solvent cabinets. Please use up the reminder of the 2% 950K PMMA - A before opening up a new bottle. I finished up the old bottle of 9% 950K PMMA today. Users are also requested to be frugal and careful in their use of these expensive materials. No one should be doing any pour transfers or placing PMMA into beakers while dispensing to the spinner coaters. If you employ a syringe and a filter when spinning your material you will obtain better and more consistent results with these materials. Exposure to air and water vapor for even a few minutes will result in a change in materials viscosity as they are nearly all solvents, and the materials may hydrolyze resulting in reticulated film morphologies and result in very poor Ebeam Lithography results. Finally you will expose yourself to more solvent vapors that is necessary to complete your coating task. All users are encouraged to employ the Ebeam Resist Handling Procedures that are posted on our web site in order to obtain optimal processing results. Thank you for your efforts to hold down cost of engineering materials within the SNF Cleanroom and thank you for your support! All the best, James Conway PS The PMMA materials are never to leave the SNF cleanroom or Ebeam lab for any reason. Please see me directly during my office hour should you desire a supply for any other outside usage. jwc -------------- next part -------------- An HTML attachment was scrubbed... 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Name: blutextb.gif Type: image/gif Size: 569 bytes Desc: not available URL: From lxuwind at stanford.edu Sun Feb 19 15:31:21 2006 From: lxuwind at stanford.edu (Liang Xu) Date: Sun, 19 Feb 2006 15:31:21 -0800 Subject: Raith free from now to 5pm Message-ID: <1140391881.43f8ffc9f18fa@webmail.stanford.edu> finished early -- Liang Xu Address: 59, Dudley Lane, Escondido Village, Apt B, Stanford, CA 94305 Tel: 650-497-1934 From faraon at stanford.edu Sun Feb 19 17:44:20 2006 From: faraon at stanford.edu (Andrei Faraon) Date: Sun, 19 Feb 2006 17:44:20 -0800 (PST) Subject: raith free tomorrow 7:30pm 12:30am Message-ID: Andrei Faraon Dept. of Applied Physics, 316 Via Pueblo Mall Stanford University Stanford, CA 94305-4090 650 497 3857 From jwc at snf.stanford.edu Fri Feb 24 09:05:07 2006 From: jwc at snf.stanford.edu (James Conway) Date: Fri, 24 Feb 2006 09:05:07 -0800 Subject: Please bring back the RAITH SW dongles Message-ID: <43FF3CC3.1010500@snf.stanford.edu> Greetings: I have not been able to locate one of the dongles I loaned out to a user several weeks ago. Will the two Users whom has the dongles please return them to me ASAP. I have a standby listing of Users whom wish to also get access to the off line SW tools. Normal loan period is juts two weeks. You can leave then on my key board on my computer in my office. Thank you, James Conway From hungtao at stanford.edu Sun Feb 26 23:16:13 2006 From: hungtao at stanford.edu (Hung-Tao Chou) Date: Sun, 26 Feb 2006 23:16:13 -0800 Subject: raith free 4am to 9am tomorrow Message-ID: <1141024573.4402a73d620e7@webmail.stanford.edu> Sample is not ready. -Hungtao From hungtao at stanford.edu Mon Feb 27 13:25:44 2006 From: hungtao at stanford.edu (Hung-Tao Chou) Date: Mon, 27 Feb 2006 13:25:44 -0800 Subject: raith free 2am to 5am Wednesday Message-ID: <1141075544.44036e588abf1@webmail.stanford.edu> I moved my session to a later time. -Hungtao From jwc at snf.stanford.edu Tue Feb 28 11:59:36 2006 From: jwc at snf.stanford.edu (James Conway) Date: Tue, 28 Feb 2006 11:59:36 -0800 Subject: Reminder: TODAY -- Ebeam Town Hall Meeting February 28, 2006 from 2:30 - 4:30 in CIS 101 Message-ID: <4404ABA8.4040900@snf.stanford.edu> Greetings Ebeam and Raith Communities: The next Ebeam Town Hall Meeting will be held today Tuesday February 28, 2006 from 2:30 - 4:30 PM at CIS 101. We hope to have a good turnout for this meeting as we will cover a number of topics under informal discussion within the Ebeam Lab. We also sincerely desire your input and feedback. The agenda and items for discussion are currently open for your input and any request. Ebeam Town Hall Meeting Agenda: 1. Welcome and Introduction by James Conway ( 5 minutes) 2. Feature Presentation: ( 30 minutes + 10 for Q&A) Yves Acremann, Stohr Group will be presenting an update from his group who are using the RAITH 150. Title: Magneto-dynamics: from field pulses to spin injection Abstract: Magnetic nanostructures still show complex switching behaviors which are important for applications. Magnetic switching by a field is envisioned to be replaced by injection of a spin polarized current into the magnet. This has been demonstrated by transport experiments. Time resolved x-ray microscopy allows for the first time to image the magnetization switching process in a spin transfer structure revealing the limitations of the macrospin model. Instead of the coherent magnetization reversal, we observe switching by lateral motion of a magnetic vortex across a nanoscale element. Our measurements reveal the fundamental roles played independently by the torques due to charge and spin currents in breaking the magnetic symmetry on picosecond time scales. 3. Microchem MaN-2403 Negative EBL Resist Technical Review: (30 minutes + ) For more than a year now we have been exploring the process parameter space working with MicroChem MaN-2403 Negative Ebeam Resist. A number of users have had a chance to test and evaluate this high quality resist material for their research here at Stanford. Several users have reported excellent EBL results using this resist. MicroChem MaN-2403 Negative Ebeam Resist offers a alternative to working with our UVN-30 amplified EBL resist. Specifically it has a wider process latitude for exposure and does not require the critical post exposure bake step. It is a Novalak based resist system and offers similar etching characteristics to other Optical Photoresist used at SNF. Users whom have tested this material are encouraged to present data and images of their EBL results working with this material. Users wishing to test and evaluate this material in February are requested to see me directly to obtain access to this material. Based on your feedback we will hope to gain consensus and together make a decision to make this material a standard stocked resist material here at SNF. 4. Raith Reservation and Scheduling Issues: (<15 minutes ) Managing the Raith 150 system with a large number of users of various experience levels. - Changes or Modification to the currently existing policies in place? - Cancellation Policy -- 24 hour notice requested? - Should we penalize users whom cancel, or repeatedly not show up for their reservations? - Should we implement a Raith System Standby Users listing? - 'Share the Ride' incentive for users working with small chips. 5. Ebeam Conference SWAG raffle: (10 minutes ) For years I have attended Three Beams, the Electron Ion Photon Beam Research Network Meeting (EIPBN) and other topical conferences. In this time I have collected a number of interesting items that I have no use for whatsoever. So to lighten up this meeting all participants may enter into a raffle to share some of this cool stuff! If you have similar items you have no use for, from comical prizes or awards to spare T-shirts and such, fell free to donate them to the Lab and we will distribute to the users in the Lab. Let have some fun with this idea at this meeting. The agenda is now closed. Looking forward to your participation. James Conway -------------- next part -------------- An HTML attachment was scrubbed... URL: From yjhuo at stanford.edu Tue Feb 28 16:36:53 2006 From: yjhuo at stanford.edu (Yijie Huo) Date: Tue, 28 Feb 2006 16:36:53 -0800 Subject: Raith free from 12am to 3am, Mar 2nd. Message-ID: <200603010036.k210asb6017527@smtp3.Stanford.EDU> Sample is not ready. Sorry for the late notice. Yijie -------------- next part -------------- An HTML attachment was scrubbed... URL: