From jwc at snf.stanford.edu Tue Jan 10 11:17:54 2006 From: jwc at snf.stanford.edu (James Conway) Date: Tue, 10 Jan 2006 11:17:54 -0800 Subject: Cleaned out the Ebeam Pass Through. You may have materials stored in this box that have been moved. Message-ID: <43C40862.10400@snf.stanford.edu> Greetings Ebeam and Raith Users: Happy New Year! If you are listed as To: in this email I have identified substrates you may have lost or abandoned that were left in the Ebeam Lab Pass Through box in the SNF cleanroom over the holiday. If you are CC: to this email this is just a reminder to check for other lost unlabeled items. Yesterday, I cleaned out the Ebeam Lab Pass Through in the SNF cleanroom. There were a number of substrates and pieces in small sample boxes that appear to be abandoned, lost, or more likely simply forgotten -- some are unlabeled and have no user name on them. I have moved everything to the upper shelf of the dry box and request you pick up your stuff by next Tuesday. If you do not desire these sample, please move them to the plastic tub above my yellow dry box and I will consider them donated for lab use. I will then use these materials for training of other Ebeam and Raith system users coming into the lab this term. I know your engineering materials are important to you! I don't wish to move them or throw them out if they are still useful for your projects. Thank you for your action to this request. James Conway SNF Ebeam Lab. P.S., We gladly accept donations of non standard substrates such as GaAs, Sapphire, Fused Si / Quartz, and Si3N4 membranes on Si amongst other things you may no longer have use for. No need to reply to this email ... -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Wed Jan 11 10:49:30 2006 From: jwc at snf.stanford.edu (James Conway) Date: Wed, 11 Jan 2006 10:49:30 -0800 Subject: ANNOUNCEMENT: RAITH Group XVIII -- Intensive 4 day short course. Next week TUESDAY - FRIDAY 10 AM - 6 PM Message-ID: <43C5533A.6080301@snf.stanford.edu> Greetings RAITH Group XVIII: If you are listed in the To: section of this email you are confirmed to be in RAITH Group XVIII. We also wish to invite all interested parties to the Tuesday morning lecture session and demo layer one training following at 2 PM - 6 PM in the afternoon. All are also welcome to attend as an observer the 'hands-on' sessions through the week. All Users are also encouraged to join any Raith Champion when they are on the system to gain further exposure to the system. This is your first announcement and confirmation of your commitment for attending the RAITH Group XVIII Training course to be held next week. The schedule follows along with a listing of Participants whom you will be working with as a Team. This will be an intensive four day workshop and you are expected to attend all sessions in order to gain the experience and skills you will need to qualify on the RAITH 150 system. Thank you for your interest in Electron Beam Technologies at the Stanford Nanofabrication Facility, James Conway Ebeam Technology Group 650-725-7075 --------------------------------- RAITH Group XVIII Schedule: Raith 150 Basic Users Training - Intensive 4 Day Short Course January 17 - 20 10 - 6 PM Tuesday through Friday. The Plan of Action: We will start out with a half day of lecture in the morning Tuesday; quickly moving into entirely 'hands on' operations training through the remainder of the week. We will break for lunch at various times, while the system is writing, so plan to be flexible with your other outside commitments. You should have started working on your GDS II patterns and preparing PMMA on your substrates if you wish to write on your material. Please bring your patterns and materials to the 'Hands-On' sessions. Some afternoons we may also be able to finish earlier, letting the system write on its own to the end of our reservations on the system. Schedule: Tuesday January 17, 2006: 10:00 - 12:30 Session 1: Basic Users Course Lecture -- CIS 101 14:00 - 17:00 Session 3: RAITH System Demonstration - Layer One -- EBEAM LAB CIS L104 Wednesday January 18, 2006: 10:00 - 12:30 Session 4: RAITH System Demonstration - Layer Two: OVERLAY -- EBEAM LAB CIS L104 14:00 - 18:00 Session 5: Hands On training session One -- EBEAM LAB CIS L104 Thursday January 19, 2006: 10:00 - 12:30 Session 4: Hands On training session Two -- EBEAM LAB CIS L104 14:00 - 18:00 Session 5: Hands On training session Three -- EBEAM LAB CIS L104 Friday January 20, 2006: 10:00 - 12:30 Session 4: Hands On training session Four -- EBEAM LAB CIS L104 14:00 - 18:00 Session 5: Hands On training session Five -- EBEAM LAB CIS L104 Individual Qualification Sessions will be held after this class so you can demonstrate your skill on the system to me and gain your login to the system. NOTE:: WE ARE SEEKING A LAPTOP AVAILABLE TO PRESENT THE MATERIALS FOR MONDAY'S SESSIONS. FIRST PERSON WHOM COMES TO ME GETS ALL THE CLASS MATERIALS ON HIS PC. I WILL PROVIDE A CD AND PRINTED MATERIALS AT THE FIRST MEETING, IF YOU HAVE NOT ALREADY RECEIVED ONE YET. ------------------------------------------------------------------------------------------------------------------------------------------- PARTICIPANTS IN RAITH GROUP XVIII: 1. Kyeongran Yoo raneeyoo at stanford.edu Coral: ________ 2. John M. Choi johnchoi at its.caltech.edu Coral: johnchoi 3. Ashwin Tulapurkar ashwin at slac.stanford.edu Coral: ashwin 4. Alan Chin achin at mail.arc.nasa.gov Coral: chinah 5. Candance Kay Chan candacec at stanford.edu Coral: candacec -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Wed Jan 11 11:59:01 2006 From: jwc at snf.stanford.edu (James Conway) Date: Wed, 11 Jan 2006 11:59:01 -0800 Subject: ANNOUNCEMENT: MaN-2403 NEGATIVE EBEAM RESIST TECHNICAL REVIEW IN FEB. -- DATE TBD Message-ID: <43C56385.4000505@snf.stanford.edu> Greetings: For more than a year now we have been exploring the process parameter space working with MicroChem MaN-2403 Negative Ebeam Resist. A number of users have had a chance to test and evaluate this high quality resist material for their research here at Stanford. Several users have reported excellent EBL results WORKING with this resist. MicroChem MaN-2403 Negative Ebeam Resist offers a alternative to working with our UVN-30 amplified resist. Specifically it has a wider process latitude for exposure and does not require the critical post exposure bake step. It is a Novalak based resist system and offers similar etching characteristics to other Optical Photoresist used in our facility. A Baseline MaN-2403 process has been established working with several users here at SNF, at it is attached for your review. A Thickness (f) Spin Speed curve are also attached. Coming in February, concurrent with the next Ebeam Town Meeting, I wish to conduct a technical review of this material with labmembers using of this material. Based on your feedback and results obtained we will then gain consensus and together make a decision to make this material a standard stocked resist material here at SNF. Users wishing to test and evaluate this material in January and early February are requested to see me directly to obtain access to this material. Thank you for your support! James Conway -------------- next part -------------- A non-text attachment was scrubbed... Name: Ma-N 2403 Process.doc Type: application/msword Size: 20992 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Ma-N 2403 Negative Process.xls Type: application/vnd.ms-excel Size: 23552 bytes Desc: not available URL: From jwc at snf.stanford.edu Wed Jan 11 13:57:19 2006 From: jwc at snf.stanford.edu (James Conway) Date: Wed, 11 Jan 2006 13:57:19 -0800 Subject: raith system passed qualification. Please carefully inspect your results since we brought the system back up! Message-ID: <43C57F3F.5070302@snf.stanford.edu> An HTML attachment was scrubbed... URL: From altug at stanford.edu Wed Jan 11 16:39:33 2006 From: altug at stanford.edu (Hatice Altug) Date: Wed, 11 Jan 2006 16:39:33 -0800 Subject: Raith free tonight 8:30pm-3:00am In-Reply-To: <43C57F3F.5070302@snf.stanford.edu> Message-ID: sample will not be ready... -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Fri Jan 13 09:14:38 2006 From: jwc at snf.stanford.edu (James Conway) Date: Fri, 13 Jan 2006 09:14:38 -0800 Subject: 2nd ANNOUNCEMENT: RAITH Group XVIII -- Intensive 4 day short course. Next TUESDAY - FRIDAY 10 AM - 6 PM Message-ID: <43C7DFFE.5040409@snf.stanford.edu> Greetings RAITH Group XVIII: If you are listed in the To: section of this email you are confirmed to be in RAITH Group XVIII. We also wish to invite all interested parties to the Tuesday morning lecture session and demo layer one training following at 2 PM - 6 PM in the afternoon. All are also welcome to attend as an observer the 'hands-on' sessions through the week. You are also encouraged to join any Raith Champion when they are on the system to gain further exposure to the system. This is your first announcement and confirmation of your commitment for attending the RAITH Group XVIII Training course to be held next week. The schedule follows along with a listing of Participants whom you will be working with as a Team. This will be an intensive four day workshop and you are expected to attend all sessions in order to gain the experience and skills you will need to qualify on the RAITH 150 system. Thank you for your interest in Electron Beam Technologies at the Stanford Nanofabrication Facility, James Conway Ebeam Technology Group 650-725-7075 --------------------------------- RAITH Group XVIII Schedule: Raith 150 Basic Users Training - Intensive 4 Day Short Course January 17 - 20 10 - 6 PM Tuesday through Friday. The Plan of Action: We will start out with a half day of lecture in the morning Tuesday; quickly moving into entirely 'hands on' operations training through the remainder of the week. We will break for lunch at various times, while the system is writing, so plan to be flexible with your other outside commitments. You should have started working on your GDS II patterns and preparing PMMA on your substrates if you wish to write on your material. Please bring your patterns and materials to the 'Hands-On' sessions. Some afternoons we may also be able to finish earlier, letting the system write on its own to the end of our reservations on the system. Schedule: Tuesday January 17, 2006: 10:00 - 12:30 Session 1: Basic Users Course Lecture -- CIS 101 14:00 - 17:00 Session 3: RAITH System Demonstration - Layer One -- EBEAM LAB CIS L104 Wednesday January 18, 2006: 10:00 - 12:30 Session 4: RAITH System Demonstration - Layer Two: OVERLAY -- EBEAM LAB CIS L104 14:00 - 18:00 Session 5: Hands On training session One -- EBEAM LAB CIS L104 Thursday January 19, 2006: 10:00 - 12:30 Session 4: Hands On training session Two -- EBEAM LAB CIS L104 14:00 - 18:00 Session 5: Hands On training session Three -- EBEAM LAB CIS L104 Friday January 20, 2006: 10:00 - 12:30 Session 4: Hands On training session Four -- EBEAM LAB CIS L104 14:00 - 18:00 Session 5: Hands On training session Five -- EBEAM LAB CIS L104 Individual Qualification Sessions will be held after this class so you can demonstrate your skill on the system to me and gain your login to the system. NOTE:: WE ARE SEEKING A LAPTOP AVAILABLE TO PRESENT THE MATERIALS FOR MONDAY'S SESSIONS. FIRST PERSON WHOM COMES TO ME GETS ALL THE CLASS MATERIALS ON HIS PC. I WILL PROVIDE A CD AND PRINTED MATERIALS AT THE FIRST MEETING, IF YOU HAVE NOT ALREADY RECEIVED ONE YET. ------------------------------------------------------------------------------------------------------------------------------------------- PARTICIPANTS IN RAITH GROUP XVIII: 1. Kyeongran Yoo raneeyoo at stanford.edu Coral: ________ 2. Yiyang Gong yiyangg at stanford.edu 3. Ashwin Tulapurkar ashwin at slac.stanford.edu Coral: ashwin 4. Alan Chin achin at mail.arc.nasa.gov Coral: chinah 5. Candance Kay Chan candacec at stanford.edu Coral: candacec Note there has been a change in the class roster. -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Tue Jan 17 09:05:47 2006 From: jwc at snf.stanford.edu (James Conway) Date: Tue, 17 Jan 2006 09:05:47 -0800 Subject: Reminder: RAITH Group XVIII -- Intensive 4 day short course. Starting Today TUESDAY - FRIDAY 10 AM - 6 PM Message-ID: <43CD23EB.6030106@snf.stanford.edu> Greetings RAITH Group XVIII: This is your first reminder for attending the RAITH Group XVIII Training course to be this week. The schedule follows along with a listing of Participants whom you will be working with as a Team. Thank you for your interest in Electron Beam Technologies at the Stanford Nanofabrication Facility, James Conway Ebeam Technology Group 650-725-7075 --------------------------------- RAITH Group XVIII Schedule: Raith 150 Basic Users Training - Intensive 4 Day Short Course January 17 - 20 10 - 6 PM Tuesday through Friday. The Plan of Action: We will start out with a half day of lecture in the morning Tuesday; quickly moving into entirely 'hands on' operations training through the remainder of the week. We will break for lunch at various times, while the system is writing, so plan to be flexible with your other outside commitments. You should have started working on your GDS II patterns and preparing PMMA on your substrates if you wish to write on your material. Please bring your patterns and materials to the 'Hands-On' sessions. Some afternoons we may also be able to finish earlier, letting the system write on its own to the end of our reservations on the system. Schedule: Tuesday January 17, 2006: 10:00 - 12:30 Session 1: Basic Users Course Lecture -- CIS 101 14:00 - 17:00 Session 3: RAITH System Demonstration - Layer One -- EBEAM LAB CIS L104 Wednesday January 18, 2006: 10:00 - 12:30 Session 4: RAITH System Demonstration - Layer Two: OVERLAY -- EBEAM LAB CIS L104 14:00 - 18:00 Session 5: Hands On training session One -- EBEAM LAB CIS L104 Thursday January 19, 2006: 10:00 - 12:30 Session 4: Hands On training session Two -- EBEAM LAB CIS L104 14:00 - 18:00 Session 5: Hands On training session Three -- EBEAM LAB CIS L104 Friday January 20, 2006: 10:00 - 12:30 Session 4: Hands On training session Four -- EBEAM LAB CIS L104 14:00 - 18:00 Session 5: Hands On training session Five -- EBEAM LAB CIS L104 Individual Qualification Sessions will be held after this class so you can demonstrate your skill on the system to me and gain your login to the system. I WILL PROVIDE A CD AND PRINTED MATERIALS AT THE FIRST MEETING, IF YOU HAVE NOT ALREADY RECEIVED ONE YET. ------------------------------------------------------------------------------------------------------------------------------------------- PARTICIPANTS IN RAITH GROUP XVIII: 1. Kyeongran Yoo raneeyoo at stanford.edu Coral: raneeyoo 2. Yiyang Gong yiyangg at stanford.edu 3. Ashwin Tulapurkar ashwin at slac.stanford.edu Coral: ashwin 4. Alan Chin achin at mail.arc.nasa.gov Coral: chinah cancelled ... 5. Candance Kay Chan candacec at stanford.edu Coral: candacec Note there has been a change in the class roster. -------------- next part -------------- An HTML attachment was scrubbed... URL: From xinranw at gmail.com Thu Jan 19 09:11:37 2006 From: xinranw at gmail.com (Xinran Wang) Date: Thu, 19 Jan 2006 09:11:37 -0800 Subject: reservation cancelled tonight from 8pm, sample not ready Message-ID: <22ffcd060601190911j3063136atf4d0ede30fe9b0e@mail.gmail.com> Sorry for the late notice. Xinran -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Fri Jan 20 17:19:28 2006 From: jwc at snf.stanford.edu (James Conway) Date: Fri, 20 Jan 2006 17:19:28 -0800 Subject: ALL USERS should carefully inspect their EBL patterns ... Message-ID: <43D18C20.1060408@snf.stanford.edu> An HTML attachment was scrubbed... URL: From toecutter4ranger at gmail.com Mon Jan 23 08:51:54 2006 From: toecutter4ranger at gmail.com (James Conway) Date: Mon, 23 Jan 2006 08:51:54 -0800 Subject: Cancelling my RAITH session for 13:00 - 18:00 today -- session is available for you! Message-ID: Hello Raith Users: I am feeling well below the weather today, and have been fighting a nagging respiratory bug all weekend. Hence it will be better to cancel my Raith session for today. 13:00 - 18:00 Hours.. Available by cell at times if Users have questions or run into problems. Please leave a VM if I don't pick up right away. Back tomorrow as usual, James Conway -------------- next part -------------- An HTML attachment was scrubbed... URL: From faraon at stanford.edu Mon Jan 23 10:25:54 2006 From: faraon at stanford.edu (Andrei Faraon) Date: Mon, 23 Jan 2006 10:25:54 -0800 (PST) Subject: Cancelling my RAITH session for 13:00 - 18:00 today -- session is available for you! In-Reply-To: Message-ID: I'll take James reservation. Andrei On Mon, 23 Jan 2006, James Conway wrote: > Hello Raith Users: > > I am feeling well below the weather today, and have been fighting a nagging > respiratory bug all weekend. > Hence it will be better to cancel my Raith session for today. 13:00 - 18:00 > Hours.. > > Available by cell at times if Users have questions or run into problems. > Please leave a VM if I don't pick up right away. > > Back tomorrow as usual, > > James Conway > Andrei Faraon Dept. of Applied Physics, 316 Via Pueblo Mall Stanford University Stanford, CA 94305-4090 650 497 3857 From jwc at snf.stanford.edu Tue Jan 24 18:35:39 2006 From: jwc at snf.stanford.edu (James Conway) Date: Tue, 24 Jan 2006 18:35:39 -0800 Subject: Comment raith SNF 2006-01-24 18:26:53: SYSTEM REQUALIFIED -- NO PROBLEMS FOUND Message-ID: <43D6E3FB.1020302@snf.stanford.edu> GREETINGS: IN REFERENCE TO STITCHING ISSUES REPORTED LAST WEEK, WE HAVE DETERMINED THAT THESE RESULTS WERE SIMPLY NEW USER'S WRITE FIELD ALIGNMENT RESULTS AND NOT ANY PROBLEMS WITH THE RAITH SYSTEM. NO ERRORS WERE OBSERVED IN PATTERN PLACEMENT OR WRITE FIELD TO WRITE FIELD STITCHING ON THE STANDARD PCM TEST PATTERN SET AT 10 KV, 30 um APT. AT 5 mm wORKING DISTANCE. USERS ARE ENCOURAGED TO ALWAYS CAREFULLY INSPECT THEIR PATTERNS UNDER THE OPTICAL MICROSCOPE AND IF NECESSARY THE SEM BEFORE CONTINUING WITH PATTERN TRANSFER. THE RAITH SYSTEM WAS FULLY REQUALIFIED THIS AFTERNOON AND NO PROBLEMS WERE OBSERVED. OVERLAY AND EBEAM STITCHING MEASUREMENTS WILL BE PERFORMED THURSDAY IF SESSION TIME ALLOWS. REF: PCM TEST 01242006 ON WAFER 02072005_2 / LOT 10312005 2% 950 K PMMA 108 nm thickness. THANK YOU FOR YOUR SUPPORT! JAMES CONWAY From xinranw at gmail.com Wed Jan 25 20:44:57 2006 From: xinranw at gmail.com (Xinran Wang) Date: Wed, 25 Jan 2006 20:44:57 -0800 Subject: reservation removed tomorrow from 10am Message-ID: <22ffcd060601252044k6def1916nd9b4113bc8085b98@mail.gmail.com> My sample won't be ready, sorry for the inconvenience. Xinran -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Fri Jan 27 09:22:14 2006 From: jwc at snf.stanford.edu (James Conway) Date: Fri, 27 Jan 2006 09:22:14 -0800 Subject: Comment raith SNF 2006-01-25 16:30:17: Electrostatic Chuck and Piezo post controls calibrated Message-ID: <43DA56C6.2060906@snf.stanford.edu> Greetings: The ESChuck and the piezo post positions used for leveling routines have been recalibrated and updated calibrations saved onto the system defaults. Further testing on wafers on the Std. Sample Holder will be tested tomorrow. Users may notice a change to the center piezo positions with no concerns. If you do not see the piezo post move into the centered positions after loading your samples please see James Conway, or refer to the RAITH Notebook NO. 3 and move the piezo heights to these positions and save your project. On the centered Piezo positions a 100 mm wafer correctly placed flat on the Std. Sample holder is level to within a delta WD of 0.014 mm. Please let me know if you have any questions. James Conway From jwc at snf.stanford.edu Fri Jan 27 09:43:19 2006 From: jwc at snf.stanford.edu (James Conway) Date: Fri, 27 Jan 2006 09:43:19 -0800 Subject: Problem raith SNF 2006-01-26 18:43:07: Unable to complete automatic WF alignment in overlay Message-ID: <43DA5BB7.7040502@snf.stanford.edu> Greetings, I posted this to the raith-pcs at snf.stanford.edu at the end of my session yesterday and am forwarding it all users this morning. If I can get some more time on the system today I will continue to trouble shoot to identify and correct the problem. Never a dull moment, James Conway -------- Original Message -------- Subject: Problem raith SNF 2006-01-26 18:43:07: Unable to complete automatic WF alignment in overlay Date: Thu, 26 Jan 2006 18:43:08 -0800 From: jwc at snf.stanford.edu To: raith-pcs at snf.stanford.edu Good Evening, This afternoon working on the system I discovered that I am unable to complete the layer 61 automated write field alignment running from the ALIGN.PLS script. This is likely due to a problem with either the auto alignment script or a call or setting change in the threshold script used to determine the position of the center of the mark scans in U and V. Result is in my attempt to perform overlay alignments; all mark scans in U and V fail and show a red light and a subsequent error message '0 marks found'. Was not able to reach Joe Klingfus @ RAITH this evening so I will resume this effort tomorrow. This may just be a issue in my login and script files and as of yet I cannot determine if this is a global problems throughout the system. Users working in Overlay please report all errors encountered. Layer 63 -- manual WF alignment functions are unaffected. Thank you for your support! JWC 01262006:18:40 -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Fri Jan 27 11:01:53 2006 From: jwc at snf.stanford.edu (James Conway) Date: Fri, 27 Jan 2006 11:01:53 -0800 Subject: Raith offline SW dongle available for the next users whom wishes to check it out. Message-ID: <43DA6E21.2020605@snf.stanford.edu> An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Tue Jan 31 12:01:35 2006 From: jwc at snf.stanford.edu (James Conway) Date: Tue, 31 Jan 2006 12:01:35 -0800 Subject: Problem corrected on RAITH SNF 2006-01-26 18:43:07: Unable to complete automatic WF alignment in overlay] Message-ID: <43DFC21F.5000400@snf.stanford.edu> Problem has been resolved. Users can now return to their previously scheduled overlay runs. Thank you for your support! James Conway -------- Original Message -------- Subject: Re: Problem raith SNF 2006-01-26 18:43:07: Unable to complete automatic WF alignment in overlay Date: Tue, 31 Jan 2006 11:29:52 -0800 From: jwc at snf.stanford.edu To: raith-pcs at snf.stanford.edu I found the bug in the script autolinescan.rec that prevented the position scan data to be placed into the correct column of the position list allowing the auto mark recognition to complete. Then tested overlay functionality to previous layer written with no problems on demo.csf and the main stitching and overlay pattern SOS.csf:overlay. Stitching measurements will be forthcoming in future testing and measurement sessions scheduled for next week. James Conway -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: blutextb.gif Type: image/gif Size: 569 bytes Desc: not available URL: