From jwc at snf.stanford.edu Wed Mar 1 11:23:55 2006 From: jwc at snf.stanford.edu (James Conway) Date: Wed, 01 Mar 2006 11:23:55 -0800 Subject: ANNOUNCEMENT: "Take A Spin with Me" -- Ebeam Resist Handling Training on the Headway. Monday March 6, 2006 11 AM to 1 PM SNF cleanroom. Message-ID: <4405F4CB.3080302@snf.stanford.edu> ANNOUNCEMENT: "Take A Spin with Me" -- Ebeam Resist Handling Training on the Headway Coater. Greetings Ebeam Lab Users, I will be conducting my monthly "Take A Spin with Me" training class next Monday March 6, 2006 from 11 AM - 1 PM. We will meet in the SNF Cleanroom alongside the Headway Spin Coater and also at WBNONMETAL. This is a great opportunity for you to get acquainted with the specific points to employ when working with our Ebeam Resist materials in order to obtain high quality thin film coatings over your wafers for Electron Beam, Scanning Probe (SPL), and optical Nano-Lithography. In these applications accurate control of Polymer thickness is important in order to obtain consistent high quality lithography results. We will be conducting this training on the Headway2 spin coater and users attending this session will gain their qualification on this tool. I will start with substrate cleans on WET BENCH NONMETAL performing substrate cleans and HF etching of the intrinsic native oxide on Silicon wafers. All users are encouraged to have their substrates cleaned and ready to go for spinning by the session time; either coming out of the 150 degree Singe oven, or if you are working on oxides or nitrides, coming out of the YES HMDS Prime oven. We can apply what ever resist system you desire for your work. My plan is to prepare more 2% 950K MW PMMA in Anisole films for the RAITH Group XIX training class to be held later in the week. All interested parties are welcome to attend this session. No need to reply to this email -- just show up! Thank you for your interest in Ebeam Technologies here at Stanford Nanofabrication Facility, James W. Conway -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Wed Mar 1 11:55:40 2006 From: jwc at snf.stanford.edu (James Conway) Date: Wed, 01 Mar 2006 11:55:40 -0800 Subject: ANNOUNCEMENT2: RAITH Group XIX -- Intensive 4 day short course. March 7 - 10 TUESDAY - FRIDAY 10 AM - 6 PM Message-ID: <4405FC3C.4010102@snf.stanford.edu> Greetings RAITH Group XIX: If you are listed in the To: section of this email you are confirmed to be in RAITH Group XIX. We also wish to invite all interested parties to the Tuesday morning lecture session and demo layer one training following at 2 PM - 6 PM in the afternoon. All are also welcome to attend as an observer the 'hands-on' sessions through the week. You are also encouraged to join any Raith Champion when they are on the system to gain further exposure to the system. This is your first announcement and confirmation of your commitment for attending the RAITH Group XIX Training course to be held in March. The schedule follows along with a listing of Participants whom you will be working with as a Team. This will be an intensive four day workshop. You are expected to attend all sessions in order to gain the experience and skills you will need to qualify on the RAITH 150 system. Please note that there are specific prerequisites for this class and you must have recent relevant SEM and LITHO experience before your can sit for this class. Please see me directly should you have any questions. Thank you for your interest in Electron Beam Technologies at the Stanford Nanofabrication Facility, James Conway Ebeam Technology Group 650-725-7075 --------------------------------- RAITH Group XIX Schedule: Raith 150 Basic Users Training - Intensive 4 Day Short Course March 7 - 10, 2006 from 10 - 6 PM Tuesday through Friday. The Plan of Action: We will start out with a half day of lecture in the morning Tuesday; quickly moving into entirely 'hands on' operations training through the remainder of the week. We will break for lunch at various times, while the system is writing, so plan to be flexible with your other outside commitments. You should have started working on your GDS II patterns and preparing PMMA on your substrates if you wish to write on your material. Please bring your patterns and materials to the 'Hands-On' sessions. Some afternoons we may also be able to finish earlier, letting the system write on its own to the end of our reservations on the system. Schedule: Tuesday March 7, 2006: 10:00 - 12:30 Session 1: Basic Users Course Lecture -- CIS 115 [Please note the room change from previous classes!] 14:00 - 17:00 Session 2: RAITH System Demonstration - Layer One -- EBEAM LAB CIS L104 Wednesday March 8, 2006: 10:00 - 12:30 Session 3: RAITH System Demonstration - Layer Two: OVERLAY -- EBEAM LAB CIS L104 14:00 - 18:00 Session 4: Hands On training session One -- EBEAM LAB CIS L104 Thursday March 9, 2006: 10:00 - 12:30 Session 5: Hands On training session Two -- EBEAM LAB CIS L104 14:00 - 18:00 Session 6: Hands On training session Three -- EBEAM LAB CIS L104 Friday March 10, 2006: 10:00 - 12:30 Session 7: Hands On training session Four -- EBEAM LAB CIS L104 14:00 - 18:00 Session 8: Hands On training session Five -- EBEAM LAB CIS L104 Individual Qualification Sessions will be held after this class so you can demonstrate your skill on the system to me and gain your login to the system. I WILL PROVIDE A CD AND PRINTED MATERIALS AT THE FIRST MEETING, IF YOU HAVE NOT ALREADY RECEIVED ONE YET. ------------------------------------------------------------------------------------------------------------------------------------------- PARTICIPANTS IN RAITH GROUP XIX: 1. Young Chul Jun mailto: ycjun at stanford.edu Coral: ycjun Phone: 650-714-3585 cell Yamamoto Group Project: Quantum Dot Cavity QED (Quantum Electron Dynamics) <> 2. Frank Jaeckel fjaeckel at stanford.edu Coral: fjaeckel Phone: 650-724-4052 office cell: 650-862-6864 W. E. Moerner Project: Electrode patterns for control... High resolution Opt. Antenna - 3. Randy Stoltenberg randalls at stanford.edu Coral: randalls Phone: 650-796-4527 Zhenan Bao Project: Electrode patterns for control... - 4. Alan Chin achin at mail.arc.nasa.gov Coral: chinah Phone: 408-887-2287 cell NASA Ames - Nanowires for Lasers and Photonics. - 5. Xiaowei Yu xwyu at stanford.edu Coral: xiaowei Phone: 1-650-862-3098 Stohr Group, Project: Spin Doctors, GMR device for Spintronics. -------------- next part -------------- An HTML attachment was scrubbed... URL: From arvisun at stanford.edu Wed Mar 1 12:54:03 2006 From: arvisun at stanford.edu (arvind sundaramurthy) Date: Wed, 01 Mar 2006 12:54:03 -0800 Subject: Raith Removed Reservation Message-ID: <6.0.1.1.2.20060301125317.02f0a4d0@arvisun.pobox.stanford.edu> Removed my reservation from 6:30pm-midnight today(Wednesday). arvind From hungtao at stanford.edu Wed Mar 1 17:52:30 2006 From: hungtao at stanford.edu (Hung-Tao Chou) Date: Wed, 1 Mar 2006 17:52:30 -0800 Subject: 3am to 7am open tomorrow Message-ID: <1141264350.44064fdebae38@webmail.stanford.edu> Move my session to an earlier time -Hungtao From yjhuo at stanford.edu Sun Mar 5 09:19:32 2006 From: yjhuo at stanford.edu (Yijie Huo) Date: Sun, 5 Mar 2006 09:19:32 -0800 Subject: Raith is free from 9am to 2pm today Message-ID: <200603051719.k25HJXFG006877@smtp3.Stanford.EDU> Run out of PMMA 2%... -------------- next part -------------- An HTML attachment was scrubbed... URL: From lxuwind at stanford.edu Sun Mar 5 16:39:21 2006 From: lxuwind at stanford.edu (Liang Xu) Date: Sun, 5 Mar 2006 16:39:21 -0800 Subject: Raith free 5-9pm today Message-ID: <1141605561.440b84b9e1aa7@webmail.stanford.edu> Sample not ready, because 2% PMMA was used up. -- Liang Xu Address: 59, Dudley Lane, Escondido Village, Apt B, Stanford, CA 94305 Tel: 650-497-1934 From xinranw at stanford.edu Mon Mar 6 13:02:33 2006 From: xinranw at stanford.edu (Xinran Wang) Date: Mon, 6 Mar 2006 13:02:33 -0800 Subject: raith free from 4pm today Message-ID: <22ffcd060603061302l6bcac894q511c0cd0c09bcbd4@mail.gmail.com> sorry for late notice. Xinran -------------- next part -------------- An HTML attachment was scrubbed... URL: From lxuwind at stanford.edu Mon Mar 6 13:12:54 2006 From: lxuwind at stanford.edu (Liang Xu) Date: Mon, 6 Mar 2006 13:12:54 -0800 Subject: raith free from 4pm today References: <22ffcd060603061302l6bcac894q511c0cd0c09bcbd4@mail.gmail.com> Message-ID: <001601c64162$bc11ee50$d16443ab@stanford.edu> I'll take it. Thanks. ----- Original Message ----- From: Xinran Wang To: raith Sent: Monday, March 06, 2006 1:02 PM Subject: raith free from 4pm today sorry for late notice. Xinran -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Mon Mar 6 14:36:33 2006 From: jwc at snf.stanford.edu (James Conway) Date: Mon, 06 Mar 2006 14:36:33 -0800 Subject: Reminder: RAITH Group XIX -- Intensive 4 day short course. tomorrow ---> March 7 - 10 TUESDAY - FRIDAY 10 AM - 6 PM Message-ID: <440CB971.1000606@snf.stanford.edu> Greetings RAITH Group XIX: If you are listed in the To: section of this email you are confirmed to be in RAITH Group XIX. We also wish to invite all interested parties to the Tuesday morning lecture session and demo layer one training following at 2 PM - 6 PM in the afternoon. All are also welcome to attend as an observer the 'hands-on' sessions through the week. All are also encouraged to join any Raith Champion when they are on the system to gain further exposure to the system. This is your first announcement and confirmation of your commitment for attending the RAITH Group XIX Training course to be held in March. The schedule follows along with a listing of Participants whom you will be working with as a Team. This will be an intensive four day workshop. You are expected to attend all sessions in order to gain the experience and skills you will need to qualify on the RAITH 150 system. Please note that there are specific prerequisites for this class and you must have recent relevant SEM and LITHO experience before your can sit for this class. Please see me directly should you have any questions. Thank you for your interest in Electron Beam Technologies at the Stanford Nanofabrication Facility, James Conway Ebeam Technology Group 650-725-7075 --------------------------------- RAITH Group XIX Schedule: Raith 150 Basic Users Training - Intensive 4 Day Short Course March 7 - 10, 2006 from 10 - 6 PM Tuesday through Friday. The Plan of Action: We will start out with a half day of lecture in the morning Tuesday; quickly moving into entirely 'hands on' operations training through the remainder of the week. We will break for lunch at various times, while the system is writing, so plan to be flexible with your other outside commitments. You should have started working on your GDS II patterns and preparing PMMA on your substrates if you wish to write on your material. Please bring your patterns and materials to the 'Hands-On' sessions. Some afternoons we may also be able to finish earlier, letting the system write on its own to the end of our reservations on the system. Schedule: Tuesday March 7, 2006: 10:00 - 12:30 Session 1: Basic Users Course Lecture -- CIS 115 [Please note the room change from previous classes!] 14:00 - 17:00 Session 2: RAITH System Demonstration - Layer One -- EBEAM LAB CIS L104 Wednesday March 8, 2006: 10:00 - 12:30 Session 3: RAITH System Demonstration - Layer Two: OVERLAY -- EBEAM LAB CIS L104 14:00 - 18:00 Session 4: Hands On training session One -- EBEAM LAB CIS L104 Thursday March 9, 2006: 10:00 - 12:30 Session 5: Hands On training session Two -- EBEAM LAB CIS L104 14:00 - 18:00 Session 6: Hands On training session Three -- EBEAM LAB CIS L104 Friday March 10, 2006: 10:00 - 12:30 Session 7: Hands On training session Four -- EBEAM LAB CIS L104 14:00 - 18:00 Session 8: Hands On training session Five -- EBEAM LAB CIS L104 Individual Qualification Sessions will be held after this class so you can demonstrate your skill on the system to me and gain your login to the system. I WILL PROVIDE A CD AND PRINTED MATERIALS AT THE FIRST MEETING, IF YOU HAVE NOT ALREADY RECEIVED ONE YET. ------------------------------------------------------------------------------------------------------------------------------------------- PARTICIPANTS IN RAITH GROUP XIX: <>1. Young Chul Jun mailto: ycjun at stanford.edu Coral: ycjun Phone: 650-714-3585 cell Yamamoto Group Project: Quantum Dot Cavity QED (Quantum Electron Dynamics) <> 2. Frank Jaeckel fjaeckel at stanford.edu Coral: fjaeckel Phone: 650-724-4052 office cell: 650-862-6864 W. E. Moerner Project: Electrode patterns for control... High resolution Opt. Antenna - <>3. Randy Stoltenberg randalls at stanford.edu Coral: randalls Phone: 650-796-4527 Zhenan Bao Project: Electrode patterns for control... - <>4. Alan Chin achin at mail.arc.nasa.gov Coral: chinah Phone: 408-887-2287 cell NASA Ames - Nanowires for Lasers and Photonics. - <>5. Xiaowei Yu xwyu at stanford.edu Coral: xiaowei Phone: 1-650-862-3098 Stohr Group, Project: Spin Doctors, GMR device for Spintronics. -------------- next part -------------- An HTML attachment was scrubbed... URL: From ifushman at stanford.edu Wed Mar 8 08:31:31 2006 From: ifushman at stanford.edu (Ilya Fushman) Date: Wed, 8 Mar 2006 08:31:31 -0800 Subject: sample on clip 4 on 03/06/06 Message-ID: <1141835491.440f06e39265e@webmail.stanford.edu> Hi, I forgot to leave a box for my sample to be unloaded to. It was on clip 4 on Monday. If someone has unloaded it, please let me know. I am leaving a box next to the raith, so if someone sees a sample on clip 4 (~ .5x.5 mm), please unload it to the box with my name on it. Thanks, ilya --------------------- Ilya Fushman Vuckovic Lab Applied Physics (650) 804 1058 --------------------- From xinranw at stanford.edu Fri Mar 10 18:53:12 2006 From: xinranw at stanford.edu (Xinran Wang) Date: Fri, 10 Mar 2006 18:53:12 -0800 Subject: raith is free tomorrow 10am, sample not ready Message-ID: <22ffcd060603101853p1dba0053g89c5d2a7d73ef6ba@mail.gmail.com> Sorry for the late notice. Xinran -------------- next part -------------- An HTML attachment was scrubbed... URL: From hungtao at stanford.edu Sat Mar 11 01:12:41 2006 From: hungtao at stanford.edu (Hung-Tao Chou) Date: Sat, 11 Mar 2006 01:12:41 -0800 Subject: raith free 2-5pm. Message-ID: <1142068361.441294899143f@webmail.stanford.edu> sample is not ready, sorry for the late notice. -Hungtao From jwc at snf.stanford.edu Wed Mar 15 18:34:33 2006 From: jwc at snf.stanford.edu (James Conway) Date: Wed, 15 Mar 2006 18:34:33 -0800 Subject: README: ALL PMMA USERS IN THE LAB -- PLEASE REDUCE YOUR WASTE OF PMMA. In-Reply-To: <20060315231408.18301.qmail@web34604.mail.mud.yahoo.com> References: <20060315231408.18301.qmail@web34604.mail.mud.yahoo.com> Message-ID: <4418CEB9.9010607@snf.stanford.edu> Greetings PMMA Users working in the SNF Lab: We have been going through both the 2% 950 K and the 5% 495K PMMA in Anisole at a much higher usage rate than is normal over the past years time. In several cases the bottle in the lab has disappeared from the lab only to return several days later nearly empty. 250 ml is enough for 100 - 150 wafers! The last bottle of 250 ml of 5% 495K PMMA in anisole was exhausted in less than a month whereas before it would normally last for more than two months. NOTICE TO ALL PMMA USERS IN THE LAB: THE PMMA SUPPLY BOTTLES AND THE MATERIALS WITHIN ARE NOT TO LEAVE THE SNF LAB FOR ANY PURPOSE OR REASON. USERS ARE REQUESTED NOT TO TAKE FROM THESE BOTTLES, OR MAKE UP SPECIFIC STOCKS OF PMMA AT OTHER VISCOSITIES FROM THESE SUPPLIES. If you need a custom formulary or viscosity please see me I have many viscosities already made up and available by sign out. USERS ARE REMINDED THAT ALL [PMMA MATERIALS IN THE LAB ARE TO BE HANDLED IN SYRINGES] AND PIPETTES AND NEVER IS THE MATERIAL TO BE POURED INTO A BEAKER OR DIRECTLY ONTO THE WAFERS DURING COATING. NO EXCEPTIONS. WHY: IF YOU POUR YOU WILL LOOSE THE CONTROL OF THE VISCOSITY AS THE SOLVENT WILL RAPIDLY EVAPORATE. YOU WILL ALSO EXPOSE YOURSELF TO MORE SOLVENT FUMES THAN ARE NECESSARY ADDING TO YOUR RISK OF EXPOSURE TO SOLVENTS. USERS ARE REQUESTED TO BE EXTRA VIGILANT, PARTICULARLY IN THE EVENINGS, AND TO INFORM ME SHOULD THEY OBSERVE USERS HANDLING THE MATERIALS INCORRECTLY OR IN A WASTEFUL MANNER. The micro resist technology gmbH PMMA materials we employ here at SNF are the highest quality materials you can obtain anywhere. But they are expensive to purchase and for us to suitably package for Lab use. We have the normal OCG PMMA at similar molecular weights as the Microchem materials if you have the need for bulk PMMA coatings and I am happy to sign you out a bottle for this type of need. I also have maintained a small supply of PMMA from before we switched over to Anisole last year that will soon expire. Finally I have a large stock of 9% 950K PMMA in Anisole available for dilutions to lower viscosity if you need it. NOTICE: TODAY I PLACED A NEW BOTTLE OF 5% 495K PMMA INTO THE CLEANROOM. IF MATERIAL CONTINUES TO BE REMOVED FROM THE LAB, OR SIMPLY WASTED BY CARELESS USERS, I WILL TAKE FURTHER ACTION TO CONTROL USAGE AND REDUCE WASTE; UP TO AN INCLUDING LOCKING UP ALL THE EBEAM RESIST. YOU WILL THEN HAVE TO CHECK IT OUT EACH DAY DURING MY OFFICE HOUR ONLY, AND AT NO OTHER TIME WILL IT BE AVAILABLE. I DESIRE NOT TO HAVE TO TAKE THESE STEPS AS IT WOULD INCONVENIENCE EVERYONE. PLEASE BE CAREFUL WORKING WITH THESE MATERIAL AND DO YOUR PART TO MINIMIZE WASTE OF THESE MATERIALS IN OUR LAB. Thank you for your interest in Ebeam Technologies here at SNF. James Conway -------------- next part -------------- An HTML attachment was scrubbed... URL: From rohank at stanford.edu Wed Mar 15 23:04:38 2006 From: rohank at stanford.edu (Rohan D. Kekatpure) Date: Wed, 15 Mar 2006 23:04:38 -0800 Subject: Done early. System available till 0400a Message-ID: <1142492678.44190e06e81bf@webmail.stanford.edu> From jwc at snf.stanford.edu Thu Mar 16 13:42:17 2006 From: jwc at snf.stanford.edu (James Conway) Date: Thu, 16 Mar 2006 13:42:17 -0800 Subject: Do you have spin speed function thickness curves for MICROCHEM CORP. 9% 950K MW PMMA in Anisole? Message-ID: <4419DBB9.2090608@snf.stanford.edu> Greetings Ebeam Lab Users: Perhaps you have some thin film data you could share? Do anyone have recent spin speed function thickness curves for 9% 950K MW PMMA in Anisole? Please post to the beamtools at snf.stanford.edu email list. Thank you, James Conway SNF From jwc at snf.stanford.edu Thu Mar 16 14:37:27 2006 From: jwc at snf.stanford.edu (James Conway) Date: Thu, 16 Mar 2006 14:37:27 -0800 Subject: man-N 2403 In-Reply-To: <6.0.1.1.2.20060315183921.01e8a9c0@rohank.pobox.stanford.edu> References: <20060315231408.18301.qmail@web34604.mail.mud.yahoo.com> <4418CEB9.9010607@snf.stanford.edu> <6.0.1.1.2.20060315183921.01e8a9c0@rohank.pobox.stanford.edu> Message-ID: <4419E8A7.9060806@snf.stanford.edu> Thank you for your testimonial! The EBTH meeting resulted in a recommendation that we make this resist part of our standard resist available in the Lab. We will continue storing the MaN 2403 as we have been until this bottle is used up. After that time we will start stocking a small supply in the Ebeam resist containment in the upper shelf of the left hand solvent cabinet. All the best, JWC Rohan D. Kekatpure wrote: > Dear James, > > I am sorry that I was not able to get in touch with you after the > EBEAM town hall meeting which focused on ma-N 2403. I just wanted to > confirm that I would be using this material extensively for my optical > device fabrication. I have found this material very easy to handle > compared to what I have heard about other chemically amplified > resists. My primary interest in using this material is as an etch mask > for fabricating single mode waveguides at 700 nm. To date it has given > me very good selectivity in an oxide etch process (1:2 or more; 1:3 is > typical). > > I know that you have been trying hard to get to standardize this > material, but in case someone needs direct user feedback, I will be > happy to provide it. > > Thanks for your help > -Rohan -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Thu Mar 16 14:41:20 2006 From: jwc at snf.stanford.edu (James Conway) Date: Thu, 16 Mar 2006 14:41:20 -0800 Subject: Ebeam Town Hall Meeting PPT available upon request. Message-ID: <4419E990.7000505@snf.stanford.edu> Greetings: February 28, 2006 we had a Ebeam Town Hall Meeting which reviewed in part recent results of the MaN-2403 Negative Tone Ebeam resist we have been characterizing here at SNF. If you missed this meeting, or desire to review the PPT slides I presented at this meeting please send jwc at snf.stanford.edu an email requesting the presentation. Thank you for your interest in Ebeam Technologies here at SNF. James Conway From xinranw at stanford.edu Thu Mar 16 22:02:00 2006 From: xinranw at stanford.edu (Xinran Wang) Date: Thu, 16 Mar 2006 22:02:00 -0800 Subject: raith cancelled tomorrow from 13:00, sample not ready Message-ID: <22ffcd060603162202l5b28de41g3085dc9ebc18cb7@mail.gmail.com> -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Fri Mar 17 09:09:31 2006 From: jwc at snf.stanford.edu (James Conway) Date: Fri, 17 Mar 2006 09:09:31 -0800 Subject: Seeking my PROLIFIC USB DRIVE Message-ID: <441AED4B.1050805@snf.stanford.edu> Greetings, I left or seem to have misplaced my Prolific 512 MB USB Hard drive in the Ebeam Lab Tuesday evening and have not been able to locate it. The drive is labeled JWCDRIVE2. It is a small clear green body plastic body with a grey case. Please return to me if you find it in the lab or entryway. Thank you, James Conway From hungtao at stanford.edu Mon Mar 20 20:00:22 2006 From: hungtao at stanford.edu (Hung-Tao Chou) Date: Mon, 20 Mar 2006 20:00:22 -0800 Subject: 9am-1pm free tomorrow Message-ID: <1142913622.441f7a56bcc00@webmail.stanford.edu> My sample is not ready, sorry for the late notice -Hungtao From arvisun at stanford.edu Wed Mar 22 19:16:25 2006 From: arvisun at stanford.edu (Arvind Sundaramurthy) Date: Wed, 22 Mar 2006 19:16:25 -0800 Subject: Reservation Removed Today(8-10pm) Message-ID: <1143083785.44221309d5a4b@webmail.stanford.edu> Sample not ready. Sorry for the late notice. arvind From rohank at stanford.edu Thu Mar 23 20:49:13 2006 From: rohank at stanford.edu (Rohan D. Kekatpure) Date: Thu, 23 Mar 2006 20:49:13 -0800 (PST) Subject: Reservation removed Sunday 8:30-11:30 Message-ID: From xinranw at stanford.edu Thu Mar 23 22:22:38 2006 From: xinranw at stanford.edu (Xinran Wang) Date: Thu, 23 Mar 2006 22:22:38 -0800 Subject: reservation cancelled from 13:30 tomorrow, sample not ready Message-ID: <22ffcd060603232222j5ca16ad5xaf539acb590664e3@mail.gmail.com> -------------- next part -------------- An HTML attachment was scrubbed... URL: From jhemanth at stanford.edu Sat Mar 25 13:05:41 2006 From: jhemanth at stanford.edu (Hemanth Jagannathan) Date: Sat, 25 Mar 2006 13:05:41 -0800 Subject: Raith free till 4:30pm today Message-ID: <001401c6504f$dfd95ac0$0100000a@jhemanthdesk> Problem with samples. Will not be able to use my reservation today. Sorry for the last minute notice. -Hemanth -------------- next part -------------- An HTML attachment was scrubbed... URL: From levi at snowmass.stanford.edu Sat Mar 25 22:03:58 2006 From: levi at snowmass.stanford.edu (Ofer Levi) Date: Sat, 25 Mar 2006 22:03:58 -0800 Subject: Using SU-8 as negative resit on Raith Message-ID: <4.3.2.7.2.20060325215936.03933d20@snow.stanford.edu> Hey all, A friend from Caltech told me that they use SU-8 on their modified SEM to write e-beam patterns as negative resist. Their recipe use a rather thick SU-8 resist (1200-1800 nm thick) with standard SU-8 developing afterwards. Their resolution is probably only 50 nm at these thickness values. Does anyone use SU-8 here on the Raith? Can someone give me some details about resist type and thickness, resolution you get and some details about processing and dose to clear.. Many thanks, Ofer ______________________________________________ Ofer Levi, Ph.D. Department of Electrical Engineering, Stanford University CIS-X Rm 310, Stanford, CA 94305-4075 Phone: (650)725-6907 or 723-0464 Fax: (650)723-4659 Adm. Asst.: Gail Chun-Creech Ph: (650)723-0983 E-Mail: levi at snow.stanford.edu Web page: http://snow.stanford.edu/~levi/ ______________________________________________ From dinhthuc at hotmail.com Sun Mar 26 01:46:12 2006 From: dinhthuc at hotmail.com (danny T) Date: Sun, 26 Mar 2006 09:46:12 +0000 Subject: Raith Free from 5pm to Midnight on Sunday Message-ID: An HTML attachment was scrubbed... URL: From lxuwind at stanford.edu Sun Mar 26 09:54:14 2006 From: lxuwind at stanford.edu (Liang Xu) Date: Sun, 26 Mar 2006 09:54:14 -0800 Subject: Raith Free from 5pm to Midnight on Sunday In-Reply-To: Message-ID: <000301c650fe$4c258380$38aa0c80@Leon> I'll take 5-7pm. Thanks. Liang Xu PhD candidate in Department of Materials Science and Engineering, Stanford University Tel: 650-723-2939 (office) 650-497-1934 (home) Address: 60 Olmsted Rd, Apt 104, Stanford, CA94305 _____ From: danny T [mailto:dinhthuc at hotmail.com] Sent: Sunday, March 26, 2006 1:46 AM To: raith at snf.stanford.edu Subject: Raith Free from 5pm to Midnight on Sunday sample not ready. sorry for the late notice DN -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Mon Mar 27 09:24:33 2006 From: jwc at snf.stanford.edu (James Conway) Date: Mon, 27 Mar 2006 09:24:33 -0800 Subject: Seeking my PROLIFIC USB DRIVE -- drive was returned Thank you! In-Reply-To: <441AED4B.1050805@snf.stanford.edu> References: <441AED4B.1050805@snf.stanford.edu> Message-ID: <44281FD1.600@snf.stanford.edu> Thanks to whomever dropped off my USB Drive on my desk over the weekend. Much appreciate the return of this device, James James Conway wrote: > Greetings, > > I left or seem to have misplaced my Prolific 512 MB USB Hard drive in > the Ebeam Lab Tuesday evening and have not been able to locate it. > The drive is labeled JWCDRIVE2. It is a small clear green body > plastic body with a grey case. Please return to me if you find it in > the lab or entryway. > > Thank you, > > James Conway > From jwc at snf.stanford.edu Mon Mar 27 12:13:47 2006 From: jwc at snf.stanford.edu (James Conway) Date: Mon, 27 Mar 2006 12:13:47 -0800 Subject: ANNOUNCEMENT: Dr. Freimut Reuther, micro resist technology, presentation on NIL and EBL resist materials THURSDAY 3-30-06 CIS 201 10 - 11 AM. Message-ID: <4428477B.1050801@snf.stanford.edu> Greetings Raith and Ebeam Communities: I was able to arrange to have Dr. Freimut Reuther, Technical Director for micro resist technology GmbH. Berlin, Germany to come to Stanford during his visit to the USA. His visit will be Thursday March 30, 2006 from 10 AM - 12 Noon with a presentation and discussions to be held in CIS 201. Starting at 10 AM there will be a 40 minute presentation followed by discussions regarding products in development at micro resist technology GmbH. Focus of the presentation will be Ormocers and Polymers that can be used for thermal nanoimprint lithography and negative tone resists for e-beam / deep UV. All interested parties within the Stanford Community are welcome to attend this meeting. The conference room has been reserved through Noon for those wishing to continue technical discussions after his presentation remarks. Thank you for your interest in Ebeam Technologies here at Stanford Nanofabrication Facility. James Conway SNF 650-725-7075 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: blutextb.gif Type: image/gif Size: 569 bytes Desc: not available URL: From hansj at stanford.edu Mon Mar 27 12:15:22 2006 From: hansj at stanford.edu (Shu-Jen Han) Date: Mon, 27 Mar 2006 12:15:22 -0800 Subject: raith free from 1 to 4pm today Message-ID: <1143490522.442847da66cb4@webmail.stanford.edu> I used previous user's slots. From chaseonline at chaseonline.chase.com Wed Mar 29 23:47:46 2006 From: chaseonline at chaseonline.chase.com (Chase Card Services Online Services Team) Date: 30 Mar 2006 07:47:46 -0000 Subject: Notification of Limited Account Access Message-ID: <20060330074746.27398.qmail@216-55-169-169.dedicated.abac.net> An HTML attachment was scrubbed... URL: From chaseonline at chaseonline.chase.com Thu Mar 30 00:55:33 2006 From: chaseonline at chaseonline.chase.com (Chase Card Services Online Services Team) Date: 30 Mar 2006 08:55:33 -0000 Subject: Chase Bank Notification Message-ID: <20060330085533.9389.qmail@216-55-169-169.dedicated.abac.net> An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Wed Mar 29 14:28:27 2006 From: jwc at snf.stanford.edu (James Conway) Date: Wed, 29 Mar 2006 14:28:27 -0800 Subject: ANNOUNCEMENT2: Dr. Freimut Reuther, micro resist technology, presentation on NIL and EBL resist materials TOMOOROW: THURSDAY 3-30-06 CIS 201 10 - 11 AM. Message-ID: <442B0A0B.4020305@snf.stanford.edu> Greetings Raith and Ebeam Communities: I was able to arrange to have Dr. Freimut Reuther, Technical Director for micro resist technology GmbH. Berlin, Germany to come to Stanford during his visit to the USA. His visit will be tomorrow, Thursday March 30, 2006 from 10 AM - 12 Noon in CIS 201. There will be a 40 minute presentation followed by discussions regarding products in development at micro resist technology GmbH. Focus of the presentation will be Ormocers and Polymers that can be used for thermal nanoimprint lithography and negative tone resists for e-beam / deep UV. All interested parties within the Stanford Community are welcome to attend this meeting. The conference room has been reserved through Noon for those wishing to continue technical discussions after his presentations. Thank you for your interest in Ebeam Technologies here at Stanford Nanofabrication Facility. James Conway SNF 650-725-7075 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: not available Type: image/gif Size: 569 bytes Desc: not available URL: From jwc at snf.stanford.edu Thu Mar 30 09:30:34 2006 From: jwc at snf.stanford.edu (James Conway) Date: Thu, 30 Mar 2006 09:30:34 -0800 Subject: Reminder: TODAY Dr. Freimut Reuther, micro resist technology, presentation on NIL and EBL resist materials THURSDAY 3-30-06 CIS 201 10 - 11 AM. Message-ID: <442C15BA.50301@snf.stanford.edu> Please come and join us for a great presentation: Greetings Raith and Ebeam Communities: I was able to arrange to have Dr. Freimut Reuther, Technical Director for micro resist technology GmbH. Berlin, Germany to come to Stanford during his visit to the USA. His visit will be today, Thursday March 30, 2006 from 10 AM - 12 Noon in CIS 201. There will be a 40 minute presentation followed by discussions regarding products in development at micro resist technology GmbH. Focus of the presentation will be Ormocers and Polymers that can be used for thermal nanoimprint lithography and negative tone resists for e-beam / deep UV. All interested parties within the Stanford Community are welcome to attend this meeting. The conference room has been reserved through Noon for those wishing to continue technical discussions after his presentations. Thank you for your interest in Ebeam Technologies here at Stanford Nanofabrication Facility. James Conway SNF 650-725-7075 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: not available Type: image/gif Size: 569 bytes Desc: not available URL: From luckyyrl at gmail.com Thu Mar 30 20:26:11 2006 From: luckyyrl at gmail.com (Yuerui Lu) Date: Thu, 30 Mar 2006 20:26:11 -0800 Subject: raith free from 9:00pm Message-ID: <9dc2cbc0603302026x625a3828l3ff82e2048c52215@mail.gmail.com> done already yesterday. sorry for late notice -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Fri Mar 31 09:21:33 2006 From: jwc at snf.stanford.edu (James Conway) Date: Fri, 31 Mar 2006 09:21:33 -0800 Subject: Imemdiate need for a Korean Speaker in CIS Message-ID: <442D651D.5020900@snf.stanford.edu> Hello, We have a korean speaker that has arrived and we need a korean speaker to assist Cam Chan help this person. Anybody in CIS that can help us? Please see James Conway or Cam Chan office ASAP From jwc at snf.stanford.edu Fri Mar 31 09:42:09 2006 From: jwc at snf.stanford.edu (James Conway) Date: Fri, 31 Mar 2006 09:42:09 -0800 Subject: [POSSIBLE VIRUS:###] [Fwd: [Fwd: EBEAM Lithography Engineer - Job Offer]] Message-ID: <442D69F1.7060901@snf.stanford.edu> -------- Original Message -------- Subject: [Fwd: EBEAM Lithography Engineer - Job Offer] Date: Fri, 31 Mar 2006 09:02:33 -0500 From: Yves-Alain Peter Organization: Ecole Polytechnique de Montreal, CANADA To: James Conway Hi James, My friend Philippe Fluckiger at EPFL is looking for an EBEAM Lithography Engineer. Could you please pass it over to your contacts who might be interested? Best, Yves-Alain -- **************************************** Yves-Alain Peter Professeur Adjoint D?partement de G?nie Physique Ecole Polytechnique de Montr?al C.P. 6079, Succ. Centre-Ville Montr?al, Qu?bec H3C 3A7 CANADA T?l : + 1 514 340 4711 poste 3100 Fax : + 1 514 340 3218 yves-alain.peter at polymtl.ca http://mems.phys.polymtl.ca **************************************** -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- An embedded message was scrubbed... From: Philippe Fluckiger Subject: EBEAM Lithography Engineer - Job Offer Date: Fri, 31 Mar 2006 15:23:11 +0200 Size: 8785 URL: