Using SU-8 as negative resit on Raith
levi at snowmass.stanford.edu
Sat Mar 25 22:03:58 PST 2006
A friend from Caltech told me that they use SU-8 on their modified SEM to
write e-beam patterns as negative resist.
Their recipe use a rather thick SU-8 resist (1200-1800 nm thick) with
standard SU-8 developing afterwards. Their resolution is probably only 50
nm at these thickness values.
Does anyone use SU-8 here on the Raith?
Can someone give me some details about resist type and thickness,
resolution you get and some details about processing and dose to clear..
Ofer Levi, Ph.D.
Department of Electrical Engineering, Stanford University
CIS-X Rm 310, Stanford, CA 94305-4075
Phone: (650)725-6907 or 723-0464
Adm. Asst.: Gail Chun-Creech Ph: (650)723-0983
E-Mail: levi at snow.stanford.edu
Web page: http://snow.stanford.edu/~levi/
More information about the raith