Using SU-8 as negative resit on Raith

[Ofer Levi]

Hey all,
A friend from Caltech told me that they use SU-8 on their modified SEM to 
write e-beam patterns as negative resist.
Their recipe use a rather thick SU-8 resist (1200-1800 nm thick) with 
standard SU-8 developing afterwards. Their resolution is probably only 50 
nm at these thickness values.
Does anyone use SU-8 here on the Raith?
Can someone give me some details about resist type and thickness, 
resolution you get and some details about processing and dose to clear..

Many thanks,
Ofer

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Ofer Levi, 		Ph.D.
Department of Electrical Engineering, Stanford University
CIS-X Rm 310,  Stanford, CA 94305-4075

Phone:   			         (650)725-6907 or 723-0464
Fax: 	                                             (650)723-4659
Adm. Asst.: Gail Chun-Creech                  Ph:  (650)723-0983
E-Mail:	         		 levi at snow.stanford.edu
Web page: 	    	http://snow.stanford.edu/~levi/
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