ANNOUNCEMENT: Dr. Freimut Reuther, micro resist technology, presentation on NIL and EBL resist materials THURSDAY 3-30-06 CIS 201 10 - 11 AM.

James Conway jwc at
Mon Mar 27 12:13:47 PST 2006

Greetings Raith and Ebeam Communities:

I was able to arrange to have Dr. Freimut Reuther,  Technical Director 
for micro resist technology GmbH. Berlin, Germany to come to Stanford 
during his visit to the USA.  His visit will be Thursday March 30, 2006 
from 10 AM - 12 Noon with a presentation and discussions to be held in 
CIS 201. 

Starting at 10 AM there will be a 40 minute presentation followed by 
discussions regarding products in development at micro resist technology 
Focus of the presentation will be Ormocers and Polymers that can be used 
for thermal nanoimprint lithography and negative tone resists for e-beam 
/ deep UV.

All interested parties within the Stanford Community are welcome to 
attend this meeting.
The conference room has been reserved through Noon for those wishing to 
continue technical discussions after his presentation remarks.

Thank you for your interest in Ebeam Technologies here at Stanford 
Nanofabrication Facility.

James Conway

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