ANNOUNCEMENT2: Dr. Freimut Reuther, micro resist technology, presentation on NIL and EBL resist materials TOMOOROW: THURSDAY 3-30-06 CIS 201 10 - 11 AM.

James Conway jwc at snf.stanford.edu
Wed Mar 29 14:28:27 PST 2006


Greetings Raith and Ebeam Communities:

I was able to arrange to have Dr. Freimut Reuther,  Technical Director 
for micro resist technology GmbH. Berlin, Germany to come to Stanford 
during his visit to the USA.  His visit will be tomorrow, Thursday March 
30, 2006 from 10 AM - 12 Noon in CIS 201. 

There will be a 40 minute presentation followed by discussions regarding 
products in development at micro resist technology GmbH.
Focus of the presentation will be Ormocers and Polymers that can be used 
for thermal nanoimprint lithography and negative tone resists for e-beam 
/ deep UV.

All interested parties within the Stanford Community are welcome to 
attend this meeting.
The conference room has been reserved through Noon for those wishing to 
continue technical discussions after his presentations.

Thank you for your interest in Ebeam Technologies here at Stanford 
Nanofabrication Facility.

James Conway
SNF
650-725-7075


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