From hungtao at stanford.edu Wed Nov 1 11:13:44 2006 From: hungtao at stanford.edu (Hung-Tao Chou) Date: Wed, 1 Nov 2006 11:13:44 -0800 Subject: done earlier, raith is free til 1pm Message-ID: <1162408424.4548f1e886bde@webmail.stanford.edu> From jwc at snf.stanford.edu Wed Nov 1 17:55:01 2006 From: jwc at snf.stanford.edu (James Conway) Date: Wed, 01 Nov 2006 17:55:01 -0800 Subject: JWC finished earlier than expected -- system is now available. Message-ID: <45494FF5.6010507@snf.stanford.edu> JWC finished earlier than expected -- RAITH 150 system is now available. Ran the system with no problems and a very tight beam spot at 20 kV for the entire afternoon. Please be careful on the Load Lock procedures this evening... Best, JWC From jwc at snf.stanford.edu Thu Nov 2 18:15:22 2006 From: jwc at snf.stanford.edu (James Conway) Date: Thu, 02 Nov 2006 18:15:22 -0800 Subject: I expect my exposure to complete about 19:10 hours or before. Message-ID: <454AA63A.8070206@snf.stanford.edu> Hello Zhangy and Raith Users: Today was a good day and we are likely to complete the EBL write early. If you desire to start earlier than your 20:00 hours reservation time please check on the system about 19:00 hours. All the best and good evening, James -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Thu Nov 2 18:20:36 2006 From: jwc at snf.stanford.edu (James Conway) Date: Thu, 02 Nov 2006 18:20:36 -0800 Subject: RAITH Status UPDATE Thursday Nov. 2, 2006-- Restrictions on acceleration voltage raised to: not to exceed 25 keV acceleration voltage. Message-ID: <454AA774.8000904@snf.stanford.edu> Greetings Raith Community: Today I successfully wrote at both 20 kV for the entire afternoon and then just performed an exposure at 25 keV acceleration voltage. No sudden increases in Gun section vacuum or other problems column were encountered. It is recommended that Users wish to work at above 20 kV first set to 20 kV and allow 5 minutes before increasing it further. Please run a Gun Monitor program during your session so I can evaluate the pressures should you run into any problems. Please call me immediately should you encounter an EHT trip that shuts down the Gun. (EHT Trip error no 519 on LEO server) Thank you for your support! Good Evening, James Conway -------------- next part -------------- An HTML attachment was scrubbed... URL: From zhangy at stanford.edu Thu Nov 2 23:09:09 2006 From: zhangy at stanford.edu (Yuan Zhang) Date: Thu, 2 Nov 2006 23:09:09 -0800 Subject: raith done earlier Message-ID: <1162537749.454aeb15cd1d0@webmail.stanford.edu> Next user may come and start your section now. Thanks, Yuan Yuan Zhang EE department From gyzhang at stanford.edu Fri Nov 3 11:22:20 2006 From: gyzhang at stanford.edu (Guangyu Zhang) Date: Fri, 3 Nov 2006 11:22:20 -0800 Subject: Raith reservation released from 8:30-12:00 tonight In-Reply-To: <1162537749.454aeb15cd1d0@webmail.stanford.edu> References: <1162537749.454aeb15cd1d0@webmail.stanford.edu> Message-ID: <1162581740.454b96ec95808@webmail.stanford.edu> Sample's not ready. Guangyu From dkozak at ucsc.edu Fri Nov 3 16:49:56 2006 From: dkozak at ucsc.edu (Dmitry Alexander Kozak) Date: Fri, 03 Nov 2006 16:49:56 -0800 Subject: Raith done early Message-ID: Done early. Machine should be good for next user. Dmitry From jwc at snf.stanford.edu Mon Nov 6 13:11:11 2006 From: jwc at snf.stanford.edu (James Conway) Date: Mon, 06 Nov 2006 13:11:11 -0800 Subject: ANNOUNCEMENT No. 2: RAITH Group XXII -- Intensive 4 day short course. NOVEMBER 7 - 10, 2006 TUESDAY - FRIDAY 10 AM - 6 PM Message-ID: <454FA4EF.9010104@snf.stanford.edu> *Greetings RAITH Group XXII:* * If you are listed in the To: section of this email you are confirmed to be in RAITH Group** XXII**. If you are listed in the CC: section of this email; I still am in need of further information or a commitment from you, and hope to add you in the next class. ** We wish to invite all interested parties to the Tuesday morning lecture session and demo layer one training following at 2 PM - 6 PM in the afternoon. All are also welcome to attend as observers the other 'hands-on' sessions through the week. All Users are also encouraged to join any Raith Champion when they are on the system to gain further exposure to the system. * *If you are listed in the To: section of this email: *This is your first reminder and confirmation of your commitment for attending the RAITH Group XXII Training course to be held NOVEMBER 7 - 10, 2006. The schedule follows along with a listing of Participants whom you will be working with as a Team. This will be an intensive four day workshop. _ *You are expected to attend all sessions in order to gain the experience and skills you will need to qualify on the RAITH 150 system.* _*NOTE:* *_There are prerequisites you must complete before attending this class:_* You must have recent relevant SEM and LITHO experience before your can sit for this class. Please see me directly during my office hour if you have any questions. *Be sure to bring examples of your best high resolution SEM work to the first class.** If you don't have the SEM experience you will be dropped from this class. *Please see me directly during my office hour if you have any questions. Users are also encouraged to attend the "Take a Spin with Me" class covering Ebeam Resist handling procedures. Next class is scheduled for Tuesday November 14, 2006 10:00 -13:00 hours in the SNF Cleanroom. There is a separate sign up for this class on the white board in my office at CIS 31. Thank you for your interest in Electron Beam Technologies at the Stanford Nanofabrication Facility, James Conway Ebeam Technology Group 650-725-7075 --------------------------------- * **RAITH Group** XXII** Schedule: ** * *Raith 150 Basic Users Training ? Intensive 4 Day Short Course* *November 07 - 10, 2006 from 10 - 6 PM Tuesday through Friday.* *The Plan of Action: *We will start out with a half day of lecture in the morning Tuesday; quickly moving into entirely 'hands on' operations training through the remainder of the week. We will break for lunch at various times, while the system is writing, so plan to be flexible with your other outside commitments. You should have started working on your GDS II patterns and preparing PMMA on your substrates if you wish to write on your material. Please bring your patterns and materials to the 'Hands-On' sessions. Some afternoons we may also be able to finish earlier, letting the system write on its own to the end of our reservations on the system.* * * Schedule:* Tuesday November 07, 2006: 10:00 - 12:15 Session 1: Basic Users Course Lecture -- CIS-X 201 14:00 - 17:00 Session 2: RAITH System Demonstration - Layer One -- EBEAM LAB CIS L104 Wednesday November 08, 2006: 10:00 - 12:30 Session 3: RAITH System Demonstration - Layer Two: OVERLAY -- EBEAM LAB CIS L104 14:00 - 18:00 Session 4: Hands On training session One -- EBEAM LAB CIS L104 Thursday November 09, 2006: 10:00 - 12:30 Session 5: Hands On training session Two -- EBEAM LAB CIS L104 14:00 - 18:00 Session 6: Hands On training session Three -- EBEAM LAB CIS L104 Friday November 10, 2006: 10:00 - 12:30 Session 7: Hands On training session Four -- EBEAM LAB CIS L104 14:00 - 18:00 Session 8: Hands On training session Five -- EBEAM LAB CIS L104 Individual Qualification Sessions will be held after this class so you can demonstrate your skill on the system to me and gain your login to the system. I WILL PROVIDE A CD AND PRINTED MATERIALS AT THE FIRST MEETING, IF YOU HAVE NOT ALREADY RECEIVED ONE YET. You can stop by my office hour and pick up a copy of these training materials during my daily office hour. (8:30 - 9:30 AM CIS 31) ------------------------------------------------------------------------------------------------------------------------------------------- *PARTICIPANTS IN RAITH GROUP XXII:* 1. Michelle Povinelli mpovinel at stanford.edu Coral: mpovinel Phone: 650 353-1832 Shan Hui Fan Group Project: Silicon Photonic crystals. 2. Deji Akinwande dejia at stanford.edu Coral: Dejia Phone: 703-623-6423 Phillip Wong Group Project: CNT for Transistors devices. 3. Gereon Meyer gereon at slac.stanford.edu Coral: gereon Phone: 510-486-6645 Stohr Group with the Spin Doctors on Magnetic ellipse patterns for storage. 4. Bing Dai bdai at stanford.edu Coral: bdai Phone: 650-862-9366 Pease Group, Project: Shot Noise test devices. 5. Filip Crnogorac filip at stanford.edu Coral: filip Phone: 650-796-9561 Pease Group, Project: Graphite Protection for 3-D IC's. Crystalline structures on amorphous substrates. 6. Dawei Zhang zhangdw at stanford.edu Coral: zhangdw Phone: (650)-796-6166 Nishi Group Project: CMOS transistor devices MOM. *Observers in RAITH Group XXIII waiting to fill participant slots that open in RAITH GROUP XXII class:* 1. Van Dorpe Pol pvandorp at imec.be Coral: sikola at fme.vutbr.cz Phone: 650-391-5549 Brongersma Group Project: Plasmonic Tunnel Junctions 2. Tom?? ?IKOLA sikola at fme.vutbr.cz Coral: ____ Phone: 650-723-5840 Brongersma Group Project: Pico Antennas 3 Anu Chandran chandran at stanford.edu Coral: anu Phone: 650-796-7160 Brongersma Group Project: Plasmonic Tunnel Junction device 4. Hesaam Esfandyarpour Coral: hesaam Phone: 650-387-6072 c Pease Group - Project: Thermo-sequencing -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: not available Type: image/gif Size: 384 bytes Desc: not available URL: From jwc at snf.stanford.edu Tue Nov 7 09:05:49 2006 From: jwc at snf.stanford.edu (James Conway) Date: Tue, 07 Nov 2006 09:05:49 -0800 Subject: REMINDER: RAITH Group XXII -- Intensive 4 day short course. NOVEMBER 7 - 10, 2006 TUESDAY - FRIDAY 10 AM - 6 PM Need a laptop! Message-ID: <4550BCED.4090306@snf.stanford.edu> *Good Morning, If anyone has a laptop we could use for the class lecture session this morning that would be great. The laptop that I normally use was check out this morning before I could get to it. See you at 10 in CIS 201... All the best, James Conway Greetings RAITH Group XXII:* * If you are listed in the To: section of this email you are confirmed to be in RAITH Group** XXII**. If you are listed in the CC: section of this email; I still am in need of further information or a commitment from you, and hope to add you in the next class. ** We wish to invite all interested parties to the Tuesday morning lecture session and demo layer one training following at 2 PM - 6 PM in the afternoon. All are also welcome to attend as observers the other 'hands-on' sessions through the week. All Users are also encouraged to join any Raith Champion when they are on the system to gain further exposure to the system. * *If you are listed in the To: section of this email: *This is your first reminder and confirmation of your commitment for attending the RAITH Group XXII Training course to be held NOVEMBER 7 - 10, 2006. The schedule follows along with a listing of Participants whom you will be working with as a Team. This will be an intensive four day workshop. _ *You are expected to attend all sessions in order to gain the experience and skills you will need to qualify on the RAITH 150 system.* _*NOTE:* *_There are prerequisites you must complete before attending this class:_* You must have recent relevant SEM and LITHO experience before your can sit for this class. Please see me directly during my office hour if you have any questions. *Be sure to bring examples of your best high resolution SEM work to the first class.** If you don't have the SEM experience you will be dropped from this class. *Please see me directly during my office hour if you have any questions. Users are also encouraged to attend the "Take a Spin with Me" class covering Ebeam Resist handling procedures. Next class is scheduled for Tuesday November 14, 2006 10:00 -13:00 hours in the SNF Cleanroom. There is a separate sign up for this class on the white board in my office at CIS 31. Thank you for your interest in Electron Beam Technologies at the Stanford Nanofabrication Facility, James Conway Ebeam Technology Group 650-725-7075 --------------------------------- * **RAITH Group** XXII** Schedule: ** * *Raith 150 Basic Users Training ? Intensive 4 Day Short Course* *November 07 - 10, 2006 from 10 - 6 PM Tuesday through Friday.* *The Plan of Action: *We will start out with a half day of lecture in the morning Tuesday; quickly moving into entirely 'hands on' operations training through the remainder of the week. We will break for lunch at various times, while the system is writing, so plan to be flexible with your other outside commitments. You should have started working on your GDS II patterns and preparing PMMA on your substrates if you wish to write on your material. Please bring your patterns and materials to the 'Hands-On' sessions. Some afternoons we may also be able to finish earlier, letting the system write on its own to the end of our reservations on the system.* * * Schedule:* Tuesday November 07, 2006: 10:00 - 12:15 Session 1: Basic Users Course Lecture -- CIS-X 201 14:00 - 17:00 Session 2: RAITH System Demonstration - Layer One -- EBEAM LAB CIS L104 Wednesday November 08, 2006: 10:00 - 12:30 Session 3: RAITH System Demonstration - Layer Two: OVERLAY -- EBEAM LAB CIS L104 14:00 - 18:00 Session 4: Hands On training session One -- EBEAM LAB CIS L104 Thursday November 09, 2006: 10:00 - 12:30 Session 5: Hands On training session Two -- EBEAM LAB CIS L104 14:00 - 18:00 Session 6: Hands On training session Three -- EBEAM LAB CIS L104 Friday November 10, 2006: 10:00 - 12:30 Session 7: Hands On training session Four -- EBEAM LAB CIS L104 14:00 - 18:00 Session 8: Hands On training session Five -- EBEAM LAB CIS L104 Individual Qualification Sessions will be held after this class so you can demonstrate your skill on the system to me and gain your login to the system. I WILL PROVIDE A CD AND PRINTED MATERIALS AT THE FIRST MEETING, IF YOU HAVE NOT ALREADY RECEIVED ONE YET. You can stop by my office hour and pick up a copy of these training materials during my daily office hour. (8:30 - 9:30 AM CIS 31) ------------------------------------------------------------------------------------------------------------------------------------------- *PARTICIPANTS IN RAITH GROUP XXII:* 1. Michelle Povinelli mpovinel at stanford.edu Coral: mpovinel Phone: 650 353-1832 Shan Hui Fan Group Project: Silicon Photonic crystals. 2. Deji Akinwande dejia at stanford.edu Coral: Dejia Phone: 703-623-6423 Phillip Wong Group Project: CNT for Transistors devices. 3. Gereon Meyer gereon at slac.stanford.edu Coral: gereon Phone: 510-486-6645 Stohr Group with the Spin Doctors on Magnetic ellipse patterns for storage. 4. Bing Dai bdai at stanford.edu Coral: bdai Phone: 650-862-9366 Pease Group, Project: Shot Noise test devices. 5. Filip Crnogorac filip at stanford.edu Coral: filip Phone: 650-796-9561 Pease Group, Project: Graphite Protection for 3-D IC's. Crystalline structures on amorphous substrates. 6. Dawei Zhang zhangdw at stanford.edu Coral: zhangdw Phone: (650)-796-6166 Nishi Group Project: CMOS transistor devices MOM. *Observers in RAITH Group XXIII waiting to fill participant slots that open in RAITH GROUP XXII class:* 1. Van Dorpe Pol pvandorp at imec.be Coral: sikola at fme.vutbr.cz Phone: 650-391-5549 Brongersma Group Project: Plasmonic Tunnel Junctions 2. Tom?? ?IKOLA sikola at fme.vutbr.cz Coral: ____ Phone: 650-723-5840 Brongersma Group Project: Pico Antennas 3 Anu Chandran chandran at stanford.edu Coral: anu Phone: 650-796-7160 Brongersma Group Project: Plasmonic Tunnel Junction device 4. Hesaam Esfandyarpour Coral: hesaam Phone: 650-387-6072 c Pease Group - Project: Thermo-sequencing -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: not available Type: image/gif Size: 384 bytes Desc: not available URL: From jwc at snf.stanford.edu Tue Nov 7 09:27:47 2006 From: jwc at snf.stanford.edu (James Conway) Date: Tue, 07 Nov 2006 09:27:47 -0800 Subject: 2nd ANNOUNCEMENT: "Take A Spin with Me" -- Ebeam Resist Handling Training on the Headway. Tuesday November 14, 2006 10:00 - 13:00 Message-ID: <4550C213.9070409@snf.stanford.edu> *ANNOUNCEMENT No. 2: "Take A Spin with Me" -- Ebeam Resist Handling Training on the Headway Coater. * Greetings Ebeam Lab Users, I will be conducting my monthly *"Take A Spin with Me" *training class next Tuesday November 14, 2006 from 10 AM - 1 PM. This is a great opportunity for you to get acquainted with the specific points to employ when working with our Ebeam Resist materials in order to obtain high quality thin film coatings over your wafers for Electron Beam, Scanning Probe (SPL), and optical Nano-Lithography. In these applications accurate control of Polymer thickness is important in order to obtain consistent high quality lithography results. We will be conducting this training on the Headway2 spin coater and users attending this session will gain their qualification on this tool. Schedule of Events: 10 - 11:00 I will start with substrate cleans on WET BENCH NONMETAL performing Pirhana substrate cleans and HF etching of the intrinsic native oxide on Silicon wafers. All users are encouraged to have their substrates cleaned and ready to go for spinning by the session time; either coming out of the 150 degree Singe oven, or if you are working on oxides or nitrides, coming out of the YES HMDS Prime oven. 11:00 - 12:30 We can apply what ever resist system you desire for your work. 12:30 - 1:00 Thin Film Measurements on the Nanospec Thin Film Analyzer All interested parties are welcome to attend this session. No need to reply to this email -- just show up! Thank you for your interest in Ebeam Technologies here at Stanford Nanofabrication Facility, James W. Conway Ebeam Technology Group Stanford Nanofabrication Facility 650-725-7075 office hour M-F 8:30 - 9:30 AM CIS 31 -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Tue Nov 7 09:31:10 2006 From: jwc at snf.stanford.edu (James Conway) Date: Tue, 07 Nov 2006 09:31:10 -0800 Subject: SPECIAL EBEAM LAB EVENT:"'3D EBL applications for UV Nano Imprint Lithography" Guido Piaszenski, Raith GmbH, Dortmund, DE. MONDAY NOV. 13 from 2 - 3 PM in CIS 101 Message-ID: <4550C2DE.7050608@snf.stanford.edu> *ANNOUNCEMENT OF A SPECIAL EBEAM LAB EVENT* *Monday November 13, 2006 2 - 3 PM CIS 101:* *"3D EBL Applications for UV Nano Imprint Lithography." * Guido Piaszenski from Raith GmbH in Dortmund, Germany has graciously offered to visit the Stanford Nanofabrication Facility and present his group's work which he will also be presenting at the NNT2006 conference in San Francisco later that week. He received his PhD in 2002 at the Ruhr-University of Bochum, Germany working with Professor U.K. K?hler. In 2003 he started working in the application department at Raith GmbH in Dortmund Germany developing, testing, and supporting Users working on the Raith Electron Beam Lithography Software applications. This meeting is open to Everyone whom wishes to attend: 2 - 3 PM CIS 101: Presentation followed by Q&A from attendees. 3 - 4:30 PM CIS 201: Technical Discussion on NIL and Ebeam Lithography topics. Abstract: Please feel free to forward this email to people of interest within the Stanford Community. -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: not available Type: image/jpeg Size: 104832 bytes Desc: not available URL: From cvenky at stanford.edu Tue Nov 7 20:54:08 2006 From: cvenky at stanford.edu (Venkatesh Chembrolu) Date: Tue, 7 Nov 2006 20:54:08 -0800 Subject: Raith free 5-10am Message-ID: <1162961648.455162f02b12d@webmail.stanford.edu> Headway is down, could not spin resist.... From jwc at snf.stanford.edu Thu Nov 9 18:14:29 2006 From: jwc at snf.stanford.edu (James Conway) Date: Thu, 09 Nov 2006 18:14:29 -0800 Subject: our write may be finished earlier than expected we will not need the additional time available In-Reply-To: <001c01c701ec$654b93f0$dc2342ab@PAN> References: <001c01c701ec$654b93f0$dc2342ab@PAN> Message-ID: <4553E085.30408@snf.stanford.edu> Jun Pan, The write just finished if you wish to start early. Best, James Jun Pan wrote: > > Hi James, > > > > I also got the same problem that the original dose is not enough to > clear the 140nm holes. I will check the new dose and let you know the > difference. > > > > PS1: The lab seems out of Remover PG now. > > PS2: I notice the title bar in Raith software becomes gold, and the > desktop icon is a little bit different. Did you update the Raith > software, or just change the appearance? > > > > Regards, > > Jun Pan > -------------- next part -------------- An HTML attachment was scrubbed... URL: From ifushman at stanford.edu Thu Nov 9 22:52:47 2006 From: ifushman at stanford.edu (Ilya Fushman) Date: Thu, 9 Nov 2006 22:52:47 -0800 Subject: cancelled res Message-ID: <28bfad130611092252n732f09acp8356b92aaf0f062e@mail.gmail.com> sorry sample nto ready From jwc at snf.stanford.edu Fri Nov 10 08:32:44 2006 From: jwc at snf.stanford.edu (James Conway) Date: Fri, 10 Nov 2006 08:32:44 -0800 Subject: REMINDER MONDAY NOV. 13 from 2 - 3 PM in CIS 101: EBEAM LAB EVENT:"'3D EBL applications for UV Nano Imprint Lithography" Guido Piaszenski, Raith GmbH, Dortmund, DE. Message-ID: <4554A9AC.4090308@snf.stanford.edu> *ANNOUNCEMENT OF A SPECIAL EBEAM LAB EVENT* *Monday November 13, 2006 2 - 3 PM CIS 101:* *"3D EBL Applications for UV Nano Imprint Lithography." * Guido Piaszenski from Raith GmbH in Dortmund, Germany has graciously offered to visit the Stanford Nanofabrication Facility and present his group's work which he will also be presenting at the NNT2006 conference in San Francisco later that week. He received his PhD in 2002 at the Ruhr-University of Bochum, Germany working with Professor U.K. K?hler. In 2003 he started working in the application department at Raith GmbH in Dortmund Germany developing, testing, and supporting Users working on the Raith Electron Beam Lithography Software applications. This meeting is open to Everyone whom wishes to attend: 2 - 3 PM CIS 101: Presentation followed by Q&A from attendees. 3 - 4:30 PM CIS 201: Technical Discussion on NIL and Ebeam Lithography topics. Abstract: Please feel free to forward this email to people of interest within the Stanford Community. -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: not available Type: image/jpeg Size: 104832 bytes Desc: not available URL: From jwc at snf.stanford.edu Fri Nov 10 09:33:08 2006 From: jwc at snf.stanford.edu (James Conway) Date: Fri, 10 Nov 2006 09:33:08 -0800 Subject: 2nd ANNOUNCEMENT: "Take A Spin with Me" -- Ebeam Resist Handling Training on the Headway. Tuesday November 14, 2006 10:00 - 13:00 Message-ID: <4554B7D4.9050306@snf.stanford.edu> *ANNOUNCEMENT: "Take A Spin with Me" -- Ebeam Resist Handling Training on the Headway Coater. * Greetings Ebeam Lab Users, I will be conducting my monthly *"Take A Spin with Me" *training class next Tuesday November 14, 2006 from 10 AM - 1 PM. This is a great opportunity for you to get acquainted with the specific points to employ when working with our Ebeam Resist materials in order to obtain high quality thin film coatings over your wafers for Electron Beam, Scanning Probe (SPL), and optical Nano-Lithography. In these applications accurate control of Polymer thickness is important in order to obtain consistent high quality lithography results. We will be conducting this training on the Headway2 spin coater and users attending this session will gain their qualification on this tool. Schedule of Events: 10 - 11:00 I will start with substrate cleans on WET BENCH NONMETAL performing Pirhana substrate cleans and HF etching of the intrinsic native oxide on Silicon wafers. All users are encouraged to have their substrates cleaned and ready to go for spinning by the session time; either coming out of the 150 degree Singe oven, or if you are working on oxides or nitrides, coming out of the YES HMDS Prime oven. 11:00 - 12:30 We can apply what ever resist system you desire for your work. 12:30 - 1:00 Thin Film Measurements on the Nanospec Thin Film Analyzer All interested parties are welcome to attend this session. No need to reply to this email -- just show up! Thank you for your interest in Ebeam Technologies here at Stanford Nanofabrication Facility, James W. Conway Ebeam Technology Group Stanford Nanofabrication Facility 650-725-7075 office hour M-F 8:30 - 9:30 AM CIS 31 -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwconway at stanford.edu Fri Nov 10 11:12:35 2006 From: jwconway at stanford.edu (James Conway) Date: Fri, 10 Nov 2006 11:12:35 -0800 Subject: Notice on reports of differences in the 5% 950K PMMA -A spin thicknesses. Message-ID: <1163185955.4554cf2347d74@webmail.stanford.edu> Greetings, On the most recent batch of 2% 950K MW PMMA in anisole delivered from Microchem I have been alerted to a change in the spin speed to film thickness characteristic. This may also be the reason that one user have reported a change in the dose to clear having increased slightly. Request that all users to be vigilant, to carefully measure their thin films after spinning and soft bake, and to report their thickness and dose to clear determinations to the beamtools at snf.stanford.edu mail list. I have inspected the bottle in the Lab and it appears normal with no evident gelation or solids having been formed. Viscousity appears also to be normal. I will be calling microchem in Mass. to see if they have other people reporting any changes in their material. From jwconway at stanford.edu Fri Nov 10 11:18:49 2006 From: jwconway at stanford.edu (James Conway) Date: Fri, 10 Nov 2006 11:18:49 -0800 Subject: ZEP-520A found in solvent cabinet this morning. Must be refrigerated! Message-ID: <1163186329.4554d099121f4@webmail.stanford.edu> Hello I just found the ZEP-520A bottle in the PMMA tub in the Left Hand solvent cabinet. This material must be refrigerated!!! If it is left out for a significant period of time it will gelate and no longer be useful in your processing. It cannot be suitably stored at room temperature.(RT) This is also a very expensive engineering material costing more than 15.00/ml. This bottle is only a week old! I am asking the User whom removed this from the refrigerator to please reply back to jwc at snf.stanford.edu and let me know when it was removed from the refrigerator. It may simply be that someone removed it in the last hour to warm up to RT before spinning -- but I could not locate you in the cleanroom. Thank you, James Conway From jwc at snf.stanford.edu Mon Nov 13 11:21:30 2006 From: jwc at snf.stanford.edu (James Conway) Date: Mon, 13 Nov 2006 11:21:30 -0800 Subject: SPECIAL EVENT TODAY:"'3D EBL applications for UV Nano Imprint Lithography" Guido Piaszenski, Raith GmbH, Dortmund, DE. MONDAY NOV. 13 from 2 - 3 PM in CIS 101 Message-ID: <4558C5BA.6020407@snf.stanford.edu> *ANNOUNCEMENT OF A SPECIAL EBEAM LAB EVENT* *Monday November 13, 2006 2 - 3 PM CIS 101:* *"3D EBL Applications for UV Nano Imprint Lithography." * Guido Piaszenski from Raith GmbH in Dortmund, Germany has graciously offered to visit the Stanford Nanofabrication Facility and present his group's work which he will also be presenting at the NNT2006 conference in San Francisco later that week. He received his PhD in 2002 at the Ruhr-University of Bochum, Germany working with Professor U.K. K?hler. In 2003 he started working in the application department at Raith GmbH in Dortmund Germany developing, testing, and supporting Users working on the Raith Electron Beam Lithography Software applications. This meeting is open to Everyone whom wishes to attend: 2 - 3 PM CIS 101: Presentation followed by Q&A from attendees. 3 - 4:30 PM CIS 201: Technical Discussion on NIL and Ebeam Lithography topics. Abstract: Please feel free to forward this email to people of interest within the Stanford Community. -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: not available Type: image/jpeg Size: 104832 bytes Desc: not available URL: From bcgierhart at ucdavis.edu Mon Nov 13 16:39:41 2006 From: bcgierhart at ucdavis.edu (Brian Gierhart) Date: Mon, 13 Nov 2006 16:39:41 -0800 (PST) Subject: raith done early Message-ID: <200611140039.kAE0dfeL000595@citheronia.ucdavis.edu> Raith free now until 6pm From jwc at snf.stanford.edu Tue Nov 14 09:11:12 2006 From: jwc at snf.stanford.edu (James Conway) Date: Tue, 14 Nov 2006 09:11:12 -0800 Subject: Reminder to the SNF NIL team: Friemut Reuther from micro resist will be visiting Tuesday 11-14-06 Message-ID: <4559F8B0.3010804@snf.stanford.edu> Greetings NIL Team and Raith Users interested in NIL, Friemut Reuther from Microresist.de in Berlin, Germany will be making a brief visit to SNF Today ( Tuesday 11-14-06.) We will be meeting at 1:00 for a quick lunch and then return to SNF in CIS 101 from about 1:30 - 2:30 to 3:00 PM. This continues discussions we started on their last visit to SNF. All interested SNF parties are welcome and I hope that all SNF NIL team members can join me for an hour or so to join in our discussions. I am most interested in learning more about the low molecular weight PMMA's and mold release materials that Microresist offers to employ in our NIL efforts. Please join us at 1:30 in CIS 101, James Conway -------- Original Message -------- Subject: Re: micro resist Visit on 14 November? Date: Fri, 10 Nov 2006 08:48:36 -0800 From: James Conway Organization: Stanford Nanofabrication Facility - Stanford University To: Freimut Reuther CC: James Conway References: <000701c70357$b41f3290$2901000a at mrt.local> <455369DC.6090507 at snf.stanford.edu> <001701c704d6$8f556800$2901000a at mrt.local> Hello Friemut Reuther, It would be great to have you come and meet with the NIL team here at SNF next week. We have been a bit slow /'getting out of the starting gates'/ in our SNF NIL efforts, but as the end of the year approaches I am getting our molds in Quartz fabricated and we will be ready to start using our NIL system to imprint test structures and some simple devices. In specific I would like to discuss with you further details of the low molecular weight PMMA's that Microchem offers, and to assist us with selecting the most appropriate material for our initial trials. There is also great interest in learning more about mold release layers and various surface treatments for our NIL stamp masters. Looking forward to meeting with you next Tuesday afternoon. If it is possible I would desire to begin with a quick lunch at 1 PM as I am teaching a class in the SNF Cleanroom from 10 AM - 1 PM. I will likely finish with these students between 12:30 and 12:45 PM. We then can start discussions with all interested SNF and Stanford parties at ~ 1:30 PM. I have a room reserved from 1:30 - 3:00 PM. (CIS 101) Please call me on my cell phone at 001-415-412-4825 upon your arrival, and/or page me out of the SNF Cleanroom on the RED Phones at the lab entryway. Safe travels this weekend on your flight to America. Thank you, James Conway Freimut Reuther wrote: > > Hello James, > > > > Thank you for the kind response. I have considered about one hour > talks and discussions about polymers and/ or resists, which are or can > be interesting for you. I have not polanned to give a presentation. > That would be much of repetition of things we already presented. May > be we can plan such a meeting in February 2007 before the SPIE > conference, if you think it would make sense. Thank you for reserving > a conference room, but I think this is not required. I wonder whether > you have specific requests. We will visit another group in Silicon > Valley on Wednesday 15 November. So if possible I would come to you at > 11:30. Please let me know. > > > Best wishes > Freimut > > ----------------------------------------------------------------------- > Dr. Freimut Reuther > Technical Director/ Technischer Leiter > > micro resist technology GmbH > Koepenicker Str. 325 > 12555 Berlin > GERMANY > > phone: +49 30 6576 2192 > fax: +49 30 6576 2193 > email: f.reuther at microresist.de > internet: www.microresist.de > > > > ----- Original Message ----- > *From:* James Conway > *To:* Freimut Reuther > *Cc:* Piaszenski, Guido ; Mahnaz > Mansourpour > *Sent:* Thursday, November 09, 2006 6:48 PM > *Subject:* Re: Microchem Visit on 14 November? > > Greetings Freimut, > > I would be happy to host you here at SNF. This is a busy week for > everyone and we will have a few visitors. I will also have Guido > Piaszenski from RAITH GmbH in Dortmund here at that time. Please > come and join us for lunch starting at your choice of either 11:30 > or Noon and following that I have reserved a conference room for > 13:30 - 15:00 hours for your presentation if you desire to give an > update and top facilitate further discussions on EBL and NIL > resist systems. > > Please reply to me ASAP confirm and I will send out an meeting > announcement. Look forward to meeting with you again. > > All the Best, > > James Conway > > > Freimut Reuther wrote: >> Hello James, >> >> >> >> How are you? >> >> We very recently decided that I attend the NNT in San Francisco >> next week. I would like to take the opportunity to visit you and >> give you an update of our developments and of course learn from >> you, whether there is some further interest in our resists and >> polymers. We sent you some samples for testing. I would be happy >> about your feedback. As far as I can see now I could come on >> Tuesday 14 November between about noon and 3 p.m. Please let me >> know if you are interested in the talks. >> >> >> Best wishes >> Freimut >> >> ----------------------------------------------------------------------- >> >> Dr. Freimut Reuther >> Technical Director/ Technischer Leiter >> >> micro resist technology GmbH >> Koepenicker Str. 325 >> 12555 Berlin >> GERMANY >> >> phone: +49 30 6576 2192 >> fax: +49 30 6576 2193 >> email: f.reuther at microresist.de >> internet: www.microresist.de >> >> >> -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Tue Nov 14 09:14:13 2006 From: jwc at snf.stanford.edu (James Conway) Date: Tue, 14 Nov 2006 09:14:13 -0800 Subject: REMINDER: "Take A Spin with Me" -- Ebeam Resist Handling Training on the Headway. today Tuesday November 14, 2006 10:00 - 13:00 Message-ID: <4559F965.8070809@snf.stanford.edu> *ANNOUNCEMENT: "Take A Spin with Me" -- Ebeam Resist Handling Training on the Headway Coater. * Greetings Ebeam Lab Users, I will be conducting my monthly *"Take A Spin with Me" *training class TODAY Tuesday November 14, 2006 from 10 AM - 1 PM. This is a great opportunity for you to get acquainted with the specific points to employ when working with our Ebeam Resist materials in order to obtain high quality thin film coatings over your wafers for Electron Beam, Scanning Probe (SPL), and optical Nano-Lithography. In these applications accurate control of Polymer thickness is important in order to obtain consistent high quality lithography results. We will be conducting this training on the Headway2 spin coater and users attending this session will gain their qualification on this tool. Schedule of Events: 10 - 11:00 I will start with substrate cleans on WET BENCH NONMETAL performing Pirhana substrate cleans and HF etching of the intrinsic native oxide on Silicon wafers. All users are encouraged to have their substrates cleaned and ready to go for spinning by the session time; either coming out of the 150 degree Singe oven, or if you are working on oxides or nitrides, coming out of the YES HMDS Prime oven. 11:00 - 12:30 We can apply what ever resist system you desire for your work. 12:30 - 1:00 Thin Film Measurements on the Nanospec Thin Film Analyzer All interested parties are welcome to attend this session. No need to reply to this email -- just show up! Thank you for your interest in Ebeam Technologies here at Stanford Nanofabrication Facility, James W. Conway Ebeam Technology Group Stanford Nanofabrication Facility 650-725-7075 office hour M-F 8:30 - 9:30 AM CIS 31 -------------- next part -------------- An HTML attachment was scrubbed... URL: From kimsangb at stanford.edu Tue Nov 14 22:10:09 2006 From: kimsangb at stanford.edu (SangBum Kim) Date: Tue, 14 Nov 2006 22:10:09 -0800 Subject: raith free from 9:00 AM to 2:00 PM Message-ID: <000b01c7087c$b4a53000$a9b50c80@sangbumhome> Sample not ready. Sorry for late notice. -------------- next part -------------- An HTML attachment was scrubbed... URL: From gyzhang at stanford.edu Thu Nov 16 14:39:52 2006 From: gyzhang at stanford.edu (gyzhang at stanford.edu) Date: Thu, 16 Nov 2006 14:39:52 -0800 Subject: Raith free tonight 8:30-11:30 In-Reply-To: <1162537749.454aeb15cd1d0@webmail.stanford.edu> References: <1162537749.454aeb15cd1d0@webmail.stanford.edu> Message-ID: <20061116143952.5f0x5w821q84wccc@webmail.stanford.edu> Sample is not ready. Sorry for the late notice. Guangyu Quoting Yuan Zhang : > Next user may come and start your section now. > > Thanks, > Yuan > > Yuan Zhang > EE department > From jwconway at stanford.edu Fri Nov 17 12:59:11 2006 From: jwconway at stanford.edu (James Conway) Date: Fri, 17 Nov 2006 12:59:11 -0800 Subject: beam current decrease? Message-ID: <1163797151.455e229fc5eb9@webmail.stanford.edu> Hello SangBum and RAITH Users: GREAT QUESTION for the raith at snf.stanford.edu discussion list. Yes -- The beam current (I beam)is lower than it was with the old FE-Gun tip. We have been driving this FE-Gun since its installation at the factory recommended settings conditioning and running in the FE-GUN tip. This conditioning has now been nearly completed and I am seeing stable emission and great vacuum in Gun section of the column. Emission current of the gun is in fact still slowly increasing through the last ten days and has gone from 0.122 nA to 0.133 nA. As that I have been unable to get ZEISS Field service to make an appointment, send an experienced engineer to SNF, to increase the Extraction Voltage and Filament Current on the FE-Gun to optimal Raith EBL values -- I will be carefully doing this myself in small stages through the next week before Thanksgiving. My target values are 0.200 - 0.225 nA at 10 keV and 30 um aperture. I have max. limits to the extraction voltage and filament currents that I can drive the FE-gun to in order to not burn it away or round out the tip geometry. YOU DO NOT HAVE TO CHANGE DOSE AS YOU WILL ADJUST THE DWELL TIME OF THE EXPOSURE TO MEET THE DOSE REQUEST IN YOUR EXPOSURE. Remember that the area step is your dependent variable, the dose is a fixed value, and the dwell time is the independent variable in your exposure settings. Hope this answers your question and if others would desire to add to this thread just reply to raith at snf.stanford.edu. ALL replies to JWC should ALWAYS go to jwc at snf.stanford.edu and NOT to my web mail account that I am sending this message from. Have a great Day! James Conway Quoting SangBum Kim : > Dear all, > > > > I have a question about the status of Raith. I noticed that the beam > current is about 0.12nA instead of 0.18nA that I used to get a few month > ago. Can this be a problem? For example, should I change the dose? > > > > Thanks, > > SangBum > > From hungtao at stanford.edu Fri Nov 17 15:23:01 2006 From: hungtao at stanford.edu (Hung-Tao Chou) Date: Fri, 17 Nov 2006 15:23:01 -0800 Subject: raith free 11-3pm Saturday Message-ID: <1163805781.455e4455c8f09@webmail.stanford.edu> My Sample is not ready. -Hungtao From makarova at stanford.edu Fri Nov 17 15:30:30 2006 From: makarova at stanford.edu (Maria Makarova) Date: Fri, 17 Nov 2006 15:30:30 -0800 Subject: raith free 11-3pm Saturday In-Reply-To: <1163805781.455e4455c8f09@webmail.stanford.edu> References: <1163805781.455e4455c8f09@webmail.stanford.edu> Message-ID: I will take it Maria Makarova Edward L. Ginzton Laboratory Stanford University (650) 723-2279 On Nov 17, 2006, at 3:23 PM, Hung-Tao Chou wrote: > My Sample is not ready. > > -Hungtao > -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Mon Nov 20 17:33:35 2006 From: jwc at snf.stanford.edu (James Conway) Date: Mon, 20 Nov 2006 17:33:35 -0800 Subject: Please remove all items from Ebeam Lab Drybox by December 1, 2006 -- NO STORAGE OF SAMPLES IN THIS DRYBOX IN DECEMBER. Message-ID: <4562576F.4060001@snf.stanford.edu> Greetings: All Users are requested to check the Ebeam Lab dry box for lost and missing samples as well as to remove all of your in process Ebeam samples from this dry box. December 1, 2006 all samples remaining will be removed and thrown away. Users are reminded that this dry box is not really dry and is not to be used for long term storage of samples in the Ebeam Lab. Only samples that are in-process and will be exposed within 24 hours are to be stored there. NO samples are to be stored in this area from December 1 through January 3, 2006 so we can clean out this box as part of our annual Lab cleanup. ALL Users are also requested to take a moment out of their tasking in the ebeam lab and assist us in cleaning up the lab of excess debris, archived manuals, and assist us by manually wiping down surfaces of the keyboards, counters and desk with IPA. Please help us keep this and other areas of the SNF clean room clean and ready for the next user. Thank you for your support! James Conway -------------- next part -------------- An HTML attachment was scrubbed... URL: From xwyu at slac.stanford.edu Wed Nov 22 19:10:48 2006 From: xwyu at slac.stanford.edu (Yu, Xiaowei) Date: Wed, 22 Nov 2006 19:10:48 -0800 Subject: Raith Reservation canceled: tomorrow 8am to 1pm Message-ID: Sorry for the short notice. Sample is not ready. Best, Xiaowei From rohank at stanford.edu Wed Nov 22 19:41:57 2006 From: rohank at stanford.edu (Rohan D Kekatpure) Date: Wed, 22 Nov 2006 19:41:57 -0800 Subject: Raith Reservation canceled: tomorrow 8am to 1pm In-Reply-To: References: Message-ID: <45651885.5080307@stanford.edu> I took it. Thanks. I have released the slot on Saturday 14:30-18:30 Yu, Xiaowei wrote: > Sorry for the short notice. Sample is not ready. > > Best, > Xiaowei > -- Rohan D. Kekatpure Ph.D. Candidate (Electrical Engg) Geballe Laboratory of Advanced Materials Stanford University, Stanford, CA 94305 Work: (650)723-4874 Cell: (650)387-7968 "It's easy to guess how big the Compton wavelength is using the knowledge that it depends only on the mass of the electron, relativity and quantum mechanics." - John Baez in Length Scales in Physics (2005) From sukruekinkocabas at stanford.edu Fri Nov 24 16:01:46 2006 From: sukruekinkocabas at stanford.edu (S. Ekin Kocabas) Date: Fri, 24 Nov 2006 16:01:46 -0800 Subject: Raith free Tomorrow 10-14 In-Reply-To: <1163805781.455e4455c8f09@webmail.stanford.edu> References: <1163805781.455e4455c8f09@webmail.stanford.edu> Message-ID: <456787EA.8050704@stanford.edu> Need to solve issues with overlay alignment... Ekin -------------- next part -------------- A non-text attachment was scrubbed... Name: smime.p7s Type: application/x-pkcs7-signature Size: 5218 bytes Desc: S/MIME Cryptographic Signature URL: From bdai at stanford.edu Fri Nov 24 17:14:27 2006 From: bdai at stanford.edu (Bing Dai) Date: Fri, 24 Nov 2006 17:14:27 -0800 Subject: Raith free Tomorrow 10-14 In-Reply-To: <456787EA.8050704@stanford.edu> References: <1163805781.455e4455c8f09@webmail.stanford.edu> <456787EA.8050704@stanford.edu> Message-ID: <1164417267.456798f37f0cc@webmail.stanford.edu> I'll take it. Thanks. Bing Quoting "S. Ekin Kocabas" : > Need to solve issues with overlay alignment... > > Ekin > -- Bing Dai Applied Physics Department CISX B103, 420 Via Palou, Stanford, CA 94305 (650) 723 4566 From bdai at stanford.edu Fri Nov 24 17:39:31 2006 From: bdai at stanford.edu (Bing Dai) Date: Fri, 24 Nov 2006 17:39:31 -0800 Subject: Raith time 830am to 12pm released this Sunday Message-ID: <1164418771.45679ed3076d5@webmail.stanford.edu> Moved to this Saturday afternoon. Thanks. -- Bing Dai Applied Physics Department CISX B103, 420 Via Palou, Stanford, CA 94305 (650) 723 4566 From sukruekinkocabas at stanford.edu Mon Nov 27 12:49:02 2006 From: sukruekinkocabas at stanford.edu (S. Ekin Kocabas) Date: Mon, 27 Nov 2006 12:49:02 -0800 Subject: Reservation removed tomorrow 6-9am Message-ID: <456B4F3E.4020404@stanford.edu> Tuesday 6-9am free on Raith. Ekin -------------- next part -------------- A non-text attachment was scrubbed... Name: smime.p7s Type: application/x-pkcs7-signature Size: 5218 bytes Desc: S/MIME Cryptographic Signature URL: From jwc at snf.stanford.edu Tue Nov 28 17:57:18 2006 From: jwc at snf.stanford.edu (James Conway) Date: Tue, 28 Nov 2006 17:57:18 -0800 Subject: reservation policy? In-Reply-To: <4569B55F.4070902@stanford.edu> References: <4569B55F.4070902@stanford.edu> Message-ID: <456CE8FE.6020702@snf.stanford.edu> Hello Raith Users and Rohan K. I am never surprised by the resourcefulness if our students on the RAITH! Dun Wei Zhang is a brand new user on the system just last week. Clearly this is not within the guidelines we have established for reservations made on CORAL for the RAITH 150 system. Dun Wei Zhang, aka Zhangdw: Please -- you must make your reservations for a continuous sessions and cannot should not make them for partial sessions to gain a larger block of time on the system. Thank you, James Conway Rohan D Kekatpure wrote: > Dear James, > > I am looking at Raith reservation as of 0800 hrs on Sunday 11/26. The > reservation of the user "zhangdw" seems a bit odd to me. Are we > allowed to make reservations like that? Please have a look at the > attached file. > > -rohan > > ------------------------------------------------------------------------ > -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: not available Type: image/bmp Size: 2359350 bytes Desc: not available URL: From zhangdw at stanford.edu Wed Nov 29 01:29:56 2006 From: zhangdw at stanford.edu (zhang dawei) Date: Wed, 29 Nov 2006 17:29:56 +0800 Subject: =?gb2312?B?tPC4tDogcmVzZXJ2YXRpb24gcG9saWN5Pw==?= In-Reply-To: <456CE8FE.6020702@snf.stanford.edu> Message-ID: <000001c71398$f77fe7e0$538c0c80@stanfordzhangd> Sorry guys. I didn?t carefully read through the reservation policy. I wont do that any more. Sorry. dawei -----????----- ???: James Conway [mailto:jwc at snf.stanford.edu] ????: 2006?11?29? 9:57 ???: Rohan D Kekatpure; zhang dawei ??: Raith SNF Mailing list ??: Re: reservation policy? Hello Raith Users and Rohan K. I am never surprised by the resourcefulness if our students on the RAITH! Dun Wei Zhang is a brand new user on the system just last week. Clearly this is not within the guidelines we have established for reservations made on CORAL for the RAITH 150 system. Dun Wei Zhang, aka Zhangdw: Please -- you must make your reservations for a continuous sessions and cannot should not make them for partial sessions to gain a larger block of time on the system. Thank you, James Conway Rohan D Kekatpure wrote: Dear James, I am looking at Raith reservation as of 0800 hrs on Sunday 11/26. The reservation of the user "zhangdw" seems a bit odd to me. Are we allowed to make reservations like that? Please have a look at the attached file. -rohan _____ -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.jpg Type: image/jpeg Size: 159637 bytes Desc: not available URL: From jwc at snf.stanford.edu Wed Nov 29 17:38:29 2006 From: jwc at snf.stanford.edu (James Conway) Date: Wed, 29 Nov 2006 17:38:29 -0800 Subject: ZEP 520 running low In-Reply-To: <1e089c430611291616x12d5af57t21f273947f06679c@mail.gmail.com> References: <1e089c430611291616x12d5af57t21f273947f06679c@mail.gmail.com> Message-ID: <456E3615.8040901@snf.stanford.edu> I am surprised how quickly this material was used up! I have a new bottle that just arrived and I have it in refrigerator in the stockroom. I will bring it out when the old bottle is done... Best, JWC Gael Close wrote: > James, > > This is to notify you that the bottle of ZEP520 is almost empty. > > -Gael > -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Thu Nov 30 08:41:21 2006 From: jwc at snf.stanford.edu (James Conway) Date: Thu, 30 Nov 2006 08:41:21 -0800 Subject: "Raith Cam" In-Reply-To: <28bfad130611292250l3a9169bcved7a80fd2548f160@mail.gmail.com> References: <28bfad130611292250l3a9169bcved7a80fd2548f160@mail.gmail.com> Message-ID: <456F09B1.8000108@snf.stanford.edu> Hello Ilya, I have thought about this too. I am also CCing the raith at snf.stanford.edu list to start a new thread for discussion. What may be better than a simple webcam and we just need someone with the time and energy to get it set up; might be to have a secure wireless network to the RAITH, possibly hosting from elwizard.stanford.edu. (My office PC..) That way authenticated users could login to either my host and gain a VPN connection to the raith computer to monitor the system, ftp files, and prepare position list. This would help me also when we run into problems on the tool . I could login remotely and take care of problems such as load lock errors and assist Users remotely. Additionally I would desire to get dual output video cards and two additional monitors so that we can watch through the clean room windows from the outside. This would also be useful for outreach to visitors coming to SNF to observe the RAITH operations in progress. Ideas and suggestions are welcomed. Anyone in the RAITH community have the wireless and PC networking skills or desire to assist in getting this set up? The floor is open to your ideas... Best, James Conway Ebeam Lab Ilya Fushman wrote: > Hey, > How about a Raith webcam that you can turn on to monitor your write. > There have been a few times when my write has stalled, and it would be > good to be able to periodically check on it remotely. Webcam's like > $50, and we could mount it on the Island computer. > -ilya -------------- next part -------------- An HTML attachment was scrubbed... URL: From shott at stanford.edu Thu Nov 30 08:57:17 2006 From: shott at stanford.edu (John Shott) Date: Thu, 30 Nov 2006 08:57:17 -0800 Subject: "Raith Cam" In-Reply-To: <456F09B1.8000108@snf.stanford.edu> References: <28bfad130611292250l3a9169bcved7a80fd2548f160@mail.gmail.com> <456F09B1.8000108@snf.stanford.edu> Message-ID: <456F0D6D.2050704@stanford.edu> James, Ilya, et al: While I won't comment on VPN or other control options, if you're looking for a really great camera for this purpose, I'd suggest something like the Sony -RZ30N. That's an network addressable camera that can be controlled (pan/tilt/zoom) from a web site. A link to specs for it is at: http://bssc.sel.sony.com/BroadcastandBusiness/DisplayModel?m=10001&p=3&sp=147&id=67347 It says that list price is $1865 ... but street price is more like $1300-1500 Mike Deal has one of these in his office (maybe not this exact model, but something very close to it) and knows a whole lot more about it than I. However, it's controllable from the web (pan/tilt/zoom), has a network connection that plugs directly into a RJ-45 network jack, and has 25X optical zoom. My guess is that with proper positioning, you could see any number of interest ... unless someone was standing in the way. For your consideration, John From sukruekinkocabas at stanford.edu Thu Nov 30 15:56:01 2006 From: sukruekinkocabas at stanford.edu (S. Ekin Kocabas) Date: Thu, 30 Nov 2006 15:56:01 -0800 Subject: "Raith Cam" In-Reply-To: <456F09B1.8000108@snf.stanford.edu> References: <28bfad130611292250l3a9169bcved7a80fd2548f160@mail.gmail.com> <456F09B1.8000108@snf.stanford.edu> Message-ID: <456F6F91.2010901@stanford.edu> Here are some ideas and questions.. One could use a video splitter instead of changing the video card on the computer. Here's an example splitter: http://www.l-com.com/item.aspx?id=8691 Would a remote connection to the Raith computer have any side effects if Raith is writing a pattern at the same time? If that is a concern, there should be means to disable it. For remote access to solve load lock errors, windows has a remote desktop client, which I use frequently. It might be activated on Raith. The problem with that is only one user can login at the same time. When a remote connection is made, the local window is blanked. http://www.microsoft.com/windowsxp/using/mobility/getstarted/remoteintro.mspx Instead of a webcam, one could schedule (every 30secs?) a "print screen" on the Raith computer, and save the image to a specific place over the network, which everyone could check to see what's going on. I googled print screen utilities, the one below might be suitable: http://www.screencapture.com/cap97.htm Ekin James Conway said the following on 11/30/2006 8:41 AM: > Hello Ilya, > > I have thought about this too. I am also CCing the > raith at snf.stanford.edu list to start a new thread for discussion. > > What may be better than a simple webcam and we just need someone with > the time and energy to get it set up; might be to have a secure > wireless network to the RAITH, possibly hosting from > elwizard.stanford.edu. (My office PC..) That way authenticated users > could login to either my host and gain a VPN connection to the raith > computer to monitor the system, ftp files, and prepare position list. > This would help me also when we run into problems on the tool . I > could login remotely and take care of problems such as load lock > errors and assist Users remotely. > > Additionally I would desire to get dual output video cards and two > additional monitors so that we can watch through the clean room > windows from the outside. This would also be useful for outreach to > visitors coming to SNF to observe the RAITH operations in progress. > > Ideas and suggestions are welcomed. Anyone in the RAITH community > have the wireless and PC networking skills or desire to assist in > getting this set up? > > The floor is open to your ideas... > > Best, > > James Conway > Ebeam Lab > > Ilya Fushman wrote: >> Hey, >> How about a Raith webcam that you can turn on to monitor your write. >> There have been a few times when my write has stalled, and it would be >> good to be able to periodically check on it remotely. Webcam's like >> $50, and we could mount it on the Island computer. >> -ilya -------------- next part -------------- A non-text attachment was scrubbed... Name: smime.p7s Type: application/x-pkcs7-signature Size: 5218 bytes Desc: S/MIME Cryptographic Signature URL: From rohank at stanford.edu Thu Nov 30 21:03:36 2006 From: rohank at stanford.edu (Rohan D Kekatpure) Date: Thu, 30 Nov 2006 21:03:36 -0800 Subject: Reservation released Saturday 8:30p-1:30a Message-ID: <456FB7A8.9010406@stanford.edu> From kimsangb at stanford.edu Thu Nov 30 21:12:33 2006 From: kimsangb at stanford.edu (SangBum Kim) Date: Thu, 30 Nov 2006 21:12:33 -0800 Subject: Reservation released Saturday 8:30p-1:30a In-Reply-To: <456FB7A8.9010406@stanford.edu> Message-ID: <000701c71507$4f14b520$a9b50c80@sangbumhome> I took it from 8:30p to 12:00a. Thank you. _____ From: Rohan D Kekatpure [mailto:rohank at stanford.edu] Sent: Thursday, November 30, 2006 9:04 PM To: raith at snf.stanford.edu Subject: Reservation released Saturday 8:30p-1:30a -------------- next part -------------- An HTML attachment was scrubbed... URL: