Comment raith SNF 2006-09-13 17:34:21: excellent stitching and resolution on qualification test 9112006
jwc at snf.stanford.edu
Wed Sep 13 18:08:58 PDT 2006
Greetings Raith Community:
We achieved excellent stitching and resolution on qualification test
EXPOSURE 9112006 AFTER the system was brought up.
Stitching offsets WF to WF is better than the measurement gage of the
LEO SEM at < 5 nm. Single Pixel Lines display superb line edge
roughness once dose to clear the film is reached.
More information about the raith