[Fwd: Problem raith SNF 2007-04-05 17:03:29: qualification failed for stitching and out of plane focus]
jwc at snf.stanford.edu
Thu Apr 5 17:16:44 PDT 2007
System is up and available for all qualified Users. Qualification Failed
and is out of normal specifications due to Write Field to Write Field
Stage leveling planarity issues continue with no change.
* Use the centered Piezo positions for your write.
* Perform focus and WF alignment for each 10 X 10 mm area you are
* Carefully inspect your EBL results BEFORE pattern transfer...
Users are requested to carefully examine their EBL results and document
if possible any issues encountered and to report to this list.*
Please report anything unusual you may encounter. Call James Conway if
you run into problems over the weekend I will try to stay on the cell
phone grid. (SMS IS GOOD!)
FYI: I will be on vacation tomorrow Friday and next Monday for a brief
holiday. Returning to SNF 10 AM Tuesday ...
-------- Original Message --------
Subject: Problem raith SNF 2007-04-05 17:03:29: qualification failed
for stitching and out of plane focus
Date: Thu, 5 Apr 2007 17:03:30 -0700
From: jwc at snf.stanford.edu
To: raith-pcs at snf.stanford.edu
QUALIFICATION FAILED. It failed for the same issues as before in the last 7 runs:
Likely due to the large offset in the spot offset calibration resulting in errors during the WF alignment which then results in WF:WF stitching errors well beyond specifications.
Std Sample holder on Piezo post is out of level planarity resulting in poor focus as you expose across a wafer.
Possible exposure error:
Unknown reason for a ~7.5 U and ~15 V shift in UV coordinate system for entire PLS written.
May have been a error in setting up UV system on write job. I checked PLS and protocol log file and it has the correct positions in the PLS and LOGS.
Try again next week after repairs to piezo post heights.
Users are not to exceed 10 keV acceleration voltage. Users should call me if they have questions or observe anything unusual.
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