From ceggiman at stanford.edu  Mon Jun  4 12:56:11 2007
From: ceggiman at stanford.edu (Christoph Eggimann)
Date: Mon, 4 Jun 2007 12:56:11 -0700
Subject: Raith free
Message-ID: <516608E9-8808-4D0C-B037-50A5210C54D4@stanford.edu>

Somebody has cancelled his reservation after me, so the Raith is free  
till 16.30 according to Coral.

Christoph


From ceggiman at stanford.edu  Mon Jun  4 12:57:53 2007
From: ceggiman at stanford.edu (Christoph Eggimann)
Date: Mon, 4 Jun 2007 12:57:53 -0700
Subject: Raith free
Message-ID: <C86A1260-5414-4718-A016-B15993685737@stanford.edu>

Someone has cancelled the reservation after me, so the Raith is free  
from now on till 4.30pm according to Coral.

Christoph


From zhangy at stanford.edu  Mon Jun  4 23:12:39 2007
From: zhangy at stanford.edu (Yuan Zhang)
Date: Mon, 04 Jun 2007 23:12:39 -0700
Subject: Raith free now to 1am
Message-ID: <20070604231239.gtyrvp2gw4ggcoko@webmail.stanford.edu>

Done early, and the tool is ready for next user.


Yuan Zhang
EE department



From kimsangb at stanford.edu  Mon Jun  4 23:13:56 2007
From: kimsangb at stanford.edu (SangBum Kim)
Date: Mon, 4 Jun 2007 23:13:56 -0700
Subject: raith free 13:30 to 18:30 tomorrow (Tue)
Message-ID: <000501c7a738$b2be6da0$a9b50c80@sangbumhome>

Don't need the time.

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From filip at stanford.edu  Tue Jun  5 02:40:56 2007
From: filip at stanford.edu (Filip Crnogorac)
Date: Tue, 05 Jun 2007 02:40:56 -0700
Subject: raith free 13:30 to 18:30 tomorrow (Tue)
In-Reply-To: <000501c7a738$b2be6da0$a9b50c80@sangbumhome>
References: <000501c7a738$b2be6da0$a9b50c80@sangbumhome>
Message-ID: <20070605024056.llqw9lt37z4tssgc@webmail.stanford.edu>

I'll take it.
Filip

Quoting SangBum Kim <kimsangb at stanford.edu>:

> Don't need the time.
>
>



--------------------------------------
Ph.D. Candidate, Stanford University
Department of Electrical Engineering
Center for Integrated Systems
B-103, 420 Via Palou
Stanford, CA 94305




From jwc at snf.stanford.edu  Tue Jun  5 17:46:12 2007
From: jwc at snf.stanford.edu (James Conway)
Date: Tue, 05 Jun 2007 17:46:12 -0700
Subject: raith status 1730 Tuesday June 5, 2007  SYSTEM WILL REMAIN OFF LINE
 FOR COOLING LOOP AND CHILLER REPAIRS.
Message-ID: <466603D4.2040301@snf.stanford.edu>

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From jwconway at stanford.edu  Thu Jun  7 16:16:04 2007
From: jwconway at stanford.edu (jwconway at stanford.edu)
Date: Thu, 07 Jun 2007 16:16:04 -0700
Subject: Raith Status 16:00 Thursday -- system coming back up for Users.
Message-ID: <20070607161604.0mf6h62hwy4g44gk@webmail.stanford.edu>

Good afternoon Raith Users:

The NESLAB chiller unit failure and a slight blockage in the turbo  
pump cooling line took down the system earlier in the week.

I flushed and reverse flushed the cooling loop with city water to 80  
psi removing a quantity of black junk, presumably fungus, in the  
cooling fluids.  Then drained and completely flushed lines again with  
1% hydrogen peroxide and water solution to disinfect lines and  
connections, then drained again.
Finally flushed with 10 gallons run through the entire cooling loop  
with pure water.

Loaner NESLAB chiller arrived inoperative due to a damaged main  
circuit breaker. Repaired breaker and restored functionality to loaner  
chiller.  Connected to RAITH cooling loop and purged all lines of  
bubbles and topped off with pure water.  Currently the flow is 1.2  
lpm, which is below the 2.0 lpm specification for system,  but better  
than 0.8 lpm flow level before.

Currently pumping down system and gun sections to set points and I am  
now performing service run up of the FE-Gun. All appears to be normal  
with the run up and conditions in the FE-Gun section appear normal.

Expect to return system to Users later this eafternoon.  I would be  
happy to load the system with the next user(s) commencing at 17:30 -  
18:00 hours. I expect it will take a week to ten days to reach  
previous gun vacuum and filament emission values.

Users are NOT TO EXCEED 10 keV acceleration voltage without my  
permission.  Please call me if you encounter any problems over the  
weekend, or desire higher acceleration voltages for your EBL write.

Thank you for your support!

James Conway


From xinranw at stanford.edu  Fri Jun  8 11:47:58 2007
From: xinranw at stanford.edu (Xinran Wang)
Date: Fri, 8 Jun 2007 11:47:58 -0700
Subject: raith free from 16:30, sample won't be ready
Message-ID: <22ffcd060706081147i19fba69bp7cf02312545339b4@mail.gmail.com>


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From filip at stanford.edu  Fri Jun  8 15:47:20 2007
From: filip at stanford.edu (Filip Crnogorac)
Date: Fri, 08 Jun 2007 15:47:20 -0700
Subject: curing pmma
Message-ID: <20070608154720.06b3vpydryg48s4s@webmail.stanford.edu>

Hi Raith users,

does anyone have experience with curing PMMA resist to achieve greater  
etch resistance? I heard of people using DUV (240nm) exposure for  
15min to harden the PMMA. Any info would be helpful.

Thanks,

Filip

--------------------------------------
Ph.D. Candidate, Stanford University
Department of Electrical Engineering
Center for Integrated Systems
B-103, 420 Via Palou
Stanford, CA 94305



From ifushman at stanford.edu  Fri Jun  8 19:11:38 2007
From: ifushman at stanford.edu (Ilya Fushman)
Date: Fri, 8 Jun 2007 19:11:38 -0700
Subject: curing pmma
In-Reply-To: <20070608154720.06b3vpydryg48s4s@webmail.stanford.edu>
References: <20070608154720.06b3vpydryg48s4s@webmail.stanford.edu>
Message-ID: <bf3d86240706081911y14058e7bub19a3a6cc9f50ca8@mail.gmail.com>

Yes,
Curing with the Karl Suss works well. We exposed for ~1/2 hour, and the etch
resistance goes up, but it is harder to remove the PMMA. The PMMA shrinks by
~ 5-10% as well.
-ilya

On 6/8/07, Filip Crnogorac <filip at stanford.edu> wrote:
>
> Hi Raith users,
>
> does anyone have experience with curing PMMA resist to achieve greater
> etch resistance? I heard of people using DUV (240nm) exposure for
> 15min to harden the PMMA. Any info would be helpful.
>
> Thanks,
>
> Filip
>
> --------------------------------------
> Ph.D. Candidate, Stanford University
> Department of Electrical Engineering
> Center for Integrated Systems
> B-103, 420 Via Palou
> Stanford, CA 94305
>
>


-- 
Ilya Fushman
Applied Physics
Stanford University
cvitae.org/ilya/
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From kocabas at stanford.edu  Sat Jun  9 17:34:16 2007
From: kocabas at stanford.edu (S. Ekin Kocabas)
Date: Sat, 09 Jun 2007 17:34:16 -0700
Subject: Sunday June 10, 10am-2pm & Tue June 12, 10am-1pm Free
Message-ID: <466B4708.9070400@stanford.edu>

I need to finish some other stuff until Wednesday..

Ekin



From kocabas at stanford.edu  Sun Jun 10 13:25:20 2007
From: kocabas at stanford.edu (S. Ekin Kocabas)
Date: Sun, 10 Jun 2007 13:25:20 -0700
Subject: Etching Silicon on Pieces
Message-ID: <466C5E30.2010306@stanford.edu>

Dear Raith Users,

I would like to be able to etch silicon on SOI pieces. While I'm waiting 
for the SOI wafers to arrive, I'm testing the process flow with full 
silicon wafers. I have used P5000 to etch silicon on full wafers, and 
the results look alright. Which tools do you use to do silicon etching 
on pieces with PMMA on them? What kind of problems do you face?

I'd appreciate any information you can provide. If you could reply to my 
email ( kocabas at stanford.edu ), I'll compile the answers in a nice form 
and send it to the Raith list.

Thank you,

Ekin


From sarves at stanford.edu  Mon Jun 11 05:24:08 2007
From: sarves at stanford.edu (sarves at stanford.edu)
Date: Mon, 11 Jun 2007 05:24:08 -0700
Subject: Fwd: Ebeam queries
Message-ID: <20070611052408.35occbzn6wkccso0@webmail.stanford.edu>

Hi e-beam users


One of my friends at UT Austin has some queries using recipes for  
Raith 150. If someone could help him, it would be greatly appreciated.

Thanks

Regards
Sarves Verma
----- Forwarded message from niteshjain at gmail.com -----
     Date: Sat, 9 Jun 2007 13:52:58 -0600
     From: Nitesh Jain <niteshjain at gmail.com>
Reply-To: Nitesh Jain <niteshjain at gmail.com>
  Subject: Ebeam queries
       To: "sarves at stanford.edu" <sarves at stanford.edu>

Hi Sarves

  I am having some issues with getting patterns using Ebeam. So I just want
to confirm my procedure. Could you please forward my queries to an
experienced user with Raith150.

   I make double layer structure for Nanowire contacts.I use PMMA 950
Chlorobenzene (2%) as a photoresist. Mostly my questions are related with
resist recipe. I use the following recipe

1) Wafer Clean- I normally use IPA/Acetone clean.Is it fine or Piranha/HF
clean is must before spinning Photoresist?

2) Before spinning- After cleaning it do you put it on a hotplate for
sometime so as to make sure that all alcohol is evaporated from the surface
of the wafer? Or do you straight away put it on the spinner.

3) Spin 2% 950K MW PMMA in chlorobenzene @ 4000rpm for 60 seconds. I use
highest possible acceleration to ramp it up to 4000RPM.  The spinner is a
closed bowl design.

4) Postbake:  180C on hotplate, 10 minutes.

5) Exposure: Raith150,  220 uC/cm2 at 20 KV

6)Develop: MIBK:IPA=1:3 (volume) for 30 seconds.

Unfortunately I am having very less consistency in terms of burning a good
spot. And I beleive there is some problem in my recipe.

Views and suggestions from experienced users are more than welcome.

Thanks
Nitesh





-- 
If winter comes, can spring be far behind- Shelley


----- End forwarded message -----

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Hi Sarves

 I am having some issues with getting patterns using Ebeam. So I just want
to confirm my procedure. Could you please forward my queries to an
experienced user with Raith150.

  I make double layer structure for Nanowire contacts.I use PMMA 950
Chlorobenzene (2%) as a photoresist. Mostly my questions are related with
resist recipe. I use the following recipe

1) Wafer Clean- I normally use IPA/Acetone clean.Is it fine or Piranha/HF
clean is must before spinning Photoresist?

2) Before spinning- After cleaning it do you put it on a hotplate for
sometime so as to make sure that all alcohol is evaporated from the surface
of the wafer? Or do you straight away put it on the spinner.

3) Spin 2% 950K MW PMMA in chlorobenzene @ 4000rpm for 60 seconds. I use
highest possible acceleration to ramp it up to 4000RPM.  The spinner is a
closed bowl design.

4) Postbake:  180C on hotplate, 10 minutes.

5) Exposure: Raith150,  220 uC/cm2 at 20 KV

6)Develop: MIBK:IPA=1:3 (volume) for 30 seconds.

Unfortunately I am having very less consistency in terms of burning a good
spot. And I beleive there is some problem in my recipe.

Views and suggestions from experienced users are more than welcome.

Thanks
Nitesh





-- 
If winter comes, can spring be far behind- Shelley
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From jwc at snf.stanford.edu  Mon Jun 11 12:16:32 2007
From: jwc at snf.stanford.edu (James Conway)
Date: Mon, 11 Jun 2007 12:16:32 -0700
Subject: ANNOUNCEMENT: RAITH Group XXVII  -- Intensive 4 day short course.
 June 19 - 22, 2007  TUESDAY - FRIDAY 10 AM - 6 PM
Message-ID: <466D9F90.8050903@snf.stanford.edu>

*Greetings RAITH Group X XVII:

**
If you are listed in the To: section of this email you are confirmed to 
be in RAITH Group** X XVII**.
If you are listed in the CC: section of this email; I still am in need 
of further information or a commitment from you, and hope to add you in 
the next class. Any RAITH user wishing to attend are also welcome if you 
desire a review of operations on the RAITH system.
**
We wish to invite all interested parties to the Tuesday morning lecture 
session and demo layer one training following at 2 PM - 6 PM in the 
afternoon. All are also welcome to attend as observers the other 
'hands-on' sessions through the week.
*
*If you are listed in the To: section of this email:
*This is your first reminder and confirmation of your commitment for 
attending the RAITH Group XXVII Training course to be held June 19 - 22, 
2007.
_*You are expected to attend all sessions in order to gain the 
experience and skills you will need to qualify on the RAITH 150 system.*

_**

Users are also encouraged to attend the *"Take a Spin with Me"* class 
covering Ebeam Resist handling procedures.
Next class is to be scheduled in the weeks after your RAITH Class. There 
is a separate sign up for this class on the white board in my office at 
CIS 31.

Thank you for your interest in Electron Beam Technologies at the 
Stanford Nanofabrication Facility,

James Conway
Ebeam Technology Group
650-725-7075
---------------------------------

*   **RAITH Group** XXVI** Schedule: **   *

*Raith 150 Basic Users Training ? Intensive 4 Day Short Course*

*June 19 - 22, 2007 from 10 - 6 PM Tuesday through Friday.*

*The Plan of Action:
*We will start out with a half day of lecture in the morning Tuesday; 
quickly moving into entirely 'hands on' operations training through the 
remainder of the week.
We will break for lunch at various times, while the system is writing, 
so plan to be flexible with your other outside commitments.  You should 
have started working on your GDS II patterns and preparing PMMA on your 
substrates if you wish to write on your material. Please bring your 
patterns and materials to the 'Hands-On' sessions. Some afternoons we 
may also be able to finish earlier,  letting the system write on its own 
to the end of our reservations on the system.*
*

* Schedule:*
Tuesday June 19, 2007:
10:00 - 12:30   Session 1:  Basic Users Course Lecture  -- CIS-X 201
14:00 - 17:00  Session 2:  RAITH System Demonstration - Layer One -- 
EBEAM LAB CIS L104

Wednesday June 20, 2007:
10:00 - 12:30 Session 3:  RAITH System Demonstration - Layer Two: 
OVERLAY -- EBEAM LAB CIS L104
14:00 - 18:00 Session 4:  Hands On training session One -- EBEAM LAB CIS 
L104

Thursday June 21, 2007:
10:00 - 12:30 Session 5: Hands On training session Two -- EBEAM LAB CIS L104
14:00 - 18:00 Session 6: Hands On training session Three -- EBEAM LAB 
CIS L104

Friday June 22, 2007:
10:00 - 12:30 Session 7: Hands On training session Four -- EBEAM LAB CIS 
L104
14:00 - 18:00 Session 8: Hands On training session Five -- EBEAM LAB CIS 
L104

Individual Qualification Sessions will be held after this class where- 
you can demonstrate your skill on the system to me and gain your login 
to the system.


I CAN PROVIDE A CD AND PRINTED MATERIALS AT THE FIRST MEETING, IF YOU 
HAVE NOT ALREADY RECEIVED ONE YET.
You can stop by my office hour and pick up a copy of these training 
materials during my daily office hour. (8:30 - 9:30 AM CIS 31)

-------------------------------------------------------------------------------------------------------------------------------------------

*RAITH Group XXVII Date June 19 - 22, 2007
BASIC USER INTENSIVE FOUR DAY SHORT COURSE.*

1.  Kelley Rivoire krivoire at stanford.edu <mailto:krivoire at stanford.edu> 
Coral:  krivoire
Vulkovic Group Project: Bio-Photonics

 2. Qianfan Xu qianfan.xu at hp.com <mailto:qianfan.xu at hp.com> Coral: qianfan
Hewlett Packard Labs  Project:  micro-ring modulators

 

3. Yao-Te Cheng *ytcheng at stanford.edu* <mailto:ytcheng at stanford.edu> 
Coral: ytcheng

Group: ???  Project:  Fabricate small apertures < 100nm with different 
shape to generate optical near field images

4. One space still available.  See James Conway


 

 








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From jwc at snf.stanford.edu  Mon Jun 11 12:18:51 2007
From: jwc at snf.stanford.edu (James Conway)
Date: Mon, 11 Jun 2007 12:18:51 -0700
Subject: Reminder tomorrow:  "Take A Spin with Me" -- Ebeam Resist Handling
 Training on the Headway.  Tuesday June 12, 2007 10:00  - 13:00
Message-ID: <466DA01B.6040009@snf.stanford.edu>

*ANNOUNCEMENT:  "Take A Spin with Me" -- Ebeam Resist Handling Training 
on the Headway Coater.
*
Greetings Ebeam Lab Users,

I will be conducting my monthly *"Take A Spin with Me" *training class 
Tuesday June 12, from 10 AM  - 1 PM.

This is a great opportunity for you to get acquainted with the specific 
points to employ when working with our Ebeam Resist materials in order 
to obtain high quality thin film coatings over your wafers for Electron 
Beam, Scanning Probe (SPL), and optical Nano-Lithography.
In these applications accurate control of polymer thickness is important 
in order to obtain consistent high quality lithography results.

We will be conducting this training on the Headway2 spin coater and 
users attending this session will gain their qualification on this tool.

Schedule of Events:

10 - 11:00 I will start with substrate cleans on WET BENCH NONMETAL 
performing Pirhana substrate cleans and HF etching of the intrinsic 
native oxide on Silicon wafers.  All users are encouraged to have their 
substrates cleaned and ready to go for spinning by the session time; 
either coming out of the 150 degree Singe oven, or if you are working on 
oxides or nitrides, coming out of the YES HMDS Prime oven.

11:00 - 12:30 We can apply what ever resist system you desire for your 
work.

12:30 - 1:00 Thin Film Measurements on the Nanospec Thin Film Analyzer

All interested parties are welcome to attend this session.  No need to 
reply to this email -- just show up!

Thank you for your interest in Ebeam Technologies here at Stanford 
Nanofabrication Facility,

James W. Conway
Ebeam Technology Group
Stanford Nanofabrication Facility
650-725-7075  office hour M-F 8:30 - 9:30 AM CIS 31

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From randalls at stanford.edu  Mon Jun 11 12:39:16 2007
From: randalls at stanford.edu (randalls at stanford.edu)
Date: Mon, 11 Jun 2007 12:39:16 -0700
Subject: Raith free for next user
Message-ID: <20070611123916.21y3sr004x6ok880@webmail.stanford.edu>




From yueruilu at stanford.edu  Mon Jun 11 20:56:48 2007
From: yueruilu at stanford.edu (Yuerui Lu)
Date: Mon, 11 Jun 2007 20:56:48 -0700
Subject: time released tonight from 9:00pm to 12:00am
Message-ID: <fd073f770706112056t278cb278i9686c86032f2d053@mail.gmail.com>

sample not ready. Sorry for so late notice
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From filip at stanford.edu  Tue Jun 12 14:03:10 2007
From: filip at stanford.edu (Filip Crnogorac)
Date: Tue, 12 Jun 2007 14:03:10 -0700
Subject: Raith time slot switch tomorrow
Message-ID: <20070612140310.z912ox00cmhs08wo@webmail.stanford.edu>

Hi All,

Anika and I are switching Raith slots tomorrow: 10am-1pm with 6-9pm.
Thanks,

Filip

--------------------------------------
Ph.D. Candidate, Stanford University
Department of Electrical Engineering
Center for Integrated Systems
B-103, 420 Via Palou
Stanford, CA 94305




From fjaeckel at stanford.edu  Wed Jun 13 08:29:45 2007
From: fjaeckel at stanford.edu (Frank Jaeckel)
Date: Wed, 13 Jun 2007 08:29:45 -0700
Subject: finished early system available
Message-ID: <20070613082945.mlnxgvlnvdvokog0@webmail.stanford.edu>



   --
Dr. rer. nat. Frank J?ckel
mail address:? ?Department of Chemistry, M/C 5080
? ? ? ? ? ? ? ? 333 Campus Drive
? ? ? ? ? ? ? ? mailbox #74
? ? ? ? ? ? ? ? Stanford University, Stanford, CA 94305-5080
street address: 369 North-South Mall, Stauffer I, Room 15
? ? ? ? ? ? ? ? Stanford University, Stanford, CA 94305-5080
phone:? ? ? ? ? +1-650-724-4052/51 (office/lab)
fax:? ? ? ? ? ? +1-650-725-0259? ? (indicate mailbox #74)
e-mail:? ? ? ? ?fjaeckel at stanford.edu
internet:? ? ? ?http://www.stanford.edu/~fjaeckel/
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From anikak at stanford.edu  Wed Jun 13 10:09:39 2007
From: anikak at stanford.edu (Anika Kinkhabwala)
Date: Wed, 13 Jun 2007 10:09:39 -0700
Subject: Raith free until 1pm
Message-ID: <20070613100939.lo4mf3g0zhk0o8cc@webmail.stanford.edu>

Samples not working well...


From jwc at snf.stanford.edu  Wed Jun 13 10:38:59 2007
From: jwc at snf.stanford.edu (James Conway)
Date: Wed, 13 Jun 2007 10:38:59 -0700
Subject: Change in raith schedule for Thursday June 14, 2007 : I will be starting
 my 1 PM session at 2 PM to attend Arvind Sundaramurthy's. PhD defense.
Message-ID: <46702BB3.4070503@snf.stanford.edu>

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From jwc at snf.stanford.edu  Wed Jun 13 10:43:45 2007
From: jwc at snf.stanford.edu (James Conway)
Date: Wed, 13 Jun 2007 10:43:45 -0700
Subject: EBeam resist wet bench guidelines
In-Reply-To: <20070612165312.5ec172scwi6800so@webmail.stanford.edu>
References: <20070612165312.5ec172scwi6800so@webmail.stanford.edu>
Message-ID: <46702CD1.2040206@snf.stanford.edu>

Good Morning Ebeam Wet Bench Users:

A great question came in by email today regarding usage of the Ebeam 
Resist Wet Bench.

So here are *_Guidelines of Usage for the Ebeam Resist Wet Bench_*

The *Ebeam Resist Wet Bench* is dedicated for Ebeam users only in an 
effort to prevent cross contamination and particulates from the Optical 
Lithography processes.

There is no qualification for use of the Ebeam wet bench. There is no 
enable on CORAL needed to utilize this bench for your processing.

*_This bench is to be used for Solvent based Ebeam Resist processing only.
_*
*NO RED OPTICAL resist *are allowed to be used, nor disposed of, on the 
Ebeam wet bench.

This bench is to be wiped down with IPA using a wiper before and after 
every usage by each User.

No glassware or chemicals are allowed to remain on this bench for any 
period. (> 1 hour)

*Processes* that you would normally use this bench for include:

    * _Ebeam resist development processing._
    * Solvent cleaning of Ebeam engineering materials and substrates.
    * Stripping Ebeam resist from substrates.
    * Processing of small pieces and chips not normally handled easily
      on the other wet benches.


This equipment is in the Gold Contaminated equipment group because it is 
in the Lithography area. However it is up to the individual Lab Member 
to employ his own glassware at an appropriate contamination level for 
their process sequence.

Users encountering any problems, or having any concerns, on this bench 
should report their comments to beamtools at snf.stanford.edu email 
discussion list.

Thank you for your interest in Ebeam Technologies here at the Stanford 
Nanofabrication Facility,

James Conway



masaharu at stanford.edu wrote:
> Dear James,
>
> I forgot to tell wetbench.
>
> I also would like to be trained to work on EB wetbench.
>
> Could you add my name to the list?
>
> Best regards,
>
> Masaharu Kobayshi
>
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From xinranw at stanford.edu  Wed Jun 13 22:10:11 2007
From: xinranw at stanford.edu (Xinran Wang)
Date: Wed, 13 Jun 2007 22:10:11 -0700
Subject: raith done early, free for next user
Message-ID: <22ffcd060706132210h304d0735q132a771171fcb74d@mail.gmail.com>


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From jwc at snf.stanford.edu  Thu Jun 14 14:51:18 2007
From: jwc at snf.stanford.edu (James Conway)
Date: Thu, 14 Jun 2007 14:51:18 -0700
Subject: Handing off my reservation to Ilya Fushman
In-Reply-To: <bf3d86240706131320md527d9aw4203254bdfaf237b@mail.gmail.com>
References: <20070612165312.5ec172scwi6800so@webmail.stanford.edu>	 <46702CD1.2040206@snf.stanford.edu> <bf3d86240706131320md527d9aw4203254bdfaf237b@mail.gmail.com>
Message-ID: <4671B856.1040001@snf.stanford.edu>


*Greetings Raith Users,*

To help Users working on the RAITH tool that needed time to complete 
their write as well as to catch up from last weekend's down time I have 
taken the following actions:

    * I have allowed Frank Jaeckel to extend his write into my session
      time from his slot this morning.
    *  I am now releasing the remainder of my reservation's time to Ilya
      Fushman so he and others working with him can complete their
      tasking this week.


All Users are strongly encouraged to carefully time their EBL pattern 
writing times and strive to accomodate other Users needing  time on the 
system by 'Sharing the Ride' in order to increase throughput and 
capacity on the system. 
Users wishing to determine actual write time versus calculated write 
time need only refer to the PROTOCOL.htm log on the system.  Select the 
date, your pattern write and click the 'exposures' tab on the upper part 
of the first page.  The column 'duration' is the actual time of the 
writing process to the second.

Finally I am feeling rather poorly today and am not feeling well at all 
so I will be leaving for the remainder of the afternoon.  I will be 
available by cell phone if any problems arise.  I will also be away on 
vacation tomorrow and Monday returning to SNF Tuesday morning at my 
normal office hour.

Thank you for your support,

James Conway




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From jwc at snf.stanford.edu  Thu Jun 14 14:52:31 2007
From: jwc at snf.stanford.edu (James Conway)
Date: Thu, 14 Jun 2007 14:52:31 -0700
Subject: Reminder: RAITH Group XXVII  -- Intensive 4 day short course. June
 19 - 22, 2007  TUESDAY - FRIDAY 10 AM - 6 PM
Message-ID: <4671B89F.3010708@snf.stanford.edu>

*Greetings RAITH Group XXVII:

**
If you are listed in the To: section of this email you are confirmed to 
be in RAITH Group** XXVII**.
If you are listed in the CC: section of this email; I still am in need 
of further information or a commitment from you, and hope to add you in 
the next class. Any RAITH user wishing to attend are also welcome if you 
desire a review of operations on the RAITH system.
**
We wish to invite all interested parties to the Tuesday morning lecture 
session and demo layer one training following at 2 PM - 6 PM in the 
afternoon. All are also welcome to attend as observers the other 
'hands-on' sessions through the week.
*
*If you are listed in the To: section of this email:
*This is your first reminder and confirmation of your commitment for 
attending the RAITH Group XXVII Training course to be held June 19 - 22, 
2007.
_*You are expected to attend all sessions in order to gain the 
experience and skills you will need to qualify on the RAITH 150 system.*

_

Users are also encouraged to attend the *"Take a Spin with Me"* class 
covering Ebeam Resist handling procedures.
Next class is to be scheduled in the weeks after your RAITH Class. There 
is a separate sign up for this class on the white board in my office at 
CIS 31.

Thank you for your interest in Electron Beam Technologies at the 
Stanford Nanofabrication Facility,

James Conway
Ebeam Technology Group
650-725-7075
---------------------------------

*   **RAITH Group** XXVI** Schedule: **   *

*Raith 150 Basic Users Training ? Intensive 4 Day Short Course*

*June 19 - 22, 2007 from 10 - 6 PM Tuesday through Friday.*

*The Plan of Action:
*We will start out with a half day of lecture in the morning Tuesday; 
quickly moving into entirely 'hands on' operations training through the 
remainder of the week.
We will break for lunch at various times, while the system is writing, 
so plan to be flexible with your other outside commitments.  You should 
have started working on your GDS II patterns and preparing PMMA on your 
substrates if you wish to write on your material. Please bring your 
patterns and materials to the 'Hands-On' sessions. Some afternoons we 
may also be able to finish earlier,  letting the system write on its own 
to the end of our reservations on the system.*
*

* Schedule:*
Tuesday June 19, 2007:
10:00 - 12:30   Session 1:  Basic Users Course Lecture  -- CIS-X 201
14:00 - 17:00  Session 2:  RAITH System Demonstration - Layer One -- 
EBEAM LAB CIS L104

Wednesday June 20, 2007:
10:00 - 12:30 Session 3:  RAITH System Demonstration - Layer Two: 
OVERLAY -- EBEAM LAB CIS L104
14:00 - 18:00 Session 4:  Hands On training session One -- EBEAM LAB CIS 
L104

Thursday June 21, 2007:
10:00 - 12:30 Session 5: Hands On training session Two -- EBEAM LAB CIS L104
14:00 - 18:00 Session 6: Hands On training session Three -- EBEAM LAB 
CIS L104

Friday June 22, 2007:
10:00 - 12:30 Session 7: Hands On training session Four -- EBEAM LAB CIS 
L104
14:00 - 18:00 Session 8: Hands On training session Five -- EBEAM LAB CIS 
L104

Individual Qualification Sessions will be held after this class where- 
you can demonstrate your skill on the system to me and gain your login 
to the system.


I CAN PROVIDE A CD AND PRINTED MATERIALS AT THE FIRST MEETING, IF YOU 
HAVE NOT ALREADY RECEIVED ONE YET.
You can stop by my office hour and pick up a copy of these training 
materials during my daily office hour. (8:30 - 9:30 AM CIS 31)

-------------------------------------------------------------------------------------------------------------------------------------------

*RAITH Group XXVII Date June 19 - 22, 2007
BASIC USER INTENSIVE FOUR DAY SHORT COURSE.*

1.  Kelley Rivoire krivoire at stanford.edu <mailto:krivoire at stanford.edu> 
Coral:  krivoire
Vulkovic Group Project: Bio-Photonics

 2. Qianfan Xu qianfan.xu at hp.com <mailto:qianfan.xu at hp.com> Coral: qianfan
Hewlett Packard Labs  Project:  micro-ring modulators

3. Yao-Te Cheng *ytcheng at stanford.edu* <mailto:ytcheng at stanford.edu> 
Coral: ytcheng

Group: ???  Project:  Fabricate small apertures < 100nm with different 
shape to generate optical near field images

4. One space still available.  See James Conway


 

 








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From koseki at stanford.edu  Fri Jun 15 15:40:26 2007
From: koseki at stanford.edu (Shinichi Koseki)
Date: Fri, 15 Jun 2007 15:40:26 -0700
Subject: Raith free 0-5am tonight
Message-ID: <000b01c7af9e$2b4208f0$231b40ab@nausicaa>

Sample is not ready.
The machine is available from 0-5am tonight.
Actually, next user's reservation is from 10am
tomorrow, so slot is open from 0-10am.

regards,

Shinichi


From vsih at stanford.edu  Fri Jun 15 16:50:28 2007
From: vsih at stanford.edu (Vanessa Sih)
Date: Fri, 15 Jun 2007 16:50:28 -0700
Subject: Raith free 0-5am tonight
In-Reply-To: <000b01c7af9e$2b4208f0$231b40ab@nausicaa>
References: <000b01c7af9e$2b4208f0$231b40ab@nausicaa>
Message-ID: <354289b40706151650j4599e251p9d073b24cc126056@mail.gmail.com>

I had the reservation from 10am-3pm on Saturday.  Instead, I will run
tonight from 10:30pm to 3:30am.

Thanks,

Vanessa


On 6/15/07, Shinichi Koseki <koseki at stanford.edu> wrote:
>
> Sample is not ready.
> The machine is available from 0-5am tonight.
> Actually, next user's reservation is from 10am
> tomorrow, so slot is open from 0-10am.
>
> regards,
>
> Shinichi
>
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From anikak at stanford.edu  Sat Jun 16 10:39:29 2007
From: anikak at stanford.edu (Anika Kinkhabwala)
Date: Sat, 16 Jun 2007 10:39:29 -0700
Subject: finished early
Message-ID: <20070616103929.1xfx24w6pugc8s0s@webmail.stanford.edu>




From ifushman at stanford.edu  Sat Jun 16 12:36:55 2007
From: ifushman at stanford.edu (Ilya Fushman)
Date: Sat, 16 Jun 2007 12:36:55 -0700
Subject: finished early
In-Reply-To: <20070616103929.1xfx24w6pugc8s0s@webmail.stanford.edu>
References: <20070616103929.1xfx24w6pugc8s0s@webmail.stanford.edu>
Message-ID: <bf3d86240706161236j6e4a7cc9ud06de0b080776b3a@mail.gmail.com>

Hi All, just started a quick write.
Thanks,
ilya

On 6/16/07, Anika Kinkhabwala <anikak at stanford.edu> wrote:
>
>
>


-- 
Ilya Fushman
Applied Physics
Stanford University
cvitae.org/ilya/
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From kocabas at stanford.edu  Sun Jun 17 12:38:37 2007
From: kocabas at stanford.edu (S. Ekin Kocabas)
Date: Sun, 17 Jun 2007 12:38:37 -0700
Subject: Monday (June 18) 8:00-11:30 Raith Free
Message-ID: <46758DBD.3000204@stanford.edu>

Sample preparation problems...




From xinranw at stanford.edu  Mon Jun 18 11:02:56 2007
From: xinranw at stanford.edu (Xinran Wang)
Date: Mon, 18 Jun 2007 11:02:56 -0700
Subject: raith finished early, free till 13:30
Message-ID: <22ffcd060706181102t3270f90qf1c84393f82cd885@mail.gmail.com>


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From ifushman at stanford.edu  Mon Jun 18 13:07:05 2007
From: ifushman at stanford.edu (Ilya Fushman)
Date: Mon, 18 Jun 2007 13:07:05 -0700
Subject: raith is free now
Message-ID: <bf3d86240706181307l2cee26e2l60897c541eb668a8@mail.gmail.com>

-- 
Ilya Fushman
Applied Physics
Stanford University
cvitae.org/ilya/
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From ceggiman at stanford.edu  Mon Jun 18 19:55:51 2007
From: ceggiman at stanford.edu (Christoph Eggimann)
Date: Mon, 18 Jun 2007 19:55:51 -0700
Subject: Raith free 1am
Message-ID: <FFB7A6FB-09E7-4152-A9B6-74CF45270019@stanford.edu>

Can't prepare sample till then, sorry for late notice



From xinranw at stanford.edu  Wed Jun 20 16:27:39 2007
From: xinranw at stanford.edu (Xinran Wang)
Date: Wed, 20 Jun 2007 16:27:39 -0700
Subject: raith free tonight from 10:30pm
Message-ID: <22ffcd060706201627i1d2dbacfqc11e3996a65ca2a9@mail.gmail.com>

Sample won't be ready. Sorry for late notice.
Xinran
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From fjaeckel at stanford.edu  Thu Jun 21 19:40:56 2007
From: fjaeckel at stanford.edu (Frank Jaeckel)
Date: Thu, 21 Jun 2007 19:40:56 -0700
Subject: released Friday 7-10AM
Message-ID: <20070621194056.0subdn6oy0gsgggg@webmail.stanford.edu>



   sample not ready, sorry for the late notice

   --
Dr. rer. nat. Frank J?ckel
mail address:? ?Department of Chemistry, M/C 5080
? ? ? ? ? ? ? ? 333 Campus Drive
? ? ? ? ? ? ? ? mailbox #74
? ? ? ? ? ? ? ? Stanford University, Stanford, CA 94305-5080
street address: 369 North-South Mall, Stauffer I, Room 15
? ? ? ? ? ? ? ? Stanford University, Stanford, CA 94305-5080
phone:? ? ? ? ? +1-650-724-4052/51 (office/lab)
fax:? ? ? ? ? ? +1-650-725-0259? ? (indicate mailbox #74)
e-mail:? ? ? ? ?fjaeckel at stanford.edu
internet:? ? ? ?http://www.stanford.edu/~fjaeckel/
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From mkoto at stanford.edu  Thu Jun 21 22:43:58 2007
From: mkoto at stanford.edu (mkoto at stanford.edu)
Date: Thu, 21 Jun 2007 22:43:58 -0700
Subject: released Friday 7-10AM
In-Reply-To: <20070621194056.0subdn6oy0gsgggg@webmail.stanford.edu>
References: <20070621194056.0subdn6oy0gsgggg@webmail.stanford.edu>
Message-ID: <20070621224358.gyp0b7auwrccg0gw@webmail.stanford.edu>


  If no one intend to use this time, I want to use 1-2 hour after my  
reservation time (4-7AM) continuously.
I cannot see and operate coral from my PC now.
Someone intend to use, please let me know.

Makoto

>
>
>   sample not ready, sorry for the late notice
>
>   --
> Dr. rer. nat. Frank J?ckel
> mail address:? ?Department of Chemistry, M/C 5080
> ? ? ? ? ? ? ? ? 333 Campus Drive
> ? ? ? ? ? ? ? ? mailbox #74
> ? ? ? ? ? ? ? ? Stanford University, Stanford, CA 94305-5080
> street address: 369 North-South Mall, Stauffer I, Room 15
> ? ? ? ? ? ? ? ? Stanford University, Stanford, CA 94305-5080
> phone:? ? ? ? ? +1-650-724-4052/51 (office/lab)
> fax:? ? ? ? ? ? +1-650-725-0259? ? (indicate mailbox #74)
> e-mail:? ? ? ? ?fjaeckel at stanford.edu
> internet:? ? ? ?http://www.stanford.edu/~fjaeckel/



***************************************************
    Makoto Koto            Visiting Scholar
  476 Lomita Mall  244 McCullough Building
  Stanford, CA 94305-4045
***************************************************


From mkoto at stanford.edu  Fri Jun 22 05:41:39 2007
From: mkoto at stanford.edu (mkoto at stanford.edu)
Date: Fri, 22 Jun 2007 05:41:39 -0700
Subject: released Friday 7-10AM
In-Reply-To: <20070621194056.0subdn6oy0gsgggg@webmail.stanford.edu>
References: <20070621194056.0subdn6oy0gsgggg@webmail.stanford.edu>
Message-ID: <20070622054139.gx5xjlrmfutcwckk@webmail.stanford.edu>


  Before starting my operation, I found some unexpected matter on LEO image.
So I gave up my time and sent message to James to confirm about this.
No one seems to use until James's time, but please keep open until his check.

Makoto

***************************************************
    Makoto Koto            Visiting Scholar
  476 Lomita Mall  244 McCullough Building
  Stanford, CA 94305-4045
***************************************************


From jwc at snf.stanford.edu  Fri Jun 22 09:20:04 2007
From: jwc at snf.stanford.edu (James Conway)
Date: Fri, 22 Jun 2007 09:20:04 -0700
Subject: New FAQ No. XXXTBD:  RAITH SEM (LEO computer Imaging problems...)
In-Reply-To: <20070621224358.gyp0b7auwrccg0gw@webmail.stanford.edu>
References: <20070621194056.0subdn6oy0gsgggg@webmail.stanford.edu> <20070621224358.gyp0b7auwrccg0gw@webmail.stanford.edu>
Message-ID: <467BF6B4.8050800@snf.stanford.edu>

Hello Dr. Koto and RAITH Community,

This is not a normal problem -- but one we have seen before in the past 
a few times before.

*Problem: * LEO SEM Image is strange and appears to be flickering often 
only in a reduced section of the screen or no image was obtainable in 
SEM or TV detector modes.

*Solution:
After verifying normal Brightness and Contrast settings shut down and 
restart the LEO computer hardware and the restart LEO application to 
re-read all the modules within the software:*

   1. Check that the auto brightness and contrast is not enabled as well
      as the Brightness and contrast target settings are within normal
      range of settings.
      Normally settings will be  ~ Brightness = 50 - 52 and Contrast =
      40 - 42 for a normal SEM image at high magnification.
   2. Logout gracefully from the LEO application and do not save any
      settings on this logout. 
      Logout of windows OS and SHUTDOWN computer.  Wait ten seconds and
      press the power on button behind the front door.
      Log back into RAITH SEM computer (LEO Computer) logon: user
      passwd: user.
      Log onto the LEO server and normal and you will see a module L-REM
      that will initialize and all imaging functions will be restored.



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From okilic at stanford.edu  Sat Jun 23 06:01:51 2007
From: okilic at stanford.edu (Onur Kilic)
Date: Sat, 23 Jun 2007 06:01:51 -0700
Subject: Will use time of next user
Message-ID: <20070623060151.0ayyl3i5t1ogo0gs@webmail.stanford.edu>

The next user (kimsora) was nice to give me 2 hours of her time that I  
need. I am sending this notification so that you don't stop my run  
thinking kimsora has not showed up for her run.

Thanks,

Onur

-- 
Onur Kilic
Applied Physics
Stanford University
http://onurkilic.com






From hendrikb at stanford.edu  Mon Jun 25 15:38:27 2007
From: hendrikb at stanford.edu (Hendrik Bluhm)
Date: Mon, 25 Jun 2007 15:38:27 -0700 (PDT)
Subject: Raith Free Wed 18:00
Message-ID: <Pine.GSO.4.44.0706251522380.25214-100000@elaine16.Stanford.EDU>



---------------------------------------------------
Hendrik Bluhm


Department of Physics
Stanford University

Work address:                   Moler Lab
           			Lab. for Advanced Materials
Phone: (650) 723-4012           McCullough Bldg.
Fax:   (650) 725-2189           476  Lomita Mall
                                Stanford, CA 94305




From dkozak at ucsc.edu  Mon Jun 25 16:06:26 2007
From: dkozak at ucsc.edu (Dmitry Alexander Kozak)
Date: Mon, 25 Jun 2007 16:06:26 -0700
Subject: raith free Wed 4-9 AM
Message-ID: <web-164570458@iron.ucsc.edu>

Removing reservation for Wed morning, 4-9 Am.
So very sorry for such late notice, wafer won't be ready 
for that time.  Will take reservation for later date.

Dmitry


From filip at stanford.edu  Mon Jun 25 17:13:01 2007
From: filip at stanford.edu (Filip Crnogorac)
Date: Mon, 25 Jun 2007 17:13:01 -0700
Subject: etch rates at AMT, ZEP520 & 2% PMMA
Message-ID: <20070625171301.htqm7xltcni8g4ss@webmail.stanford.edu>

Hi all,

in case anyone is working with thin resists:

AMT etch rates of resist for process #3 (prog 3 - oxide and nitride etch)

ZEP520 (non-diluted) = 115 A/min = 11.5 nm/min
2% PMMA (no UV cure) = 190 A/min = 19 nm/min

based on 2 min etches, 3 runs, 2 wafers each in middle slots. Remember  
there may be some polymer redeposition.

Enjoy,

Filip

--------------------------------------
Ph.D. Candidate, Stanford University
Department of Electrical Engineering
Center for Integrated Systems
B-103, 420 Via Palou
Stanford, CA 94305




From randalls at stanford.edu  Tue Jun 26 10:25:56 2007
From: randalls at stanford.edu (randalls at stanford.edu)
Date: Tue, 26 Jun 2007 10:25:56 -0700
Subject: Raith free at 11am
In-Reply-To: <web-164570458@iron.ucsc.edu>
References: <web-164570458@iron.ucsc.edu>
Message-ID: <20070626102556.eiunkwrw2iyos4k4@webmail.stanford.edu>

I'll be done early. Next user welcome to start at 11.




From filip at stanford.edu  Tue Jun 26 13:22:13 2007
From: filip at stanford.edu (Filip Crnogorac)
Date: Tue, 26 Jun 2007 13:22:13 -0700
Subject: Raith Fri 1-5pm Free
Message-ID: <20070626132213.uiiobr0kyrcwoc8c@webmail.stanford.edu>

will be out of the country...

F




From anikak at stanford.edu  Tue Jun 26 16:30:45 2007
From: anikak at stanford.edu (Anika Kinkhabwala)
Date: Tue, 26 Jun 2007 16:30:45 -0700
Subject: Raith 9a-1p tomorrow free
In-Reply-To: <20070626132213.uiiobr0kyrcwoc8c@webmail.stanford.edu>
References: <20070626132213.uiiobr0kyrcwoc8c@webmail.stanford.edu>
Message-ID: <20070626163045.h2h6aphsqd4wc0ks@webmail.stanford.edu>

sorry for the late notice!


From zhangli at stanford.edu  Wed Jun 27 15:09:29 2007
From: zhangli at stanford.edu (Li Zhang)
Date: Wed, 27 Jun 2007 15:09:29 -0700
Subject: raith free 9:30pm to 1:00am tonight
Message-ID: <66aaf8f30706271509r3958f0a7mc85fce00ed207e66@mail.gmail.com>

sample was done this morning.

-- 
Li
---------------------------------------
Li Zhang
Dai's Group
Department of Chemistry
Stanford University
---------------------------------------
          .oooO
          (       )    Oooo.
           \     (     (       )
            \     )     )     /
Life is good,     (     /
                       it's just not easy.
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From panjun at stanford.edu  Wed Jun 27 15:10:06 2007
From: panjun at stanford.edu (Jun Pan)
Date: Wed, 27 Jun 2007 15:10:06 -0700
Subject: raith free 1800-21:30 today
Message-ID: <002201c7b907$ebced9a0$462242ab@PAN>

 

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From yiyangg at stanford.edu  Wed Jun 27 15:47:54 2007
From: yiyangg at stanford.edu (yiyangg at stanford.edu)
Date: Wed, 27 Jun 2007 15:47:54 -0700
Subject: raith free 1800-21:30 today
In-Reply-To: <002201c7b907$ebced9a0$462242ab@PAN>
References: <002201c7b907$ebced9a0$462242ab@PAN>
Message-ID: <20070627154754.zitqbjq4a5mskk0o@webmail.stanford.edu>

Thanks, I have taken it.


Quoting Jun Pan <panjun at stanford.edu>:

>
>
>




From faraon at stanford.edu  Thu Jun 28 16:59:36 2007
From: faraon at stanford.edu (Andrei Faraon)
Date: Thu, 28 Jun 2007 16:59:36 -0700
Subject: Raith free until 11pm
Message-ID: <28d3ece90706281659ye81da86p9e1861a6149f0508@mail.gmail.com>

My chips did not come out well so I will not do the write. Sorry for the
very late notice.

-- 
Andrei Faraon

Stanford University, Applied Physics
316 Via Pueblo Mall
Stanford, CA, 94305
Mobile: 650 714 7881
Office: 650 723 2279
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From mkoto at stanford.edu  Thu Jun 28 17:21:29 2007
From: mkoto at stanford.edu (mkoto at stanford.edu)
Date: Thu, 28 Jun 2007 17:21:29 -0700
Subject: Raith free until 11pm
In-Reply-To: <28d3ece90706281659ye81da86p9e1861a6149f0508@mail.gmail.com>
References: <28d3ece90706281659ye81da86p9e1861a6149f0508@mail.gmail.com>
Message-ID: <20070628172129.5kdthaq5wfk88wg4@webmail.stanford.edu>

I took 18:00-21:00.
thanks,

Makoto


> My chips did not come out well so I will not do the write. Sorry for the
> very late notice.
>
> -- 
> Andrei Faraon
>
> Stanford University, Applied Physics
> 316 Via Pueblo Mall
> Stanford, CA, 94305
> Mobile: 650 714 7881
> Office: 650 723 2279



***************************************************
    Makoto Koto            Visiting Scholar
  476 Lomita Mall  244 McCullough Building
  Stanford, CA 94305-4045
***************************************************


From koseki at stanford.edu  Thu Jun 28 17:45:12 2007
From: koseki at stanford.edu (Shinichi Koseki)
Date: Thu, 28 Jun 2007 17:45:12 -0700
Subject: Raith free from 9pm - 4am
Message-ID: <000f01c7b9e6$c045b940$231b40ab@nausicaa>

Wafer is not ready. Sorry for the late notice, too.
Now the slot is open from 9pm - 4am tonight.
Hope someone can make use of it.

regards,

Shinichi


----- Original Message ----- 
From: <mkoto at stanford.edu>
To: "Andrei Faraon" <faraon at stanford.edu>
Cc: "Raith SNF Mailing list" <raith at snf.stanford.edu>
Sent: Thursday, June 28, 2007 5:21 PM
Subject: Re: Raith free until 11pm


>I took 18:00-21:00.
> thanks,
> 
> Makoto
> 
> 
>> My chips did not come out well so I will not do the write. Sorry for the
>> very late notice.
>>
>> -- 
>> Andrei Faraon
>>
>> Stanford University, Applied Physics
>> 316 Via Pueblo Mall
>> Stanford, CA, 94305
>> Mobile: 650 714 7881
>> Office: 650 723 2279
> 
> 
> 
> ***************************************************
>    Makoto Koto            Visiting Scholar
>  476 Lomita Mall  244 McCullough Building
>  Stanford, CA 94305-4045
> ***************************************************
>


From jwc at snf.stanford.edu  Thu Jun 28 18:20:42 2007
From: jwc at snf.stanford.edu (James Conway)
Date: Thu, 28 Jun 2007 18:20:42 -0700
Subject: James will be away on vacation June 29 through Monday July 9, 2007
  FAQ: HOW to get help on the RAITH System during your session -- "Who are
 your gonna call"
Message-ID: <46845E6A.7070709@snf.stanford.edu>


*FAQ 06 : HOW to get help on the RAITH System during your session -- 
"Who are your gonna call?"*


*Greetings Raith Users:*

I will be away all of next week on FTO and will not be around through 
July 9, 2007 returning to work July 10, 2007.
I wish to remind everyone that we have set into place a hierarchical 
structure on what to do and whom to call if you encounter problems on 
the RAITH 150 system during my absence' or for those times I am not be 
available by cell phone.

I will be available by phone at 415-412-4825 by voice mail and SMS text 
messaging.  I will respond at my earliest opportunity.


For Example:

    * You encounter a LOAD LOCK Error on the system and cannot complete 
the Load/ Unload cycle without an administrator login.
    * The pumps or system hardware are not working normally and the 
logic may have become reversed.
   
   1. If I am available, try to call me on my cell and I will walk you 
through the Recovery procedures. 001-415-412-4825
     

   2. Try to contact any RAITH Champion:

    * Ilya Fushman      ifushman at stanford.edu
      <mailto:ifushman at stanford.edu>       650-804-1058

    *

      Andrei Faraon    faraon at stanford.edu
      <mailto:faraon at stanford.edu>          650-714-7881

    *

      Xinran Wang      xinranw at gmail.com
      <mailto:xinranw at gmail.com>           650-796-4743
      <mailto:xinranw at gmail.com>

    *

      Jun Pan              panjun at stanford.edu
      <mailto:panjun at stanford.edu>          650-353-6588

     


   3. Contact a RAITH USA Application Support Specialist:

Dr. Joseph Klingfus, Applications Scientist jk at raithusa.com  218-483-1267
    

   4. For Major Hardware issues and all emergencies with the RAITH 
Hardware:
Contact the  RAITH USA Field Service Manager, Cole Loomis 
cl at raithusa.com   (631) 738-9500
or Kevin Burcham kb at raithusa.com also at the Main Raith USA line (631) 
738-9500
    

Finally unless it is a catastrophic failure and the system becomes 
unsafe or in the least terrifying to operate -- please avoid placing the 
system into RED LIGHT Mode when I am away.
ALWAYS report all errors and comments to to the CORAL 'Make Comments' or 
'Report Problem' section so it gets logged into our tracking system.
To quote John Shott, "Its not a problem until it is reported to CORAL."

Many thanks to the many Raith Champions whom have come forward and 
offered to cover for me during my absence!

Thank you all for your support!

James Conway
Ebeam Technology Group
Stanford Nanofabrication Facility.
650-725-7075
cell 415-412-4825
jwc at snf.stanford.edu



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From hendrikb at stanford.edu  Fri Jun 29 15:35:04 2007
From: hendrikb at stanford.edu (Hendrik Bluhm)
Date: Fri, 29 Jun 2007 15:35:04 -0700 (PDT)
Subject: Raith free tomorrow 3:30 - 7:30
Message-ID: <Pine.GSO.4.44.0706291533560.11112-100000@elaine15.Stanford.EDU>

Moved reservation to later slots that became available.

---------------------------------------------------
Hendrik Bluhm


Department of Physics
Stanford University

Work address:                   Moler Lab
           			Lab. for Advanced Materials
Phone: (650) 723-4012           McCullough Bldg.
Fax:   (650) 725-2189           476  Lomita Mall
                                Stanford, CA 94305