EBeam resist wet bench guidelines

James Conway jwc at snf.stanford.edu
Wed Jun 13 10:43:45 PDT 2007

Good Morning Ebeam Wet Bench Users:

A great question came in by email today regarding usage of the Ebeam 
Resist Wet Bench.

So here are *_Guidelines of Usage for the Ebeam Resist Wet Bench_*

The *Ebeam Resist Wet Bench* is dedicated for Ebeam users only in an 
effort to prevent cross contamination and particulates from the Optical 
Lithography processes.

There is no qualification for use of the Ebeam wet bench. There is no 
enable on CORAL needed to utilize this bench for your processing.

*_This bench is to be used for Solvent based Ebeam Resist processing only.
*NO RED OPTICAL resist *are allowed to be used, nor disposed of, on the 
Ebeam wet bench.

This bench is to be wiped down with IPA using a wiper before and after 
every usage by each User.

No glassware or chemicals are allowed to remain on this bench for any 
period. (> 1 hour)

*Processes* that you would normally use this bench for include:

    * _Ebeam resist development processing._
    * Solvent cleaning of Ebeam engineering materials and substrates.
    * Stripping Ebeam resist from substrates.
    * Processing of small pieces and chips not normally handled easily
      on the other wet benches.

This equipment is in the Gold Contaminated equipment group because it is 
in the Lithography area. However it is up to the individual Lab Member 
to employ his own glassware at an appropriate contamination level for 
their process sequence.

Users encountering any problems, or having any concerns, on this bench 
should report their comments to beamtools at snf.stanford.edu email 
discussion list.

Thank you for your interest in Ebeam Technologies here at the Stanford 
Nanofabrication Facility,

James Conway

masaharu at stanford.edu wrote:
> Dear James,
> I forgot to tell wetbench.
> I also would like to be trained to work on EB wetbench.
> Could you add my name to the list?
> Best regards,
> Masaharu Kobayshi
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