From jwc at snf.stanford.edu Tue Apr 1 19:28:31 2008 From: jwc at snf.stanford.edu (James Conway) Date: Tue, 01 Apr 2008 18:28:31 -0800 Subject: Is Raith sample stage tilted ? In-Reply-To: <003d01c88eaf$35063780$231b40ab@nausicaa> References: <003d01c88eaf$35063780$231b40ab@nausicaa> Message-ID: <47F2EF4F.9080000@snf.stanford.edu> Hello Shinichi Koseki and the RAITH community: YES -- the standard sample holder does not land perfectly level due to wear and scratches on the top surface and normal wear to the backside kinetic mounts. I posted many emails to this effect several months ago.This sample holder has become very worn from new users and abuse from clipping additional fixture mounts and sliding wafers and gouges from tweezer scratches on the soft AL surface. My measurements last year indicated a total delta WD of between 124 and 174 um moving across a 90 mm distance across a 100 mm wafer clipped to both clip 2 and clip 4 of the standard sample holder. In my testing a delta WD of greater than 10 um /mm will result in loss of resolution for a 100 nm single pixel lines and below. (refer: Origin Target rings) using the 30 um aperture and 5 mm WD. The 10 um aperture will show a even more pronounced effect. Please refer to FAQ notebook NO 3 and 4 to review my measurements. I mounted a wafer to this assembly yesterday and obtained ~ 0.380 mm (380 um) total WD across 90 mm. I will repeat this measurement to assure that I did not clip onto lint free fibers, or had anything on the back side of my wafer as the magnitude is much larger than expected. I had just cleaned the mount using a wiper and IPA just before loading. The std. sample holder design specifications are greater that the +- 50 um that can be pushed up or pulled down from center position of the piezo leveling post. It was never designed to be leveled using the piezo post. However if you try to level a wafer you can obtain a suitable result for most EBL applications. Start out with centered piezo positions and follow the leveling procedure. My plan to to have this fixture reconditioned during the July 4th break if I can obtain design specifications and a blue print. I desire it to be fly cut and lapped to a very smooth finish. I may also have the kinetic mounts re-machined if possible. For users whom have a critical focusing need there are two alternatives.: We recently purchased for ~$15K USD a Universal Sample Holder that has adjustable kinetic mounts and can be leveled to within 100 nm to 1 um routinely. I HAVE ASKED ALL USERS TO BE EXTREMELY CAREFUL AND SHOW CARE SO AS TO NOT SCRATCH THE ALUMINUM SURFACE. PLEASE CAREFULLY PLACE UPON AND NEVER SLIDE A SUBSTRATE ACROSS THE SURFACE OR IS WILL BE QUICKLY RUINED. Silicon and GaAs substrates are much harder than Aluminum. You can make huge scratches into the polished surface if you are not extremely careful. For those working on full wafers I also have a full wafer electrostatic chuck which can also be precisely leveled to with 10 - 180 nm routinely. This assembly will work for wafers of 75, 100, 125 and 150 mm sizes. Some training, escorted use for the first five mountings, and my permission are required to employ this assembly. It too can be totally wrecked by just a single scratch into the charging surface. Replacement cost is on the order of $50K Euros. It can be a bit tricky to charge this assembly up and it will not function for insulating substrates, to my knowledge. If you have specific questions please see me during my office hour. Thank you for your support! James Conway PS I would like to personally commend Shinichi Koseki for his observations on this issue and for his great participation in assisting the RAITH community. Recently he carefully timed his write sessions and I have observed them completing their tasking just as I enter the Ebeam Lab to start my afternoon sessions. This is exactly what being a RAITH Champion is all about. Thank you Koseki-san! Shinichi Koseki wrote: > Hi James, > > I have a question. > It looks for me that the Raith sample stage is tilted. > > Please see the attached SEM images of my grating. (which I made last > week) > (~200nm grating period and 50/50 duty cycle, plasma etched > for target grating depth = 50nm) > This is written by Raith 30um aperture with dose 125uC on 2% 950K PMMA. > The one near the origin (where I adjust the focus with the > contamination dots) > was well written, but the one at 5mm above the origin was not. > > My GaAs chip size is about 8mm x 10mm. I paid particular attention for > the clamping (at clip #2 of old sample holder), so that no tilt was > visible. > Also, the back side of the chip is reasonablly clean. > Yesterday, the WD was 4.95mm near the origin, 4.96mm at (6mm, 9mm), > 10um difference ! > > Are your writings going well these days ? Should I adjust piezo > manually ? > Thanks for your comment ! > > Shinichi > ------------------------------------------------------------------------ > > > ------------------------------------------------------------------------ > -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: not available Type: image/jpeg Size: 75697 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: not available Type: image/jpeg Size: 72838 bytes Desc: not available URL: From jwc at snf.stanford.edu Tue Apr 1 19:32:46 2008 From: jwc at snf.stanford.edu (James Conway) Date: Tue, 01 Apr 2008 18:32:46 -0800 Subject: [Fwd: Berkeley Nano Forum] Message-ID: <47F2F04E.3050608@snf.stanford.edu> Ebeam and RAITH Users: This may be an excellent opportunity to improve communications and our general relationship between UC Berkeley and Stanford in a technical topical forum. It would also be a good place to present if you have not presented your work publicly before. Thank you, James Conway -------- Original Message -------- Subject: Berkeley Nano Forum Date: Tue, 25 Mar 2008 16:50:14 -0700 From: Mary Tang To: labmembers at snf.stanford.edu CC: Kayte Fischer References: <47E98ECA.1080603 at berkeley.edu> Labmembers -- A meeting announcement from across the bay: > *Fellow Researchers in Nanotechnology!* > > > The Berkeley Nanotechnology Club is proud to present to you an > opportunity to > present your research in the field of Nanotechnology at our upcoming > *Berkeley* > *Nano Forum on April 27^th *. The event will be hosting of about 300 > fellow > researchers, professors, entrepreneurs and others. We invite you to > bring your > research and put it on display at our *Poster Session*, to do so, > please submit > your 250 word abstracts to the following email addresses: > tapanpatel at berkeley.edu > and also to kayte at berkeley.edu . > > *Where:* Haas School of Business on the UCB Campus) > *When:* April 27^th > *Abstract Deadline:* April 5th (March 28^th for UCB students)^ > *Abstracts Submission:* tapanpatel at berkeley.edu > ; kayte at berkeley.edu > > > *Also* take a look at the attached Poster Session Flyer. > > > To subscribe to the Berkeley Nanotechnology Club mailing list, send an > e-mail to majordomo at listlink.berkeley.edu > containing the single line > "subscribe nanoclub" (without the quotes) in the body of the message. > > Visit us at http://nanoclub.berkeley.edu > > -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From kathrynt at stanford.edu Tue Apr 1 20:25:44 2008 From: kathrynt at stanford.edu (Kathryn Todd) Date: Tue, 1 Apr 2008 20:25:44 -0700 Subject: raith free tomorrow 10:30-1pm Message-ID: <4070ecc80804012025l3d85d397uf8c7e7bae6595f2@mail.gmail.com> From ahazeghi at stanford.edu Tue Apr 1 20:34:15 2008 From: ahazeghi at stanford.edu (Arash Hazeghi) Date: Tue, 1 Apr 2008 20:34:15 -0700 Subject: raith free tomorrow 10:30-1pm Message-ID: Taken - original message - Subject: raith free tomorrow 10:30-1pm From: "Kathryn Todd" Date: 04/02/2008 3:25 AM From toecutter4ranger at gmail.com Wed Apr 2 18:50:52 2008 From: toecutter4ranger at gmail.com (toecutter4ranger at gmail.com) Date: Thu, 3 Apr 2008 01:50:52 +0000 Subject: Stitching Message-ID: <626989564-1207187490-cardhu_decombobulator_blackberry.rim.net-605526973-@bxe120.bisx.prod.on.blackberry> Thank you for your measurement report. The 40 um fields have stitching breaks in X axis. The 1 um sub-sub fields also display butting errors as well. Your images have the same results as my exposures done last week and inspected today. Likely it is just time for a column PM which is now overdue. I will try two more test early next week and try to arrange service soon. Thank you. James Sent via BlackBerry by AT&T From ecezhoulj at gmail.com Thu Apr 3 10:55:20 2008 From: ecezhoulj at gmail.com (Linjie Zhou) Date: Thu, 3 Apr 2008 10:55:20 -0700 Subject: RAITH reservation swap References: <200804010552.m315qHYB007905@xylocopa.ucdavis.edu> <28d3ece90803312253s4e9d9b86l7270bc01850f87ce@mail.gmail.com> Message-ID: <037f01c895b3$e3250d40$934aeda9@Elcapitan> Hi, Since I have some urgent things to do on Thursday everning, I may not be able to use my Raith reservation time. Is anybody willing to swap the reservation with me? Friday night, Saturday, or Sunday are all ok. My reserved time slot: 2 am to 6 am, Fri. (April. 4) Thanks very much for your help! ljzhou -------------- next part -------------- An HTML attachment was scrubbed... URL: From mpovinel at stanford.edu Tue Apr 8 11:51:58 2008 From: mpovinel at stanford.edu (Michelle Povinelli) Date: Tue, 8 Apr 2008 11:51:58 -0700 Subject: Thurs 1:30p-2:30p released Message-ID: Thurs 1:30p-2:30p is released. From ahazeghi at stanford.edu Wed Apr 9 00:38:03 2008 From: ahazeghi at stanford.edu (Arash Hazeghi) Date: Wed, 09 Apr 2008 00:38:03 -0700 Subject: RAITH available now Message-ID: <20080409003803.z8eev0mjokggg0w8@webmail.stanford.edu> finished early. Arash From bilee at stanford.edu Wed Apr 9 00:39:06 2008 From: bilee at stanford.edu (Byoungil Lee) Date: Wed, 9 Apr 2008 00:39:06 -0700 Subject: RAITH available now In-Reply-To: <20080409003803.z8eev0mjokggg0w8@webmail.stanford.edu> References: <20080409003803.z8eev0mjokggg0w8@webmail.stanford.edu> Message-ID: <620185DCD01D434DBFB8B87172831B3D@BILeeX61> Taken. Thanks, Byoungil -----Original Message----- From: Arash Hazeghi [mailto:ahazeghi at stanford.edu] Sent: Wednesday, April 09, 2008 12:38 AM To: raith at snf.stanford.edu Subject: RAITH available now finished early. Arash From ahazeghi at stanford.edu Wed Apr 9 01:55:43 2008 From: ahazeghi at stanford.edu (Arash Hazeghi) Date: Wed, 09 Apr 2008 01:55:43 -0700 Subject: Beam blanker switch Message-ID: <20080409015543.l25numgubwgwc448@webmail.stanford.edu> Hi, Last night I spent more than 2 hours on the tool trying to figure why the beam would unblank itself when using the move command (with beam blanked), scanning anything in the position list or doing align write field. I was not able to do manual align write field because the beam would unblank itself, machine would go under SEM control and no image was acquired as a result. I tried automatic marks, the beam was unblanked again exposing all of my wafer and switching to int mode on its own. So I gave up, on the way out I talked to the next user about this, after looking at the control rack he figured the manual beam blanker switch was in lower position. I didn't know about this switch and as far as I know users are not supposed to change these settings. My time was wasted and my wafer was destroyed because an expert user did not remember to reset the switch. Please be more considerate. Thanks, Arash From jwc at snf.stanford.edu Wed Apr 9 11:47:53 2008 From: jwc at snf.stanford.edu (James Conway) Date: Wed, 09 Apr 2008 11:47:53 -0700 Subject: ANNOUNCEMENT: "Take A Spin with Me" -- Ebeam Resist Handling Training on the Headway for APRIL. Tuesday April 29 , 2008 10:15 AM to 12:30 PM Message-ID: <47FD0F59.1010106@snf.stanford.edu> * **ANNOUNCEMENT: "Take A Spin with Me" -- Resist Handling Training on the Headway Coater. MARCH CLASSES. * Greetings SNF Lab Users, I will be conducting my next *"Take A Spin with Me" *training class Tuesday April 29th , 2008 from 10:15 AM - 12:30 PM. There is a sign up sheet posted on the white board in my office if you desire to sign up in advance. This is a great opportunity for you to get acquainted with the specific points to employ when working with our Ebeam or Optical Resist materials in order to obtain high quality thin film coatings over your wafers for Electron Beam, Scanning Probe (SPL), and Optical Lithography. In these applications accurate control of polymer thickness is important in order to obtain consistent high quality lithography results. We will be conducting this training on the Headway Spin Coater. Users attending this session will gain their qualification on this tool and also learn to perform thin film measurements on the Nanospec TFA measurement tool. This is a Hands-On Lab Session, please have your substrates clean and ready to coat on the Headway Coater. Class Schedule: 10:15 - 11:00 I will start with substrate cleans on WET BENCH NONMETAL performing Pirhana substrate cleans and HF etching of the intrinsic native oxide on Silicon wafers. All users must have their substrates cleaned and ready to go for spinning by the session time; either coming out of the 150 degree Singe oven, or if you are working on oxides or nitrides, coming out of the YES HMDS Prime oven directly. 11:00 - 12:00 We can apply what ever Ebeam or Optical Resist system you desire for your work. 12:00 - 12:30 Thin Film Measurements on the Nanospec Thin Film Analyzer All interested parties are welcome to attend this session. Thank you for your interest in Ebeam and Optical Lithography at Stanford Nanofabrication Facility, James W. Conway Ebeam Technology Group Stanford Nanofabrication Facility 650-725-7075 office hour Tuesday - Friday 8:30 - 9:30 AM CIS 31 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: not available Type: image/gif Size: 3681 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: not available Type: image/jpeg Size: 49030 bytes Desc: not available URL: From jwc at snf.stanford.edu Wed Apr 9 11:50:38 2008 From: jwc at snf.stanford.edu (James Conway) Date: Wed, 09 Apr 2008 11:50:38 -0700 Subject: ANNOUNCEMENT: "Take A Spin with Me" -- Ebeam Resist Handling Training on the Headway for MAY. Tuesday May 6 and 20th, 2008 10:15 AM to 12:30 PM Message-ID: <47FD0FFE.5050402@snf.stanford.edu> * **ANNOUNCEMENT: "Take A Spin with Me" -- Resist Handling Training on the Headway Coater. MARCH CLASSES. * Greetings SNF Lab Users, I will be conducting my next *"Take A Spin with Me" *training class Tuesday May 6 and 20th , 2008 from 10:15 AM - 12:30 PM. There is a sign up sheet posted on the white board in my office if you desire to sign up in advance. This is a great opportunity for you to get acquainted with the specific points to employ when working with our Ebeam or Optical Resist materials in order to obtain high quality thin film coatings over your wafers for Electron Beam, Scanning Probe (SPL), and Optical Lithography. In these applications accurate control of polymer thickness is important in order to obtain consistent high quality lithography results. We will be conducting this training on the Headway Spin Coater. Users attending this session will gain their qualification on this tool and also learn to perform thin film measurements on the Nanospec TFA measurement tool. This is a Hands-On Lab Session, please have your substrates clean and ready to coat on the Headway Coater. Class Schedule: 10:15 - 11:00 I will start with substrate cleans on WET BENCH NONMETAL performing Pirhana substrate cleans and HF etching of the intrinsic native oxide on Silicon wafers. All users must have their substrates cleaned and ready to go for spinning by the session time; either coming out of the 150 degree Singe oven, or if you are working on oxides or nitrides, coming out of the YES HMDS Prime oven directly. 11:00 - 12:00 We can apply what ever Ebeam or Optical Resist system you desire for your work. 12:00 - 12:30 Thin Film Measurements on the Nanospec Thin Film Analyzer All interested parties are welcome to attend this session. Thank you for your interest in Ebeam and Optical Lithography at Stanford Nanofabrication Facility, James W. Conway Ebeam Technology Group Stanford Nanofabrication Facility 650-725-7075 office hour Tuesday - Friday 8:30 - 9:30 AM CIS 31 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: not available Type: image/gif Size: 3681 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: not available Type: image/jpeg Size: 49030 bytes Desc: not available URL: From jwc at snf.stanford.edu Wed Apr 9 15:44:15 2008 From: jwc at snf.stanford.edu (James Conway) Date: Wed, 09 Apr 2008 15:44:15 -0700 Subject: ANNOUNCEMENT: RAITH GROUP XXXI: BASIC USERS CLASS -- FOUR DAY INTENSIVE SHORT COURSE. APRIL 22 - 25, 2008 10 AM TO 6 PM Message-ID: <47FD46BF.9000100@snf.stanford.edu> *Greetings RAITH Group XXXI: ** If you are listed in the To: section of this email you are confirmed to be in RAITH Group** XXXI -- the next RAITH** Four Day Basic User Short Course. If you are listed in the CC: section of this email, I am** still ** in need of further information, or a commitment from you, and hope to add you in the next class. Any RAITH users wishing to attend are also welcome if you desire a review of operations on the RAITH 150 system. ** We wish to invite all other interested parties to the Tuesday morning lecture session from 10:00 AM - 12:30 PM, and the following Demo Layer One training from 2 PM - 6 PM in the afternoon. All others are also welcome to attend as observers the other 'Hands-On' sessions through the week. * *If you are listed in the To: section of this email: *This is your first reminder and confirmation of your commitment for attending the RAITH Group XXXI Training course to be held February 5 to 8, 2008 _*You are expected to attend all sessions in order to gain the experience and skills you will need to qualify on the RAITH 150 system.* _Users are also encouraged to attend the *"Take a Spin with Me"* class covering Ebeam Resist handling procedures. I am next holding this class on April 29th from 10:15 - 12:30 PM in the SNF cleanroom. There is a separate sign up for this class on the white board in my office at CIS 31. Thank you for your interest in Electron Beam Technologies at the Stanford Nanofabrication Facility, James Conway Ebeam Technology Group 650-725-7075 --------------------------------- * **RAITH Group** XXX**I** **Schedule: ** * *Raith 150 Basic Users Training -- Intensive 4 Day Short Course* *April 22 to 25th, 2007 from 10 - 6 PM Tuesday through Friday.* *The Plan of Action: *We will start out with a half day of lecture in the morning Tuesday; quickly moving into entirely 'Hands On' operations training through the remainder of the week. We will break for lunch at various times, while the system is writing, so plan to be flexible with your other outside commitments. You should have started working on your GDS II patterns and preparing PMMA on your substrates if you wish to write on your material. Please bring your patterns and materials to the 'Hands-On' sessions. Some afternoons we may also be able to finish earlier, letting the system write on its own to the end of our reservations on the system.* * * Schedule:* Tuesday April 22, 2008: 10:00 - 12:30 Session 1: Basic Users Course Lecture -- CIS-X 201 14:00 - 17:00 Session 2: RAITH System Demonstration - Layer One -- EBEAM LAB CIS L104 Wednesday April 23, 2008: 10:00 - 12:30 Session 3: RAITH System Demonstration - Layer Two: OVERLAY -- EBEAM LAB CIS L104 14:00 - 18:00 Session 4: Hands On training session One -- EBEAM LAB CIS L104 Thursday April 24, 2008: 10:00 - 12:30 Session 5: Hands On training session Two -- EBEAM LAB CIS L104 14:00 - 18:00 Session 6: Hands On training session Three -- EBEAM LAB CIS L104 Friday April 25, 2008: 10:00 - 12:30 Session 7: Hands On training session Four -- EBEAM LAB CIS L104 14:00 - 18:00 Session 8: Hands On training session Five -- EBEAM LAB CIS L104 Individual Qualification Sessions will be held after this class where you can demonstrate your skill on the system to me and gain your login to the system. I can provide a CD and printed materials at the first meeting, if you have not already received one yet. You can stop by my office hour and pick up a copy of these training materials during my daily office hour. (8:30 - 9:30 AM CIS 31) Just bring along a USB drive! ------------------------------------------------------------------------------------------------------------------------------------------- ** RAITH GROUP XXXI: Basic Users Class -- Four Day Short Course 1. Marlene Marjorie Ferrier mferrier at stanford.edu Coral: mferrier Nishi Group, Project: Tunneling devices studies. 2. Arka Majumdar arkam at stanford.edu Coral: arkam Vuckovic Group Project: QD in PhC cavity for computation. 3. Prabhu Arumugam auprabhu at yahoo.com Coral: auprabhu Phone: 408 702 0891 UCSC Group? Project: ___________________________________ 4. Chong Xie chongxie at stanford.edu Coral: chongxie Yi Cui Group, Materials Science. Project: nano-electrode for sensing. 5. Gordon Wan cwan at stanford.edu Coral: ccwan H.S. Phillip Wong EE dept. Project: nano-electromechanical relay with MWCNT. 6. Alexander Fried adfried at stanford.edu Coral: adfried Vuckovic Group Project: Photonic Crystals on GaAs. *Note: This is a tentative class listing due to pending certification of pre-requisites to be completed. * -------------- next part -------------- An HTML attachment was scrubbed... URL: From raneeyoo at stanford.edu Wed Apr 9 19:45:36 2008 From: raneeyoo at stanford.edu (Kyeongran Yoo) Date: Wed, 09 Apr 2008 19:45:36 -0700 Subject: Raith free until 20:30 In-Reply-To: <20080409015543.l25numgubwgwc448@webmail.stanford.edu> References: <20080409015543.l25numgubwgwc448@webmail.stanford.edu> Message-ID: <20080409194536.ueqb9ofmokccwg08@webmail.stanford.edu> finished early From jwc at snf.stanford.edu Thu Apr 10 11:01:16 2008 From: jwc at snf.stanford.edu (James Conway) Date: Thu, 10 Apr 2008 11:01:16 -0700 Subject: Problem with PMMA exposure/lift off In-Reply-To: <062CBE28-CA8E-4B81-B017-71F9671CD9E8@stanford.edu> References: <062CBE28-CA8E-4B81-B017-71F9671CD9E8@stanford.edu> Message-ID: <47FE55EC.6070007@snf.stanford.edu> Hello Arash Hazeghi and Others: Thanks for the images. In the first two images you are below the dose to clear for the finer lines. What is evident is you can see the 1 um sub-sub-field butting as these field overlap slightly, and at the 40 um sub-field you can see an apparent stitch break between the write fields. It is normal practice to increase dose slightly to eliminate these effects and both of those exposure artifacts will develop out. If your resist stack height is above 400 nm you may wish to increase development time and agitation as well. On the 300 nm 5% 495K PMMA I routinely develop fro 30 seconds, perform a quick high Magnification Microscope inspection, and then if I see these artifacts perform additional development in ten second intervals until the features are cleared. As the EBEAM tool slowly accumulates hydrocarbons in the lower sections of the column, specifically the final aperture in the objective lens and in the area around the blanking aperture, the astigmatism in the lens increases as does some charge up in the apertures when blanked; resulting in shifts of the ebeam spots placement as it writes these sub-fields. Within a very small range these fields can be adjusted -- but at some point we may need to perform a PM on the column to return the system to a normal state. I am currently evaluating these effects and have just two evenings ago refocused and changes stigmation slightly to the column settings. In my exposure test I reviewed last evening I reported a reduction in the magnitude of the stitching issues particularly for the 40 um sub-fields. IN the last two images it is plainly evident that there is an adhesion issue in your metal lift off films. You may wish to reconsider your initial substrate clean up method to ensure you are starting out clean and without any small source residues on your wafers surface. A simple TAPE test will assist you in evaluating thin film adhesion. All Users are advised to be sure to run the $DEF CF CL write field calibration routine for all of their exposures. Users working on any charging substrates such as SOI, or substrates with oxides or nitrides are recommended to coat their samples with a charge compensation coating such as ESPACER or a thin metal film to reduce charging effects on your EBL writes. Thank you for your support! James Conway Arash Hazeghi wrote: > Hi all, > I have been trying liftoff on my samples recently but it looks like > either I am doing something wrong or there is an exposure problem with > eBeam. I am trying to resolve 150nm lines on 300nm 5% 950-K PMMA > (standard coat procedure). I have tried area exposure dose from > 350uC/cm2 to 430uC/cm2. metal is 80A Pd+200A Pt. lift off was in > acetone with syringing. looking under the optical microscope some > higher dose exposures seem to have come out except for there are cuts > in the thin lines. In other samples looks like the exposed areas were > also lifted off. I have attached several pictures, exposure does is > indicated in each filename. Some users have already suggested using > higher doses which I am trying now, but I'd be happy to hear if there > are any other comments. > > Thank you, > Arash > > > > > > -------------------------------------------------------------------------- > Arash Hazeghi > > PhD Candidate > Stanford Center for Integrated Systems, > 420 Via Palou Mall, CIS-X 300 > tel: 650-725-0418 > mobile: 650-353-1866 > http://www.stanford.edu/~ahazeghi > > -------------- next part -------------- An HTML attachment was scrubbed... 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Name: not available Type: image/jpeg Size: 151241 bytes Desc: not available URL: From ecezhoulj at gmail.com Thu Apr 10 11:39:45 2008 From: ecezhoulj at gmail.com (Linjie Zhou) Date: Thu, 10 Apr 2008 11:39:45 -0700 Subject: Raith free 1 am to 5 am, April 13 References: <20080409015543.l25numgubwgwc448@webmail.stanford.edu> <20080409194536.ueqb9ofmokccwg08@webmail.stanford.edu> Message-ID: <011101c89b3a$41908d60$934aeda9@Elcapitan> Raith free from 1 am to 5 am on this Sunday (April 13) From jwc at snf.stanford.edu Thu Apr 10 11:58:42 2008 From: jwc at snf.stanford.edu (James Conway) Date: Thu, 10 Apr 2008 11:58:42 -0700 Subject: ZEP- 520A Question on stripping on GaAs and Si substrates In-Reply-To: <22cc95d90803281743s7f941271x3a83a3f3dc51d3eb@mail.gmail.com> References: <22cc95d90803281743s7f941271x3a83a3f3dc51d3eb@mail.gmail.com> Message-ID: <47FE6362.5080800@snf.stanford.edu> The easiest and fastest means to remove completely ZEP-520 and most of the PMMA blends is to RIE with O2 plasma. You can also strip off completely, particularly if it is cross linked thermally or after exposure to fluorine chemistries in the etchers, by employing NMP based solvents with surfactants such as PRS-127 followed by PRS-1000 Photoresist stripper or simply Microchem Remover PG heated gently to above 40 degrees C. Note that the ZEP -520 is so very high in contrast that even a 400 nm film will likely clear with just a slight increase in dose or increase development time. Try 55 ?C/cm**2 at 10 keV. Thank you for an excellent question! Best, James Conway Bryan Ellis wrote: > Hi James, > > I have a question about the ZEP 520a resist when you have some time. > I spun it onto a sample of GaAs and some Si samples this morning, but > I got the spin speeds wrong so I have a thick layer (~400nm instead of > 250nm). I tried to remove the resist from both the GaAs and the Si > samples by soaking them in Acetone for an hour. When I took the > samples out of the Acetone the Si samples were completely clean, but > the GaAs sample still had resist on it (I don't think the resist > thickness changed at all actually). Have you ever seen this before, > and do you have any recommendations for how to remove the resist? > > Thanks for your help, > Bryan -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Thu Apr 10 12:07:41 2008 From: jwc at snf.stanford.edu (James Conway) Date: Thu, 10 Apr 2008 12:07:41 -0700 Subject: "Finished" early: Raith150 program crashed In-Reply-To: <4d36fb940803282145r7fd84e84l9787d442cde13d0c@mail.gmail.com> References: <4d36fb940803282145r7fd84e84l9787d442cde13d0c@mail.gmail.com> Message-ID: <47FE657D.8030808@snf.stanford.edu> Hello ALL: We have seen this problem from time to time on the RAITH computer when running the RAITH150.exe application. Often after cancelling a exposure or when doing a lot of changes in the editor without saving yur changes regularly. While I am not sure, I think this is due to some memory addressing issues whereas the WINDOW XP OS doesn't allow an application to address specific addresses in the memory arrays if it has not been allocated within the application. I am not a windows software person so maybe someone else has a better diagnosis or opinion. If this occurs on the system it is recommended to gracefully *shut down* the RAITH computer and restart the WIN XP OS. and then the RAITH application. I will bring this up at the RAITH Users meeting at Three Beams in late May to determine if other users are encountering this issue and how it can be reduced or eliminated. Yours, James Conway Aaron Hryciw wrote: > Hello all (especially James, who might know why this happened, and > koseki, who is next) - > > I am "finished" my session early, due to a crash of the Raith150 > program. I was saving some minor changes to my patterns in the GDSII > database while making my final positionlist, and, after eight > modifications without any problems, the Raith150 program suddenly > popped up two fatal error messages, indicating something to the effect > of a "read violation" of some memory address (sorry, I don't remember > the exact wording), and shut down. Upon restarting the program, the > UVW coordinate system was reset, the positionlist wasn't saved, and, > in any event, I do not have time to refocus, etc., in my remaining > reservation time. > > Does anyone know why I got these error messages and the Raith150 > crash? Did I exceed available memory? My patterns were reasonably > large dose arrays, explicitly drawn out as single structure references > (perhaps this was a mistake, and I ought to have made a structure > reference of the single structure, and done the matrix duplication in > the positionlist instead). Please advise! > > Best, > > - Aaron > > > -- > Aaron Hryciw > Postdoctoral Scholar > Geballe Laboratory for Advanced Materials > Stanford University > 476 Lomita Mall (04-490) > McCullough Building, Rm. 325 > Stanford, CA 94305-4045 > > Tel.: (650) 723-5840 > Fax.: (650) 736-1984 -------------- next part -------------- An HTML attachment was scrubbed... URL: From bdai at stanford.edu Sun Apr 13 11:01:22 2008 From: bdai at stanford.edu (Bing Dai) Date: Sun, 13 Apr 2008 11:01:22 -0700 Subject: Raith free for next user Message-ID: <20080413110122.7j2o8i8jok8wksg0@webmail.stanford.edu> finished early... Bing From raneeyoo at stanford.edu Tue Apr 15 01:36:27 2008 From: raneeyoo at stanford.edu (Kyeongran Yoo) Date: Tue, 15 Apr 2008 01:36:27 -0700 Subject: raith release at 5:30am-8:30am on Thursday 17th Message-ID: <20080415013627.tt8cwtso68c8ksww@webmail.stanford.edu> From ecezhoulj at gmail.com Sat Apr 19 17:32:24 2008 From: ecezhoulj at gmail.com (Linjie Zhou) Date: Sat, 19 Apr 2008 17:32:24 -0700 Subject: raith release at 1:30am-5am on Sunday 20th References: <20080415013627.tt8cwtso68c8ksww@webmail.stanford.edu> Message-ID: <02cc01c8a27e$026a2970$934aeda9@Elcapitan> Sample is not ready. Sorry for the short notice. From bdai at stanford.edu Sat Apr 19 19:30:28 2008 From: bdai at stanford.edu (Bing Dai) Date: Sat, 19 Apr 2008 19:30:28 -0700 Subject: Raith Free for Next User Message-ID: <20080419193028.49024gvyoc4kgw4s@webmail.stanford.edu> Finished early ... Thanks, Bing From panjun at stanford.edu Sun Apr 20 16:56:33 2008 From: panjun at stanford.edu (Jun Pan) Date: Sun, 20 Apr 2008 16:56:33 -0700 Subject: free 18:30-24:00 Message-ID: <200804202356.m3KNuWhd017049@smtp-roam.Stanford.EDU> Not able to finish the sample -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Mon Apr 21 11:17:33 2008 From: jwc at snf.stanford.edu (James Conway) Date: Mon, 21 Apr 2008 11:17:33 -0700 Subject: Reminder: TOMORROW RAITH GROUP XXXI: BASIC USERS CLASS -- FOUR DAY INTENSIVE SHORT COURSE. APRIL 22 - 25, 2008 10 AM TO 6 PM Message-ID: <480CDA3D.6050408@snf.stanford.edu> *Reminder for RAITH Group XXXI -- Basic Users Class: ** If you are listed in the To: section of this email you are confirmed to be in RAITH Group** XXXI starting tomorrow.** If you are listed in the CC: section of this email, I am** still ** in need of further information, or a commitment from you, and hope to add you in the next class. Any RAITH users wishing to attend are also welcome if you desire a review of operations on the RAITH 150 system. ** We wish to invite all other interested parties to the Tuesday morning lecture session from 10:00 AM - 12:30 PM, and the following Demo Layer One training from 2 PM - 6 PM in the afternoon. All others are also welcome to attend as observers the other 'Hands-On' sessions through the week. * Looking forward to getting started on your projects together! **Thank you for your interest in Electron Beam Technologies at the Stanford Nanofabrication Facility, James Conway * **RAITH Group** XXX**I** **Schedule: ** * *Raith 150 Basic Users Training -- Intensive 4 Day Short Course* *April 22 to 25th, 2008 from 10 - 6 PM Tuesday through Friday.* *The Plan of Action: *We will start out with a half day of lecture in the morning Tuesday; quickly moving into entirely 'Hands On' Operations Training through the remainder of the week. We will break for lunch at various times, while the system is writing, so plan to be flexible with your other outside commitments. You should have started working on your GDS II patterns and preparing PMMA on your substrates if you wish to write on your material. Please bring your patterns and materials to the 'Hands-On' sessions. Some afternoons we may also be able to finish earlier, letting the system write on its own to the end of our reservations on the system.* * * Schedule:* Tuesday April 22, 2008: 10:00 - 12:30 Session 1: Basic Users Course Lecture -- *CIS-X 201* 14:00 - 17:00 Session 2: RAITH System Demonstration - Layer One -- EBEAM LAB CIS L104 Wednesday April 23, 2008: 10:00 - 12:30 Session 3: RAITH System Demonstration - Layer Two: OVERLAY -- EBEAM LAB CIS L104 14:00 - 18:00 Session 4: Hands On training session One -- EBEAM LAB CIS L104 Thursday April 24, 2008: 10:00 - 12:30 Session 5: Hands On training session Two -- EBEAM LAB CIS L104 14:00 - 18:00 Session 6: Hands On training session Three -- EBEAM LAB CIS L104 Friday April 25, 2008: 10:00 - 12:30 Session 7: Hands On training session Four -- EBEAM LAB CIS L104 14:00 - 16:00 Session 8: Hands On training session Five -- EBEAM LAB CIS L104 Individual Qualification Sessions will be held after this class where you can demonstrate your skill on the system to me and gain your login to the system. I can provide a CD or printed materials at the first meeting, if you have not already received one yet. You can stop by my office hour and pick up a copy of these training materials during my daily office hour. (8:30 - 9:30 AM CIS 31) Just bring along a USB drive! ------------------------------------------------------------------------------------------------------------------------------------------- RAITH GROUP XXXI: Basic Users Class -- Four Day Short Course 1. Marlene Marjorie Ferrier mferrier at stanford.edu Coral: mferrier Nishi Group, Project: Tunneling devices studies. 2. Arka Majumdar arkam at stanford.edu Coral: arkam Vuckovic Group Project: QD in PhC cavity for computation. 3. Prabhu Arumugam auprabhu at yahoo.com Coral: auprabhu Phone: 408 702 0891 UCSC Group? Project: ___________________________________ 4. Chong Xie chongxie at stanford.edu Coral: chongxie Yi Cui Group, Materials Science. Project: nano-electrode for sensing. 5. Gordon Wan cwan at stanford.edu Coral: ccwan H.S. Phillip Wong EE dept. Project: nano-electromechanical relay with MWCNT. 6. Alexander Fried adfried at stanford.edu Coral: adfried Vuckovic Group Project: Photonic Crystals on GaAs. *Note: This is a tentative class listing due to pending certification of pre-requisites to be completed. * -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Mon Apr 21 12:24:09 2008 From: jwc at snf.stanford.edu (James Conway) Date: Mon, 21 Apr 2008 12:24:09 -0700 Subject: Users will need to use the Faraday Cup on stage and not Faraday cup on sample holder Message-ID: <480CE9D9.5020108@snf.stanford.edu> *Good Afternoon RAITH Users,* Minor problems encountered this afternoon Users will need to use the *Faraday Cup on Stage* and not Faraday cup on sample holder to measure beam current today. The last User reported a problem reading current to the std. sample holders Faraday Cup and we are currently troubleshooting this issue. I am starting late at 1:30 PM on the system to allow the previous User time to complete her write due to the delay that just occurred to her session time. Thank you for your support! James Conway -------------- next part -------------- An HTML attachment was scrubbed... URL: From xinranw at stanford.edu Mon Apr 21 15:41:59 2008 From: xinranw at stanford.edu (Xinran Wang) Date: Mon, 21 Apr 2008 15:41:59 -0700 Subject: raith free tomorrow 12pm Message-ID: <22ffcd060804211541y314b7080x915e8b27b16f183@mail.gmail.com> Sample not ready, sorry for the late notice. Xinran -------------- next part -------------- An HTML attachment was scrubbed... URL: From krivoire at stanford.edu Mon Apr 21 19:11:59 2008 From: krivoire at stanford.edu (Kelley Rivoire) Date: Mon, 21 Apr 2008 19:11:59 -0700 Subject: raith offline computer not booting correctly Message-ID: <18d3aabd0804211911y27fc9bfdse2a64ce4b0ea687@mail.gmail.com> Dear raith users, The raith offline computer was frozen when I went to load my patterns, so I rebooted it. Now, however, it does not boot up correctly. (It restarts after the Windows screen comes up.) I tried booting in last known good configuration and safe mode, but that didn't help. If someone wants to try fixing it, I am sure it would be appreciated--for right now, I just turned it off. thanks, Kelley From ahryciw at gmail.com Mon Apr 21 22:16:46 2008 From: ahryciw at gmail.com (Aaron Hryciw) Date: Mon, 21 Apr 2008 22:16:46 -0700 Subject: Raith session cancelled (23:00 to 03:00): headway shutdown Message-ID: <4d36fb940804212216u5b9daf0m5d8ca2d799e80807@mail.gmail.com> Raith users: We are cancelling our Raith session (11:00 p.m. to 3:00 a.m.), since the previous user on headway2 encountered a problem: vacuum valve seems to be broken in the "on" position, such that it will not release his (thin) substrate. As such, we were unable to coat our substrate. Many apologies for the short notice! ? Aaron -- Aaron Hryciw Postdoctoral Scholar Geballe Laboratory for Advanced Materials Stanford University 476 Lomita Mall (04-490) McCullough Building, Rm. 325 Stanford, CA 94305-4045 Tel.: (650) 723-5840 Fax.: (650) 736-1984 -------------- next part -------------- An HTML attachment was scrubbed... URL: From bilee at stanford.edu Tue Apr 22 06:17:25 2008 From: bilee at stanford.edu (Byoungil Lee) Date: Tue, 22 Apr 2008 06:17:25 -0700 Subject: Issues with the Universal holder (Raith) Message-ID: <007701c8a47b$34b7c2d0$b66018ac@BILEEOFFICE> Dear James, I found a couple of issues with the Universal sample holder over the last night. 4inch wafer-range leveling (height control) does not work anymore on the universal holder. It used to work beautifully just until 3 days ago. ( I attached the picture of 50nm metal lines which were patterned with wafer-size leveling 3 days ago. ) Is the universal holder too damaged to do wafer-range height control? I am really concerned since height control is very critical for my current ebeam process. Also, the Faraday cup on Stage on the universal holder does not work as well. I am pointing this out because I'm not sure what you mentioned in your previous email was about universal holder or std. holder. Thank you for your help! Byoungil Lee -- Ph.D Candidate Center for Integrated Systems, CISX B113 420 Via Palou, Stanford University, Stanford, CA 94305. Phone: +1-650-796-9791 Email: bilee at stanford.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: KR9A2C4D3_2.tif Type: image/tiff Size: 787028 bytes Desc: not available URL: From jwc at snf.stanford.edu Tue Apr 22 18:27:48 2008 From: jwc at snf.stanford.edu (James Conway) Date: Tue, 22 Apr 2008 18:27:48 -0700 Subject: [Fwd: Problem raith SNF 2008-04-22 18:17:11: problem encounter by several users getting level sample holders] Message-ID: <480E9094.5040200@snf.stanford.edu> Raith Users: Users are requested to see me during my office hour if they either encountered a stage to sample holder crash or any other problem during a load lock procedure or of they have observed missing or out of focus features from their EBL write results. Over the weekend we lost the functionality of the sample holder Faraday cup connection to the picoammeter and concurrently started measuring very large out of level conditions on both the standard and the universal sample holders. The magnitude of this issue as observed is grossly larger than anything we have measured before and is a cause for grave concern. I am now suspecting damage to the piezo post mounting arms, or the ceramic mounting balls on top of the piezo stacks themselves, as a possible cause of this condition. This may have been a result of a user incorrectly mounting then attempting to load the sample holder or some other event affecting the mechanical integrity of the XY Stage. Thank you, James Conway -------- Original Message -------- Subject: Problem raith SNF 2008-04-22 18:17:11: problem encounter by several users getting level sample holders Date: Tue, 22 Apr 2008 18:17:12 -0700 From: jwc at snf.stanford.edu To: raith-pcs at snf.stanford.edu Caution to ALL USERS: Both the Std. sample holder and now the Universal Sample Holder USH) are not landing onto the piezo mounts correctly. We are measuring ~ 0.770 - 0.880 mm total delta working distance across a 100 mm wafer -- when it should be less than 0.124 mm on the std. sample holder and less than 2 um on the USH. Users are requested to reply if they encountered a stage or loading sample holder crash or misfortune during their operations over the last two weeks. Users writing on the system the last two weeks are requested to carefully inspect their patterns before pattern transfer to confirm their CD's are to specifications. Please report to the raith at snf.stanford.edu list your observations. Immediate field service request has been made to RAITH USA Inc. today at 6 PM PST. Thank you, JWC -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Wed Apr 23 09:23:59 2008 From: jwc at snf.stanford.edu (James Conway) Date: Wed, 23 Apr 2008 09:23:59 -0700 Subject: Canceling my RAITH reservation for Thursday May 1, 2008 from 1- 6 PM. Message-ID: <480F629F.6050809@snf.stanford.edu> An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Wed Apr 23 19:26:13 2008 From: jwc at snf.stanford.edu (James Conway) Date: Wed, 23 Apr 2008 19:26:13 -0700 Subject: [Fwd: Problem raith SNF 2008-04-23 19:15:49: calibration are required to piezo post and mech. adjustments to all sample holders need to be completed] Message-ID: <480FEFC5.1010306@snf.stanford.edu> Greetings RAITH Community: The system is coming back up after repairs. More testing and mechanical adjustments to the sample holders are required and I will continue this effort tomorrow. Experienced Users only unless you have my permission through tomorrow afternoon. Call me if you have any concerns. Users on the CORAL schedule overnight this evening and morning have my blessings to come onto the system. Good Luck. Please report if you see anything unusual. Thank you, James Conway -------- Original Message -------- Subject: Problem raith SNF 2008-04-23 19:15:49: calibration are required to piezo post and mech. adjustments to all sample holders need to be completed Date: Wed, 23 Apr 2008 19:15:49 -0700 From: jwc at snf.stanford.edu To: raith-pcs at snf.stanford.edu Greetings: Thanks to an incredible effort and response by RAITH Field service leader Bern Steggemann, whom by chance was traveling through SFO this morning we have effected repairs and replacement to the ceramic ball mounted on Piezo post three of the XY Laser stage. The electrical connection to the Faraday Cup on stage also resolved itself with this repair. I have tested the Load Lock and Robot arm and exchange position settings for sample holder transfer. Just brought the FE-GUN back up and it will take about six hours for emission to stabilize and possibly a day or more to return to previous emission levels. Vacuum levels are elevated but safe to resume operations this evening. I loaded the Universal Sample holder and attempted to level using the Piezo controls, but was unable to successfully level to any less than a total delta WD of 0.194 mm across a 96 mm axis across a 100 mm wafer. Note Piezo three is the fixed reference post height that the others are adjusted to mechanically. I desire to repeat this measurement again before attempting to perform mechanical adjustments to both the Universal and Electrostatic chuck sample holders. Note the Std. sample holder cannot be adjusted as they are pressed in, its detents are worn, and likely should soon be replaced or simply discarded. I will confirm with RAITH USA Inc. if I need to recalibrate the piezo controls before performing mechanical adjustments. *With some reservations I am releasing the system to experienced users only.* Users should carefully check their focus and perform a write field alignment within ~ 5 mm of where they intend to write their patterns. Be sure TO center all piezos as you come onto the system. Thank you for your support! James Conway -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Wed Apr 23 19:33:40 2008 From: jwc at snf.stanford.edu (James Conway) Date: Wed, 23 Apr 2008 19:33:40 -0700 Subject: ANNOUNCEMENT2: "Take A Spin with Me" -- Ebeam Resist Handling Training on the Headway for APRIL. Tuesday April 29 , 2008 10:15 AM to 12:30 PM Message-ID: <480FF184.9040807@snf.stanford.edu> * **ANNOUNCEMENT: "Take A Spin with Me" -- Resist Handling Training on the Headway Coater. MARCH CLASSES. * Greetings SNF Lab Users, I will be conducting my next *"Take A Spin with Me" *training class Tuesday April 29th , 2008 from 10:15 AM - 12:30 PM. There is a sign up sheet posted on the white board in my office if you desire to sign up in advance. This is a great opportunity for you to get acquainted with the specific points to employ when working with our Ebeam or Optical Resist materials in order to obtain high quality thin film coatings over your wafers for Electron Beam, Scanning Probe (SPL), and Optical Lithography. In these applications accurate control of polymer thickness is important in order to obtain consistent high quality lithography results. We will be conducting this training on the Headway Spin Coater. Users attending this session will gain their qualification on this tool and also learn to perform thin film measurements on the Nanospec TFA measurement tool. This is a Hands-On Lab Session, please have your substrates clean and ready to coat on the Headway Coater. Class Schedule: 10:15 - 11:00 I will start with substrate cleans on WET BENCH NONMETAL performing Pirhana substrate cleans and HF etching of the intrinsic native oxide on Silicon wafers. All users must have their substrates cleaned and ready to go for spinning by the session time; either coming out of the 150 degree Singe oven, or if you are working on oxides or nitrides, coming out of the YES HMDS Prime oven directly. 11:00 - 12:00 We can apply what ever Ebeam or Optical Resist system you desire for your work. 12:00 - 12:30 Thin Film Measurements on the Nanospec Thin Film Analyzer All interested parties are welcome to attend this session. Thank you for your interest in Ebeam and Optical Lithography at Stanford Nanofabrication Facility, James W. Conway Ebeam Technology Group Stanford Nanofabrication Facility 650-725-7075 office hour Tuesday - Friday 8:30 - 9:30 AM CIS 31 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: not available Type: image/gif Size: 3681 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: not available Type: image/jpeg Size: 49030 bytes Desc: not available URL: From mpreiner at stanford.edu Wed Apr 23 20:36:06 2008 From: mpreiner at stanford.edu (mpreiner at stanford.edu) Date: Wed, 23 Apr 2008 20:36:06 -0700 Subject: Raith free NOW until 11pm In-Reply-To: <480FEFC5.1010306@snf.stanford.edu> References: <480FEFC5.1010306@snf.stanford.edu> Message-ID: <20080423203606.qqcy9vwsw8co0o04@webmail.stanford.edu> For experienced users only, per email below. Enjoy. mike Quoting James Conway : > Greetings RAITH Community: > > The system is coming back up after repairs. More testing and > mechanical adjustments to the sample holders are required and I will > continue this effort tomorrow. > Experienced Users only unless you have my permission through tomorrow > afternoon. Call me if you have any concerns. > Users on the CORAL schedule overnight this evening and morning have my > blessings to come onto the system. > Good Luck. Please report if you see anything unusual. > > Thank you, > > James Conway > > > -------- Original Message -------- > Subject: Problem raith SNF 2008-04-23 19:15:49: calibration are > required to piezo post and mech. adjustments to all sample holders need > to be completed > Date: Wed, 23 Apr 2008 19:15:49 -0700 > From: jwc at snf.stanford.edu > To: raith-pcs at snf.stanford.edu > > > > Greetings: > Thanks to an incredible effort and response by RAITH Field service > leader Bern Steggemann, whom by chance was traveling through SFO this > morning we have effected repairs and replacement to the ceramic ball > mounted on Piezo post three of the XY Laser stage. > The electrical connection to the Faraday Cup on stage also resolved > itself with this repair. > > I have tested the Load Lock and Robot arm and exchange position > settings for sample holder transfer. > Just brought the FE-GUN back up and it will take about six hours for > emission to stabilize and possibly a day or more to return to previous > emission levels. Vacuum levels are elevated but safe to resume > operations this evening. > > I loaded the Universal Sample holder and attempted to level using the > Piezo controls, but was unable to successfully level to any less than a > total delta WD of 0.194 mm across a 96 mm axis across a 100 mm wafer. > Note Piezo three is the fixed reference post height that the others are > adjusted to mechanically. > I desire to repeat this measurement again before attempting to perform > mechanical adjustments to both the Universal and Electrostatic chuck > sample holders. > Note the Std. sample holder cannot be adjusted as they are pressed in, > its detents are worn, and likely should soon be replaced or simply > discarded. I will confirm with RAITH USA Inc. if I need to recalibrate > the piezo controls before performing mechanical adjustments. > > *With some reservations I am releasing the system to experienced users > only.* Users should carefully check their focus and perform a write > field alignment within ~ 5 mm of where they intend to write their > patterns. Be sure TO center all piezos as you come onto the system. > Thank you for your support! > James Conway From ahazeghi at stanford.edu Thu Apr 24 01:42:58 2008 From: ahazeghi at stanford.edu (Arash Hazeghi) Date: Thu, 24 Apr 2008 01:42:58 -0700 Subject: Lift off Message-ID: <003e01c8a5e7$327cb080$97761180$@edu> Dear RAITH users, I have been trying to resolve 100-150nm lines with the RAITH using 5%-950K PMMA (thickness=300nm), I am using area exposure dose of 160 uC/cm2, developing for 45 sec, post-develop bake @90C for 2 min and then metal evaporation. Metal layers are 10A Ti (for adhesion) and 400A Pd. I did sonication for about 15sec after the wafer had been sitting in Acetone for a while. Some of my devices came out well but some are missing the thin lines (see attached SEM images) does anyone know if mild sonication will cause thin features to "peel off" the substrate? Thanks, Arash ---------------------------------------------------------------------------- - Arash Hazeghi PhD Candidate, Stanford Center for Integrated Systems 420 Via Palou Mall, CIS-X 300 Stanford, CA 94305 phone: +1-(650)-725-0418 http://www.stanford.edu/~ahazeghi/ -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: PMMA5-950K-45secdev-dose160-13.jpg Type: image/jpeg Size: 214381 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: PMMA5-950K-45secdev-dose160-06.jpg Type: image/jpeg Size: 179546 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: PMMA5-950K-45secdev-dose160-10.jpg Type: image/jpeg Size: 113083 bytes Desc: not available URL: From jwc at snf.stanford.edu Thu Apr 24 09:12:55 2008 From: jwc at snf.stanford.edu (James Conway) Date: Thu, 24 Apr 2008 09:12:55 -0700 Subject: RAITH GROUP XXXII: BASIC USERS CLASS -- FOUR DAY INTENSIVE SHORT COURSE resumes today at 10 AM in the Ebeam Lab Message-ID: <4810B187.2040305@snf.stanford.edu> Greetings RAITH Group XXXII:* ** * Thank you for your understanding in the interruption to our schedule and plan yesterday. These complex electro-mechanical systems can be a challenge to keep up all the time. I spend much of yesterday bringing the tool back up after repairs to the XY stage and many of the problems we encountered in our session on Tuesday afternoon have been resolved. We will resume the RAITH Basic Users Class this morning at 10 AM in the Ebeam Lab. We will develop out the wafer that we wrote and set the system up for another exposure and begin working doing exposures in overlay to the patterns we wrote Tuesday evening. Thank you for your support! James Conway -------------- next part -------------- An HTML attachment was scrubbed... URL: From xinranw at stanford.edu Thu Apr 24 09:14:04 2008 From: xinranw at stanford.edu (Xinran Wang) Date: Thu, 24 Apr 2008 08:14:04 -0800 Subject: finished early, free until 10 Message-ID: <22ffcd060804240914n38071723ud4128d4b2d7eb767@mail.gmail.com> -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Thu Apr 24 09:16:39 2008 From: jwc at snf.stanford.edu (James Conway) Date: Thu, 24 Apr 2008 09:16:39 -0700 Subject: Problem raith SNF 2008-04-23 19:15:49: calibration are required to piezo post and mech. adjustments to all sample holders need to be completed] In-Reply-To: <003001c8a605$f188a290$231b40ab@nausicaa> References: <480FEFC5.1010306@snf.stanford.edu> <003001c8a605$f188a290$231b40ab@nausicaa> Message-ID: <4810B267.5040500@snf.stanford.edu> Good Morning Koseki-san, Thank you for your measurements! This is great help to me to obtain these values from you. Today in the Raith class I will compare your numbers to mine using a 100 mm wafer clipped to the Std. sample holder. Many Thanks, James Conway Shinichi Koseki wrote: > Hi James, > > I am using the machine, and encountered no problems so far. > Thanks for the repair ! > > FYI, here are the parameters I got. WD uniformity is also good. > > clip #2 at the standard sample holder. > 30 um aperture / 0.17039 nA > WD=4.7158mm @ V=2.7mm (on my chip, U=left end of the chip) > WD=4.7122mm @ V=4.5mm (after ~2hrs) > WD=4.7092mm @ V=6.6mm (further after ~2hrs) > > best, > > Shinichi > > > ----- Original Message ----- > *From:* James Conway > *To:* Raith SNF Mailing list ; > Makoto Koto ; Mike Preiner > ; Shinichi Koseki > ; Xinran Wang > ; Filip Crnogorac > > *Sent:* Wednesday, April 23, 2008 7:26 PM > *Subject:* [Fwd: Problem raith SNF 2008-04-23 19:15:49: > calibration are required to piezo post and mech. adjustments to > all sample holders need to be completed] > > Greetings RAITH Community: > > The system is coming back up after repairs. More testing and > mechanical adjustments to the sample holders are required and I > will continue this effort tomorrow. > Experienced Users only unless you have my permission through > tomorrow afternoon. Call me if you have any concerns. > Users on the CORAL schedule overnight this evening and morning > have my blessings to come onto the system. > Good Luck. Please report if you see anything unusual. > > Thank you, > > James Conway > > > -------- Original Message -------- > Subject: Problem raith SNF 2008-04-23 19:15:49: calibration are > required to piezo post and mech. adjustments to all sample holders > need to be completed > Date: Wed, 23 Apr 2008 19:15:49 -0700 > From: jwc at snf.stanford.edu > To: raith-pcs at snf.stanford.edu > > > > Greetings: > Thanks to an incredible effort and response by RAITH Field service leader Bern Steggemann, whom by chance was traveling through SFO this morning we have effected repairs and replacement to the ceramic ball mounted on Piezo post three of the XY Laser stage. > The electrical connection to the Faraday Cup on stage also resolved itself with this repair. > > I have tested the Load Lock and Robot arm and exchange position settings for sample holder transfer. > Just brought the FE-GUN back up and it will take about six hours for emission to stabilize and possibly a day or more to return to previous emission levels. > Vacuum levels are elevated but safe to resume operations this evening. > > I loaded the Universal Sample holder and attempted to level using the Piezo controls, but was unable to successfully level to any less than a total delta WD of 0.194 mm across a 96 mm axis across a 100 mm wafer. > Note Piezo three is the fixed reference post height that the others are adjusted to mechanically. > I desire to repeat this measurement again before attempting to perform mechanical adjustments to both the Universal and Electrostatic chuck sample holders. > Note the Std. sample holder cannot be adjusted as they are pressed in, its detents are worn, and likely should soon be replaced or simply discarded. > > I will confirm with RAITH USA Inc. if I need to recalibrate the piezo controls before performing mechanical adjustments. > > *With some reservations I am releasing the system to experienced users only.* > Users should carefully check their focus and perform a write field alignment within ~ 5 mm of where they intend to write their patterns. > Be sure TO center all piezos as you come onto the system. > Thank you for your support! > James Conway > > > -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Thu Apr 24 18:21:04 2008 From: jwc at snf.stanford.edu (James Conway) Date: Thu, 24 Apr 2008 18:21:04 -0700 Subject: Raith Status Thursday at 6 PM. Message-ID: <48113200.8010705@snf.stanford.edu> An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Fri Apr 25 08:54:42 2008 From: jwc at snf.stanford.edu (James Conway) Date: Fri, 25 Apr 2008 08:54:42 -0700 Subject: Comment raith SNF 2008-04-25 04:37:44: 2% 950k PMMA is running out Message-ID: <4811FEC2.207@snf.stanford.edu> Good Morning, I am aware we are down to our last 30 ml of 2% 950K PMMA in the lab and am stocking everything this morning for the weekend. JWC bilee at snf.stanford.edu wrote: -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Fri Apr 25 09:53:13 2008 From: jwc at snf.stanford.edu (James Conway) Date: Fri, 25 Apr 2008 09:53:13 -0700 Subject: ANNOUNCEMENT: "Take A Spin with Me" -- Ebeam Resist Handling Training on the Headway for MAY. Tuesday May 6 and 20th, 2008 10:15 AM to 12:30 PM Message-ID: <48120C79.9060603@snf.stanford.edu> * **ANNOUNCEMENT: "Take A Spin with Me" -- Resist Handling Training on the Headway Coater. MARCH CLASSES. * Greetings SNF Lab Users, I will be conducting my next *"Take A Spin with Me" *training class Tuesday May 6 and 20th , 2008 from 10:15 AM - 12:30 PM. There is a sign up sheet posted on the white board in my office if you desire to sign up in advance. This is a great opportunity for you to get acquainted with the specific points to employ when working with our Ebeam or Optical Resist materials in order to obtain high quality thin film coatings over your wafers for Electron Beam, Scanning Probe (SPL), and Optical Lithography. In these applications accurate control of polymer thickness is important in order to obtain consistent high quality lithography results. We will be conducting this training on the Headway Spin Coater. Users attending this session will gain their qualification on this tool and also learn to perform thin film measurements on the Nanospec TFA measurement tool. This is a Hands-On Lab Session, please have your substrates clean and ready to coat on the Headway Coater. Class Schedule: 10:15 - 11:00 I will start with substrate cleans on WET BENCH NONMETAL performing Pirhana substrate cleans and HF etching of the intrinsic native oxide on Silicon wafers. All users must have their substrates cleaned and ready to go for spinning by the session time; either coming out of the 150 degree Singe oven, or if you are working on oxides or nitrides, coming out of the YES HMDS Prime oven directly. 11:00 - 12:00 We can apply what ever Ebeam or Optical Resist system you desire for your work. 12:00 - 12:30 Thin Film Measurements on the Nanospec Thin Film Analyzer All interested parties are welcome to attend this session. Thank you for your interest in Ebeam and Optical Lithography at Stanford Nanofabrication Facility, James W. Conway Ebeam Technology Group Stanford Nanofabrication Facility 650-725-7075 office hour Tuesday - Friday 8:30 - 9:30 AM CIS 31 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: not available Type: image/gif Size: 3681 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: not available Type: image/jpeg Size: 49030 bytes Desc: not available URL: From jwc at snf.stanford.edu Mon Apr 28 14:41:04 2008 From: jwc at snf.stanford.edu (James Conway) Date: Mon, 28 Apr 2008 14:41:04 -0700 Subject: I need all the raith dongles returned to me today... Message-ID: <48164470.5020709@snf.stanford.edu> Greetings to the Raith Users whom have the RAITH Off Line Software dongles: When I loan out a raith dongle key it is to be returned within two weeks or fourteen days at the latest. The people in the To: list have all had them more than a month! Please return the raith keys to me today! Users or groups interested in purchase of the RAITH off line software and the GDSII editor can contact me directly and I can obtain a current quote. Thank you, James Conway -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: everest.jpg Type: image/jpeg Size: 17350 bytes Desc: not available URL: From jwc at snf.stanford.edu Tue Apr 29 09:49:32 2008 From: jwc at snf.stanford.edu (James Conway) Date: Tue, 29 Apr 2008 09:49:32 -0700 Subject: Reminder: "Take A Spin with Me" -- Ebeam Resist Handling Training on the Headway for APRIL. Tuesday April 29 , 2008 10:15 AM to 12:30 PM Message-ID: <4817519C.8080901@snf.stanford.edu> * **ANNOUNCEMENT: "Take A Spin with Me" -- Resist Handling Training on the Headway Coater. MARCH CLASSES. * Greetings SNF Lab Users, I will be conducting my *"Take A Spin with Me" *training class today Tuesday April 29th , 2008 from 10:15 AM - 12:30 PM. There is a sign up sheet posted on the white board in my office if you desire to sign up in advance. This is a great opportunity for you to get acquainted with the specific points to employ when working with our Ebeam or Optical Resist materials in order to obtain high quality thin film coatings over your wafers for Electron Beam, Scanning Probe (SPL), and Optical Lithography. In these applications accurate control of polymer thickness is important in order to obtain consistent high quality lithography results. We will be conducting this training on the Headway Spin Coater. Users attending this session will gain their qualification on this tool and also learn to perform thin film measurements on the Nanospec TFA measurement tool. This is a Hands-On Lab Session, please have your substrates clean and ready to coat on the Headway Coater. Class Schedule: 10:15 - 11:00 I will start with substrate cleans on WET BENCH NONMETAL performing Pirhana substrate cleans and HF etching of the intrinsic native oxide on Silicon wafers. All users must have their substrates cleaned and ready to go for spinning by the session time; either coming out of the 150 degree Singe oven, or if you are working on oxides or nitrides, coming out of the YES HMDS Prime oven directly. 11:00 - 12:00 We can apply what ever Ebeam or Optical Resist system you desire for your work. 12:00 - 12:30 Thin Film Measurements on the Nanospec Thin Film Analyzer All interested parties are welcome to attend this session. Thank you for your interest in Ebeam and Optical Lithography at Stanford Nanofabrication Facility, James W. Conway Ebeam Technology Group Stanford Nanofabrication Facility 650-725-7075 office hour Tuesday - Friday 8:30 - 9:30 AM CIS 31 -------------- next part -------------- An HTML attachment was scrubbed... URL: From ahryciw at gmail.com Tue Apr 29 11:34:01 2008 From: ahryciw at gmail.com (Aaron Hryciw) Date: Tue, 29 Apr 2008 11:34:01 -0700 Subject: Raith released 05/01 23:00-03:00 EOM Message-ID: <4d36fb940804291134u5d28d7y5bd79cddcda504ec@mail.gmail.com> -- Aaron Hryciw Postdoctoral Scholar Geballe Laboratory for Advanced Materials Stanford University 476 Lomita Mall (04-490) McCullough Building, Rm. 325 Stanford, CA 94305-4045 Tel.: (650) 723-5840 Fax.: (650) 736-1984 -------------- next part -------------- An HTML attachment was scrubbed... URL: From ytcheng at stanford.edu Tue Apr 29 11:37:57 2008 From: ytcheng at stanford.edu (Yao-Te Cheng) Date: Tue, 29 Apr 2008 11:37:57 -0700 Subject: Raith released 05/01 23:00-03:00 EOM In-Reply-To: <4d36fb940804291134u5d28d7y5bd79cddcda504ec@mail.gmail.com> References: <4d36fb940804291134u5d28d7y5bd79cddcda504ec@mail.gmail.com> Message-ID: <001801c8aa28$24d8c960$6e8a5c20$@edu> Taken. Thanks. Yao-Te From: Aaron Hryciw [mailto:ahryciw at gmail.com] Sent: Tuesday, April 29, 2008 11:34 AM To: raith at snf.stanford.edu Subject: Raith released 05/01 23:00-03:00 EOM -- Aaron Hryciw Postdoctoral Scholar Geballe Laboratory for Advanced Materials Stanford University 476 Lomita Mall (04-490) McCullough Building, Rm. 325 Stanford, CA 94305-4045 Tel.: (650) 723-5840 Fax.: (650) 736-1984 -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Tue Apr 29 19:17:41 2008 From: jwc at snf.stanford.edu (James Conway) Date: Tue, 29 Apr 2008 19:17:41 -0700 Subject: Is Raith going to be up tomorrow morning? In-Reply-To: <20080429142118.wxspfnemsog84gc0@webmail.stanford.edu> References: <480FEFC5.1010306@snf.stanford.edu> <20080429142118.wxspfnemsog84gc0@webmail.stanford.edu> Message-ID: <4817D6C5.8070501@snf.stanford.edu> Hello Kyeongran and Raith Community: Late today I remounted the ceramic ball and the top plate of the P3 Piezo mount to the piezo post after allowing the epoxy adhesive attaching the ball to cure in atmosphere overnight. Upon staring the system pump down I ran into unexpected problems with the turbo pump(TP) and/or its vacuum controller when it did not reach proper speeds before a timeout tripped in the controller stopped the pump down sequence . I will need to open and remount the two ports that I have opened to effect repairs to the piezo mount. I will resume this work tomorrow. Hoping to have the system available to users tomorrow evening... My apologizes for the interruption to your research plans, James Conway SNF Ebeam Lab Kyeongran Yoo wrote: > Hello James, > I have a joint session with SangBum tomorrow morning at Raith. > I am wondering if it is going to be up by then. > Please let me know and thanks, > Kyeongran > -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Wed Apr 30 09:53:06 2008 From: jwc at snf.stanford.edu (James Conway) Date: Wed, 30 Apr 2008 09:53:06 -0700 Subject: ANNOUNCEMENT: "Take A Spin with Me" -- Ebeam Resist Handling Training on the Headway for MAY. Tuesday May 6 and 20th, 2008 10:15 AM to 12:30 PM Message-ID: <4818A3F2.4080907@snf.stanford.edu> * **ANNOUNCEMENT: "Take A Spin with Me" -- Resist Handling Training on the Headway Coater. MARCH CLASSES. * Greetings SNF Lab Users, I will be conducting my next *"Take A Spin with Me" *training class Tuesday May 6 and 20th , 2008 from 10:15 AM - 12:30 PM. There is a sign up sheet posted on the white board in my office if you desire to sign up in advance. This is a great opportunity for you to get acquainted with the specific points to employ when working with our Ebeam or Optical Resist materials in order to obtain high quality thin film coatings over your wafers for Electron Beam, Scanning Probe (SPL), and Optical Lithography. In these applications accurate control of polymer thickness is important in order to obtain consistent high quality lithography results. We will be conducting this training on the Headway Spin Coater. Users attending this session will gain their qualification on this tool and also learn to perform thin film measurements on the Nanospec TFA measurement tool. This is a Hands-On Lab Session, please have your substrates clean and ready to coat on the Headway Coater. Class Schedule: 10:15 - 11:00 I will start with substrate cleans on WET BENCH NONMETAL performing Pirhana substrate cleans and HF etching of the intrinsic native oxide on Silicon wafers. All users must have their substrates cleaned and ready to go for spinning by the session time; either coming out of the 150 degree Singe oven, or if you are working on oxides or nitrides, coming out of the YES HMDS Prime oven directly. 11:00 - 12:00 We can apply what ever Ebeam or Optical Resist system you desire for your work. 12:00 - 12:30 Thin Film Measurements on the Nanospec Thin Film Analyzer All interested parties are welcome to attend this session. Thank you for your interest in Ebeam and Optical Lithography at Stanford Nanofabrication Facility, James W. Conway Ebeam Technology Group Stanford Nanofabrication Facility 650-725-7075 office hour Tuesday - Friday 8:30 - 9:30 AM CIS 31 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: not available Type: image/gif Size: 3681 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: not available Type: image/jpeg Size: 49030 bytes Desc: not available URL: From jwc at snf.stanford.edu Wed Apr 30 18:43:27 2008 From: jwc at snf.stanford.edu (James Conway) Date: Wed, 30 Apr 2008 18:43:27 -0700 Subject: RAITH Status 18:00 Wednesday -- System repairs completed -- I need to finish more testing tomorrow before releasing to users. Message-ID: <4819203F.5000001@snf.stanford.edu> *Good Evening Raith Community: * Many thanks to the many Users whom have offered assistance, a spare hand to help me reach things from behind the tool, and support during this very difficult week. I believe we have completed repairs to the stage and today I replaced the O-ring seal to the rear door that prevented me from pumping down the system last night. The rear door O-ring seal is a difficult one to keep in place during installation and fitting of the door to the chamber. Last night as I screwed down the door I pinched the O-ring on the seal surface and it was sliced. Currently I am pumping down the system,and running up the FE-Gun. I have successfully completed three automatic and two manual Load Lock exchanges of the Universal Sample Holder. Tomorrow I will test each of the two sample holders by performing the Load Lock exchange five times each to ensure that we are going to stay up when Users come onto the tool. I hope to resume the coral schedule in the mid to late afternoon. Best guess is 3 PM hand off to users on the schedule. FE-Gum emission should be close to normal levels. To catch up to the schedule I am asking all users to "Share the Ride" and load with others after you to create opportunities for those whom were impacted by this down time. It is also now expected that all Users will be in attendance at the RAITH tool as their exposures complete to reduce idle system time between reservation slots. If anyone has any questions please see me during my office hours. Thank you for your support! James Conway -------------- next part -------------- An HTML attachment was scrubbed... URL: