From lmoore.email at gmail.com  Fri Feb  1 09:00:33 2008
From: lmoore.email at gmail.com (Lindsay Moore)
Date: Fri, 1 Feb 2008 09:00:33 -0800
Subject: reservation released
Message-ID: <4dfce5b30802010900y647e0c51j733ef6db51211970@mail.gmail.com>

due to unforseeable sample failure, my remaining time will be insufficient
to complete my write.  session released and SEM free until 10:30.  sorry for
the late notice.
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From lsmoore at stanford.edu  Fri Feb  1 09:00:59 2008
From: lsmoore at stanford.edu (Lindsay Moore)
Date: Fri, 1 Feb 2008 09:00:59 -0800
Subject: reservation released
In-Reply-To: <4dfce5b30802010900y647e0c51j733ef6db51211970@mail.gmail.com>
References: <4dfce5b30802010900y647e0c51j733ef6db51211970@mail.gmail.com>
Message-ID: <4dfce5b30802010900v5976db32o3f5eeba433c88f7e@mail.gmail.com>

due to unforseeable sample failure, my remaining time will be insufficient
to complete my write.  session released and SEM free until 10:30.  sorry for
the late notice.
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From jwc at snf.stanford.edu  Fri Feb  1 09:18:01 2008
From: jwc at snf.stanford.edu (James Conway)
Date: Fri, 01 Feb 2008 09:18:01 -0800
Subject: Today 8:30 - 10:30 RAITH session released due to death of sample...
Message-ID: <47A35449.8040501@snf.stanford.edu>

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From ytcheng at stanford.edu  Fri Feb  1 16:13:39 2008
From: ytcheng at stanford.edu (ytcheng at stanford.edu)
Date: Fri, 01 Feb 2008 16:13:39 -0800
Subject: raith free from now to 6pm
Message-ID: <20080201161339.s2d4f4rtj4w0k8os@webmail.stanford.edu>

finished early

Yao-Te


From faraon at stanford.edu  Fri Feb  1 16:15:51 2008
From: faraon at stanford.edu (Andrei Faraon)
Date: Fri, 1 Feb 2008 16:15:51 -0800
Subject: raith free from now to 6pm
In-Reply-To: <20080201161339.s2d4f4rtj4w0k8os@webmail.stanford.edu>
References: <20080201161339.s2d4f4rtj4w0k8os@webmail.stanford.edu>
Message-ID: <28d3ece90802011615y2934c444ifa542916ac8fb617@mail.gmail.com>

I'll take it.

Andrei



On Feb 1, 2008 4:13 PM,  <ytcheng at stanford.edu> wrote:
> finished early
>
> Yao-Te
>



-- 
Andrei Faraon

Stanford University, Applied Physics
316 Via Pueblo Mall
Stanford, CA, 94305
Mobile: 650 714 7881
Office: 650 723 2279


From jwc at snf.stanford.edu  Fri Feb  1 16:30:19 2008
From: jwc at snf.stanford.edu (James Conway)
Date: Fri, 01 Feb 2008 16:30:19 -0800
Subject: Any User may now operate the RAITH system up to 30 keV acceleration
 voltage.  FE_GUN adjustments aslo performed today.
Message-ID: <47A3B99B.7050800@snf.stanford.edu>

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From rohank at stanford.edu  Sat Feb  2 12:46:46 2008
From: rohank at stanford.edu (Rohan D. Kekatpure)
Date: Sat, 2 Feb 2008 12:46:46 -0800 (PST)
Subject: Done Early. Raith Free 12:45p-2:00p
Message-ID: <Pine.GSO.4.44.0802021246120.12058-100000@elaine11.Stanford.EDU>






From koseki at stanford.edu  Mon Feb  4 08:16:42 2008
From: koseki at stanford.edu (Shinichi Koseki)
Date: Mon, 4 Feb 2008 08:16:42 -0800
Subject: time swap notice 
Message-ID: <000901c86749$543aeac0$231b40ab@nausicaa>

Hi,

Just for notice, I swapped my reservation slot (Wed 0am-) 
with today's Michelle's slot (Mon 9am-).

regards,

Shinichi


From jwc at snf.stanford.edu  Mon Feb  4 11:50:46 2008
From: jwc at snf.stanford.edu (James Conway)
Date: Mon, 04 Feb 2008 11:50:46 -0800
Subject: ANNOUNCEMENT:  "Take A Spin with Me" -- Ebeam Resist Handling Training
 on the Headway.  Tuesday  January 29, 2008 from 10:15  - 12:30
Message-ID: <47A76C96.9040401@snf.stanford.edu>

*

*
**
*
ANNOUNCEMENT:  "Take A Spin with Me" -- Resist Handling Training on the 
Headway Coater.*

Greetings SNF Lab Users,

I will be conducting my next *"Take A Spin with Me" *training class 
Tuesday February 19, 2008 from 10:15 AM  - 12:30 PM. There is a sign up 
sheet posted on the white board in my office if you desire to sign up in 
advance.

This is a great opportunity for you to get acquainted with the specific 
points to employ when working with our Ebeam or Optical Resist materials 
in order to obtain high quality thin film coatings over your wafers for 
Electron Beam, Scanning Probe (SPL), and optical Nano-Lithography. In 
these applications accurate control of polymer thickness is important in 
order to obtain consistent high quality lithography results.

We will be conducting this training on the Headway Spin Coater.  Users 
attending this session will gain their qualification on this tool and 
also learn to perform thin film measurements on the Nanospec TFA 
measurement tool.
This is a Hands-On Lab Session, please have your substrates clean and 
ready to coat on the Headway Coater.

Class Schedule:

10:15 - 11:00 I will start with substrate cleans on WET BENCH NONMETAL 
performing Pirhana substrate cleans and HF etching of the intrinsic 
native oxide on Silicon wafers.  All users must have their substrates 
cleaned and ready to go for spinning by the session time; either coming 
out of the 150 degree Singe oven, or if you are working on oxides or 
nitrides, coming out of the YES HMDS Prime oven directly.

11:00 - 12:00 We can apply what ever Ebeam or Optical Resist system you 
desire for your work.

12:00 - 12:30 Thin Film Measurements on the Nanospec Thin Film Analyzer

All interested parties are welcome to attend this session.
Thank you for your interest in Ebeam and Optical Lithography at Stanford 
Nanofabrication Facility,

James W. Conway
Ebeam Technology Group
Stanford Nanofabrication Facility
650-725-7075  office hour Tuesday - Friday 8:30 - 9:30 AM CIS 31

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From jwc at snf.stanford.edu  Tue Feb  5 09:21:34 2008
From: jwc at snf.stanford.edu (James Conway)
Date: Tue, 05 Feb 2008 09:21:34 -0800
Subject: REMINDER FOR TODAY: RAITH Group XXX -- Intensive 4 day short course.
 FEBRUARY 5 TO 8 2008  TUESDAY - THURSDAY next two weeks 10 AM - 6 PM
Message-ID: <47A89B1E.7080106@snf.stanford.edu>

*Greetings RAITH Group XXX:

**
If you are listed in the To: section of this email you are confirmed to 
be in RAITH Group** XXX -- the next RAITH** Four Day Basic User Short 
Course.
If you are listed in the CC: section of this email, I am** still ** in 
need of further information, or a commitment from you, and hope to add 
you in the next class.
Any RAITH Users wishing to attend are also welcome if you desire a 
review of operations on the RAITH 150 system.
**
We wish to invite all other interested parties to the Tuesday morning 
lecture session from 10:00 AM  - 12:30 PM,  and the following Demo Layer 
One training from 2 PM - 6 PM in the afternoon.  All others are also 
welcome to attend as observers the other 'Hands-On' sessions through the 
week.
*
*If you are listed in the To: section of this email:
*This is your final reminder and confirmation of your commitment for 
attending the RAITH Group XXX Training course to be held February 5 to 
8, 2008
_*You are expected to attend all sessions in order to gain the 
experience and skills you will need to qualify on the RAITH 150 system.*

_Users are also encouraged to attend the *"Take a Spin with Me"* 
<http://snf.stanford.edu/cgi-bin/ezmlm-cgi?430:mss:73:200801:bleokmmlinkjilfgnknc> 
class covering Ebeam Resist handling procedures. I am next holding this 
class on January 29th from 10:15 - 12:30 PM in the SNF cleanroom. There 
is a separate sign up for this class on the white board in my office at 
CIS 31.

Thank you for your interest in Electron Beam Technologies at the 
Stanford Nanofabrication Facility,

James Conway
Ebeam Technology Group
650-725-7075
---------------------------------

*   **RAITH Group** XXIX **Schedule: **   *

*Raith 150 Basic Users Training -- Intensive 4 Day Short Course*

*February 5th to 8th, 2007 from 10 - 6 PM Tuesday through Friday.*

*The Plan of Action:
*We will start out with a half day of lecture in the morning Tuesday; 
quickly moving into entirely 'hands on' operations training through the 
remainder of the week.
We will break for lunch at various times, while the system is writing, 
so plan to be flexible with your other outside commitments.  You should 
have started working on your GDS II patterns and preparing PMMA on your 
substrates if you wish to write on your material. Please bring your 
patterns and materials to the 'Hands-On' sessions. Some afternoons we 
may also be able to finish earlier,  letting the system write on its own 
to the end of our reservations on the system.*
*

* Schedule:*
Tuesday February 5, 2008:
10:00 - 12:30   Session 1:  Basic Users Course Lecture  -- CIS-X 201
14:00 - 17:00  Session 2:  RAITH System Demonstration - Layer One -- 
EBEAM LAB CIS L104

Wednesday February 6, 2008:
10:00 - 12:30 Session 3:  RAITH System Demonstration - Layer Two: 
OVERLAY -- EBEAM LAB CIS L104
14:00 - 18:00 Session 4:  Hands On training session One -- EBEAM LAB CIS 
L104

Thursday February 7, 2008:
10:00 - 12:30 Session 5: Hands On training session Two -- EBEAM LAB CIS L104
14:00 - 18:00 Session 6: Hands On training session Three -- EBEAM LAB 
CIS L104

Friday February 8, 2008:
10:00 - 12:30 Session 7: Hands On training session Four -- EBEAM LAB CIS 
L104
14:00 - 18:00 Session 8: Hands On training session Five -- EBEAM LAB CIS 
L104

Individual Qualification Sessions will be held after this class where 
you can demonstrate your skill on the system to me and gain your login 
to the system.


I CAN PROVIDE A CD AND PRINTED MATERIALS AT THE FIRST MEETING, IF YOU 
HAVE NOT ALREADY RECEIVED ONE YET.
You can stop by my office hour and pick up a copy of these training 
materials during my daily office hour. (8:30 - 9:30 AM CIS 31) Just 
bring along a USB drive!

-------------------------------------------------------------------------------------------------------------------------------------------

*RAITH Group XXX Date February 5 to 8, 2008:**
BASIC USER INTENSIVE FOUR DAY SHORT COURSE.
tentative class listing due to pending certification of pre-requisites 
completed.
*

Trudie Wang trudie at stanford.edu <mailto:trudie at stanford.edu>  Coral: trudie
Phone: 510-852-4058 Peumans Group
Project: lateral multi-junction nanowire nano-concentrator photovoltaic

Mike Preiner  mpreiner at stanford.edu <mailto:mpreiner at stanford.edu> Coral 
mpreiner Phone: 650-387-7729 cell
Nick Melosh Project: Plasmonic Waveguide for molecular electronics.

Vincent Yi Wei Chen chenyw at stanford.edu <mailto:chenyw at stanford.edu> 
Coral: vincentcyw Phone: 650-498-8206
Paul McIntyre Group
Project: Fabricating nanowire biosensors using e-beam to put patterns of 
small gold dots - ~70nm in diameter in a trench so that nanowires can be 
grown later.








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From jwc at snf.stanford.edu  Wed Feb  6 12:27:31 2008
From: jwc at snf.stanford.edu (James Conway)
Date: Wed, 06 Feb 2008 12:27:31 -0800
Subject: I am allowing Ilya Fushman to extend into my session time to complete
 his write. I will start at around 1:30 PM instead of 1:00 PM.
Message-ID: <47AA1833.7080501@snf.stanford.edu>

Hello Raith Users:

I will be starting a half hour later than scheduled today and I want my 
session time through 18:00 hours.
This is to allow Ilya Fushman to extend into my session time to complete 
his write. I will start at ~1:30 PM instead of 1:00 PM.

Thank you,

James Conway
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From dejia at stanford.edu  Thu Feb  7 02:32:11 2008
From: dejia at stanford.edu (Deji A.)
Date: Thu, 07 Feb 2008 02:32:11 -0800
Subject: raith free 330am-730am
Message-ID: <47AADE2B.2030005@stanford.edu>

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From bilee at stanford.edu  Thu Feb  7 02:41:51 2008
From: bilee at stanford.edu (Byoungil Lee)
Date: Thu, 7 Feb 2008 02:41:51 -0800
Subject: raith free 330am-730am
References: <47AADE2B.2030005@stanford.edu>
Message-ID: <000601c86976$0c576290$946040ab@BILEEOFFICE>

I will take it.

Thank you.

Byoungil
  ----- Original Message ----- 
  From: Deji A. 
  To: Raith SNF Mailing list 
  Sent: Thursday, February 07, 2008 2:32 AM
  Subject: raith free 330am-730am


  sample not ready at last minute
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From toecutter4ranger at gmail.com  Thu Feb  7 17:01:31 2008
From: toecutter4ranger at gmail.com (toecutter4ranger at gmail.com)
Date: Fri, 8 Feb 2008 01:01:31 +0000
Subject: RAITH offline overnight
Message-ID: <439331012-1202432376-cardhu_decombobulator_blackberry.rim.net-1730479843-@bxe134.bisx.prod.on.blackberry>


Good afternoon,

RAITH will be off line to users overnight due to failed turbo pump.  

Tomorrow I will flush out the cooling sys and install the new pump.

Thank you for your support,

James Conway  
Sent via BlackBerry by AT&T



From jwc at snf.stanford.edu  Fri Feb  8 15:15:37 2008
From: jwc at snf.stanford.edu (James Conway)
Date: Fri, 08 Feb 2008 15:15:37 -0800
Subject: Raith system is back up and online for Users...
Message-ID: <47ACE299.90807@snf.stanford.edu>

Good Afternoon Raith Users:

System is up and ready for use.  We will resume the coral reservations 
queue from this moment onward.
Kathryn Todd has just come onto the system and we should let the 
schedule slide if needed as I took up an hour of her session bringing up 
the tool and performing the usual system checks.

Users are requested to operate the system up to 20 keV, and no higher, 
until the Gun section vacuum reached the mid E-10 Torr level.  I will 
test the system at higher acceleration voltages next week .

Thank you four your support!

James Conway


-------- Original Message --------
Subject: 	Re: Shutdown raith SNF 2008-02-07 08:00:11: turbo pump failure
Date: 	Fri, 8 Feb 2008 14:44:38 -0800
From: 	jwc at snf.stanford.edu
To: 	raith-pcs at snf.stanford.edu



RAITH vacuum system pumping and easily reached target vac. set points to start ion pump.
FE_Gun up and running with suitable emission.
Users coming back on system and we are resuming CORAL schedule at this time.
Call JWC if any problems arise this evening. 415-412-4825 cell
ALL Users please operate at 20 keV or below through Monday afternoon.
Thank you for your support!
James Conway


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From filip at stanford.edu  Sat Feb  9 12:47:08 2008
From: filip at stanford.edu (Filip Crnogorac)
Date: Sat, 09 Feb 2008 12:47:08 -0800
Subject: raith free until 3pm
Message-ID: <20080209124708.w9ak0zsl0kwksos4@webmail.stanford.edu>

Having problems locating the right sample. Will only inspect at 3pm.
Apologies for late notice.
Filip



From shinichikoseki at gmail.com  Sat Feb  9 13:04:32 2008
From: shinichikoseki at gmail.com (Shinichi Koseki)
Date: Sat, 9 Feb 2008 13:04:32 -0800
Subject: raith free until 3pm
In-Reply-To: <20080209124708.w9ak0zsl0kwksos4@webmail.stanford.edu>
References: <20080209124708.w9ak0zsl0kwksos4@webmail.stanford.edu>
Message-ID: <3b532e5a0802091304v2658af29h55134dc457bb4fee@mail.gmail.com>

1-2pm taken. Thanks !

Shinichi


On Feb 9, 2008 12:47 PM, Filip Crnogorac <filip at stanford.edu> wrote:
> Having problems locating the right sample. Will only inspect at 3pm.
> Apologies for late notice.
> Filip
>
>


From shinichikoseki at gmail.com  Sat Feb  9 13:42:37 2008
From: shinichikoseki at gmail.com (Shinichi Koseki)
Date: Sat, 9 Feb 2008 13:42:37 -0800
Subject: raith free until 3pm
In-Reply-To: <3b532e5a0802091304v2658af29h55134dc457bb4fee@mail.gmail.com>
References: <20080209124708.w9ak0zsl0kwksos4@webmail.stanford.edu>
	 <3b532e5a0802091304v2658af29h55134dc457bb4fee@mail.gmail.com>
Message-ID: <3b532e5a0802091342o56f8993oaeec79c0df2b2c15@mail.gmail.com>

I would like to use until 3pm. Thanks !

Shinichi

On Feb 9, 2008 1:04 PM, Shinichi Koseki <shinichikoseki at gmail.com> wrote:
> 1-2pm taken. Thanks !
>
> Shinichi
>
>
>
> On Feb 9, 2008 12:47 PM, Filip Crnogorac <filip at stanford.edu> wrote:
> > Having problems locating the right sample. Will only inspect at 3pm.
> > Apologies for late notice.
> > Filip
> >
> >
>


From dejia at stanford.edu  Mon Feb 11 00:42:28 2008
From: dejia at stanford.edu (Deji A.)
Date: Mon, 11 Feb 2008 00:42:28 -0800
Subject: raith free 3am-9am
Message-ID: <47B00A74.6040300@stanford.edu>

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From jwc at snf.stanford.edu  Mon Feb 11 14:31:02 2008
From: jwc at snf.stanford.edu (James Conway)
Date: Mon, 11 Feb 2008 14:31:02 -0800
Subject: ANNOUNCEMENT:  "Take A Spin with Me" -- Ebeam Resist Handling Training
 on the Headway.  Tuesday  January 29, 2008 from 10:15  - 12:30
Message-ID: <47B0CCA6.5080904@snf.stanford.edu>

*

*
**
*
ANNOUNCEMENT:  "Take A Spin with Me" -- Resist Handling Training on the 
Headway Coater.*

Greetings SNF Lab Users,

I will be conducting my next *"Take A Spin with Me" *training class 
Tuesday February 19, 2008 from 10:15 AM  - 12:30 PM. There is a sign up 
sheet posted on the white board in my office if you desire to sign up in 
advance.

This is a great opportunity for you to get acquainted with the specific 
points to employ when working with our Ebeam or Optical Resist materials 
in order to obtain high quality thin film coatings over your wafers for 
Electron Beam, Scanning Probe (SPL), and optical Nano-Lithography. In 
these applications accurate control of polymer thickness is important in 
order to obtain consistent high quality lithography results.

We will be conducting this training on the Headway Spin Coater.  Users 
attending this session will gain their qualification on this tool and 
also learn to perform thin film measurements on the Nanospec TFA 
measurement tool.
This is a Hands-On Lab Session, please have your substrates clean and 
ready to coat on the Headway Coater.

Class Schedule:

10:15 - 11:00 I will start with substrate cleans on WET BENCH NONMETAL 
performing Pirhana substrate cleans and HF etching of the intrinsic 
native oxide on Silicon wafers.  All users must have their substrates 
cleaned and ready to go for spinning by the session time; either coming 
out of the 150 degree Singe oven, or if you are working on oxides or 
nitrides, coming out of the YES HMDS Prime oven directly.

11:00 - 12:00 We can apply what ever Ebeam or Optical Resist system you 
desire for your work.

12:00 - 12:30 Thin Film Measurements on the Nanospec Thin Film Analyzer

All interested parties are welcome to attend this session.
Thank you for your interest in Ebeam and Optical Lithography at Stanford 
Nanofabrication Facility,

James W. Conway
Ebeam Technology Group
Stanford Nanofabrication Facility
650-725-7075  office hour Tuesday - Friday 8:30 - 9:30 AM CIS 31

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From jwc at snf.stanford.edu  Mon Feb 11 17:16:14 2008
From: jwc at snf.stanford.edu (James Conway)
Date: Mon, 11 Feb 2008 17:16:14 -0800
Subject: Comment on RAITH reservations on Coral. RAITH STATUS MONDAY 5 PM
 
Message-ID: <47B0F35E.5010708@snf.stanford.edu>

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From jwc at snf.stanford.edu  Tue Feb 12 17:19:22 2008
From: jwc at snf.stanford.edu (James Conway)
Date: Tue, 12 Feb 2008 17:19:22 -0800
Subject: Finished early system is available for next User -- change in raith
 computer mouse...
Message-ID: <47B2459A.4030501@snf.stanford.edu>

Greetings:

The RAITH class finished earlier than scheduled and the system is 
available for the next Users.

The wireless Mouse on the RAITH computer will not charge its batteries 
and we have lost its functionality.  I will go to FRY's and purchase a 
new package.

In the meantime I have installed a wired USB mouse that will allow users 
to access the application until  the replacement is in the Lab.

Thank you for your support!

James Conway

 
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From toecutter4ranger at gmail.com  Wed Feb 13 13:32:37 2008
From: toecutter4ranger at gmail.com (toecutter4ranger at gmail.com)
Date: Wed, 13 Feb 2008 21:32:37 +0000
Subject: Starting at 2 PM
Message-ID: <421948854-1202938240-cardhu_decombobulator_blackberry.rim.net-169466211-@bxe134.bisx.prod.on.blackberry>

Greetings
My morning sessions ran late 

I will start my RAITH session at 2 PM

James Conway
Sent via BlackBerry by AT&T



From toecutter4ranger at gmail.com  Wed Feb 13 16:04:47 2008
From: toecutter4ranger at gmail.com (toecutter4ranger at gmail.com)
Date: Thu, 14 Feb 2008 00:04:47 +0000
Subject: Finished early RAITH is available to next user
Message-ID: <718192162-1202947367-cardhu_decombobulator_blackberry.rim.net-1777985213-@bxe134.bisx.prod.on.blackberry>


Finished my inspection
System ready for next users

Jwc
Sent via BlackBerry by AT&T



From kocabas at stanford.edu  Fri Feb 15 10:31:41 2008
From: kocabas at stanford.edu (S. Ekin Kocabas)
Date: Fri, 15 Feb 2008 10:31:41 -0800
Subject: Weird Raith Behavior
Message-ID: <47B5DA8D.4070103@stanford.edu>

Hi,

I did a write last Sunday using Raith. The focusing and write field 
alignment all went through without any problems. After I developed and 
etched the sample, I realized that the mask and the actual patterns that 
were written by Raith differed. I'm attaching optical microscope 
pictures from the sample I etched and also parts of the mask that I used 
for EBL. If you ever experienced similar problems with Raith 
(writefields intersecting with one another, EBL results different than 
the mask results etc.) please let me know. I have other sessions coming 
up, and since I'm doing multi-layer EBL, I cannot continue if the first 
layer is messed up.

Thanks a lot,

Ekin
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From ifushman at stanford.edu  Fri Feb 15 10:54:30 2008
From: ifushman at stanford.edu (Ilya Fushman)
Date: Fri, 15 Feb 2008 10:54:30 -0800
Subject: cancelling my write due to construction noise
Message-ID: <bf3d86240802151054j109b1c6esa13c116fc1e2a80f@mail.gmail.com>

Hi,
It looks like the dots I burn are not circular and jitter too much when I
image. I'm assuming that this is construction noise. So I will not write. So
afternoon jwc session is open.
-ilya

-- 
Ilya Fushman
Applied Physics
Stanford University
cvitae.org/ilya/
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From yiyangg at stanford.edu  Fri Feb 15 10:59:26 2008
From: yiyangg at stanford.edu (Yiyang Gong)
Date: Fri, 15 Feb 2008 10:59:26 -0800
Subject: cancelling my write due to construction noise
In-Reply-To: <bf3d86240802151054j109b1c6esa13c116fc1e2a80f@mail.gmail.com>
References: <bf3d86240802151054j109b1c6esa13c116fc1e2a80f@mail.gmail.com>
Message-ID: <47B5E10E.5030106@stanford.edu>

I will take 1:30-3 if available

Yiyang

Ilya Fushman wrote:
> Hi,
> It looks like the dots I burn are not circular and jitter too much 
> when I image. I'm assuming that this is construction noise. So I will 
> not write. So afternoon jwc session is open.
> -ilya
>
> -- 
> Ilya Fushman
> Applied Physics
> Stanford University
> cvitae.org/ilya/ <http://cvitae.org/ilya/> 



From lsmoore at stanford.edu  Fri Feb 15 19:44:35 2008
From: lsmoore at stanford.edu (Lindsay Moore)
Date: Fri, 15 Feb 2008 19:44:35 -0800
Subject: 11am-1pm tomorrow released
Message-ID: <4dfce5b30802151944l4276a49o19bfba3bce501bc6@mail.gmail.com>

i have a bad cold.
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From koseki at stanford.edu  Fri Feb 15 19:48:59 2008
From: koseki at stanford.edu (Shinichi Koseki)
Date: Fri, 15 Feb 2008 19:48:59 -0800
Subject: 11am-1pm tomorrow released
References: <4dfce5b30802151944l4276a49o19bfba3bce501bc6@mail.gmail.com>
Message-ID: <001201c8704e$dcb94af0$231b40ab@nausicaa>

Taken, thanks. Please take care of your health.

Shinichi
  ----- Original Message ----- 
  From: Lindsay Moore 
  To: Raith SNF Mailing list 
  Sent: Friday, February 15, 2008 7:44 PM
  Subject: 11am-1pm tomorrow released


  i have a bad cold.
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From ljzhou at ucdavis.edu  Sat Feb 16 10:40:11 2008
From: ljzhou at ucdavis.edu (Linjie Zhou)
Date: Sat, 16 Feb 2008 10:40:11 -0800
Subject: Cancel Raith reservation 5:00 to 8:30 Feb 17
Message-ID: <014201c870cb$5d815c50$1401a8c0@ares>

Samples are not ready yet. Apologies for the late notice.
LZ
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From raneeyoo at stanford.edu  Mon Feb 18 21:41:39 2008
From: raneeyoo at stanford.edu (Kyeongran Yoo)
Date: Mon, 18 Feb 2008 21:41:39 -0800
Subject: raith free now until 24
Message-ID: <20080218214139.gtksijs2iyos8g8k@webmail.stanford.edu>

finished early


From koseki at stanford.edu  Mon Feb 18 21:46:03 2008
From: koseki at stanford.edu (Shinichi Koseki)
Date: Mon, 18 Feb 2008 21:46:03 -0800
Subject: raith free now until 24
References: <20080218214139.gtksijs2iyos8g8k@webmail.stanford.edu>
Message-ID: <001a01c872ba$b6cd98f0$231b40ab@nausicaa>

Thanks, I'll take it.

Shinichi

----- Original Message ----- 
From: "Kyeongran Yoo" <raneeyoo at stanford.edu>
To: <raith at snf.stanford.edu>
Sent: Monday, February 18, 2008 9:41 PM
Subject: raith free now until 24


> finished early
>


From ifushman at stanford.edu  Tue Feb 19 01:08:49 2008
From: ifushman at stanford.edu (Ilya Fushman)
Date: Tue, 19 Feb 2008 01:08:49 -0800
Subject: raith free now until 24
In-Reply-To: <001a01c872ba$b6cd98f0$231b40ab@nausicaa>
References: <20080218214139.gtksijs2iyos8g8k@webmail.stanford.edu>
	 <001a01c872ba$b6cd98f0$231b40ab@nausicaa>
Message-ID: <bf3d86240802190108y487609f0j21e8ab7027c0c3a7@mail.gmail.com>

user zhangy didn't show, so i'm taking the raith at 1:30.
-ilya

On Feb 18, 2008 9:46 PM, Shinichi Koseki <koseki at stanford.edu> wrote:

> Thanks, I'll take it.
>
> Shinichi
>
> ----- Original Message -----
> From: "Kyeongran Yoo" <raneeyoo at stanford.edu>
> To: <raith at snf.stanford.edu>
> Sent: Monday, February 18, 2008 9:41 PM
> Subject: raith free now until 24
>
>
> > finished early
> >
>



-- 
Ilya Fushman
Applied Physics
Stanford University
cvitae.org/ilya/
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From xinranw at stanford.edu  Tue Feb 19 14:05:38 2008
From: xinranw at stanford.edu (Xinran Wang)
Date: Tue, 19 Feb 2008 14:05:38 -0800
Subject: raith free tomorrow 7am
Message-ID: <22ffcd060802191405r1fcc6afcmab213e3a6b02e098@mail.gmail.com>

I was able to finish all the chips today, so don't need tomorrow's session
any more.

xinran
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From kathrynt at stanford.edu  Tue Feb 19 14:07:04 2008
From: kathrynt at stanford.edu (Kathryn Todd)
Date: Tue, 19 Feb 2008 14:07:04 -0800
Subject: raith free tomorrow 7am
In-Reply-To: <22ffcd060802191405r1fcc6afcmab213e3a6b02e098@mail.gmail.com>
References: <22ffcd060802191405r1fcc6afcmab213e3a6b02e098@mail.gmail.com>
Message-ID: <4070ecc80802191407xc0f901emcfc1183e0156ddcf@mail.gmail.com>

7:30 to 9:30am taken

-Kathryn

On Feb 19, 2008 2:05 PM, Xinran Wang <xinranw at stanford.edu> wrote:
> I was able to finish all the chips today, so don't need tomorrow's session
> any more.
>
> xinran
>


From jwc at snf.stanford.edu  Wed Feb 20 11:38:37 2008
From: jwc at snf.stanford.edu (James Conway)
Date: Wed, 20 Feb 2008 11:38:37 -0800
Subject: Weird Raith Behavior
In-Reply-To: <47B5DA8D.4070103@stanford.edu>
References: <47B5DA8D.4070103@stanford.edu>
Message-ID: <47BC81BD.6010002@snf.stanford.edu>

Hello Ekin:

Please look back into the protocol.htm file on the RAITH desktop find 
your date of your exposure and examine the Write Field Alignment values 
used in your write.  I would expect that this result would vary 
significantly from the normal ZOOM values obtained typically 0.925 U and 
0.946 V at 5 mm WD.

If this is not the case please give consideration to charging effects 
particularly if you are writing onto SOI or oxide thin films or glass or 
quartz substrates.

Please follow up and let me know what you find out!

All the Best,

James Conway



S. Ekin Kocabas wrote:
> Hi,
>
> I did a write last Sunday using Raith. The focusing and write field 
> alignment all went through without any problems. After I developed and 
> etched the sample, I realized that the mask and the actual patterns 
> that were written by Raith differed. I'm attaching optical microscope 
> pictures from the sample I etched and also parts of the mask that I 
> used for EBL. If you ever experienced similar problems with Raith 
> (writefields intersecting with one another, EBL results different than 
> the mask results etc.) please let me know. I have other sessions 
> coming up, and since I'm doing multi-layer EBL, I cannot continue if 
> the first layer is messed up.
>
> Thanks a lot,
>
> Ekin
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From jwc at snf.stanford.edu  Wed Feb 20 13:41:02 2008
From: jwc at snf.stanford.edu (James Conway)
Date: Wed, 20 Feb 2008 13:41:02 -0800
Subject: ANNOUNCEMENT:  "Take A Spin with Me" -- Ebeam Resist Handling Training
 on the Headway for MARCH.  Tuesday  MARCH 11 AND 25TH , 2008 10:15 AM to
 12:30 PM
Message-ID: <47BC9E6E.70301@snf.stanford.edu>

*

*
**
*
ANNOUNCEMENT:  "Take A Spin with Me" -- Resist Handling Training on the 
Headway Coater.
MARCH CLASSES.
*
Greetings SNF Lab Users,

I will be conducting my next *"Take A Spin with Me" *training class 
Tuesday March 11 and 25th , 2008 from 10:15 AM  - 12:30 PM. There is a 
sign up sheet posted on the white board in my office if you desire to 
sign up in advance.

This is a great opportunity for you to get acquainted with the specific 
points to employ when working with our Ebeam or Optical Resist materials 
in order to obtain high quality thin film coatings over your wafers for 
Electron Beam, Scanning Probe (SPL), and optical Nano-Lithography. In 
these applications accurate control of polymer thickness is important in 
order to obtain consistent high quality lithography results.

We will be conducting this training on the Headway Spin Coater.  Users 
attending this session will gain their qualification on this tool and 
also learn to perform thin film measurements on the Nanospec TFA 
measurement tool.
This is a Hands-On Lab Session, please have your substrates clean and 
ready to coat on the Headway Coater.

Class Schedule:

10:15 - 11:00 I will start with substrate cleans on WET BENCH NONMETAL 
performing Pirhana substrate cleans and HF etching of the intrinsic 
native oxide on Silicon wafers.  All users must have their substrates 
cleaned and ready to go for spinning by the session time; either coming 
out of the 150 degree Singe oven, or if you are working on oxides or 
nitrides, coming out of the YES HMDS Prime oven directly.

11:00 - 12:00 We can apply what ever Ebeam or Optical Resist system you 
desire for your work.

12:00 - 12:30 Thin Film Measurements on the Nanospec Thin Film Analyzer

All interested parties are welcome to attend this session.
Thank you for your interest in Ebeam and Optical Lithography at Stanford 
Nanofabrication Facility,

James W. Conway
Ebeam Technology Group
Stanford Nanofabrication Facility
650-725-7075  office hour Tuesday - Friday 8:30 - 9:30 AM CIS 31

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From jwc at snf.stanford.edu  Wed Feb 20 13:45:25 2008
From: jwc at snf.stanford.edu (James Conway)
Date: Wed, 20 Feb 2008 13:45:25 -0800
Subject: Cancellng my Raith session 2:30 - 6:30 TODAY i This slot is now available.
Message-ID: <47BC9F75.1070508@snf.stanford.edu>

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From bilee at stanford.edu  Wed Feb 20 13:49:16 2008
From: bilee at stanford.edu (Byoungil Lee)
Date: Wed, 20 Feb 2008 13:49:16 -0800
Subject: Cancellng my Raith session 2:30 - 6:30 TODAY i This slot is now available.
References: <47BC9F75.1070508@snf.stanford.edu>
Message-ID: <008401c8740a$70272e10$946040ab@BILEEOFFICE>

I will take the slot.

Thank you
Byoungil
  ----- Original Message ----- 
  From: James Conway 
  To: Raith SNF Mailing list 
  Sent: Wednesday, February 20, 2008 1:45 PM
  Subject: Cancellng my Raith session 2:30 - 6:30 TODAY i This slot is now available.


  Greetings RAITH Users:

  I am canceling my RAITH session for this afternoon from 2:30 - 6:30 PM due to unexpected scheduling conflict.  I need to do some more metrology on the previous layer written before continuing.

  First to reply has the session and the slot is now available on CORAL.

  Thank you for your support!

  James Conway


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From jwc at snf.stanford.edu  Wed Feb 20 18:02:28 2008
From: jwc at snf.stanford.edu (James Conway)
Date: Wed, 20 Feb 2008 18:02:28 -0800
Subject: Metal Lift-off with PMMA
In-Reply-To: <008801c86965$57a6ed30$946040ab@BILEEOFFICE>
References: <47AA1833.7080501@snf.stanford.edu> <008801c86965$57a6ed30$946040ab@BILEEOFFICE>
Message-ID: <47BCDBB4.8070708@snf.stanford.edu>

Hello Byoungil Lee,

How thick is the metallization?  Normally in lift-off metallization you 
would not desire to fill the PMMA features more than about 50 - 60% of 
the resist thickness.
If you are depositing between 100 and 300 nm try the 5% 495K Single 
layer process with a PMMA resist thickness at 300 - 310 nm or 40 - 50 % 
thicker than your metal film.
If you are seeing significant line edge roughness in your PMMA features 
expose a new sample using a smaller aperture size which will also allow 
you to employ a smaller area or line step size.

You could also employ ZEP-520 process when exposed at 10 keV with the 10 
or 20 ?m aperture using a dose to clear of 35 - 40 ?C/cm**2 for areas 
and 100 - 120 pC/cm for Single Pixel Lines.
This material has an inherent undercut suitable for most lift off 
structures when exposed at 10 keV and below.  It is also a very 
sensitive resist system that gives very reproducible results and your 
coated ZEP films on substrates will store for many months to years 
without a change in exposure characteristic.

Unless your metal deposition is really thick I would not recommend the 
dual layer process (JingKong1 process) as it will be hard to get 100 nm 
lines consistently due to aspect ratio of resist height ( typ. 1 - 1.5 
?m) to feature size going beyond 10:1.  See me if you have more 
questions and I would be happy to examine your SEM's of these features 
together.

All the Best,

James Conway

Attachment:  Ebeam Resist Processing_Metal_liftoff.ppt 



Byoungil Lee wrote:
> Dear James,
>
> This is Byoungil (bilee), one of the Raith users.
> Recently, I've been trying to get 100nm metal (Pt) lines by lift-off.
> I tried the simplest process where I deposit Ti+Pt on 100nm thick PMMA 
> pattern.
> The 100nm wide metal lines look fine, but the edges are a little rough.
> If I use double-layer resist, would it be better?   Could you give me 
> any suggestion/comment/recipe on the metal lift-off process using PMMA?
>
> By the way, the latex nano particles in the ebeam room are running 
> out. Where could I get it when it runs out?
>
> Thank you,
> Byoungil Lee
>
>
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From bryane at stanford.edu  Thu Feb 21 07:54:00 2008
From: bryane at stanford.edu (Bryan Ellis)
Date: Thu, 21 Feb 2008 07:54:00 -0800
Subject: User dejia and I are switching times
Message-ID: <22cc95d90802210754v604c7defte8ff026e7e7721f4@mail.gmail.com>

I will be using the Raith this morning, and Deji will be using it this
afternoon.

Bryan
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From jwc at snf.stanford.edu  Thu Feb 21 10:20:42 2008
From: jwc at snf.stanford.edu (James Conway)
Date: Thu, 21 Feb 2008 10:20:42 -0800
Subject: cancelling my write due to construction noise
In-Reply-To: <bf3d86240802151054j109b1c6esa13c116fc1e2a80f@mail.gmail.com>
References: <bf3d86240802151054j109b1c6esa13c116fc1e2a80f@mail.gmail.com>
Message-ID: <47BDC0FA.6080505@snf.stanford.edu>

Greetings Raith and Ebeam Users:

It should be noted and advised to Users that the dwell times of almost 
any feature write written on any Ebeam tool is much much shorter in time 
than the frequency of vibrations from the construction and  demolition 
activities ongoing in the neighborhood.  In fact the amplitude of these 
vibrations is somewhat less than what we experienced during the shoring 
and pile driving operations of the Clark Center Bio-X project two years 
ago.  So far I have not seen any feature irregularity that could have 
been caused by vibration.

On the other hand imaging particularly at slow scan rates will show many 
horizontal image ripples as an artifact of the -Y scanning and 
vibration, acoustic, and acceleration events.
If any user has  what they think is a feature that was affected by these 
issues please send me or post a copy for everyones review.  I have been 
writing some rather difficult gratings on 100 200 and 650 nm pitches and 
have yet to find anything unusual.

Your comments are invited as this could prove to be an interesting 
discussion on our beam tools mail list.

FYI: Construction activities generally finish at about 15:05 hours each 
afternoon.

Best,

James Conway



Ilya Fushman wrote:
> Hi,
> It looks like the dots I burn are not circular and jitter too much 
> when I image. I'm assuming that this is construction noise. So I will 
> not write. So afternoon jwc session is open.
> -ilya
>
> -- 
> Ilya Fushman
> Applied Physics
> Stanford University
> cvitae.org/ilya/ <http://cvitae.org/ilya/> 
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From chandran at gmail.com  Fri Feb 22 01:26:48 2008
From: chandran at gmail.com (anu chandran)
Date: Fri, 22 Feb 2008 01:26:48 -0800
Subject: Raith free Friday 3pm to 7pm.
Message-ID: <ecc0293e0802220126o5eed3271l588e96b66e5efcb@mail.gmail.com>

Sorry for the late notice.
Anu

-- 
Anu Chandran
Materials Science & Engineering
476 Lomita Mall,McCullough Building
Stanford CA 94305-4045
T:6507236466 Lab
T:6507234874 Office
F:6507249851
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From dejia at stanford.edu  Fri Feb 22 01:57:24 2008
From: dejia at stanford.edu (Deji A.)
Date: Fri, 22 Feb 2008 01:57:24 -0800
Subject: Raith free Friday 3pm to 7pm.
In-Reply-To: <ecc0293e0802220126o5eed3271l588e96b66e5efcb@mail.gmail.com>
References: <ecc0293e0802220126o5eed3271l588e96b66e5efcb@mail.gmail.com>
Message-ID: <20080222015724.peywdxrsgswc4gcg@webmail.stanford.edu>

Taken

Quoting anu chandran <chandran at gmail.com>:

> Sorry for the late notice.
> Anu
>
> --
> Anu Chandran
> Materials Science & Engineering
> 476 Lomita Mall,McCullough Building
> Stanford CA 94305-4045
> T:6507236466 Lab
> T:6507234874 Office
> F:6507249851
>



Cheerz
Deji A.
-----------------------------------
Nature is the teacher of all things


From kathrynt at stanford.edu  Fri Feb 22 13:12:12 2008
From: kathrynt at stanford.edu (Kathryn Todd)
Date: Fri, 22 Feb 2008 13:12:12 -0800
Subject: reservation 8-11am tomorrow released
Message-ID: <4070ecc80802221312vedec95ft65549f159c64059a@mail.gmail.com>




From filip at stanford.edu  Fri Feb 22 13:47:31 2008
From: filip at stanford.edu (Filip Crnogorac)
Date: Fri, 22 Feb 2008 13:47:31 -0800
Subject: Raith free Sun 8-11am
Message-ID: <20080222134731.h7wikiuadwscogco@webmail.stanford.edu>

will be out of town.
Filip






From filip at stanford.edu  Fri Feb 22 13:52:19 2008
From: filip at stanford.edu (Filip Crnogorac)
Date: Fri, 22 Feb 2008 13:52:19 -0800
Subject: oops. Raith free Sun 8PM-midnight
Message-ID: <20080222135219.vfp1uttj38k088w0@webmail.stanford.edu>

This is the correct slot.

Filip






From kathrynt at stanford.edu  Sun Feb 24 10:38:40 2008
From: kathrynt at stanford.edu (Kathryn Todd)
Date: Sun, 24 Feb 2008 10:38:40 -0800
Subject: sem free today 11-1:30
Message-ID: <4070ecc80802241038w72978803ic9fc7a63bb9b7fa6@mail.gmail.com>

Very sorry for the late notice. Sample not ready.


From koseki at stanford.edu  Sun Feb 24 10:47:50 2008
From: koseki at stanford.edu (Shinichi Koseki)
Date: Sun, 24 Feb 2008 10:47:50 -0800
Subject: sem free today 11-1:30
References: <4070ecc80802241038w72978803ic9fc7a63bb9b7fa6@mail.gmail.com>
Message-ID: <002a01c87715$c1cff8b0$231b40ab@nausicaa>

Taken, thanks.

Shinichi

----- Original Message ----- 
From: "Kathryn Todd" <kathrynt at stanford.edu>
To: "raith" <raith at snf.stanford.edu>
Sent: Sunday, February 24, 2008 10:38 AM
Subject: sem free today 11-1:30


> Very sorry for the late notice. Sample not ready.
>


From anikak at stanford.edu  Mon Feb 25 11:17:18 2008
From: anikak at stanford.edu (Anika Kinkhabwala)
Date: Mon, 25 Feb 2008 11:17:18 -0800
Subject: 2% 950K PMMA in anisole is out
Message-ID: <fe7ed2cd0802251117v5b7208dfp53f71bf94a52bfba@mail.gmail.com>

I finished off the last 3mL this morning...
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From rohank at stanford.edu  Mon Feb 25 12:09:26 2008
From: rohank at stanford.edu (Rohan D. Kekatpure)
Date: Mon, 25 Feb 2008 12:09:26 -0800
Subject: Starting 1 hr late: Raith free from 8:00a to 9:00a tuesday
Message-ID: <20080225120926.lryqtdf7s0gskgkw@webmail.stanford.edu>




From toecutter4ranger at gmail.com  Mon Feb 25 17:22:58 2008
From: toecutter4ranger at gmail.com (James Conway)
Date: Mon, 25 Feb 2008 17:22:58 -0800
Subject: LSMOORE did not show up for her session bby 16 minutes after thesession began. I will continue writing my arrays...
Message-ID: <dea8d710802251722n6fc22e75ia4274c942a7b5c7f@mail.gmail.com>

Greetings Raith Users:

LSMOORE did not show up for her session so at 16 minutes after the should
have session begun -- I will continue writing my arrays until the next
reservation starts at 7 PM (DKOZAK)

James Conway for ZhangDW
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From rohank at stanford.edu  Tue Feb 26 11:14:33 2008
From: rohank at stanford.edu (Rohan D. Kekatpure)
Date: Tue, 26 Feb 2008 11:14:33 -0800 (PST)
Subject: Done early: Raith free 11:15a-1p
Message-ID: <Pine.GSO.4.44.0802261113430.29931-100000@elaine3.Stanford.EDU>






From jwc at snf.stanford.edu  Tue Feb 26 17:08:52 2008
From: jwc at snf.stanford.edu (James Conway)
Date: Tue, 26 Feb 2008 17:08:52 -0800
Subject: ANNOUNCEMENT:  "Take A Spin with Me" -- Ebeam Resist Handling Training
 on the Headway for MARCH.  Tuesday  MARCH 11 AND 25TH , 2008 10:15 AM to
 12:30 PM
Message-ID: <47C4B824.4030101@snf.stanford.edu>

*

*
**
*
ANNOUNCEMENT:  "Take A Spin with Me" -- Resist Handling Training on the 
Headway Coater.
MARCH CLASSES.
*
Greetings SNF Lab Users,

I will be conducting my next *"Take A Spin with Me" *training class 
Tuesday March 11 and 25th , 2008 from 10:15 AM  - 12:30 PM. There is a 
sign up sheet posted on the white board in my office if you desire to 
sign up in advance.

This is a great opportunity for you to get acquainted with the specific 
points to employ when working with our Ebeam or Optical Resist materials 
in order to obtain high quality thin film coatings over your wafers for 
Electron Beam, Scanning Probe (SPL), and optical Nano-Lithography. In 
these applications accurate control of polymer thickness is important in 
order to obtain consistent high quality lithography results.

We will be conducting this training on the Headway Spin Coater.  Users 
attending this session will gain their qualification on this tool and 
also learn to perform thin film measurements on the Nanospec TFA 
measurement tool.
This is a Hands-On Lab Session, please have your substrates clean and 
ready to coat on the Headway Coater.

Class Schedule:

10:15 - 11:00 I will start with substrate cleans on WET BENCH NONMETAL 
performing Pirhana substrate cleans and HF etching of the intrinsic 
native oxide on Silicon wafers.  All users must have their substrates 
cleaned and ready to go for spinning by the session time; either coming 
out of the 150 degree Singe oven, or if you are working on oxides or 
nitrides, coming out of the YES HMDS Prime oven directly.

11:00 - 12:00 We can apply what ever Ebeam or Optical Resist system you 
desire for your work.

12:00 - 12:30 Thin Film Measurements on the Nanospec Thin Film Analyzer

All interested parties are welcome to attend this session.
Thank you for your interest in Ebeam and Optical Lithography at Stanford 
Nanofabrication Facility,

James W. Conway
Ebeam Technology Group
Stanford Nanofabrication Facility
650-725-7075  office hour Tuesday - Friday 8:30 - 9:30 AM CIS 31

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From jwc at snf.stanford.edu  Tue Feb 26 17:12:59 2008
From: jwc at snf.stanford.edu (James Conway)
Date: Tue, 26 Feb 2008 17:12:59 -0800
Subject: [Fwd: Comment raith SNF 2008-02-26 14:19:04: elevated vibration and
 RFI levels are evident in SEM view]
Message-ID: <47C4B91B.4020006@snf.stanford.edu>

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From dkozak at ucsc.edu  Wed Feb 27 01:28:09 2008
From: dkozak at ucsc.edu (Dmitry Alexander Kozak)
Date: Wed, 27 Feb 2008 01:28:09 -0800
Subject: time open Thursday 4-7 AM
Message-ID: <web-27783618@email-prod-be-1.ucsc.edu>

I had that slot, but feeling sick, so cancelling my 
reservation.  Please feel free to take it.

Dmitry


From chandran at gmail.com  Wed Feb 27 22:05:58 2008
From: chandran at gmail.com (anu chandran)
Date: Wed, 27 Feb 2008 22:05:58 -0800
Subject: slot free tomorrow 7:00am to 10:30pm
Message-ID: <ecc0293e0802272205y4f6c2deaoa17b11639faebcb3@mail.gmail.com>

Broke my sample..
Sorry for the late notice
Anu

-- 
Anu Chandran
Materials Science & Engineering
476 Lomita Mall,McCullough Building
Stanford CA 94305-4045
T:6507236466 Lab
T:6507234874 Office
F:6507249851
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From bilee at stanford.edu  Thu Feb 28 00:31:12 2008
From: bilee at stanford.edu (Byoungil Lee)
Date: Thu, 28 Feb 2008 00:31:12 -0800
Subject: Raith free 1am ~ 4am
References: <ecc0293e0802272205y4f6c2deaoa17b11639faebcb3@mail.gmail.com>
Message-ID: <002201c879e4$46f561d0$946040ab@BILEEOFFICE>

Sorry for the late notice.

Thanks,
Byoungil 
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From jwc at snf.stanford.edu  Thu Feb 28 11:10:10 2008
From: jwc at snf.stanford.edu (James Conway)
Date: Thu, 28 Feb 2008 11:10:10 -0800
Subject: IFUSHMAN cannot make his session. System is available until 1:15
 PM. 
Message-ID: <47C70712.9030603@snf.stanford.edu>

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From toecutter4ranger at gmail.com  Thu Feb 28 14:02:35 2008
From: toecutter4ranger at gmail.com (James Conway)
Date: Thu, 28 Feb 2008 14:02:35 -0800
Subject: RAITH STATUS 13:50 Thursday 2-28-08 + I will be starting at 3 PM as I need to strip and reapply PMMA on my substrate.
Message-ID: <dea8d710802281402wd799388xb79b8548dc3c151e@mail.gmail.com>

Greetings RAITH Users:

Working with RAITH USA Inc. I am troubleshooting the larger than normal
scanning flag artifacts and Image Ripples on the RAITH 150 EBL system.
There may possibly be a problem with the Electron Optics board or its power
supply voltages.  Users will find it difficult to properly focus and
stigmate using contamination dots or on small sub 100 nm features due to
this problem. The magnitude of the images ripples has been increasing each
day since this weekend when this problems surfaced.
Users should be particularly careful during Write Field Alignments.  Please
also report any other unusual problems or observations you can identify to
this list.
A RAITH Field Service visit has been requested to address this problem.

While the demolition and construction activities across the street have
added to our problems this week -- the problem I am troubleshooting occurs
at all times of day/night and is apparent even when you do not have the
system in focus on any feature in SEM view.  Q.E.D., I believe the problem
is sourced from the scanning /deflection section on the RAITH SEM (LEO) and
not from external influences.  The platform vibration isolation system is
working and set at all the normal parameters we normally employ. Turbo pump
and NESLAB chiller operation pressure and flow are normal and no significant
vibration is evidenced from these sub-systems.

Thank you for your support!

James Conway
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From jwc at snf.stanford.edu  Thu Feb 28 18:44:06 2008
From: jwc at snf.stanford.edu (James Conway)
Date: Thu, 28 Feb 2008 18:44:06 -0800
Subject: RAITH STATUS 18:50 Thursday 2-28-08 System is up and normal operations
 resume.
In-Reply-To: <dea8d710802281402wd799388xb79b8548dc3c151e@mail.gmail.com>
References: <dea8d710802281402wd799388xb79b8548dc3c151e@mail.gmail.com>
Message-ID: <47C77176.4060700@snf.stanford.edu>

    *

    Good Evening RAITH Users and RAITH USA Field Service,

    *I am happy to report that the RAITH 150 system issues with flags
    and large ripples in the SEM image view have been resolved.
    Today I checked all the sub-systems coming into the platform;
    chiller, turbo, vibration isolation pads and the ground connections
    and power supply to the system and all was found to be fine.  I did
    reduce the Chiller water pressure down from 60 psi to 40 psi while
    maintaining 2 lpm of cooling flow.
    I then shutdown the computers and performed a "red button' reset on
    the main raith power switch and allowed the Electron Optics and
    other controller cards to reset and then promptly resumed power and
    vacuum system pumping after replacing the air lock cable into the
    back of the system.


    My EBL session was normal and no issues were observed. I measured
    the normal 13 - 14 nm contamination dot with a 5 - 7 nm image
    ripple.  These are the normal values we see day in and day out. 
    Yesterday these flags or image ripples were on the order of 25 - 40
    nm, and we were seeing cyclical jumps in the SEM image dot position
    moving back and forth in the Y plane.  SEM image and raith image
    acquisitions for write field alignment are crisp and clear and users
    will again be able to find contamination dots to perform the alignment.

    Users are requested to promptly report any further issues to the
    RAITH Coral 'make comment' section should any unusual artifacts be
    observed.

    System is up and we are resuming the CORAL schedule at this time.

    Thank you for your support!

    James Conway

    :-)








James Conway wrote:
> Greetings RAITH Users:
>
> Working with RAITH USA Inc. I am troubleshooting the larger than 
> normal scanning flag artifacts and Image Ripples on the RAITH 150 EBL 
> system.  There may possibly be a problem with the Electron Optics 
> board or its power supply voltages.  Users will find it difficult to 
> properly focus and stigmate using contamination dots or on small sub 
> 100 nm features due to this problem. The magnitude of the images 
> ripples has been increasing each day since this weekend when this 
> problems surfaced.
> Users should be particularly careful during Write Field Alignments.  
> Please also report any other unusual problems or observations you can 
> identify to this list.
> A RAITH Field Service visit has been requested to address this problem.
>
> While the demolition and construction activities across the street 
> have added to our problems this week -- the problem I am 
> troubleshooting occurs at all times of day/night and is apparent even 
> when you do not have the system in focus on any feature in SEM view.  
> Q.E.D., I believe the problem is sourced from the scanning /deflection 
> section on the RAITH SEM (LEO) and not from external influences.  The 
> platform vibration isolation system is working and set at all the 
> normal parameters we normally employ. Turbo pump and NESLAB chiller 
> operation pressure and flow are normal and no significant vibration is 
> evidenced from these sub-systems.
>
> Thank you for your support!
>
> James Conway
>
>
>
>
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From mkoto at stanford.edu  Fri Feb 29 05:53:32 2008
From: mkoto at stanford.edu (mkoto at stanford.edu)
Date: Fri, 29 Feb 2008 05:53:32 -0800
Subject: RAITH will open to next user
In-Reply-To: <dea8d710802281402wd799388xb79b8548dc3c151e@mail.gmail.com>
References: <dea8d710802281402wd799388xb79b8548dc3c151e@mail.gmail.com>
Message-ID: <20080229055332.s5zk4m8ou84wkwwk@webmail.stanford.edu>

Hi,

  My session will finish earlier than my estimation, around 6:30.
Next user can start earlier. Sorry for short notice.

Makoto

***************************************************
    Makoto Koto            Visiting Scholar
  476 Lomita Mall  244 McCullough Building
  Stanford, CA 94305-4045
***************************************************


From jwc at snf.stanford.edu  Fri Feb 29 11:24:39 2008
From: jwc at snf.stanford.edu (James Conway)
Date: Fri, 29 Feb 2008 11:24:39 -0800
Subject: Special Ebeam Lab Presentation:  Chemically Amplified Molecular Resists
 for E-Beam Lithography , Dr. Alex Robinson University of Birmingham, UK.
  Tuesday March 4 , 20081:30 PM CIS 101
Message-ID: <47C85BF7.6040608@snf.stanford.edu>

*Special Ebeam Lab Presentation: 
Chemically Amplified Molecular Resists for E-Beam Lithography
Dr. Alex P.G. Robinson University of Birmingham, UK.
Tuesday March 4, 2008 1:30 PM in CIS 101*

*It is my pleasure to announce that Dr. Alex P.G. Robinson will be 
visiting the Stanford Nanofabrication Facility next Tuesday afternoon 
and will present his work on Chemically Amplified Molecular Resists. He 
has also promised to give us an introduction and an update on activities 
at the Nanoscale Physics Research Laboratory <http://nprl.bham.ac.uk/> 
at the **University of Birmingham.

All interested parties are invited to attend.  There will be ample time 
for discussions after his presentation and we have the room through 3 PM.


James W. Conway
Ebeam Lab
Stanford Nanofabrication Facility
650-725-7075
-------------------------------------------------------

*

*Chemically Amplified Molecular Resists for E-Beam Lithography***

J. Manyam^a , F.P. Gibbons^a , S. Diegoli^b , M. Manickam^b , J.A. 
Preece^b , R.E. Palmer^a , _A.P.G. Robinson_^a

/ /

^a Nanoscale Physics Research Laboratory, School of Physics and 
Astronomy, The University of Birmingham, Birmingham, B15 2TT, UK

phone: +44 (0)121 414 4641   e-mail: a.p.g.robinson at bham.ac.uk 
<mailto:alex at nprl.ph.bham.ac.uk>

^b School of Chemistry, The University of Birmingham, Birmingham, B15 
2TT, UK

 

Key words:  Electron Beam Lithography, Molecular Resist, Fullerene, 
Chemically Amplified Resist

 

The minimum lithographic feature size for microelectronic fabrication 
continues to shrink, and resist properties are beginning to dominate the 
achievable resolution. There is a strong need for a high resolution, 
high sensitivity resist for the 32 nm node, and beyond, that is not met 
by conventional polymeric resists at this time. The line width roughness 
(LWR) requirements at the 32 nm node [1] are already equal to the radius 
of gyration of a typical resist polymer, [2] whilst the resolution 
itself will be less than the polymer molecule size at future nodes. 
Molecular resists, such as oglimers and molecular glasses rely on 
smaller molecules, giving the potential for lower LWR and improved 
resolution. Fullerene derivative molecules have a diameter of 
approximately 1 nm and have been shown to act as negative tone resists 
with high etch durability and a resolution of 10 nm when exposed via 
electron beam lithography.  However, the sensitivity of such resists is 
extremely poor and significant improvements would have to be made to 
make the material commercially viable.  A common way to improve resist 
sensitivity is chemical amplification (CA) by addition of a 
photosensitizer, and optionally a cross-linker. Here we present a 
fullerene based three component chemically amplified resist system, 
which shows high resolution and sensitivity, wide process latitude, and 
etch durability comparable with commercial novolac resists.

 

Fullerene resist films were prepared on hydrogen terminated silicon by 
spin coating and were irradiated using a Philips XL30SFEG scanning 
electron microscope equipped with a Raith lithography system. The 
fullerene CA resist consisted of the derivative MF03-04, an epoxide 
cross-linker and a photoacid generator.  The sensitivity of this resist 
was shown to be between 5 and 10 ?C/cm^2 at 20 keV for various 
combinations of post application bake and post exposure bake 
conditions.  Using 30 keV electron beam exposure, sparse patterns with 
12 nm resolution were demonstrated, at a line dose of 300 pC/cm, whilst 
dense patterns with half-pitch 20 nm were achieved at 200 pC/cm, as 
shown in figure 1. The LWR for the densely patterned resist (measured at 
hp 25 nm) is approximately 4 nm. The etch durability of the fullerene 
resist was comparable to SAL601, a common novolac resist.

 

[1] International Technology Road map for Semiconductors, 2006 Update, 
http://www.itrs.net <http://www.itrs.net/>.

[2] R.L. Brainard, G.G. Barclay, E.H. Anderson, L.E. Ocola, 
Microelectron. Eng., *2002*, /61-62/, 707.

 

Figure 1:         20 nm half-pitch lines and spaces exposed with a dose 
of 200 pC/cm at 30 keV, developed in MCB (1:1) IPA for 10 s, with a 10 s 
IPA rinse.


*
*

*
*

*
*

*
*

*
*

*
*

*
*


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From jwc at snf.stanford.edu  Fri Feb 29 11:36:05 2008
From: jwc at snf.stanford.edu (James Conway)
Date: Fri, 29 Feb 2008 11:36:05 -0800
Subject: Raith run crashed
In-Reply-To: <D03F9B80-F355-4D71-8F17-99B35A0CAA52@stanford.edu>
References: <3b532e5a0802282225ib388225vb518b9172f7baef0@mail.gmail.com> <D03F9B80-F355-4D71-8F17-99B35A0CAA52@stanford.edu>
Message-ID: <47C85EA5.3040207@snf.stanford.edu>

Hi Michelle,

I too experienced several unusual application termination events during 
complex overlay writes during my session Wednesday.  I  them defragged 
the RAITH Hard drive after cleaning up the file system.
I have 2 GB of memory on that computer so it shouldn't be a memory 
issue.  I am trying to learn more about these types of events.
I have CC'd Joe Klingfus at RAITH USA for his comments and we will see 
if there is anything to check or repair to eliminate these issues promptly.
Thank you for your report!

James Conway

Michelle Povinelli wrote:
> Hi James,
> I got an error in the middle of my write session:
>
>> The error message is by the standard windows error tab, saying
>> "Raith150.EXE has encountered a problem, and needs to close.
>> We are sorry for the inconvenience. - Please tell Microsoft about
>> this problem..."
>>
>> Its detail goes,
>> Error signature: Raith150.exe, Mod name: Beamdpgen.dll,
>> offset 0000a655, etc
>>
>> No error message is shown from the Raith software itself.
>
> Do you know any possible causes this error? I am writing a series of 
> 2mm long waveguides.
>
> Michelle
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