From jwc at snf.stanford.edu Mon Mar 3 11:08:22 2008 From: jwc at snf.stanford.edu (James Conway) Date: Mon, 03 Mar 2008 11:08:22 -0800 Subject: Tomorrow : Lab Presentation: Chemically Amplified Molecular Resists for E-Beam Lithography , Dr. Alex Robinson University of Birmingham, UK. Tuesday March 4 , 20081:30 PM CIS 101 Message-ID: <47CC4CA6.8040502@snf.stanford.edu> * * * * * **Special Ebeam Lab Presentation: Chemically Amplified Molecular Resists for E-Beam Lithography Dr. Alex P.G. Robinson University of Birmingham, UK. Tuesday March 4, 2008 1:30 PM in CIS 101* *It is my pleasure to announce that Dr. Alex P.G. Robinson will be visiting the Stanford Nanofabrication Facility next Tuesday afternoon and will present his work on Chemically Amplified Molecular Resists. He has also promised to give us an introduction and an update on activities at the Nanoscale Physics Research Laboratory at the **University of Birmingham. All interested parties are invited to attend. There will be ample time for discussions after his presentation and we have the room through 3 PM. James W. Conway Ebeam Lab Stanford Nanofabrication Facility 650-725-7075 ------------------------------------------------------- * *Chemically Amplified Molecular Resists for E-Beam Lithography*** J. Manyam^a , F.P. Gibbons^a , S. Diegoli^b , M. Manickam^b , J.A. Preece^b , R.E. Palmer^a , _A.P.G. Robinson_^a / / ^a Nanoscale Physics Research Laboratory, School of Physics and Astronomy, The University of Birmingham, Birmingham, B15 2TT, UK phone: +44 (0)121 414 4641 e-mail: a.p.g.robinson at bham.ac.uk ^b School of Chemistry, The University of Birmingham, Birmingham, B15 2TT, UK Key words: Electron Beam Lithography, Molecular Resist, Fullerene, Chemically Amplified Resist The minimum lithographic feature size for microelectronic fabrication continues to shrink, and resist properties are beginning to dominate the achievable resolution. There is a strong need for a high resolution, high sensitivity resist for the 32 nm node, and beyond, that is not met by conventional polymeric resists at this time. The line width roughness (LWR) requirements at the 32 nm node [1] are already equal to the radius of gyration of a typical resist polymer, [2] whilst the resolution itself will be less than the polymer molecule size at future nodes. Molecular resists, such as oglimers and molecular glasses rely on smaller molecules, giving the potential for lower LWR and improved resolution. Fullerene derivative molecules have a diameter of approximately 1 nm and have been shown to act as negative tone resists with high etch durability and a resolution of 10 nm when exposed via electron beam lithography. However, the sensitivity of such resists is extremely poor and significant improvements would have to be made to make the material commercially viable. A common way to improve resist sensitivity is chemical amplification (CA) by addition of a photosensitizer, and optionally a cross-linker. Here we present a fullerene based three component chemically amplified resist system, which shows high resolution and sensitivity, wide process latitude, and etch durability comparable with commercial novolac resists. Fullerene resist films were prepared on hydrogen terminated silicon by spin coating and were irradiated using a Philips XL30SFEG scanning electron microscope equipped with a Raith lithography system. The fullerene CA resist consisted of the derivative MF03-04, an epoxide cross-linker and a photoacid generator. The sensitivity of this resist was shown to be between 5 and 10 ?C/cm^2 at 20 keV for various combinations of post application bake and post exposure bake conditions. Using 30 keV electron beam exposure, sparse patterns with 12 nm resolution were demonstrated, at a line dose of 300 pC/cm, whilst dense patterns with half-pitch 20 nm were achieved at 200 pC/cm, as shown in figure 1. The LWR for the densely patterned resist (measured at hp 25 nm) is approximately 4 nm. The etch durability of the fullerene resist was comparable to SAL601, a common novolac resist. [1] International Technology Road map for Semiconductors, 2006 Update, http://www.itrs.net . [2] R.L. Brainard, G.G. Barclay, E.H. Anderson, L.E. Ocola, Microelectron. Eng., *2002*, /61-62/, 707. Figure 1: 20 nm half-pitch lines and spaces exposed with a dose of 200 pC/cm at 30 keV, developed in MCB (1:1) IPA for 10 s, with a 10 s IPA rinse. * * * * * * * * * * * * * * -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: not available Type: image/jpeg Size: 53906 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: not available Type: image/gif Size: 38525 bytes Desc: not available URL: From dejia at stanford.edu Mon Mar 3 15:37:36 2008 From: dejia at stanford.edu (Deji A.) Date: Mon, 03 Mar 2008 15:37:36 -0800 Subject: raith free midnight to 430am Message-ID: <47CC8BC0.6000900@stanford.edu> An HTML attachment was scrubbed... URL: From bilee at stanford.edu Mon Mar 3 18:18:31 2008 From: bilee at stanford.edu (Byoungil Lee) Date: Mon, 3 Mar 2008 18:18:31 -0800 Subject: Raith reservation canceled 7-10am tomorrow References: <47CC8BC0.6000900@stanford.edu> Message-ID: <001001c87d9e$0a529c30$9bb30c80@bileehome> Sample is not ready. Byoungil -------------- next part -------------- An HTML attachment was scrubbed... URL: From anikak at stanford.edu Mon Mar 3 18:50:23 2008 From: anikak at stanford.edu (Anika Kinkhabwala) Date: Mon, 3 Mar 2008 18:50:23 -0800 Subject: Raith reservation canceled 7-10am tomorrow In-Reply-To: <001001c87d9e$0a529c30$9bb30c80@bileehome> References: <47CC8BC0.6000900@stanford.edu> <001001c87d9e$0a529c30$9bb30c80@bileehome> Message-ID: actually taken this time... On Mon, Mar 3, 2008 at 6:18 PM, Byoungil Lee wrote: > Sample is not ready. > > Byoungil > -------------- next part -------------- An HTML attachment was scrubbed... URL: From renshen at stanford.edu Tue Mar 4 17:42:11 2008 From: renshen at stanford.edu (Shen Ren) Date: Tue, 4 Mar 2008 17:42:11 -0800 Subject: Ma-D 532 Developer Message-ID: <628a66910803041742t2b61ad25v24e2c2d14a34e94d@mail.gmail.com> Dear EBEAM Community Users, We have been desperately looking for the Ma-D532 together with JWC this afternoon. It is supposed to be in the yellow cabinet, at least in one of the transfer cart. But it is not obviously. We searched the whole lab three times without success. This chemical was used up last week. And the log book showed that it was put into the lab this morning. If you know where it is, saw someone using it, used it today, or even have a hint of where it might be, please let me know. Thanks a lot. -- Best wishes, Shen Ren Department of Electrical Engineering Stanford University "The Chinese call luck opportunity and they say it knocks every day on your door. Some people hear it; some do not. It's not enough to hear opportunity knock. You must let him in, greet him, make friends and work together." - Bernard Gittelson -------------- next part -------------- An HTML attachment was scrubbed... URL: From mkoto at stanford.edu Wed Mar 5 10:01:47 2008 From: mkoto at stanford.edu (mkoto at stanford.edu) Date: Wed, 05 Mar 2008 10:01:47 -0800 Subject: Raith reservation canceled 3-7:30am tomorrow (3/6) In-Reply-To: <001001c87d9e$0a529c30$9bb30c80@bileehome> References: <47CC8BC0.6000900@stanford.edu> <001001c87d9e$0a529c30$9bb30c80@bileehome> Message-ID: <20080305100147.47gzcn79c00gggow@webmail.stanford.edu> Sample won't be ready. Makoto *************************************************** Makoto Koto Visiting Scholar 476 Lomita Mall 244 McCullough Building Stanford, CA 94305-4045 *************************************************** From jwc at snf.stanford.edu Thu Mar 6 12:28:41 2008 From: jwc at snf.stanford.edu (James Conway) Date: Thu, 06 Mar 2008 12:28:41 -0800 Subject: SEMs of MaN2403 EBL patterns written during "rippling" in the SEM mode Message-ID: <47D053F9.30306@snf.stanford.edu> An HTML attachment was scrubbed... URL: From toecutter4ranger at gmail.com Thu Mar 6 17:18:46 2008 From: toecutter4ranger at gmail.com (James Conway) Date: Thu, 6 Mar 2008 17:18:46 -0800 Subject: we have just finished early -- RAITH Is available for next User. Message-ID: Hello We have just finished early -- RAITH Is available for next User. Thank you and Good Evening, JWC -------------- next part -------------- An HTML attachment was scrubbed... URL: From englund at stanford.edu Thu Mar 6 23:21:19 2008 From: englund at stanford.edu (Dirk Englund) Date: Thu, 6 Mar 2008 23:21:19 -0800 Subject: canceling reservation tonight Message-ID: <6323C123-4BCB-4937-90B0-100F019C7CCF@stanford.edu> Canceling reservation from 12:00 - 4:00 am --- sample not ready. -Dirk Grad. Student in Appl. Physics - Stanford U. cvitae.org/englund/ -------------- next part -------------- An HTML attachment was scrubbed... URL: From kimsangb at stanford.edu Fri Mar 7 18:18:34 2008 From: kimsangb at stanford.edu (SangBum Kim) Date: Fri, 7 Mar 2008 18:18:34 -0800 Subject: raith free from 2:30AM to 7:30AM Saturday Message-ID: <001301c880c2$b641de80$a9b50c80@sangbumhome> Sample is not ready -------------- next part -------------- An HTML attachment was scrubbed... URL: From ytcheng at stanford.edu Sun Mar 9 10:49:52 2008 From: ytcheng at stanford.edu (ytcheng at stanford.edu) Date: Sun, 09 Mar 2008 10:49:52 -0700 Subject: raith free from now to 1pm Message-ID: <20080309104952.qakb9ualcgsswwo8@webmail.stanford.edu> finished early Yao-Te From mpovinel at stanford.edu Sun Mar 9 15:26:55 2008 From: mpovinel at stanford.edu (Michelle Povinelli) Date: Sun, 9 Mar 2008 15:26:55 -0700 Subject: raith free until 6pm Message-ID: <369F1DC6-5B22-4741-886B-36280096803D@stanford.edu> Could not get an image during write field alignment. Not enough time left to write sample. Raith free from now until 6pm. Michelle From jwc at snf.stanford.edu Tue Mar 11 10:02:12 2008 From: jwc at snf.stanford.edu (James Conway) Date: Tue, 11 Mar 2008 09:02:12 -0800 Subject: REMINDER: "Take A Spin with Me" -- Ebeam Resist Handling Training on the Headway for MARCH. Tuesday MARCH 11 AND 25TH , 2008 10:15 AM to 12:30 PM Message-ID: <47D6BB14.2050303@snf.stanford.edu> * * ** * ANNOUNCEMENT: "Take A Spin with Me" -- Resist Handling Training on the Headway Coater. MARCH CLASSES. * Greetings SNF Lab Users, I will be conducting my next *"Take A Spin with Me" *training class Tuesday March 11 and 25th , 2008 from 10:15 AM - 12:30 PM. There is a sign up sheet posted on the white board in my office if you desire to sign up in advance. This is a great opportunity for you to get acquainted with the specific points to employ when working with our Ebeam or Optical Resist materials in order to obtain high quality thin film coatings over your wafers for Electron Beam, Scanning Probe (SPL), and optical Nano-Lithography. In these applications accurate control of polymer thickness is important in order to obtain consistent high quality lithography results. We will be conducting this training on the Headway Spin Coater. Users attending this session will gain their qualification on this tool and also learn to perform thin film measurements on the Nanospec TFA measurement tool. This is a Hands-On Lab Session, please have your substrates clean and ready to coat on the Headway Coater. Class Schedule: 10:15 - 11:00 I will start with substrate cleans on WET BENCH NONMETAL performing Pirhana substrate cleans and HF etching of the intrinsic native oxide on Silicon wafers. All users must have their substrates cleaned and ready to go for spinning by the session time; either coming out of the 150 degree Singe oven, or if you are working on oxides or nitrides, coming out of the YES HMDS Prime oven directly. 11:00 - 12:00 We can apply what ever Ebeam or Optical Resist system you desire for your work. 12:00 - 12:30 Thin Film Measurements on the Nanospec Thin Film Analyzer All interested parties are welcome to attend this session. Thank you for your interest in Ebeam and Optical Lithography at Stanford Nanofabrication Facility, James W. Conway Ebeam Technology Group Stanford Nanofabrication Facility 650-725-7075 office hour Tuesday - Friday 8:30 - 9:30 AM CIS 31 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: not available Type: image/gif Size: 3681 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: not available Type: image/jpeg Size: 49030 bytes Desc: not available URL: From dejia at stanford.edu Tue Mar 11 11:23:17 2008 From: dejia at stanford.edu (Deji A.) Date: Tue, 11 Mar 2008 11:23:17 -0700 Subject: raith free 6pm-11pm tomorrow Message-ID: <47D6CE15.5010100@stanford.edu> An HTML attachment was scrubbed... URL: From faraon at stanford.edu Wed Mar 12 00:44:00 2008 From: faraon at stanford.edu (Andrei Faraon) Date: Wed, 12 Mar 2008 00:44:00 -0700 Subject: finished early - raith available for next user Message-ID: <28d3ece90803120044m37262a89r721651f1d360b1ba@mail.gmail.com> -- Andrei Faraon Stanford University, Applied Physics 316 Via Pueblo Mall Stanford, CA, 94305 Mobile: 650 714 7881 Office: 650 723 2279 www.stanford.edu/~faraon From xinranw at stanford.edu Wed Mar 12 15:21:27 2008 From: xinranw at stanford.edu (Xinran Wang) Date: Wed, 12 Mar 2008 15:21:27 -0700 Subject: raith free Friday 12:00am Message-ID: <22ffcd060803121521je02cbe3wbd3d195c311c4ddd@mail.gmail.com> Sample won't be ready, sorry for late notice. Xinran -------------- next part -------------- An HTML attachment was scrubbed... URL: From ifushman at stanford.edu Wed Mar 12 16:17:06 2008 From: ifushman at stanford.edu (Ilya Fushman) Date: Wed, 12 Mar 2008 16:17:06 -0700 Subject: sample not ready Message-ID: hi, sorry sample not ready. can't do write. -ilya -- Ilya Fushman Applied Physics Stanford University cvitae.org/ilya/ -------------- next part -------------- An HTML attachment was scrubbed... URL: From ifushman at stanford.edu Wed Mar 12 17:03:11 2008 From: ifushman at stanford.edu (Ilya Fushman) Date: Wed, 12 Mar 2008 17:03:11 -0700 Subject: nevermind taking it back Message-ID: sorry for the confusion ... -- Ilya Fushman Applied Physics Stanford University cvitae.org/ilya/ -------------- next part -------------- An HTML attachment was scrubbed... URL: From chandran at gmail.com Thu Mar 13 09:37:31 2008 From: chandran at gmail.com (anu chandran) Date: Thu, 13 Mar 2008 09:37:31 -0700 Subject: Raith free Friday 7:00 am to 12:30pm Message-ID: Sorry for the late notice -- Anu Chandran Materials Science & Engineering 476 Lomita Mall,McCullough Building Stanford CA 94305-4045 T:6507236466 Lab T:6507234874 Office F:6507249851 -------------- next part -------------- An HTML attachment was scrubbed... URL: From fjaeckel at stanford.edu Thu Mar 13 09:41:24 2008 From: fjaeckel at stanford.edu (Frank Jaeckel) Date: Thu, 13 Mar 2008 09:41:24 -0700 Subject: Raith free Friday 7:00 am to 12:30pm In-Reply-To: References: Message-ID: <1e8b3d5b0803130941m2821b797s3f31623bd12e5ba1@mail.gmail.com> took it an released Saturday 7-11AM. fj On Thu, Mar 13, 2008 at 9:37 AM, anu chandran wrote: > Sorry for the late notice > > -- > Anu Chandran > Materials Science & Engineering > 476 Lomita Mall,McCullough Building > Stanford CA 94305-4045 > T:6507236466 Lab > T:6507234874 Office > F:6507249851 -- http://www.stanford.edu/~fjaeckel/ -------------- next part -------------- An HTML attachment was scrubbed... URL: From zhangli at stanford.edu Fri Mar 14 15:33:27 2008 From: zhangli at stanford.edu (Li Zhang) Date: Fri, 14 Mar 2008 15:33:27 -0700 Subject: Raith free 11:am to 2:30pm tomorrow saturday Message-ID: <66aaf8f30803141533y6fe97fd5v19156dadeb19bd6a@mail.gmail.com> Sorry for the very late notice, sample is not ready. Thanks -- Li --------------------------------------- Li Zhang Dai's Group Department of Chemistry Stanford University --------------------------------------- .oooO ( ) Oooo. \ ( ( ) \ ) ) / Life is good, ( / it's just not easy. -------------- next part -------------- An HTML attachment was scrubbed... URL: From filip at stanford.edu Fri Mar 14 16:21:30 2008 From: filip at stanford.edu (Filip Crnogorac) Date: Fri, 14 Mar 2008 16:21:30 -0700 Subject: Raith free 11:am to 2:30pm tomorrow saturday In-Reply-To: <66aaf8f30803141533y6fe97fd5v19156dadeb19bd6a@mail.gmail.com> References: <66aaf8f30803141533y6fe97fd5v19156dadeb19bd6a@mail.gmail.com> Message-ID: <20080314162130.0sbpxxygaskos8c0@webmail.stanford.edu> Taken, Thanks, F Quoting Li Zhang : > Sorry for the very late notice, sample is not ready. Thanks > > -- > Li > --------------------------------------- > Li Zhang > Dai's Group > Department of Chemistry > Stanford University > --------------------------------------- > .oooO > ( ) Oooo. > \ ( ( ) > \ ) ) / > Life is good, ( / > it's just not easy. > -------------------------------------- Ph.D. Candidate, Stanford University Department of Electrical Engineering Center for Integrated Systems B-103, 420 Via Palou Stanford, CA 94305 From bilee at stanford.edu Sun Mar 16 00:28:20 2008 From: bilee at stanford.edu (Byoungil Lee) Date: Sat, 15 Mar 2008 23:28:20 -0800 Subject: Raith reservation released 0-2:30am, Sat Mar 22 References: <66aaf8f30803141533y6fe97fd5v19156dadeb19bd6a@mail.gmail.com> Message-ID: <002101c88737$4f9428c0$b66018ac@BILEEOFFICE> Sample will not be ready by then. Thanks, Byoungil -------------- next part -------------- An HTML attachment was scrubbed... URL: From ahryciw at gmail.com Mon Mar 17 09:59:37 2008 From: ahryciw at gmail.com (Aaron Hryciw) Date: Mon, 17 Mar 2008 09:59:37 -0700 Subject: 3/21 Raith reservation released Message-ID: <4d36fb940803170959l676cf314w1ac4fe16fc779043@mail.gmail.com> I have released my Raith reservation on Friday, March 21st, from 05:30 to 09:30. Cheers! ? Aaron -- Aaron Hryciw Postdoctoral Scholar Geballe Laboratory for Advanced Materials Stanford University 476 Lomita Mall (04-490) McCullough Building, Rm. 325 Stanford, CA 94305-4045 Tel.: (650) 723-5840 Fax.: (650) 736-1984 -------------- next part -------------- An HTML attachment was scrubbed... URL: From anikak at stanford.edu Tue Mar 18 06:11:09 2008 From: anikak at stanford.edu (Anika Kinkhabwala) Date: Tue, 18 Mar 2008 06:11:09 -0700 Subject: Raith imaging is not working Message-ID: I am having issues getting the SEM or even the tv camera to work this morning. The user before me had no problems, but when I loaded my sample, I couldn't see anything because the tv camera signal is completely black. Then, when I tried the SE2 or inlens signal, it also looked odd. Anyway, the rest of my session is free (only until 7am). -Anika -------------- next part -------------- An HTML attachment was scrubbed... URL: From mpreiner at stanford.edu Tue Mar 18 10:44:25 2008 From: mpreiner at stanford.edu (mpreiner at stanford.edu) Date: Tue, 18 Mar 2008 10:44:25 -0700 Subject: Raith imaging is not working In-Reply-To: References: Message-ID: <20080318104425.kcifg70gg8osw0c8@webmail.stanford.edu> Quoting Anika Kinkhabwala : > I am having issues getting the SEM or even the tv camera to work this > morning. The user before me had no problems, but when I loaded my sample, I > couldn't see anything because the tv camera signal is completely black. > Then, when I tried the SE2 or inlens signal, it also looked odd. Anyway, > the rest of my session is free (only until 7am). > > -Anika > It's been working fine for me. (started at 9am) -mike From jwc at snf.stanford.edu Tue Mar 18 17:57:50 2008 From: jwc at snf.stanford.edu (James Conway) Date: Tue, 18 Mar 2008 16:57:50 -0800 Subject: Raith imaging is not working In-Reply-To: <20080318104425.kcifg70gg8osw0c8@webmail.stanford.edu> References: <20080318104425.kcifg70gg8osw0c8@webmail.stanford.edu> Message-ID: <47E0650E.8000801@snf.stanford.edu> All you needed to do is gracefully exit the LEO application, log out and SHUTDOWN Windows OS and reboot. What happens is occasionally the L-REM module is either read in error or the firmware is revoked at application launch. If you shut down the computer it frees up the memory segment where this firmware resides and reads that specific script again on the application boot, registers it with the LEO server and you have all your channels back. If this happens again I will add it to the FAQ listings. All the Best, James Conway Anika Kinkhabwala wrote: > I am having issues getting the SEM or even the tv camera to work this > morning. The user before me had no problems, but when I loaded my > sample, I couldn't see anything because the tv camera signal is > completely black. Then, when I tried the SE2 or inlens signal, it > also looked odd. Anyway, the rest of my session is free (only until 7am). > > -Anika > -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Wed Mar 19 10:18:54 2008 From: jwc at snf.stanford.edu (James Conway) Date: Wed, 19 Mar 2008 09:18:54 -0800 Subject: Releasing my reservation for Friday March 28th from 10 AM to 3 PM -- up for your reservation needs. Message-ID: <47E14AFE.6040201@snf.stanford.edu> An HTML attachment was scrubbed... URL: From jwconway at stanford.edu Wed Mar 19 16:50:06 2008 From: jwconway at stanford.edu (jwconway at stanford.edu) Date: Wed, 19 Mar 2008 16:50:06 -0700 Subject: RAITH is back up and available to users --finished now Message-ID: <20080319165006.pem5rsga2ogs00cg@webmail.stanford.edu> Greetings: Some days go better than others... I spent most of my session reservation time this afternoon bringing the system back up after an rather unusual problem was encountered early this afternoon that brought the entire system down and off line to Users. The system is now back up, all interfaces and sub-systems have been checked out, and we are now ready to resume the Coral schedule with the next User. I am finished for the day and the next user may now come onto the system early if possible. Please call me if you encounter any significant problems on the tool overnight. Thank you for your support! James Conway Ebeam Lab SNF From zhangdw at stanford.edu Thu Mar 20 17:32:11 2008 From: zhangdw at stanford.edu (zhangdw at stanford.edu) Date: Thu, 20 Mar 2008 17:32:11 -0700 Subject: 18:00-23:00 free, really sorry for the late notice, syringe used up, can't coat resist Message-ID: <20080320173211.694wvqnhickw88ss@webmail.stanford.edu> From koseki at stanford.edu Thu Mar 20 18:13:41 2008 From: koseki at stanford.edu (Shinichi Koseki) Date: Thu, 20 Mar 2008 18:13:41 -0700 Subject: 18:00-24:00 free, really sorry for the late notice, syringe used up, can't coat resist In-Reply-To: <20080320173211.694wvqnhickw88ss@webmail.stanford.edu> References: <20080320173211.694wvqnhickw88ss@webmail.stanford.edu> Message-ID: <20080320181341.7adkfdhk0gg08wk8@webmail.stanford.edu> I got the cancelled slot, but it turned out I didn't need it. I'm very very sorry, but the slot is now open until 12pm tonight. sorry, Shinichi Quoting zhangdw at stanford.edu: > From faraon at stanford.edu Thu Mar 20 22:12:55 2008 From: faraon at stanford.edu (Andrei Faraon) Date: Thu, 20 Mar 2008 22:12:55 -0700 Subject: Raith free until midnight - I finished earlier Message-ID: <28d3ece90803202212m30b49f90n26ff4ae40e7c04@mail.gmail.com> -- Andrei Faraon Stanford University, Applied Physics 316 Via Pueblo Mall Stanford, CA, 94305 Mobile: 650 714 7881 Office: 650 723 2279 www.stanford.edu/~faraon -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Fri Mar 21 09:51:02 2008 From: jwc at snf.stanford.edu (James Conway) Date: Fri, 21 Mar 2008 08:51:02 -0800 Subject: ANNOUNCEMENT: "Take A Spin with Me" -- Ebeam Resist Handling Training on the Headway for MARCH. Tuesday MARCH 11 AND 25TH , 2008 10:15 AM to 12:30 PM Message-ID: <47E3E776.4070706@snf.stanford.edu> * * ** * ANNOUNCEMENT: "Take A Spin with Me" -- Resist Handling Training on the Headway Coater. MARCH CLASSES. * Greetings SNF Lab Users, I will be conducting my next *"Take A Spin with Me" *training class Tuesday March 25th , 2008 from 10:15 AM - 12:30 PM. There is a sign up sheet posted on the white board in my office if you desire to sign up in advance. This is a great opportunity for you to get acquainted with the specific points to employ when working with our Ebeam or Optical Resist materials in order to obtain high quality thin film coatings over your wafers for Electron Beam, Scanning Probe (SPL), and optical Nano-Lithography. In these applications accurate control of polymer thickness is important in order to obtain consistent high quality lithography results. We will be conducting this training on the Headway Spin Coater. Users attending this session will gain their qualification on this tool and also learn to perform thin film measurements on the Nanospec TFA measurement tool. This is a Hands-On Lab Session, please have your substrates clean and ready to coat on the Headway Coater. Class Schedule: 10:15 - 11:00 I will start with substrate cleans on WET BENCH NONMETAL performing Pirhana substrate cleans and HF etching of the intrinsic native oxide on Silicon wafers. All users must have their substrates cleaned and ready to go for spinning by the session time; either coming out of the 150 degree Singe oven, or if you are working on oxides or nitrides, coming out of the YES HMDS Prime oven directly. 11:00 - 12:00 We can apply what ever Ebeam or Optical Resist system you desire for your work. 12:00 - 12:30 Thin Film Measurements on the Nanospec Thin Film Analyzer All interested parties are welcome to attend this session. Thank you for your interest in Ebeam and Optical Lithography at Stanford Nanofabrication Facility, James W. Conway Ebeam Technology Group Stanford Nanofabrication Facility 650-725-7075 office hour Tuesday - Friday 8:30 - 9:30 AM CIS 31 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: not available Type: image/gif Size: 3681 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: not available Type: image/jpeg Size: 49030 bytes Desc: not available URL: From jwc at snf.stanford.edu Mon Mar 24 11:44:55 2008 From: jwc at snf.stanford.edu (James Conway) Date: Mon, 24 Mar 2008 10:44:55 -0800 Subject: confirming for your session tomorrow Tuesday March 25, 2008 -- Possible to Share the Ride Message-ID: <47E7F6A7.9060001@snf.stanford.edu> Dawei Zhang, Confirming we are working together on overlay alignments to your optical patterns on the RAITH 150. We have a long session so we will wish to 'Share the Ride!' if anyone is interested in trying to fill in after his write. Session time opened up the hour before hand so I changed our reservation back an hour to 1:00 to 7:00 PM. Please be on time to start. Thank you, James Conway -------------- next part -------------- An HTML attachment was scrubbed... URL: From jwc at snf.stanford.edu Mon Mar 24 12:43:13 2008 From: jwc at snf.stanford.edu (James Conway) Date: Mon, 24 Mar 2008 11:43:13 -0800 Subject: Friday March 28, 2008 RAITH USA visit to discuss applications and cpaabilities of their new Ion Line nano-FIB. -- CIS 101 10:00 - 10:40 AM Message-ID: <47E80451.3020303@snf.stanford.edu> Greetings Raith and Ebeam Users: This Friday March 28, 2008 in CIS 101 from 10:00 - 10:40 AM: We will be having several members of RAITH visit us to discuss potential applications and review the capabilities of their new ionLiNE nano-FIB system. All Users and Lab Members wishing to learn more, or to discuss potential new applications or fabrication questions using these tools are welcome to attend. This is NOT just another Focused Ion Beam tool... The Raith ionLiNE is an advanced focused ion-beam nanofabrication instrument designed and characterized to meet lithography tool standards. The unique components are the patented NanoFIB column, the ELPHY pattern generator, the laser interferometer stage, and a complete lithography software package, all integrated into one system to enable advanced ion-beam patterning. The ion-beam source and column produce the beam stability required for automated advanced lithography. With a small beam diameter and nominal beam tails, the focused ion-beam offers high lateral selectivity, enabling fabricated feature sizes of 10 nanometers and below. Exposures are made in a variety of scan modes using a high speed 16-bit pattern generator. The pattern generator technology enables nanosecond ion dose control and 3D grey level patterning. For applications covering areas larger than a single exposure field, the laser interferometer stage provides positioning resolution of 1 nm. With these unique features, the ionLiNE delivers critical lithography specifications, such as stitching and overlay accuracies. The lithography software permits the generation or import of complex patterns in the widely accepted GDSII data format, job automation for overnight patterning without user interaction, automated dose control, metrology, and automated focus control via height sensing schemes. Fixed Beam Moving Stage (FBMS), a zero stitching error writing mode for the seamless exposure of extended structures, completes the advanced patterning of the ionLiNE. Additional options, such as a gas-injection system and nanomanipulators, can be added to allow unique nanofabrication and nanoengineering capabilities. Everyone is welcome. Thank you, James Conway 650-725-7075 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Raith ionLiNE.pdf Type: application/x-pdf Size: 513567 bytes Desc: not available URL: From jwc at snf.stanford.edu Mon Mar 24 18:55:00 2008 From: jwc at snf.stanford.edu (James Conway) Date: Mon, 24 Mar 2008 17:55:00 -0800 Subject: Reminder: "Take A Spin with Me" -- Ebeam Resist Handling Training on the Headway for MARCH. TOMORROW --> Tuesday MARCH 25TH , 2008 10:15 AM to 12:30 PM Message-ID: <47E85B74.5040501@snf.stanford.edu> * * ** * ANNOUNCEMENT: "Take A Spin with Me" -- Resist Handling Training on the Headway Coater. MARCH CLASSES. * Greetings SNF Lab Users, I will be conducting my next *"Take A Spin with Me" *training class tomorrow Tuesday March 25th , 2008 from 10:15 AM - 12:30 PM. There is a sign up sheet posted on the white board in my office if you desire to sign up in advance. This is a great opportunity for you to get acquainted with the specific points to employ when working with our Ebeam or Optical Resist materials in order to obtain high quality thin film coatings over your wafers for Electron Beam, Scanning Probe (SPL), and optical Nano-Lithography. In these applications accurate control of polymer thickness is important in order to obtain consistent high quality lithography results. We will be conducting this training on the Headway Spin Coater. Users attending this session will gain their qualification on this tool and also learn to perform thin film measurements on the Nanospec TFA measurement tool. This is a Hands-On Lab Session, please have your substrates clean and ready to coat on the Headway Coater. Class Schedule: 10:15 - 11:00 I will start with substrate cleans on WET BENCH NONMETAL performing Pirhana substrate cleans and HF etching of the intrinsic native oxide on Silicon wafers. All users must have their substrates cleaned and ready to go for spinning by the session time; either coming out of the 150 degree Singe oven, or if you are working on oxides or nitrides, coming out of the YES HMDS Prime oven directly. 11:00 - 12:00 We can apply what ever Ebeam or Optical Resist system you desire for your work. 12:00 - 12:30 Thin Film Measurements on the Nanospec Thin Film Analyzer All interested parties are welcome to attend this session. Thank you for your interest in Ebeam and Optical Lithography at Stanford Nanofabrication Facility, James W. Conway Ebeam Technology Group Stanford Nanofabrication Facility 650-725-7075 office hour Tuesday - Friday 8:30 - 9:30 AM CIS 31 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: not available Type: image/gif Size: 3681 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: not available Type: image/jpeg Size: 49030 bytes Desc: not available URL: From jwc at snf.stanford.edu Wed Mar 26 19:21:56 2008 From: jwc at snf.stanford.edu (James Conway) Date: Wed, 26 Mar 2008 18:21:56 -0800 Subject: James will be out of the office Thursday March 27, 2008 attending MRS in SF. Message-ID: <47EB04C4.5000404@snf.stanford.edu> Ebeam Lab Users: Sorry for the short notice, but I will be off site most of tomorrow attending the Materials Research Society meeting in San Francisco. If there are problems I may be reachable by cell phone between sessions. Thank you, James Conway -------------- next part -------------- An HTML attachment was scrubbed... URL: From bilee at stanford.edu Wed Mar 26 20:50:04 2008 From: bilee at stanford.edu (Byoungil Lee) Date: Wed, 26 Mar 2008 20:50:04 -0700 Subject: Raith free Fri/28 0:30-4am References: <47EB04C4.5000404@snf.stanford.edu> Message-ID: <004a01c88fbd$a3d5fc40$b66018ac@BILEEOFFICE> Sorry, sample is not ready. Thanks, Byoungil -------------- next part -------------- An HTML attachment was scrubbed... URL: From lsmoore at stanford.edu Thu Mar 27 09:44:33 2008 From: lsmoore at stanford.edu (Lindsay Moore) Date: Thu, 27 Mar 2008 09:44:33 -0700 Subject: free 1:30-4. i'm sick. sorry for late notice. Message-ID: <4dfce5b30803270944o5b05e46bpe5d8796e0f5abf2e@mail.gmail.com> -------------- next part -------------- An HTML attachment was scrubbed... URL: From koseki at stanford.edu Thu Mar 27 10:32:44 2008 From: koseki at stanford.edu (Shinichi Koseki) Date: Thu, 27 Mar 2008 10:32:44 -0700 Subject: free 1:30-4. --> 24:30 - released References: <4dfce5b30803270944o5b05e46bpe5d8796e0f5abf2e@mail.gmail.com> Message-ID: <003101c89030$90d0eba0$231b40ab@nausicaa> Taken, thanks. Take care of your health. I release my original slot, tonight from 0:30am-. best, Shinichi ----- Original Message ----- From: Lindsay Moore To: Raith SNF Mailing list Sent: Thursday, March 27, 2008 9:44 AM Subject: free 1:30-4. i'm sick. sorry for late notice. -------------- next part -------------- An HTML attachment was scrubbed... URL: From ahazeghi at stanford.edu Fri Mar 28 01:24:32 2008 From: ahazeghi at stanford.edu (Arash Hazeghi) Date: Fri, 28 Mar 2008 01:24:32 -0700 Subject: Problem with PMMA exposure/lift off Message-ID: <062CBE28-CA8E-4B81-B017-71F9671CD9E8@stanford.edu> Hi all, I have been trying liftoff on my samples recently but it looks like either I am doing something wrong or there is an exposure problem with eBeam. I am trying to resolve 150nm lines on 300nm 5% 950-K PMMA (standard coat procedure). I have tried area exposure dose from 350uC/cm2 to 430uC/cm2. metal is 80A Pd+200A Pt. lift off was in acetone with syringing. looking under the optical microscope some higher dose exposures seem to have come out except for there are cuts in the thin lines. In other samples looks like the exposed areas were also lifted off. I have attached several pictures, exposure does is indicated in each filename. Some users have already suggested using higher doses which I am trying now, but I'd be happy to hear if there are any other comments. Thank you, Arash ???? ------------------------------------------------------------------------ -- Arash Hazeghi PhD Candidate Stanford Center for Integrated Systems, 420 Via Palou Mall, CIS-X 300 tel: 650-725-0418 mobile: 650-353-1866 http://www.stanford.edu/~ahazeghi -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: 5PMMA-950K-DOS350-45sec.jpg Type: image/jpeg Size: 154072 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: 5PMMA-950K-DOS410-45sec-4.jpg Type: image/jpeg Size: 154752 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: 5PMMA-950K-DOS430-45sec-2.jpg Type: image/jpeg Size: 156748 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: 5PMMA-950K-DOS430-45sec.jpg Type: image/jpeg Size: 151241 bytes Desc: not available URL: From jwc at snf.stanford.edu Fri Mar 28 10:09:14 2008 From: jwc at snf.stanford.edu (James Conway) Date: Fri, 28 Mar 2008 09:09:14 -0800 Subject: TODAY -- Friday March 28, 2008 RAITH USA presentation to discuss applications and capabilities of their new Ion LiNE nano-FIB. tool -- CIS 101 10:00 - 10:40 AM Message-ID: <47ED263A.7090101@snf.stanford.edu> Greetings Raith, Ebeam, and SNF Lab members: Today, Friday March 28, 2008 in CIS 101 from 10:00 - 10:40 AM We will be having several members of RAITH, both from Dortmund, Germany and the USA visit SNF to discuss potential applications and review the capabilities of their new ionLiNE nano-FIB system. This new system is a result of an extensive collaborative effort in Europe between a number of companies and universities. http://www.nanofib.com/ Within this project this team have made some remarkable innovations in developing a new class of FIB tool that can provide a new avenue of nanofabrication patterning as we move into truly nano-scale device dimensions. All Users and Lab Members wishing to learn more, or to discuss potential new applications or fabrication questions using these tools are welcome to attend. This could become an opportunity for researchers at Stanford to get some samples run to test your ideas and develop novel application of the tool for your work. This is NOT just another Focused Ion Beam tool... Everyone is welcome. Thank you, James Conway 650-725-7075 The Raith ionLiNE is an advanced focused ion-beam nanofabrication instrument designed and characterized to meet lithography tool standards. The unique components are the patented NanoFIB column, the ELPHY pattern generator, the laser interferometer stage, and a complete lithography software package, all integrated into one system to enable advanced ion-beam patterning. The ion-beam source and column produce the beam stability required for automated advanced lithography. With a small beam diameter and nominal beam tails, the focused ion-beam offers high lateral selectivity, enabling fabricated feature sizes of 10 nanometers and below. Exposures are made in a variety of scan modes using a high speed 16-bit pattern generator. The pattern generator technology enables nanosecond ion dose control and 3D grey level patterning. For applications covering areas larger than a single exposure field, the laser interferometer stage provides positioning resolution of 1 nm. With these unique features, the ionLiNE delivers critical lithography specifications, such as stitching and overlay accuracies. The lithography software permits the generation or import of complex patterns in the widely accepted GDSII data format, job automation for overnight patterning without user interaction, automated dose control, metrology, and automated focus control via height sensing schemes. Fixed Beam Moving Stage (FBMS), a zero stitching error writing mode for the seamless exposure of extended structures, completes the advanced patterning of the ionLiNE. Additional options, such as a gas-injection system and nanomanipulators, can be added to allow unique nanofabrication and nanoengineering capabilities. -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Raith ionLiNE.pdf Type: application/x-pdf Size: 513567 bytes Desc: not available URL: From yiyangg at stanford.edu Fri Mar 28 11:56:35 2008 From: yiyangg at stanford.edu (Yiyang Gong) Date: Fri, 28 Mar 2008 11:56:35 -0700 Subject: I have taken jesse's session until 3pm today In-Reply-To: <004a01c88fbd$a3d5fc40$b66018ac@BILEEOFFICE> References: <47EB04C4.5000404@snf.stanford.edu> <004a01c88fbd$a3d5fc40$b66018ac@BILEEOFFICE> Message-ID: <47ED3F63.40602@stanford.edu> thanks From zhangli at stanford.edu Fri Mar 28 17:19:15 2008 From: zhangli at stanford.edu (Li Zhang) Date: Fri, 28 Mar 2008 17:19:15 -0700 Subject: Raith free tomorrow night from 8:30 to midnight. Message-ID: <66aaf8f30803281719s6bf18be5ic38c63c5ae7838d8@mail.gmail.com> Sample won't be ready. Sorry for late notice. -- Li --------------------------------------- Li Zhang Dai's Group Department of Chemistry Stanford University --------------------------------------- .oooO ( ) Oooo. \ ( ( ) \ ) ) / Life is good, ( / it's just not easy. -------------- next part -------------- An HTML attachment was scrubbed... URL: From ahryciw at gmail.com Fri Mar 28 21:45:52 2008 From: ahryciw at gmail.com (Aaron Hryciw) Date: Fri, 28 Mar 2008 21:45:52 -0700 Subject: "Finished" early: Raith150 program crashed Message-ID: <4d36fb940803282145r7fd84e84l9787d442cde13d0c@mail.gmail.com> Hello all (especially James, who might know why this happened, and koseki, who is next) - I am "finished" my session early, due to a crash of the Raith150 program. I was saving some minor changes to my patterns in the GDSII database while making my final positionlist, and, after eight modifications without any problems, the Raith150 program suddenly popped up two fatal error messages, indicating something to the effect of a "read violation" of some memory address (sorry, I don't remember the exact wording), and shut down. Upon restarting the program, the UVW coordinate system was reset, the positionlist wasn't saved, and, in any event, I do not have time to refocus, etc., in my remaining reservation time. Does anyone know why I got these error messages and the Raith150 crash? Did I exceed available memory? My patterns were reasonably large dose arrays, explicitly drawn out as single structure references (perhaps this was a mistake, and I ought to have made a structure reference of the single structure, and done the matrix duplication in the positionlist instead). Please advise! Best, - Aaron -- Aaron Hryciw Postdoctoral Scholar Geballe Laboratory for Advanced Materials Stanford University 476 Lomita Mall (04-490) McCullough Building, Rm. 325 Stanford, CA 94305-4045 Tel.: (650) 723-5840 Fax.: (650) 736-1984 -------------- next part -------------- An HTML attachment was scrubbed... URL: From kimsangb at stanford.edu Sat Mar 29 22:34:00 2008 From: kimsangb at stanford.edu (SangBum Kim) Date: Sat, 29 Mar 2008 22:34:00 -0700 Subject: raith free from 12AM to 5AM Message-ID: <20080329223400.02jan555wk44wwcg@webmail.stanford.edu> Sample is not ready. It is free until 9AM tomorrow. Sorry for late notice. From ahazeghi at stanford.edu Mon Mar 31 12:37:30 2008 From: ahazeghi at stanford.edu (Arash Hazeghi) Date: Mon, 31 Mar 2008 12:37:30 -0700 Subject: RAITH reservation swap Message-ID: <00fe01c89366$a8e7cd10$fab76730$@edu> Hi, I have a RAITH reservation on Tuesday 4/8 from 21:00 to 1:30AM which I'd like to swap for time during the day (10AM to 6PM) so James can help me with my design, I'd greatly appreciate if anyone can swap their daytime reservation with me. Thank you, Arash ---------------------------------------------------------------------------- ------ Arash Hazeghi PhD Candidate Stanford Center for Integrated Systems CIS-X 300, 420 Via Palou Mall, Stanford, CA 94305 phone: +1-650-725-0418 web: http://www.stanford.edu/~ahazeghi -------------- next part -------------- An HTML attachment was scrubbed... URL: From ljzhou at ucdavis.edu Mon Mar 31 22:52:17 2008 From: ljzhou at ucdavis.edu (Linjie Zhou) Date: Mon, 31 Mar 2008 22:52:17 -0700 (PDT) Subject: PC account Message-ID: <200804010552.m315qHYB007905@xylocopa.ucdavis.edu> Hi, Does anybody know the account and password of the PC that is on the table close to the Raith computer (also installed Raith program for pattern preparation)? Thanks, Linjie > Hi, > > I have a RAITH reservation on Tuesday 4/8 from 21:00 to 1:30AM which I'd > like to swap for time during the day (10AM to 6PM) so James can help me > with > my design, I'd greatly appreciate if anyone can swap their daytime > reservation with me. > > > > Thank you, > > Arash > > > > ---------------------------------------------------------------------------- > ------ > > Arash Hazeghi > > > > PhD Candidate > > Stanford Center for Integrated Systems > > CIS-X 300, 420 Via Palou Mall, > > Stanford, CA 94305 > > > > phone: +1-650-725-0418 > > web: http://www.stanford.edu/~ahazeghi > > > > From faraon at stanford.edu Mon Mar 31 22:53:33 2008 From: faraon at stanford.edu (Andrei Faraon) Date: Mon, 31 Mar 2008 22:53:33 -0700 Subject: PC account In-Reply-To: <200804010552.m315qHYB007905@xylocopa.ucdavis.edu> References: <200804010552.m315qHYB007905@xylocopa.ucdavis.edu> Message-ID: <28d3ece90803312253s4e9d9b86l7270bc01850f87ce@mail.gmail.com> The password and username are written under the keyboard. Andrei On Mon, Mar 31, 2008 at 10:52 PM, Linjie Zhou wrote: > > Hi, > > Does anybody know the account and password of the PC that is on the table > close to the Raith computer (also installed Raith program for pattern > preparation)? > > Thanks, > > Linjie > > > > > > Hi, > > > > I have a RAITH reservation on Tuesday 4/8 from 21:00 to 1:30AM which I'd > > like to swap for time during the day (10AM to 6PM) so James can help me > > with > > my design, I'd greatly appreciate if anyone can swap their daytime > > reservation with me. > > > > > > > > Thank you, > > > > Arash > > > > > > > > > ---------------------------------------------------------------------------- > > ------ > > > > Arash Hazeghi > > > > > > > > PhD Candidate > > > > Stanford Center for Integrated Systems > > > > CIS-X 300, 420 Via Palou Mall, > > > > Stanford, CA 94305 > > > > > > > > phone: +1-650-725-0418 > > > > web: http://www.stanford.edu/~ahazeghi > > > > > > > > > -- Andrei Faraon Stanford University, Applied Physics 316 Via Pueblo Mall Stanford, CA, 94305 Mobile: 650 714 7881 Office: 650 723 2279 www.stanford.edu/~faraon -------------- next part -------------- An HTML attachment was scrubbed... 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