fanpy839 at stanford.edu
Tue Jul 21 18:17:51 PDT 2009
I have been using zep520 (~250nm thickness). My pattern involves 100nm-1000nm wide areas to be exposed with 200nm separation in between.
I have tried exposure dose from 35-40uC/cm^2 @10keV. After development, I could only identify the separation between 100nm wide patterns. For wider patterns, the 200nm separations between them just disappear and the exposed areas look like having merged into a whole big pad.
Is this due to proximity effect? Do you have any advice and tips (such as a smaller dose overall or applying the proximity correction software on raith)?
Thank you very much and I would really appreciate your replies!
PhD student, Materials Science & Engineering, Stanford University, Stanford, CA
BS in Physics 2008, School of Physics, Peking University, Beijing, China
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