From jasonlin at stanford.edu Sat Feb 5 20:22:38 2011 From: jasonlin at stanford.edu (J. Jason Lin) Date: Sat, 5 Feb 2011 20:22:38 -0800 Subject: savannah released Sunday, Monday Message-ID: Released bunch of time on Sunday evening and Monday afternoon. -------------- next part -------------- An HTML attachment was scrubbed... URL: From luckys at stanford.edu Wed Feb 9 12:56:47 2011 From: luckys at stanford.edu (Lucky Suriyasena Liyanage) Date: Wed, 9 Feb 2011 12:56:47 -0800 (PST) Subject: Savannah is free the whole day! Message-ID: <1617426754.927025.1297285007357.JavaMail.root@zm03.stanford.edu> Samples are not ready! Thanks, Lucky From jprovine at stanford.edu Thu Feb 10 08:26:21 2011 From: jprovine at stanford.edu (J Provine) Date: Thu, 10 Feb 2011 08:26:21 -0800 Subject: free thursday am Message-ID: trainee cancelled. savannah is available. j -------------- next part -------------- An HTML attachment was scrubbed... URL: From jprovine at stanford.edu Thu Feb 17 10:57:44 2011 From: jprovine at stanford.edu (J Provine) Date: Thu, 17 Feb 2011 10:57:44 -0800 Subject: ALD updates (savannah, fiji-l, and fiji-r) and ALD Spring Retreat Message-ID: Hello all, a brief update on ald status in the snf. *Savannah* the savannah is running well and fully functional. Al2O3, HfO2, ZrO2, and TiO2 are performing as demonstrated last year. currently the TMA pulses for Al2O3 Standard recipe are much larger than necessary and i'm adjusting the recipe to waste less TMA once i verify that the performance (optical and electrical) of the deposited film is unchanged by shortening the TMA pulse duration. when i get the chance i'm working with the new ammonia line to check on TiN deposition also, but this has been somewhat slow going currently. the savannah website has been significantly updated with more characterization data (Al2O3 published - TiO2, HfO2, ZrO2 still to be uploaded) and updated instructions to reflect the new ammonia line and new lessons learned. i strongly encourage all savannah users to (re)read the website to ingest these changes: https://snf.stanford.edu/SNF/equipment/chemical-vapor-deposition/ald/savannah *Fiji-l & Fiji-r* We still have no news from the permit proposal we submitted to the fire marshall's office in mid-december. no rejection, no approval. a request for additional information was met by John Shott several weeks ago. this means the fire marshall's has not met its own timeline of replying within 15 business days by a long shot. snf staff is applying regular contact to encourage response. we remain optimistic with extreme caution. *ALD Spring Retreat 2011* Cambridge Nanotech is hosting a workshop on ALD at Stanford march 14 and 15th. more information and registration can be found here: www.cambridgenanotech.com/spring this is not a sales meeting or pitch, but instead an open exchange of ALD knowledge and ideas. there is a registration fee that includes lunch and dinner for monday. An agenda is attached (some time slots may move, but the speakers are set). Finally, the ald user group meeting for snf which is bi-weekly fridays at 10am in allen 101...is cancelled for february 18 because i need to be in berkeley that morning for a meeting. see you march 4th. thanks, j -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Spring Retreat Agenda.pdf Type: application/pdf Size: 74223 bytes Desc: not available URL: From jprovine at stanford.edu Thu Feb 17 18:26:16 2011 From: jprovine at stanford.edu (J Provine) Date: Thu, 17 Feb 2011 18:26:16 -0800 Subject: ALD updates (savannah, fiji-l, and fiji-r) and ALD Spring Retreat In-Reply-To: References: Message-ID: hi all, back again with a fast update on the fiji permitting status*. the county has declined to rule on the permit application submitted in december 2010. this not that they are saying "no" or "yes" just that they are not responding. the fire marshall's office would like to have a standardized template for permit applications submitted. in the long run this will be great for snf because it will make clear the necessary elements of a good application and hopefully the equipment permitting process. in the short term it means that this template must be generated and submitted to the fire marshall's office. john shott made a first cut today and various stanford fire and eh&s folks and roger and i will be tackling this to see what can be added. the effort is on to turn this around quickly (as soon as the beginning of next week), so that the clock can start to tick on the fire marshall's office again. while i'm sure this news latest is frustrating, we must do our best to meet this new challenge as quickly and thoroughly as possible so that researchers can get access to the fiji. i'll keep you updated as things progress. j *whether you believe it or not, i update you with all real news as it comes in (sparing everyone innuendo, rumor, and hearsay). how infrequently and sparingly you hear an update on fiji permitting from me is exactly how infrequently i hear from any source. On Thu, Feb 17, 2011 at 10:57 AM, J Provine wrote: > Hello all, > a brief update on ald status in the snf. > > *Savannah* > the savannah is running well and fully functional. Al2O3, HfO2, ZrO2, and > TiO2 are performing as demonstrated last year. currently the TMA pulses for > Al2O3 Standard recipe are much larger than necessary and i'm adjusting the > recipe to waste less TMA once i verify that the performance (optical and > electrical) of the deposited film is unchanged by shortening the TMA pulse > duration. > when i get the chance i'm working with the new ammonia line to check on TiN > deposition also, but this has been somewhat slow going currently. > the savannah website has been significantly updated with more > characterization data (Al2O3 published - TiO2, HfO2, ZrO2 still to be > uploaded) and updated instructions to reflect the new ammonia line and new > lessons learned. i strongly encourage all savannah users to (re)read the > website to ingest these changes: > https://snf.stanford.edu/SNF/equipment/chemical-vapor-deposition/ald/savannah > > *Fiji-l & Fiji-r* > We still have no news from the permit proposal we submitted to the fire > marshall's office in mid-december. no rejection, no approval. a request > for additional information was met by John Shott several weeks ago. this > means the fire marshall's has not met its own timeline of replying within 15 > business days by a long shot. snf staff is applying regular contact to > encourage response. we remain optimistic with extreme caution. > > *ALD Spring Retreat 2011* > Cambridge Nanotech is hosting a workshop on ALD at Stanford march 14 and > 15th. more information and registration can be found here: > www.cambridgenanotech.com/spring > this is not a sales meeting or pitch, but instead an open exchange of ALD > knowledge and ideas. there is a registration fee that includes lunch and > dinner for monday. > An agenda is attached (some time slots may move, but the speakers are set). > > > Finally, the ald user group meeting for snf which is bi-weekly fridays at > 10am in allen 101...is cancelled for february 18 because i need to be in > berkeley that morning for a meeting. see you march 4th. > > thanks, > j > -------------- next part -------------- An HTML attachment was scrubbed... URL: From jprovine at stanford.edu Thu Feb 24 18:59:26 2011 From: jprovine at stanford.edu (J Provine) Date: Thu, 24 Feb 2011 18:59:26 -0800 Subject: precursor changes Message-ID: hello all, the ammonia line has been cleared the source bottle turned off in preparation for adding an O2 filter on that line. elmer will have to weld a fitting for this change so i will update everyone as soon as i know the timeline. additionally, the request for some different chemistries means there is a need for some precursor swapping. i would like to make the following proposal: removing the zirconium precursor on wednesday march 2 in the morning to be replaced with diethy-zinc for ZnO films. then on monday march 14, swapping the zinc precursor out for the Yttrium precursor. if this causes problems in your fabrication plans, please let me know. j -------------- next part -------------- An HTML attachment was scrubbed... URL: