savannah update

[J Provine]

daesung lee and i are running HfO2 thursday night/friday morning.  so if
others need that material a test deposition will already be done by early
tomorrow morning.  also a possible solution has arisen for fixing the heater
connection.  if it is successful everything will be back to normal friday.
 if not, then it is back to the short-term solution.
j

On Thu, Jan 20, 2011 at 3:43 PM, J Provine <jprovine at stanford.edu> wrote:

> hi everyone,
> from the list below here is the update.
> 1) install new substrate heater (DONE)
> 2) assemble chamber (DONE)
> 3) leak check system pump (DONE) and He leak checked (DONE)
> 4) bake out (CURRENTLY ONGOING)
> still to come
> 5) test deposition
>
> unfortunately there is an issue with the connection on one of the substrate
> heaters.  jim haydon and i were able to work out a temporary solution that i
> believe is ok.  i'll be checking the system throughout bake out and get info
> from cambridge nanotech to make sure our solution is feasible.  i am not
> comfortable with leaving the system unattended in its current state and will
> not release it to users as is.  i know some folks are up against some tough
> time crunches and so unless i found out our current heater solution is not
> functioning, i will help people run the system until a permanent fix can be
> figured out.
>
> however, i am away at the MEMS conference from sunday morning until
> thursday evening and if a solution can not be found before i leave the
> system will be left offline in my absence until a permanent solution can be
> figured out.
>
> so starting this evening at 10pm and running until saturday at 10pm is 48
> hours of potential deposition.  remember the tool has just come back online
> so a test deposition is not just recommended but required for whatever film
> you are running.  respond to this email requesting slots letting me know
> what deposition you need and the urgency and available times.
>
> for those awaiting training, it does not make sense to me to train you on
> the tool in its current state.  i am sorry for the continued delay, but i
> believe everyone would prefer a functioning and safe system instead of just
> one they can use.  since the only remaining problem is this one heater, i am
> hopeful that this can be resolved asap.
>
> more updates as they become available.
> j
>
> On Wed, Jan 19, 2011 at 10:47 AM, J Provine <jprovine at stanford.edu> wrote:
>
>> hi all,
>> cambridge nanotech sent a replacement part for the substrate heater
>> overnight.  it arrived just now.  i'm in meetings most of the day, but i'll
>> grab time in the snf when i can to start assembling the chamber.  this is
>> the sequence of events:
>>
>> 1) install new substrate heater
>> 2) assemble chamber
>> 3) leak check (first with system pump and then with He leak checker
>> 4) bake out (this is several hours) to get the chamber hot and drive off
>> moisture that collected.
>> 5) test deposition (thursday morning)
>> 6) release the tool to others & start training the backlog of new users
>> (be willing to let the new users shadow you - they will also be shadowing me
>> for the test runs)
>>
>> of course each step has to be successful for the next step to be enacted.
>>  i'll keep you updated as this progresses.
>> j
>>
>
>
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