Jim McVittie mcvittie at snf.stanford.edu
Mon Jun 30 12:15:09 PDT 2003


The melting point is not the issue. It is the vapor pressure is the concern.
The vapor pressure of tin is not that bad. Tin has a vapor pressure of 1E-4
T at 997C. My cutoff for high vapor pressure materials is Indium, which has
a vapor pressure.of 1E-4 T at 773C. By the way Copper is at 1E-4 T at 1017C,
so there is not much difference between copper and tin.


Mary Tang wrote:

> Hi all --
> Aditi (coral login = kitu) has asked for copper and then tin to be
> deposited on her substrates (no break in vacuum between depositions).
> Since tin is a low melting temperature metal, will this be a problem for
> metalica?  Are there any other concerns?
> Mary
> --
> Mary X. Tang, Ph.D.
> National Nanofabrication Users' Network
> Stanford Nanofabrication Facility
> CIS Room 136, Mail Code 4070
> Stanford, CA  94305
> (650)723-9980
> mtang at snf.stanford.edu
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