[Fwd: FW: Impurity levels in CVD diamond]

Michael Deal mdeal at stanford.edu
Wed Nov 5 16:21:15 PST 2003


I agree with Jim.  I don't believe "no metal above the detection limit of 
1ppm."   Maybe some metals, but not all.      -mike



At 03:20 PM 11/5/2003, Jim McVittie wrote:
>Mary,
>
>His impurity analysis seems to be too good if one assumed standard
>detectivity levels. In our best Si wafers with our best cleaning
>procedures, we always see impurities above the detectivity level.
>My conclusion is that is that their measure method was not up industrial
>standards and is not meaningful. Holding him to the same standard as we
>use for everyobne else, I want to see results from Charles Evans or have
>him do his run just before the tube is clean.  What do you say Mike?
>
>     Jim
>
>
>
>Mary Tang wrote:
>
> > Hello SpecMat'ers --
> >
> > Shabbir was asking about the status of his SpecMat request to process
> > diamond-coated wafers in the nitride tube.  I had a chat with him and
> > learned more about what he wants.  He wants a smooth, dense nitride
> > film on top of his wafers (so PECVD nitride will not do.)  I asked him
> > if he had any information from the vendor about the quality of the CVD
> > diamond film, and this is what he has provided.  Is this adequate to
> > approve processing of these wafers in tylannitride?
> >
> > Mary
> >
> > -------- Original Message --------
> > Subject: FW: Impurity levels in CVD diamond
>      Date: Wed, 5 Nov 2003 11:58:03 -0800
>      From: "Shabbir A. Bashar, Ph.D." <bashar at snf.stanford.edu>
>        To: <mtang at snf.stanford.edu>
> >
> > Hi Mary,Here's the certification for our CVD diamond vendor.  I hope
> > this will satisfy your needs.Shabbir.
> > -----Original Message-----
> > Sent: Wednesday, November 05, 2003 11:56 AM
> > To: bashar at snf.stanford.edu
> > Subject: Fwd: Impurity levels in P1 CVD diamond
> >
> > Note: forwarded message attached.
> > -----------------------------------------------------------------------
> > Do you Yahoo!?
> > Protect your identity with Yahoo! Mail AddressGuard
> >    ----------------------------------------------------------------
> >
> > Subject: Impurity levels in P1 CVD diamond
> > Date: Tue, 4 Nov 2003 13:06:22 -0800
> > From: "Michael Pinneo" <mpinneo at p1diamond.com>
> > To: <Shabbir_Bashar at Group4Labs.com>
> > CC: "John Herb" <jaherb at p1diamond.com>
> >
> > To whom it may concern:
> >
> > These comments concern non-carbon elemental impurity levels in CVD
> > diamond materials made using plasma CVD in P1 Diamond deposition
> > systems.
> >
> > The materials exposed to the deposition process are aluminum (chamber
> > walls), molybdenum (substrate holder), and fused silica (observation
> > windows).
> >
> > X-ray fluorescence tests done at FermiLab in 2001 on samples of our CVD
> > diamond showed no metal or oxygen impurities above the detection limit
> > of one part per million.  Silicon was found in the samples at
> > concentrations less than 10ppm.
> >
> > Based on these results, P1's CVD diamond films meet or exceed
> > requirements for designation as CMOS Grade or Electronic Grade
> > materials.
> >
> > Sincerely,
> >
> >
> > Michael Pinneo, Ph.D.
> > CTO
> >
> > P1 Diamond, Inc.
> > 3571 Leonard Court
> > Santa Clara, CA  95054
> >
> > 408-567-9684 x103
> > 408-567-9685  fax
> >
> >




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