Shipley 1805 and developer 351

John Shott shott at snf.stanford.edu
Tue Apr 13 08:45:44 PDT 2004


Lan:
 
Certainly MF319 would be preferred from the standpoint of mobile ion
contamination.  I've got no experience, however, to say whether MF319 works
well with S1805 resist.
 
When you say that you hope to achieve 0.5 um linewidths, I trust that means
that you have masks that were made outside as we have no ability to produce
features anywhere that small on a 1X mask with out mask making tools.

Thanks,

John
 
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