Shipley 1805 and developer 351

[John Shott]

Lan:
 
Certainly MF319 would be preferred from the standpoint of mobile ion
contamination.  I've got no experience, however, to say whether MF319 works
well with S1805 resist.
 
When you say that you hope to achieve 0.5 um linewidths, I trust that means
that you have masks that were made outside as we have no ability to produce
features anywhere that small on a 1X mask with out mask making tools.

Thanks,

John
 
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