Request for Yttrium use
mcvittie at snf.stanford.edu
Tue Aug 17 12:46:47 PDT 2004
I see no problem in using Y in the Metalica. There are no safety issues
(ratings: 0 0 1) that I can fine and it has a relatively low vapor
pressure (1e-8T at 830C). Sputtering is the preferred method of
deposition for this metal.
jim kruger wrote:
> Request for approval of Y (Yttrium) deposition in
> Requestor: Jim Kruger (jimkruger at snf.stanford.edu)
> Phone: 650-726-7260
> e-mail: jimkruger at yahoo.com
> Advisor: Cymer (John Viatella)
> 1985 Las Plumas Avenue
> San Jose, CA 95133
> (408) 259-7337 Phone
> (408) 729-0277 Fax
> Vendor e-mail: acialloys.com
> This material is a candidate for use in the
> Multi-Layer-Mirrors that will be used for EUV
> Work at SNF would be limited to sputter deposition in
> Metallica, determination of film thickness by Dektak,
> Zygo , manual 4-point probe and possibly AFM. Wafers
> are to be sawed into coupons for tests outside of SNF.
> Since Yttrium (Y) is already in use in SNF ( Innotec),
> I dont believe there are any issues. The vapor
> pressure of Y is very similar to that of Si. Finely
> divided particles of Y are reported as igniting in air
> above 400 C, but thin films for Multi-layer-mirrors
> are reported as stable.
> Material form: Solid
> I propose to bring one sputter target (1 dia. x
> 0.125) into SNF and deposit 10 to 100 nm on 8 or 12
> wafers. Beyond film measurements and sawing, only
> annealing tests (hot plate or Blue M oven) are
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