Request for Yttrium use

Jim McVittie mcvittie at snf.stanford.edu
Tue Aug 17 12:46:47 PDT 2004


All,

I see no problem in using Y in the Metalica. There are no safety issues
(ratings: 0 0 1) that I can fine and it has a relatively low vapor
pressure (1e-8T at 830C).  Sputtering is the preferred method of
deposition for this metal.

    Jim

jim kruger wrote:

> Request for approval of Y (Yttrium) deposition  in
> Metallica
>
> Requestor:  Jim Kruger  (jimkruger at snf.stanford.edu)
> Phone:  650-726-7260
> e-mail:  jimkruger at yahoo.com
> Advisor:  Cymer  (John Viatella)
>
> Vendor:
> ACIalloys.com
> 1985 Las Plumas Avenue
> San Jose, CA 95133
> (408) 259-7337 Phone
> (408) 729-0277 Fax
>
> Vendor e-mail: acialloys.com
>
> This material is a candidate for use in the
> Multi-Layer-Mirrors that will be used for EUV
> Lithography.
> Work at SNF would be limited to sputter deposition in
> Metallica, determination of film thickness by Dektak,
> Zygo , manual 4-point probe and possibly AFM.  Wafers
> are to be sawed into coupons for tests outside of SNF.
>
> Since Yttrium (Y) is already in use in SNF ( Innotec),
> I don’t believe there are any issues.  The vapor
> pressure of Y is very similar to that of Si.  Finely
> divided particles of Y are reported as igniting in air
> above 400 C, but thin films for Multi-layer-mirrors
> are reported as stable.
>
> Material form: Solid
> I propose to bring one sputter target (1” dia. x
> 0.125”) into SNF and deposit  10 to 100 nm on 8 or 12
> wafers.  Beyond film measurements and sawing, only
> annealing tests (hot plate or Blue M oven) are
> planned.
>
>
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