Couple of requests from MEMS Exchange
latta at snf.stanford.edu
Wed Aug 18 09:36:01 PDT 2004
The MEMS Exchange people has asked me to ask about two etch proccesses;
1) They have a customer that has nitride over Moly/carbon on a Si
substrate. They want to use a Cl process to etch the nitride and expose
the Moly/carbon. Any chance pquest can be used? They do not want to
use a flourine process.
2) Another customer wants to etch Al/3%Ti off a SiC substrate. I need
to check about the cleanliness of the sputtered metals, but the first
problem is that the samples are 2 inch. They are suggesting that we
mount them to a 4 in wafer and use p5000.
Thanks for your reply,
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