[Fwd: New materials request]

Mary Tang mtang at snf.stanford.edu
Mon Feb 23 11:38:37 PST 2004

Hi all --

Was this approved?  (Sorry, I don't seem to have any response in my


-------- Original Message --------
Subject: New materials request
Date: Fri, 30 Jan 2004 12:08:41 -0800
From: masa <masafumi at stanford.edu>
To: specmat at snf.stanford.edu
CC: mcvittie at snf.stanford.edu

Dear Special Materials Committee,

I'd like to request to use new materials in CIS. Here is information

Requestor name: Masafumi Nakamura

Phone number: 6507259936

email address: masafumi at stanford.edu

Requestorfs PI (Advisor) or Company: Prof. Prinz

The name of the new Chemical (give all names commonly used):
YSZ(Yttrium Stabilized Zirconia) and GDC(Gadolinium Doped Ceria)

If there are secondary new chemicals that must be used with this
material, such as a developer for a new resist, list each of them here
and supply MSDSs for each of them. 

Name of vendor/manufacturer that you are planning to obtain this
material from: Kurt J. Lesker

URL for vendorfs website where info on the proposed chemical can be

Vendorfs address and phone number: 
3983 First Street 
Livermore, CA 94551

What is your reason for wanting to bring this material into the lab: 
I want to process, such as etch, Si wafer or SiN in CIS after deposition
of these materials. 

List all the lab equipment and wet benches that you propose to use with
this chemical:
Drytek1 and wetbenchgen

Proposed quantity of the chemical that you want to bring into lab (give
both raw and mixed quantities): 
YSZ: Yttrium 16%, Zirconia 84% - Purity:99.7%
GDC: Gadolinium 20%, Ceria 20% - Purity:99.9%

State the form that the proposed chemical is in: Thin film on Si wafer.

Put together a detailed process flow description on how you proposed to
use this
The materials are DC sputtered thin film and oxidized afterward.

I sent MSDS to Jim via fax. If you have any comment on them, Please let
me know.

Masafumi Nakamura

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