Application to use SU-8
mahnaz at snf.stanford.edu
Tue Jul 6 14:17:38 PDT 2004
sorry for the delay, the issue with su8 is contamination. we do allow
the chemical to be spun only at headway and is one on one base. I will
see you today for training so we can discuss it in more details.
Umberto Ulmanella wrote:
> To whom it may concern,
> I am contemplating the possibility of using SU-8 photoresist from
> Microchem corp. (http://www.microchem.com) in my process. The goal is
> to obtain tall structures, in the order of 100um or more, in
> particular reservoir and channels, with minimum feature size 10um.
> Currently the design has not been finalized, so the choice between the
> different families of product is still open, with the SU8-50 to 100
> and SU8-2035 to 2100 the most likely. I would appreciate any feedback
> on the choice of a particular type, especially for what concerns the
> difference between the traditional SU8 and the newer SU8-2000 types.
> Please find attached the necessary documentation as per the SNF
> procedures listed in your website. Any suggestions regarding changes
> to equipment and/or procedures are welcome.
> Umberto Ulmanella
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