Application to use SU-8

Mahnaz Mansourpour mahnaz at snf.stanford.edu
Tue Jul 6 14:17:38 PDT 2004


Hi Umberto,
 sorry for the delay, the issue with su8 is contamination. we do allow
the chemical  to be spun only at headway and is one on one base. I will
see you today for training so we can discuss it in more details.

mahnaz

Umberto Ulmanella wrote:

>
> To whom it may concern,
>
> I am contemplating the possibility of using SU-8 photoresist from
> Microchem corp. (http://www.microchem.com) in my process. The goal is
> to obtain tall structures, in the order of 100um or more, in
> particular reservoir and channels, with minimum feature size 10um.
> Currently the design has not been finalized, so the choice between the
> different families of product is still open, with the SU8-50 to 100
> and SU8-2035 to 2100 the most likely. I would appreciate any feedback
> on the choice of a particular type, especially for what concerns the
> difference between the traditional SU8 and the newer SU8-2000 types.
> Please find attached the necessary documentation as per the SNF
> procedures listed in your website. Any suggestions regarding changes
> to equipment and/or procedures are welcome.
>
> Regards,
>
> Umberto Ulmanella
>
>
>
>
-------------- next part --------------
An HTML attachment was scrubbed...
URL: <http://snf.stanford.edu/pipermail/specmat/attachments/20040706/4eca82db/attachment.html>


More information about the specmat mailing list