New Material registering request [UV15]

Mahnaz Mansourpour mahnaz at snf.stanford.edu
Thu Mar 4 11:13:09 PST 2004


I think is just fine.
mahnaz
Mary Tang wrote:

> Hi all --
>
> Hiro has several requests for similar materials.  As it seems that all the
> processing through the material cure will be done outside SNF, the films that
> the drytek and the semhitachi see will be generally inert (organic or silicone
> polymers of mixtures thereof.)  All these sound OK to me.  Can we approve
> them?
>
> Mary
>
> "Tetsuhiro (Hiro) Hatogai" wrote:
>
> > Special Materials Committee:
> >
> > Here is the application for new material, UV15.
> > Mainly we are going to use these materials in "Drytek1" and
> > "semhitachi".
> > I attached the scanned MSDS for the material.
> >
> > Here is the information for the material required by following website.
> > http://snf.stanford.edu/Materials/NewMatProc.html
> >
> > 1.  Requestor name: Tetsuhiro Hatogai
> > 2.  Phone number: 650-799-5366
> > 3.  Email address: hatogai at stanford.edu
> > 4.  Requestors PI: Professor R. Fabian W. Pease
> > 5.  Name of new chemical: UV15
> > 6.  No other materials
> > 7.  Name of vendor: Master Bond Inc.
> > 8.  http://www.masterbond.com
> > 9. 154 Hobart Street Hackensack, New Jersey 07601
> > 10. We would like to find materials that suit well to fabricate small
> > structures
> > 11. Find other material that is comparable with UV15.
> > 12. Drytek1, semhitachi
> > 13. 1 oz.
> > 14. Liquid
> > 15. No chemical is needed to mix it
> > 16. Please see attached
> > 17. Will not be used in the clean area
> > 18. Storage group identifier = L, Main Hazard Class = 6
> > 19. Should be enough room
> > 20. It can be disposed as usual trash.
> > 21. Process Flow:
> > (1) Spin-coat PVA on a silicon wafer that has small structure on it
> >      using spin coater that our group owns in Packard 076
> > (2) Detach dried PVA film from silicon wafer,
> > (3) Spin-coat UV15 on the side that has structures on it of dried PVA
> > film
> > (4) Etch back UV15 to reduce the thickness of residual layer using
> > drytek1
> > (5) Observe the structures and measure the residual layer thickness
> > using semhitachi
> >
> > Sincerely,
> > Tetsuhiro Hatogai (Hiro)
> >
> >   ------------------------------------------------------------------------
> >                        Name: MSDS UV15 p1.JPG
> >    MSDS UV15 p1.JPG    Type: JPEG Image (image/jpeg)
> >                    Encoding: base64
> >
> >                        Name: MSDS UV15 p2.JPG
> >    MSDS UV15 p2.JPG    Type: JPEG Image (image/jpeg)
> >                    Encoding: base64
>
> --
> Mary X. Tang, Ph.D.
> Stanford Nanofabrication Facility
> CIS Room 136, Mail Code 4070
> Stanford, CA  94305
> (650)723-9980
> mtang at stanford.edu
> http://snf.stanford.edu




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