mtang at snf.stanford.edu
Mon Mar 22 09:24:06 PST 2004
Hi SpecMat'ers --
Then, let's say that this is officially approved, just for Vignesh and
for this procedure.
Vignesh G wrote:
> Hi Mary,
> My answers are inline, in bold.
> - Vignesh
> At 03:54 PM 3/19/2004 -0800, you wrote:
>> Hi all --
>> The polymer is pretty inert (or at least each block is inert, and
>> it's likely that the block copolymer is as well). Benzene is a
>> carcinogen, but is no worse that chlorobenzene, which is used as a
>> solvent for many resists used at the headway, which has particularly
>> good exhaust. The headway is not really set up for flushing volumes
>> of solvent, but if only 10 ml are used, then I think it's OK (would
>> you agree, Mahnaz?)
>> The only other concern I'd have is the post-spin incubation in a
>> benzene atmosphere. It seems that you might want to have the chip
>> placed next to a small beaker of benzene and place these under a
>> larger beaker -- I think it would be a good idea to place these into
>> a larger petri dish, in order to contain any possible spills and
>> drips. I also think that it would be better to do this incubation
>> in one of the solvent hoods, rather than at the headway spin bench
>> (since that bench is polypro and not really meant to be in contact
>> with solvents.) Vignesh -- is it OK to transfer your chip from the
>> headway to the solvent bench for post-spin processing?
> Yup, don't see a problem in letting my samples incubate in anyplace
> besides the Headway bench.
>> What do all you SpecMat'ers think?
>> Vignesh G Shankar wrote:
>> > To the SpecMat Committee,
>> > Subject: Approval to use Poly (styrene-b-ethyleneoxide)
>> > 1. Vignesh Gowrishankar
>> > 2. 650 736 0268
>> > 3. vigneshg at stanford.edu
>> > 4. Prof. Michael McGehee
>> > 5. Chemical: Poly (styrene-b-ethyleneoxide)
>> > 6. Will need benzene as solvent
>> > 7. "Homemade" at IBM Almaden
>> > 8. unavailable
>> > 9. unavailable
>> > 10. I need to spin coat the block copolymer with benzene as my
>> > solvent, for which I need a powerful "fume hood" / exhaust.
>> > 11. This block copolymer self-assembles to give me the structures I
>> > need. Benzene is the only solvent that works for what I need.
>> > 12. Headway
>> > 13. 10 ml
>> > 14. Solution
>> > 15. Benzene will be the solvent for this block copolymer (PS-b-PEO)
>> > 16. MSDS for the individual blocks are available. They are attached
>> > 17. Will not need to store in SNF
>> > 18. Purity: unknown
>> > 19. not sure yet
>> > 20. not sure yet
>> > 21. Process Flow: Place Si piece on Headway, spin and flush with
>> > benzene. Stop spinner, drop a couple of drops of block-copolymer
>> > (PS-b-PEO) benzene solution and spin again to spin coat. Place Si
>> > pieces with spin coated samples in an atmosphere saturated with
>> > benzene (under an overturned beaker for e.g.) for a few hours.
>> Mary X. Tang, Ph.D.
>> Stanford Nanofabrication Facility
>> CIS Room 136, Mail Code 4070
>> Stanford, CA 94305
>> mtang at stanford.edu
> Vignesh G. Shankar
> PhD Candidate in Materials Science and Engineering
> Stanford University
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
mtang at stanford.edu
-------------- next part --------------
An HTML attachment was scrubbed...
More information about the specmat