Poly (styrene-b-ethyleneoxide)

Mary Tang mtang at snf.stanford.edu
Mon Mar 22 09:24:06 PST 2004


Hi SpecMat'ers --

Then, let's say that this is officially approved, just for Vignesh and
for this procedure.

Thanks,

Mary

Vignesh G wrote:

> Hi Mary,
>
> My answers are inline, in bold.
>
> - Vignesh
>
> At 03:54 PM 3/19/2004 -0800, you wrote:
>
>> Hi all --
>>
>> The polymer is pretty inert (or at least each block is inert, and
>> it's likely that the block copolymer is as well).  Benzene is a
>> carcinogen, but is no worse that chlorobenzene, which is used as a
>> solvent for many resists used at the headway, which has particularly
>> good exhaust.  The headway is not really set up for flushing volumes
>> of solvent, but if only 10 ml are used, then I think it's OK (would
>> you agree, Mahnaz?)
>>
>> The only other concern I'd have is the post-spin incubation in a
>> benzene atmosphere.  It seems that you might want to have the chip
>> placed next to a small beaker of benzene and place these under a
>> larger beaker -- I think it would be a good idea to place these into
>> a larger petri dish, in order to contain any possible spills and
>> drips.  I also think that it would be better to do this incubation
>> in one of the solvent hoods, rather than at the headway spin bench
>> (since that bench is polypro and not really meant to be in contact
>> with solvents.)  Vignesh -- is it OK to transfer your chip from the
>> headway to the solvent bench for post-spin processing?
>
>
> Yup, don't see a problem in letting my samples incubate in anyplace
> besides the Headway bench.
>
>
>
>> What do all you SpecMat'ers think?
>>
>> Mary
>>
>> Vignesh G Shankar wrote:
>>
>> >
>> >
>> >      To the SpecMat Committee,
>> >
>> >      Subject: Approval to use Poly (styrene-b-ethyleneoxide)
>> >
>> >      1. Vignesh Gowrishankar
>> >      2. 650 736 0268
>> >      3. vigneshg at stanford.edu
>> >      4. Prof. Michael McGehee
>> >      5. Chemical: Poly (styrene-b-ethyleneoxide)
>> >      6. Will need benzene as solvent
>> >      7. "Homemade" at IBM Almaden
>> >      8.  unavailable
>> >      9. unavailable
>> >
>> >
>> > 10. I need to spin coat the block copolymer with benzene as my
>> > solvent, for which I need a powerful "fume hood" / exhaust.
>> > 11. This block copolymer self-assembles to give me the structures I
>> > need. Benzene is the only solvent that works for what I need.
>> > 12. Headway
>> > 13. 10 ml
>> > 14. Solution
>> > 15. Benzene will be the solvent for this block copolymer (PS-b-PEO)
>> >
>> > 16. MSDS for the individual blocks are available. They are attached
>> >
>> > 17. Will not need to store in SNF
>> > 18. Purity: unknown
>> > 19. not sure yet
>> > 20. not sure yet
>> > 21. Process Flow: Place Si piece on Headway, spin and flush with
>> > benzene. Stop spinner, drop a couple of drops of block-copolymer
>> > (PS-b-PEO) benzene solution and spin again to spin coat. Place Si
>> > pieces with spin coated samples in an atmosphere saturated with
>> > benzene (under an overturned beaker for e.g.) for a few hours.
>>
>>
>> --
>> Mary X. Tang, Ph.D.
>> Stanford Nanofabrication Facility
>> CIS Room 136, Mail Code 4070
>> Stanford, CA  94305
>> (650)723-9980
>> mtang at stanford.edu
>> http://snf.stanford.edu
>>
>
> -=-=-=-=-=-=-=-=-=-=-=-=-=-=-=-=-=-=-=-=-=-=-=-=-=-
> Vignesh G. Shankar
>
> PhD Candidate in Materials Science and Engineering
> Stanford University
>
> -=-=-=-=-=-=-=-=-=-=-=-=-=-=-=-=-=-=-=-=-=-=-=-=-=-

--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu

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