Ruthenium Processing in Lab

Jim McVittie mcvittie at cis.Stanford.EDU
Mon Mar 29 13:34:25 PST 2004

Hi Jim,

I got no replies from SpecMat concerning my note of Mar 18 on your use of
Ruthenium, so you can go ahead and use Ruthenium according to the plan we
discussed.  Jim

On Thu, 18 Mar 2004, Jim McVittie wrote:

> All,
> I met with Jim Kruger this morning and went over his request to do some
> processing of Ru in the SNF lab. The proposed processing includes sputter
> deposition of Ru in the Metallica system, PECVD of SiO2 on Ru in the STS
> dep system and wet etching of SiO2 on top of the Ru layer. The main safety
> question in processing this material is that Ru can forms two oxides, one
> of which is toxic. RuO2 is the oxide form, which is the most common, most
> stable and non-toxic (RuO2 -- melting point: 1200°C - sublimes, CAS
> registry number: 12036-10-1). RuO4 is the toxic, unstable form (Boiling
> point: 130°C, CAS registry number: 20427-56-9). RuO4 forms in O2 
> plasmas and in strong oxidizers. 
> In regard to the proposed process, the only likely time when RuO4 could
> form is during the initial deposition in the PECVD process. Since RuO4 is
> so volatile, any RuO4 formed during this brief period will go out the
> exhaust and will not be a problem to the operator/user. So I do not see
> that we have a safety problem here. I propose that we allow Jim to do
> what he proposed. However, since RuO4 formation is a concern, I suggest we
> limit this ok for Ru use in the lab to only what has been proposed
> here.  Any future Ru requests will need to be renewed at that time.
> 	Jim 
> On Wed, 10 Mar 2004, jim kruger wrote:
> > Attached is a more complete request for consideration
> > of Ruthenium.  
> > 
> > There is a 3-4 week ARO delay in obtaining the target.
> >  When might I expect a decision?  If only part of the
> > process flow is approved, we might go ahead with Ru
> > deposition and do more work outside.
> > 
> > Thanks, 
> > Jim Kruger
> > 
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Jim McVittie, Ph.D.    			Senior Research Scientist 
Allen Center for Integrated Systems     Electrical Engineering
Stanford University             	jmcvittie at
Rm. 336, 330 Serra Mall			Fax: (650) 723-4659
Stanford, CA 94305-4075			Tel: (650) 725-3640

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