Niobium use in cleanroom

Jim McVittie mcvittie at cis.Stanford.EDU
Fri Sep 10 12:48:41 PDT 2004


As far as I tell, there should be no problem with your proposed use of Nb 
in the lab. Nb has been etched in one of the Dryteks years ago. NbF5 has a 
boiling point of 79C so it will easily etch in a F based etch gas. Lets 
see if anyone else has any coments. 


On Fri, 10 Sep 2004, Gloria Wong wrote:

> Hi,
> I would like to process niobium/tungsten films (my project is on work
> function control of MOS structures) in the lab.  I will be depositing
> the films in the Clemens Lab in McCullough, then patterning the films in
> the cleanroom.  This would involve optical lithography (Karlsuss), dry
> etching (drytek 1), wet etching (wbgen) and Al deposition (metallica or
> innotec).
> Please let me know if Nb use is okay for the lab, or if there is
> information you need from me.  Also it would be helpful to know how long
> I will need to wait before a decision is made.
> Much thanks,
> Gloria
> PhD Candidate
> Clemens Group
> Materials Science and Engineering

Jim McVittie, Ph.D.    			Senior Research Scientist 
Allen Center for Integrated Systems     Electrical Engineering
Stanford University             	jmcvittie at
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Stanford, CA 94305-4075			Tel: (650) 725-3640

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