processing request

Ankur Jain ankurjn at
Tue Apr 5 13:15:47 PDT 2005

Hello SpecMat members,
 Following my request to allow processing of my wafers containing a Ni-Ti
film in the LTO furnace, I had a brief meeting with Mike discussing my
process flow. TiNi Alloy Company, the vendor that sputters these Ni-Ti
films for me uses a Perkin-Elmer 4450 sputterer that is used exclusively
for depositing Ni-Ti, and no other metals. They have done Auger
spectroscopy on their films in the past and the only significant surface
contamination observed was elemental carbon, which they say is normal for
anything exposed to air.
 Following my discussion with Mike, who agreed in principle to let me use
the LTO tube, I am sending this email to SpecMat with a request to kindly
expedite a final decision on my request. I would appreciate it very much
if I can get started on my microfabrication soon.



On Mon, 4 Apr 2005, Michael Deal wrote:

> LTO is semicleanB, so it's okay to put Ni and Ti in there as long as the Ni
> and Ta are not contaminated from somewhere else.  (We allow Ni and Ta
> deposited in the new SCT sputterer to go into semiclean tools now, for
> example.)     Ankur, where was the NiTi deposited and how clean is
> it?   (Was it deposited in a system that also does gold or iron?)
>                                                  0mike
> At 01:13 PM 4/4/2005, Ankur Jain wrote:
> >Hello SpecMat members,
> >  I have six 4-inch Si wafers. It has a sandwich of 2 micron thermal oxide
> >and 2 micron layer of Nickel-Titanium alloy on one side. The other side
> >has only 2 micron thermal oxide. I would like to deposit about 0.5 microns
> >of LTO on the Nickel-Titanium side. I understand that Ni is not one of the
> >standard metals allowed on the metal side of the LTO tube.  However,
> >Maurice suggested that I write to SpecMat and find out if it might be
> >possible to do a one-time deposition just before the LTO tube is scheduled
> >for pull and clean. Please let me know if that would be possible.
> >  If you have any other suggestions for depositing an electrically
> >passivating layer that will still let my wafers be processed in clean
> >equipment after deposition, I would welcome them.
> >
> >thanks,
> >
> >Ankur.
> >
> >*************************************************************************
> >Graduate Student
> >Microscale Heat Transfer Laboratories         Residence:
> >Room 201, Building 530                        126 Blackwelder Ct, Apt 902
> >Stanford, CA-94305                            Stanford, CA - 94305
> >Ph: 650-736-0044                              Cell Ph: 650-799-8986
> >

Graduate Student
Microscale Heat Transfer Laboratories         Residence:
Room 201, Building 530                        126 Blackwelder Ct, Apt 902
Stanford, CA-94305                            Stanford, CA - 94305
Ph: 650-736-0044                              Cell Ph: 650-799-8986

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